JP2000128695A - MANAGEMENT IN CLEANING CaF2 SINGLE CRYSTAL SUBSTRATE - Google Patents

MANAGEMENT IN CLEANING CaF2 SINGLE CRYSTAL SUBSTRATE

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Publication number
JP2000128695A
JP2000128695A JP10311049A JP31104998A JP2000128695A JP 2000128695 A JP2000128695 A JP 2000128695A JP 10311049 A JP10311049 A JP 10311049A JP 31104998 A JP31104998 A JP 31104998A JP 2000128695 A JP2000128695 A JP 2000128695A
Authority
JP
Japan
Prior art keywords
cleaning
single crystal
lens
caf
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10311049A
Other languages
Japanese (ja)
Inventor
Hiroyuki Suzuki
博幸 鈴木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP10311049A priority Critical patent/JP2000128695A/en
Publication of JP2000128695A publication Critical patent/JP2000128695A/en
Pending legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To provide a method for managing the cleanliness of the substrate surface made of CaF2 single crystal and having a preferred plane shape. SOLUTION: When the method for managing the cleanliness of the substrate surface made of CaF2 single crystal comprises (A) polishing the surface of a substrate made of CaF2 single crystal so as to have a preferred plane shape and (B) cleaning the above surface after that, the surface energy of a polished surface of the CaF2 single crystal substrate after being cleaned is measured and the value of its hydrogen bond term is managed so as to become >=20 dyne/cm.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、高機能が要求され
る用途に用いられるレンズ、特に高精度な光学素子等の
洗浄管理方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for controlling the cleaning of a lens used for an application requiring a high function, particularly a high-precision optical element.

【0002】[0002]

【従来の技術】従来、CaF2,MgF2等のフッ化物系
結晶材料からなるレンズ等の光学素子は、その光学特性
が極めて広範囲の波長帯にわたって良好な透過率をもつ
とともに、低分散であることから、高級カメラレンズ、
テレビジョンカメラレズ等の高機能が要求される高精度
なレンズに用いられてきた。またCaF2,MgF2等の
フッ化物系結晶材料からなる光学素子はエキシマレーザ
ー等の短波長光でもその透過率が高いことから、短波長
用の光学素子として使用することが検討され始めてい
る。
Conventionally, optical elements such as lenses made of fluoride crystal material of CaF 2, MgF 2 or the like, with its optical properties with extremely wide good transmittance over the wavelength band of, certain low dispersion From that, luxury camera lens,
It has been used for high-precision lenses, such as television cameras, which require high performance. Optical elements made of fluoride-based crystal materials such as CaF 2 and MgF 2 have high transmittance even for short-wavelength light such as excimer lasers. Therefore, use of such optical elements as short-wavelength optical elements has begun to be studied.

【0003】上記のような光学素子の洗浄においては、
従来は洗浄槽に洗浄液を入れた中にレンズを浸漬させて
超音波洗浄法により洗浄するのが一般的であった。この
ような洗浄槽を数槽設けておき界面活性剤、純水等によ
り順次洗浄した後、最終的にイソプロピル−アルコール
洗浄を行う場合では、洗浄槽が大きくなり洗浄機本体も
高価で巨大となり、さらに乾燥等で使用される溶剤も非
常に多くなる。環境保護という観点から言えば、溶剤使
用を削減するか、さらに溶剤を使用しない洗浄方法が今
後必要になってくる。
In the cleaning of the optical element as described above,
Conventionally, it has been common practice to immerse a lens in a cleaning bath containing a cleaning liquid and clean the lens by an ultrasonic cleaning method. When several such washing tanks are provided and sequentially washed with a surfactant, pure water and the like, and finally isopropyl-alcohol washing is performed, the washing tank becomes large, and the washing machine body becomes expensive and huge, Further, the amount of solvent used for drying and the like also becomes very large. From the viewpoint of environmental protection, it is necessary to reduce the use of solvents or to use a solvent-free cleaning method in the future.

【0004】このように従来の高精度なレンズの洗浄
は、いわゆるWET法と呼ばれる方法で行われていた
が、さらに短波長の紫外光を扱う光学素子のレンズ表面
の汚染物質を除去するためには、WET法による洗浄の
みでは不十分でありDRY洗浄が重要になってきた。
As described above, the conventional high-precision cleaning of the lens has been performed by the so-called WET method. However, in order to remove contaminants on the lens surface of an optical element that handles ultraviolet light having a shorter wavelength. However, DRY cleaning has become important because cleaning by the WET method alone is not sufficient.

【0005】すなわち、エキシマレーザーの波長領域で
はレンズ表面の汚染物質によりレンズの透過率が低下す
るが、特に汚染物質として有機物残渣がレンズの透過率
低下をもたらすことが判ってきた。
That is, in the wavelength region of an excimer laser, the transmittance of a lens is reduced by a contaminant on the lens surface. In particular, it has been found that an organic residue as a contaminant reduces the transmittance of the lens.

【0006】レンズ洗浄後の表面の清浄度を評価する手
段としては、これらの高精度レンズの場合、最も一般的
な方法は洗浄後の基板の光学特性を評価することであっ
た。この方法は信頼性、再現性、精度、の点からすれば
問題ないが、測定に要する時間がかかりすぎるため、実
際の生産では問題があった。
As a means for evaluating the cleanliness of the surface after lens cleaning, in the case of these high-precision lenses, the most common method has been to evaluate the optical characteristics of the substrate after cleaning. This method has no problem in terms of reliability, reproducibility, and accuracy, but has a problem in actual production because it takes too much time for measurement.

【0007】[0007]

【発明が解決しようとする課題】以上説明したように、
従来一般的に行われてきた洗浄後の評価方法における問
題点としては、測定に要する時間が非常に長く、生産効
率を低下させていることである。例えば、ArFエキシ
マステッパーに使用される真空紫外の波長域では、大気
中で光が吸収されてしまうためレンズの光学特性を評価
するには、測定対象物であるレンズの雰囲気を窒素に置
換しなければならず、特にレンズ径の大きいものではこ
の窒素置換に長時間を要するため生産タクトに影響を与
える。
As described above,
A problem in the evaluation method after cleaning that has been generally performed in the past is that the time required for measurement is extremely long, and the production efficiency is reduced. For example, in a vacuum ultraviolet wavelength range used for an ArF excimer stepper, light is absorbed in the atmosphere, so that to evaluate the optical characteristics of the lens, the atmosphere of the lens to be measured must be replaced with nitrogen. In particular, in the case of a lens having a large lens diameter, it takes a long time for the nitrogen replacement, which affects the production tact.

【0008】本発明は、上記従来の技術の問題点に鑑み
てなされたものであって、従来のように測定時間が非常
に長くかかることなく、短時間に洗浄後の表面の清浄度
を管理できる方法を提供することが目的である。
SUMMARY OF THE INVENTION The present invention has been made in view of the above-mentioned problems of the prior art, and manages the cleanliness of the surface after cleaning in a short time without requiring a very long measurement time as in the prior art. The aim is to provide a possible method.

【0009】[0009]

【課題を解決するための手段】上記の目的を達成する本
発明は次のようである。すなわち、CaF2単結晶から
なる基板の表面を所定の面形状に研磨し、その後前記C
aF2単結晶からなる基板の表面を洗浄する加工工程に
おいて、洗浄後の前記CaF2単結晶基板の研磨面の表
面エネルギを測定し、その水素結合項の値が20dyne/c
m以上になるように管理することを特徴とするCaF2
結晶からなる基板の洗浄管理方法である。
The present invention for achieving the above object is as follows. That is, the surface of the substrate made of CaF 2 single crystal is polished to a predetermined surface shape, and then the C
in the process step of cleaning the surface of a substrate made of aF 2 single crystal, the surface energy of the polishing surface of the CaF 2 single crystal substrate after cleaning was measured, the value is 20 dyne / c of the hydrogen bond
This is a method for managing cleaning of a substrate made of a CaF 2 single crystal, characterized in that the substrate is controlled to at least m.

【0010】さらに、この管理方法において、洗浄機の
表面エネルギーの中で、分散項の値を30〜40dyne/c
m、極性項の値を0〜5dyne/cmの範囲に管理することを
特徴とするものである。
Further, in this control method, the value of the dispersion term in the surface energy of the cleaning machine is set to 30 to 40 dyne / c.
m, the value of the polarity term is controlled in the range of 0 to 5 dyne / cm.

【0011】[0011]

【発明の実施の形態】通常のレンズ加工工程としては、
レンズ材料からまず大まかなレンズ形状を形成し、その
後研磨により最終的な面形状、面粗さを得る。
DESCRIPTION OF THE PREFERRED EMBODIMENTS As a normal lens processing step,
First, a rough lens shape is formed from the lens material, and then a final surface shape and surface roughness are obtained by polishing.

【0012】レンズ加工工程での汚染物質は、加工工程
により異なるが基本的には研磨剤、ゴミ等の無機物、お
よび油、指紋等の有機物である。これらの汚染物質は、
共有結合、静電力、ファンデルワールス力等によりレン
ズの各加工工程で発生する。ところでレンズは最終的な
面形状、面粗さが得られ後、表面にレンズの透過率向上
のための反射防止膜を形成する。そのため、レンズ加工
が終了した後の、最終洗浄は非常に重要になる。特に、
紫外線領域で使用される、例えばエキシマレーザー用の
レンズでは非常に高い透過率が要求されるため、レンズ
加工後の最終洗浄がレンズの光学性能を左右してしま
う。さらに、このような波長領域での透過率劣化を引き
起こす要因として、有機物が関与していることが判って
きたため、レンズ表面の有機物除去が洗浄において重要
である。
The contaminants in the lens processing step vary depending on the processing step, but are basically abrasives, inorganic substances such as dust, and organic substances such as oil and fingerprints. These pollutants are
It occurs in each processing step of the lens due to covalent bonding, electrostatic force, van der Waals force, and the like. After the final surface shape and surface roughness of the lens are obtained, an antireflection film for improving the transmittance of the lens is formed on the surface. Therefore, final cleaning after lens processing is completed is very important. In particular,
Since a very high transmittance is required for a lens used in the ultraviolet region, for example, for an excimer laser, the final cleaning after lens processing affects the optical performance of the lens. Furthermore, since it has been found that organic substances are involved as a factor causing the transmittance deterioration in such a wavelength region, removal of organic substances on the lens surface is important in cleaning.

【0013】上述のようにレンズ加工後の最終洗浄にお
いて洗浄効果が十分あるのか評価することが、工程を管
理していく上で必要である。種々検討の結果、CaF2
単結晶基板の研磨面の表面エネルギを測定し、この中の
水素結合項の値が特に重要であることが判ってきた。
As described above, it is necessary to evaluate whether the cleaning effect is sufficient in the final cleaning after the lens processing in order to manage the process. As a result of various studies, CaF 2
The surface energy of the polished surface of the single crystal substrate was measured, and it was found that the value of the hydrogen bond term was particularly important.

【0014】すなわち、CaF2単結晶基板のへき開面
の表面エネルギを測定し、水素結合項を計算してみる
と、へき開した直後では水素結合項の値が24dyne/cm
程度と高いが、大気中に放置しおくと、分散項と極性項
はほとんど変化しないのに対し、水素結合項の値は時間
経過とともに低下する。これはCaF2基板表面が大気
中に存在するハイドロカーボン等により汚染され、その
結果表面エネルギも経時的に低下することが考えられ
る。このことから、へき開面のへき開直後の水素結合項
の値と洗浄後の水素結合項が同等であれば、洗浄面の正
常度は非常に高いと判断できる。
That is, the surface energy of the cleaved surface of the CaF 2 single crystal substrate was measured and the hydrogen bond term was calculated. As a result, immediately after cleavage, the value of the hydrogen bond term was 24 dyne / cm.
Although high, the dispersion term and the polar term hardly change when left to stand in the air, whereas the value of the hydrogen bond term decreases with time. This is considered that the surface of the CaF 2 substrate is contaminated by hydrocarbons or the like existing in the atmosphere, and as a result, the surface energy is also reduced with time. From this, it can be determined that the normality of the cleaned surface is very high if the value of the hydrogen bond term immediately after cleavage of the cleavage surface is equal to the value of the hydrogen bond term after cleaning.

【0015】へき開面は、清浄面として理想の状態にあ
るわけで、清浄後の表面エネルギーの分散項と極性項の
値も、へき開面の値と同じ程度の範囲であることが考え
られ、管理値として採用できる。
The cleaved surface is in an ideal state as a clean surface, and the values of the dispersion term and the polarity term of the surface energy after cleaning are considered to be in the same range as the value of the cleaved surface. Can be adopted as a value.

【0016】このような方法を採用すれば、従来に比べ
て短時間に清浄度を評価できるので、レンズ加工の生産
性を落すことなく、かつ品質の良好なレンズが安定して
製造することが可能になる。
By adopting such a method, it is possible to evaluate the cleanliness in a shorter time as compared with the conventional method, so that a lens of good quality can be stably manufactured without lowering the productivity of lens processing. Will be possible.

【0017】[0017]

【実施例】本発明による実施例について以下に示す。Embodiments of the present invention will be described below.

【0018】実施例1 まず表面エネルギの評価方法について述べる。表面エネ
ルギの評価の仕方は従来よく知られた方法で行った。す
なわち、表面エネルギのあらかじめ知られている液体に
よって基板表面での接触角を測定しておき、これらのデ
ータから計算により表面エネルギの、分散項、極性項、
水素結合項をそれぞれ求める。本発明においては評価用
液体としては、アルファブロモナフタレン、ジヨードメ
タン、純水の3種類を使用した。
Embodiment 1 First, a method for evaluating the surface energy will be described. The evaluation of the surface energy was performed by a conventionally well-known method. That is, the contact angle on the substrate surface is measured using a liquid whose surface energy is known in advance, and the dispersion term, the polarity term,
Find each hydrogen bond term. In the present invention, three kinds of liquids for evaluation were alpha bromonaphthalene, diiodomethane, and pure water.

【0019】このような手法を用いて、あらかじめCa
2単結晶基板からへき開した材料の表面の表面エネル
ギを求めた。次にレンズ研磨面の最終洗浄前と洗浄後の
表面エネルギをそれぞれ、同じ手法により求めた。これ
らの結果を表1に示す。なお、洗浄後のレンズは、従来
法による光学特性の評価により、洗浄が充分であること
が確認されたものである。
Using such a technique, Ca
The surface energy of the surface of the material cleaved from the F 2 single crystal substrate was determined. Next, the surface energy before and after the final cleaning of the lens polished surface was determined by the same method. Table 1 shows the results. It should be noted that the lens after cleaning was confirmed to be sufficiently cleaned by the evaluation of the optical characteristics by the conventional method.

【0020】[0020]

【表1】 このように表面エネルギの測定結果から分散項、極性
項、水素結合項の値をそれぞれ比較すると洗浄前後では
分散項、極性項についてはほとんど変化していないのに
対し、水素結合項が明らかに上昇している。
[Table 1] In this way, comparing the values of the dispersion term, the polarity term, and the hydrogen bond term from the surface energy measurement results, the dispersion term and the polarity term hardly changed before and after cleaning, but the hydrogen bond term clearly increased. are doing.

【0021】またへき開面との比較では、洗浄後の表面
エネルギが非常に近い値を示していることが判る。これ
らの結果から、洗浄後の表面エネルギがへき開面の表面
エネルギとほぼ同等の値であるので、洗浄効果が評価で
きるものと判断した。
In comparison with the cleaved surface, it can be seen that the surface energy after cleaning shows a very close value. From these results, it was determined that the cleaning effect could be evaluated because the surface energy after cleaning was almost equal to the surface energy of the cleaved surface.

【0022】以上のことから、洗浄後の水素結合項の値
が20dyne/cm以上あれば洗浄効果としては充分あるも
のと考えられる。
From the above, it is considered that the cleaning effect is sufficient if the value of the hydrogen bond term after cleaning is 20 dyne / cm or more.

【0023】この結果は次のようなメカニズムからなる
ことが推測できる。
It can be inferred that this result has the following mechanism.

【0024】有機材料であるポリマーについては、この
表面エネルギは既に測定されており、その結果を表2に
示す(文献値)。
For a polymer which is an organic material, this surface energy has already been measured, and the results are shown in Table 2 (literature values).

【0025】[0025]

【表2】 これらの値をみると、ポリマー材料である有機物の水素
結合項はすべてゼロである。ところで、CaF2洗浄前
の表面エネルギの水素結合項の値は表1の結果ら判るよ
うにゼロを示している。このことは洗浄前ではCaF2
表面に有機材料であるポリマー等が存在していたことが
考えられ、これは研磨工程で付着したものがそのまま残
存したためと思われる。そして洗浄後同様な方法で求め
た表面エネルギは、水素結合項が上昇して、へき開面の
ものとほぼ同等の値を示している。これは洗浄により、
CaF2表面の有機材料が除去され、清浄度の非常に高
い面が得られたものと推測できる。この評価法によれ
ば、これまで述べたように有機物が膜状に付着した汚染
の除去管理に効果を発揮するほか、非常に薄い有機膜に
ついても検出できるので優れたCaF2表面の清浄度の
管理方法と考える。
[Table 2] Looking at these values, the hydrogen bonding terms of the organic material as the polymer material are all zero. By the way, the value of the hydrogen bond term of the surface energy before the CaF 2 cleaning shows zero as can be seen from the results of Table 1. This means that before cleaning, CaF 2
It is conceivable that an organic material such as a polymer was present on the surface, and this was probably due to the fact that what adhered in the polishing step remained. After the cleaning, the surface energy obtained by the same method shows a value substantially equal to that of the cleaved surface due to an increase in the hydrogen bond term. This is by washing
It can be assumed that the organic material on the surface of CaF 2 was removed and a surface with extremely high cleanliness was obtained. According to this evaluation method, organic matter as described is addition to effective removal management of contamination adhering to the membrane, a very thin can detect also the organic film excellent in CaF 2 surface cleanliness far Think of it as a management method.

【0026】[0026]

【発明の効果】以上説明したように本発明によるCaF
2単結晶基板の洗浄管理方法を採用すれば、従来に比べ
て簡単に清浄度が評価できるので、レンズ加工の生産性
を落すことなく、かつ品質の良好なレンズが安定して製
造することが可能になる。その結果、製品の歩留まり向
上が期待でき、コストの低減を計ることができる。
As described above, the CaF according to the present invention is used.
(2) If a single-crystal substrate cleaning management method is adopted, the degree of cleanliness can be evaluated more easily than in the past, so that high-quality lenses can be stably manufactured without lowering the productivity of lens processing. Will be possible. As a result, an improvement in product yield can be expected, and cost can be reduced.

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 CaF2単結晶からなる基板の表面を所
定の面形状に研磨し、その後前記CaF2単結晶からな
る基板の表面を洗浄する加工工程において、洗浄後の前
記CaF2単結晶基板の研磨面の表面エネルギを測定
し、その水素結合項の値が20dyne/cm以上になるよう
に管理することを特徴とするCaF2単結晶からなる基
板の洗浄管理方法。
In a processing step of polishing a surface of a substrate made of a CaF 2 single crystal into a predetermined surface shape and then cleaning the surface of the substrate made of a CaF 2 single crystal, the cleaned CaF 2 single crystal substrate A method for controlling the cleaning of a substrate made of a single crystal of CaF 2 , wherein the surface energy of the polished surface is measured and the value of the hydrogen bond term is controlled to be 20 dyne / cm or more.
【請求項2】 洗浄後の研磨面の表面エネルギの中で、
分散項の値を30〜40dyne/cm 、極性項の値を0〜5
dyne/cmの範囲になるように管理することを特徴とする
請求項1に記載のCaF2単結晶からなる基板の洗浄管
理方法。
2. In the surface energy of the polished surface after cleaning,
The value of the dispersion term is 30-40 dyne / cm, and the value of the polarity term is 0-5.
cleaning management method of a substrate made of CaF 2 single crystal according to claim 1, characterized in that managing to be in the range of dyne / cm.
JP10311049A 1998-10-30 1998-10-30 MANAGEMENT IN CLEANING CaF2 SINGLE CRYSTAL SUBSTRATE Pending JP2000128695A (en)

Priority Applications (1)

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Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
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Publications (1)

Publication Number Publication Date
JP2000128695A true JP2000128695A (en) 2000-05-09

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ID=18012502

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Country Status (1)

Country Link
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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106944884A (en) * 2017-02-09 2017-07-14 同济大学 A kind of calcium fluoride crystal method for cleaning surface
CN113070273A (en) * 2020-01-03 2021-07-06 中国科学院上海硅酸盐研究所 Surface treatment method for improving laser damage threshold of calcium fluoride crystal optical element

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN106944884A (en) * 2017-02-09 2017-07-14 同济大学 A kind of calcium fluoride crystal method for cleaning surface
CN113070273A (en) * 2020-01-03 2021-07-06 中国科学院上海硅酸盐研究所 Surface treatment method for improving laser damage threshold of calcium fluoride crystal optical element

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