JP2000126562A - Cleaning method for catching fine particle in ultrapure water, filter membrane for catching fine particle in ultrapure water and storage and carriage method for part - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a cleaning method for removing effectively polluted fine particles adhered to a filter membrane for catching fine particles used at the time of measuring the number of particles contained in ultrapure water and reducing the volume of ultrapure water passed through the filter membrane and shortening the filtration time at the time of catching fine particles accordingly. SOLUTION: As a cleaning water for a filter membrane, anyone of a cleaning water prepared by adding a surface active agent 85 into ultrapure water 43, a cleaning water prepared by adding the surface active agent into an electrolytic cathode water prepared by electrolyzing the ultrapure water 43, a cleaning water prepared by adding the surface active agent into a hydrogen dissolved water prepared by dissolving hydrogen gas into the ultrapure water 43, a cleaning water prepared by adding the surface active agent into an electrolytic anode water prepared by electrolyzing the ultrapure water 43 and a cleaning water prepared by adding the surface active agent into an oxidized gas dissolved water prepared by dissolving one kind selected out of oxygen gas, chlorine gas and ozone gas into the ultrapure water 43 is used. Also preferably the pH adjustment in the cleaning water, the selection of the surface active agent, the temperature rise of the cleaning water and the ultrasonic wave irradiation to the cleaning water are carried out.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

[0001] The present invention relates to a method for cleaning a filtration membrane for capturing fine particles, which is used when measuring the number of fine particles contained in ultrapure water.

[0002]

2. Description of the Related Art In recent years, ultrapure water used in semiconductor production, chemical production, and the like has been required to be further improved in water quality. Therefore, there is a high demand for the number of fine particles in ultrapure water, which is one of the water quality control items of ultrapure water. For example, the required water quality is such that fine particles having a particle size of 0.1 μm or more are ultrapure water. In some cases, the level is as high as 1 or less per ml.

[0003] It is important to confirm that the target water quality is maintained in the ultrapure water production facility.
As an evaluation method of the fine particles in the ultrapure water described above, in addition to the online method using laser scattering and sound waves, the fine particles captured on the filtration membrane when the ultrapure water is filtered by the filtration membrane can be evaluated by an optical microscope. And a direct microscopy method using a scanning electron microscope.

In the direct microscopy method, a sampling pipe is branched from a pipe through which outlet water of an ultrapure water production facility, generally, outlet water of a secondary water purifier flows, and a part of the ultrapure water is flown. A filtration operation of filtering a certain amount of ultrapure water with a filtration membrane for trapping fine particles disposed at a position to capture fine particles contained in the ultrapure water, and a filtration membrane that has been subjected to the operation of trapping fine particles, are scanned by a scanning electron microscope. A counting operation for counting the number of fine particles by photographing the film surface with a microscope or the like, performing image processing, or the like is performed.

[0005] The filtration membrane for capturing fine particles in ultrapure water is:
For example, it is about 25 mm in diameter, and it is practically difficult to directly observe the entire membrane surface with a scanning electron microscope or the like. Actually, about 0.011%, the number of captured fine particles based on the total effective filtration area is determined by calculation.

As an example, a case will be described in which it is proved by using a direct microscopy method that the number of fine particles having a particle diameter of 0.1 μm or more, which is the standard, is 1 or less per 1 ml of ultrapure water. Depending on the type of membrane, the membrane formation method, the standard particle size of the particles to be counted, etc., a large number of particles will inevitably adhere to the membrane during the membrane formation and handling processes, depending on the type of membrane, membrane formation method, standard particle size of the particles to be counted, etc. The number of initially attached fine particles on the film was measured with a particle size of 0.1 μm.
10 ⁵ to 10 ⁶ particles with a particle size of 0.05
In the case of particles having a size of not less than μm, the number of particles ranges from 10 ⁷ to 10 ⁸ .

For this reason, for example, when the number of contaminating particles initially adhering to the filtration membrane is of the order of 10 ^6,
When confirming the water quality of less than or equal to ml, in order to prove that the number of captured fine particles is significant in terms of measurement accuracy, pass the amount of water in which the number of captured fine particles is equal to or more than the initial contaminated fine particles through the filtration membrane. ing. In addition, the number of fine particles on this blank membrane is measured using a filtration membrane that does not pass water as a blank membrane, and the value obtained by subtracting the actually measured value of fine particles on the blank membrane from the actually measured value of fine particles on the passed membrane is captured per unit flow rate. Evaluation is made by converting to the number of fine particles.

[0008]

The required water quality for ultrapure water has recently become more and more advanced, and the same applies to the fine particles contained in ultrapure water. There is a need. Therefore, in order to evaluate such fine particles having a fine particle diameter by direct microscopy, it is necessary to use a filtration membrane for capturing fine particles having a smaller pore diameter.

When a filtration membrane for capturing fine particles having a small pore diameter is used, the measurement range is widened, and fine particles having a small particle diameter are also measured. For example,
The number of initially contaminated fine particles having a particle size of 0.05 μm or more is 10 ⁷ to 1
0 is ^eight, in this case in order to measure the ultra-pure water of the fine particles, since the number of acquired particles must passed through the water as the initial contamination particles as many or more,
An enormous water flow of 10 ⁸ ml = 100 m ³ is required, and the filtration time is also long.

[0010] The present invention has been made in view of the above circumstances, and can effectively remove contaminating particles adhering to a filtration membrane for capturing particles in ultrapure water. It is an object of the present invention to provide a cleaning method capable of reducing the amount of ultrapure water flowing through a membrane and reducing the filtration time.

[0011]

In order to achieve the above object, the present invention provides a method for cleaning a filtration membrane for trapping fine particles in ultrapure water as shown in the following (1) to (10). (1) A method for cleaning a filtration membrane for capturing fine particles in ultrapure water, comprising cleaning the filtration membrane for capturing fine particles in ultrapure water with cleaning water obtained by adding a surfactant to ultrapure water. . (2) Washing water obtained by adding a surfactant to electrolytic cathode water obtained by electrolyzing ultrapure water, or adding a surfactant to hydrogen-dissolved water obtained by dissolving hydrogen gas in ultrapure water A method for cleaning a filtration membrane for capturing fine particles in ultrapure water, comprising cleaning the filtration membrane for capturing fine particles in ultrapure water with cleaning water. (3) Oxidation in which one selected from oxygen gas, chlorine gas, and ozone gas is dissolved in cleaning water obtained by adding a surfactant to electrolytic anode water obtained by electrolyzing ultrapure water, or in ultrapure water. A method for cleaning a filtration membrane for capturing fine particles in ultrapure water, comprising cleaning the filtration membrane for capturing fine particles in ultrapure water with cleaning water obtained by adding a surfactant to dissolved water of a reactive gas. (4) Adjust the pH of the wash water to the alkaline side (1)-
The cleaning method of (3). (5) The washing method according to (4), wherein an anionic surfactant and / or an amphoteric surfactant are used as the surfactant. (6) Adjust the pH of the wash water to the acidic side (1) to (3)
Cleaning method. (7) The washing method according to (6), wherein a cationic surfactant and / or an amphoteric surfactant are used as the surfactant. (8) Warm the washing water to 30 to 100 ° C (1) to
The cleaning method of (7). (9) The cleaning method of (1) to (7), in which the cleaning water is irradiated with ultrasonic waves. (10) While heating the washing water to 30 to 100 ° C,
The cleaning method according to (1) to (7), wherein the cleaning water is irradiated with ultrasonic waves.

A surfactant is added to cleaning water obtained by adding a surfactant to ultrapure water, and electrolytic cathode water (hereinafter sometimes simply referred to as electrolytic cathode water) obtained by electrolyzing ultrapure water. Dissolved water obtained by dissolving hydrogen gas in cleaning water and ultrapure water (hereinafter sometimes simply referred to as hydrogen dissolved water)
Washing water obtained by adding a surfactant to water, washing water obtained by adding a surfactant to electrolytic anode water obtained by electrolyzing ultrapure water (hereinafter sometimes simply referred to as electrolytic anode water), or Oxidizing gas-dissolved water in which one selected from oxygen gas, chlorine gas and ozone gas is dissolved in ultrapure water
When washing water obtained by adding a surfactant to oxidizing gas-dissolved water) is used as washing water for the filtration membrane for capturing fine particles in ultrapure water, pure ultrapure water and electrolytic cathode water are simply used. An excellent effect of removing contaminating fine particles can be obtained as compared with a case where hydrogen-dissolved water, electrolytic anode water, oxidizing gas-dissolved water, or a general cleaning agent (such as ammonia water) is used as cleaning water.

That is, in the solution, the fine particles and the filtration membrane are charged, and the potential changes from plus to minus depending on the pH value of the solution. If the surface potentials of the fine particles and the filtration membrane are opposite signs, the fine particles will not be easily removed from the membrane due to electrostatic attraction. If the surface potential of the fine particles and the surface potential of the filtration membrane are the same, the fine particles are easily removed from the membrane by the repulsive force, and the fine particles once removed are difficult to adhere again. The surfactant used in the present invention can change the surface potential by adsorbing on the surface of a particle or a film. That is, an activator having the same sign as the surface potential of the particles or the membrane can further increase the potential, and an activator having a different sign can reverse the surface potential by adsorption. Therefore, in the present invention, the surface potential of the fine particles and the filtration membrane is controlled to be negative by adding an anionic surfactant to the washing water, or the surface potential of the fine particles and the filtration membrane is controlled to be positive by adding a cationic surfactant. By doing so, an excellent effect of removing fine particles can be obtained.

The filtration membrane has numerous pores, and the surface of the membrane is microscopically very uneven. Since the microparticles are very often adsorbed in the pores and the gaps between the irregularities and the inside of the pores, it is necessary to make the washing water permeate into these gaps and the insides of the pores. Surfactants are excellent in penetrating action, and can penetrate washing water into those parts which are hardly wetted by water. In particular, this effect is large in a film made of polycarbonate or alumina having a property of repelling water (water repellency). Further, by combining physical separation means by ultrasonic waves or heating at the time of cleaning, the separated fine particles can be easily taken in the washing water and dispersed, and a more excellent effect of removing fine particles can be obtained.

As described above, the present invention has an effect as a detergent (effect of dispersing dirt components in washing water) of a surfactant, an effect of adsorbing on a membrane surface to control a surface potential, pores and the like. And the effect of contacting the washing water with the permeated portion. Further, in the present invention, as described below, by performing cleaning so that the cleaning water remains on the film surface, the bactericidal action of the surfactant can be used.

Hereinafter, the present invention will be described in more detail. In the cleaning method of the present invention, cleaning water obtained by adding a surfactant to ultrapure water (hereinafter, also referred to as surfactant-added ultrapure water), electrolytic cathode water obtained by electrolyzing ultrapure water Cleaning water obtained by adding a surfactant to water (hereinafter also referred to as surfactant-added electrolytic cathode water), cleaning water obtained by adding a surfactant to hydrogen-dissolved water obtained by dissolving hydrogen gas in ultrapure water (Hereinafter sometimes referred to as surfactant-added hydrogen-dissolved water), washing water obtained by adding a surfactant to electrolytic anode water obtained by electrolyzing ultrapure water (hereinafter, surfactant-added electrolytic anode water). Or cleaning water obtained by adding a surfactant to oxidizing gas-dissolved water in which one selected from oxygen gas, chlorine gas and ozone gas is dissolved in ultrapure water (hereinafter referred to as surfactant addition). Oxidizing gas dissolved water) Ri, washing the diesel particulate filtration membrane for ultrapure water.

In this case, the surfactant-added ultrapure water, the surfactant-added electrolytic cathode water, the surfactant-added hydrogen-dissolved water, the surfactant-added electrolytic anodic water, and the surfactant-added oxidizing gas-dissolved water (hereinafter referred to as “oxidized gas-dissolved water”). It is preferable to use ultrapure water having a fine particle content equal to or less than the ultrapure water to be measured as the ultrapure water used for the preparation of the surfactant-added cleaning water). .

Examples of the hydrogen-dissolved water used for preparing the surfactant-dissolved hydrogen-dissolved water include (a) hydrogen-dissolved water obtained by dissolving hydrogen gas in ultrapure water by bubbling;
(B) Hydrogen-dissolved water in which hydrogen gas is dissolved in ultrapure water via a gas permeable membrane, and (c) hydrogen-dissolved water in which hydrogen gas is dissolved in ultrapure water using an ejector can be used. However, the present invention is not limited to these. In this case, as the hydrogen gas, for example, a hydrogen gas filled in a gas cylinder, a hydrogen gas generated by electrolyzing water, or the like can be used, and a high-purity hydrogen generated by electrolyzing ultrapure water can be used. It is particularly preferred to use a gas. As the hydrogen dissolving water, it is preferable to use one having an ORP (redox potential) of -100 mV or less, particularly -700 to -800 mV, from the viewpoint of obtaining a high effect of removing contaminating fine particles.

As the oxidizing gas-dissolved water used for preparing the surfactant-added oxidizing gas-dissolved water, for example, (a) one kind of oxidizing gas selected from oxygen gas, chlorine gas and ozone gas is purified by bubbling. Oxidizing gas-dissolved water dissolved in water, (b) oxidizing gas-dissolved water obtained by dissolving the oxidizing gas in ultrapure water through a gas permeable membrane, and (c) the oxidizing gas using an ejector. Oxidizing gas-dissolved water or the like dissolved in ultrapure water can be used, but is not limited thereto. In this case, as the oxidizing gas, for example, an oxidizing gas filled in a gas cylinder, an oxygen gas generated by electrolyzing water, an ozone gas, or the like can be used. It is particularly preferable to use the purified high-purity oxygen gas or ozone gas. As the oxidizing gas dissolved water, it is preferable to use one having an ORP (redox potential) of +350 mV or more from the viewpoint of obtaining a high effect of removing contaminating fine particles.

The electrolytic cathode water used for preparing the surfactant-added electrolytic cathode water refers to water obtained from the cathode electrode side when ultrapure water is electrolyzed, and the surfactant-added electrolytic anode water is prepared. The electrolytic anode water used in the above refers to water obtained from the anode electrode side when ultrapure water is electrolyzed. In this case, "electrolyze ultrapure water"
This means simply applying a DC voltage to the ultrapure water, and as a result, a DC current is applied to the ultrapure water and an electrolysis reaction occurs, such as decomposition of water into oxygen and hydrogen. It does not necessarily mean the case.

For electrolysis of ultrapure water, for example, an anode chamber in which an electrode (anode electrode) for applying a positive voltage is disposed and an electrode (cathode electrode) for applying a negative voltage are disposed in the tank by a diaphragm. A two-chamber electrolyzer divided into a cathode chamber and
Alternatively, it can be performed using a three-chamber electrolysis apparatus having an intermediate chamber partitioned by a diaphragm between an anode chamber and a cathode chamber. In the present invention, electrolytic water obtained from the above-mentioned cathode chamber can be used as the electrolytic cathode water, and electrolytic water obtained from the above-mentioned anode chamber can be used as the electrolytic anode water.

It is preferable that the structural members, electrodes, and the like of the above-mentioned electrolyzer be made of a material from which fine particles are not eluted. Examples of the structural material include organic materials such as polyvinyl chloride (PVC), polypropylene (PP), and acrylic resin, and inorganic materials such as ceramics and glass.
In addition, a preferable material can be selected from metal materials or the like having a surface treatment such as rubber lining or oxide film treatment on the liquid contact surface.

As the diaphragm, for example, a filter or a porous film, an ion exchange membrane, or the like made of a polymer material such as cellulose, polyethylene, polypropylene, polyester, polystyrene, or a fluororesin, or an inorganic material such as ceramics is used. Can be. If an ion exchange membrane is used, the electrolysis voltage can be reduced by the conductivity of the ion exchange membrane, and power consumption when a constant electrolysis current flows can be saved. Further, arranging the electrode and the ion exchange membrane so as to be in close contact with each other is advantageous in that the electrolytic voltage can be further reduced and power consumption can be saved, which is a preferable configuration. further,
When an anion exchange membrane is used for the membrane that separates the cathode compartment and the intermediate compartment, the amount of reducing substance that diffuses from the cathode compartment to the intermediate compartment can be reduced due to the ion exclusion effect of the membrane. Examples of such an anion exchange membrane include an anion exchange membrane in which an anion exchange group has been introduced into a fluororesin matrix, such as TOSFLEX IE-SA and IE-D.
F, the same IE-SF (manufactured by Tosoh Corporation) and the like, and an anion exchange membrane having a styrene-divinylbenzene copolymer as a base, such as Neosepta AMH (manufactured by Tokuyama Soda Co., Ltd.).

As the anode and cathode electrodes, a metal, alloy, metal oxide, or the like, or a substrate obtained by plating or coating a metal or the like, or a conductive material such as sintered carbon may be used. The shape may be a plate, a punching plate, a mesh, or the like. In particular, it is desirable that the material of the cathode is excellent in alkali resistance. For example, it is desirable to use Pt, Pd, Au, Ag, Cu, stainless steel, carbon steel, graphite, vitreous carbon, or the like.

The electrolytic cathode water has an ORP (oxidation-reduction potential) of -100 mV or less, particularly -700 to -800.
It is preferable to use one having mV in terms of obtaining a high effect of removing contaminating fine particles. ORP for electrolytic anode water
It is preferable to use one having (redox potential) of +350 mV or more from the viewpoint of obtaining a high effect of removing contaminating fine particles.

In the present invention, there is no particular limitation on the type of surfactant used for preparing the surfactant-added washing water, but anionic surfactants, cationic surfactants, nonionic surfactants and amphoteric surfactants are preferred. Can be used.
Specifically, examples of the anionic surfactant include a fatty acid type, an alkyl sulfate type, an alkylbenzene sulfonic acid type, an alkyl naphthalene sulfonic acid type, an alkyl sulfosuccinic acid type, an alkyl diphenyl ether disulfonic acid type, an alkyl phosphate type, and a polyphosphate. Oxyethylene alkyl sulfate type, polyoxyethylene allyl sulfate type and the like can be used. As nonionic surfactants, for example, polyoxyethylene alkyl ether type, polyoxyethylene alkyl allyl ether type, sorbitan fatty acid ester type, polyoxyethylene sorbitan fatty acid ester type, polyoxyethylene sorbitol fatty acid ester type, glycerin fatty acid ester type, Polyoxyethylene fatty acid ester type, polyoxyethylene alkylamine type, alkylalkanolamide type and the like can be used. As the cationic surfactant, for example, an alkylamine type, a quaternary ammonium type and the like can be used. As the amphoteric surfactant,
For example, alkyl betaine type, amine oxide type and the like can be used.

Among these, particularly preferred are anionic surfactants of alkyl sulfate ester type and alkylbenzene sulfonic acid type, nonionic surfactants of polyoxyethylene alkyl ether type and polyoxyethylene alkyl allyl ether type, and quaternary. An ammonium type cationic surfactant and an alkyl betaine type amphoteric surfactant. It is appropriate that the amount of the surfactant added is 1 ppm or more.

In the washing method (4) of the present invention, when washing the filtration membrane with the surfactant-added washing water, the pH of the surfactant-added washing water is adjusted to the alkali side. Here, “adjusting the pH of the surfactant-added cleaning water to the alkaline side” means adjusting the pH of the surfactant-added cleaning water to be greater than 7. In this case, the more preferable pH of the surfactant-added washing water is 8 to 13, particularly 9 to 12.

As described above, the pH value of the surfactant-added washing water
When is adjusted to the alkali side, it is preferable to use an anionic surfactant as the surfactant. in this case,
As the anionic surfactant, those described above can be suitably used.

That is, the surface potential of the fine particles and the filtration membrane changes depending on the pH value of the solution. In an alkaline solution, the fine particles generally exhibit a negative potential. In a filtration membrane that exhibits a negative potential in an alkaline solution, the surface potential of the fine particles and the filtration membrane is further negatively inclined by adding an anionic surfactant, and the electrostatic repulsion of both particles is further increased. The removal effect is obtained.

In the washing method (6) of the present invention, when washing the filtration membrane with the detergent-added washing water, the pH of the surfactant-added washing water is adjusted to the acidic side. Here, “adjusting the pH of the surfactant-added cleaning water to the acidic side” means adjusting the pH of the surfactant-added cleaning water to be lower than 7. In this case, the more preferable pH of the surfactant-added washing water is 1 to 6, particularly 2 to 4.

As described above, the pH value of the surfactant-added cleaning water
When is adjusted to the acidic side, it is preferable to use a cationic surfactant as the surfactant. In this case, those described above can be suitably used as the cationic surfactant.

That is, in an acidic solution, fine particles generally show a positive potential. In a filtration membrane that exhibits a positive potential in an acidic solution, the addition of a cationic surfactant further enhances the electrostatic repulsion between the fine particles and the filtration membrane,
Further, a strong fine particle removing effect can be obtained.

Further, in the vicinity of neutral, the surface potential of the fine particles and the filtration membrane can take a value from plus to minus depending on the constituent elements and materials. In such a case, the fine particles and the surface of the filtration membrane may be negatively charged by adding an anionic surfactant, or the fine particles and the surface of the filtration membrane may be positively charged by adding a cationic surfactant. In all cases, an excellent effect of removing fine particles can be obtained. The surface potential depends on the type of dissolved ions and is not uniquely determined by the pH value.

Further, the amphoteric surfactant contains both anionic and cationic surface active portions, and exhibits cationic properties when the solution is in the acidic range and anionic properties when the solution is in the alkaline range. In the electrical region, it exhibits nonionic properties. Therefore, the amphoteric surfactant has a p
H can be suitably used regardless of the region.

In the washing method (8) of the present invention, when the filtration membrane is washed with the detergent-added washing water, the washing water is used for 3 times.
Warm to 0-100 ° C. When the temperature of the surfactant-added cleaning water is lower than 30 ° C., only the same effect as when the surfactant-added cleaning water is used at room temperature can be obtained. Further, even if the temperature of the detergent-added washing water is higher than 100 ° C., a remarkable increase in the effect cannot be expected, and the washing operation becomes complicated.
The more preferable heating temperature of the surfactant-added washing water is 40 to
80 ° C., and the most preferred heating temperature is 40 to 60 ° C.

In the washing method (9) of the present invention, when the filtration membrane is washed with the detergent-added washing water, the washing water is irradiated with ultrasonic waves. In this case, the frequency of the ultrasonic wave is not limited, but an ultrasonic wave having a frequency of 0.8 to 3 MHz (hereinafter, also sometimes referred to as a megahertz band ultrasonic wave) is preferable. it can. Particularly preferred as ultrasonic waves in the megahertz band are:
It has a frequency of 0.9 to 1.5 MHz.

In the washing method (10) of the present invention, when washing the filtration membrane with the detergent-added washing water, the washing water is heated to 30 to 100 ° C. and the washing water is irradiated with ultrasonic waves. . The details of the heating temperature of the surfactant-added cleaning water are the same as in the cleaning method (8), and the details of the ultrasonic waves are the same as in the cleaning method (9).

In the washing methods (1) to (10) of the present invention, the washing mode when the filtration membrane is washed using the above-mentioned washing water added with each surfactant is not limited. Can be suitably adopted. Surfactant-added washing water is continuously injected into the washing tank,
A mode in which the filtration membrane is immersed in the washing water and the washing water continuously overflows from the washing tank (overflow method). In this case, only the membrane may be immersed in the washing water to float, or the filtration membrane may be held by membrane holding means such as a membrane holder, and the entire membrane holding means may be immersed in the washing water. . A method in which the filtration membrane is held by a membrane holding means such as a membrane holder, and the surfactant-added washing water is directly applied to the membrane surface of the filtration membrane, and the washing water is caused to flow continuously to the membrane surface (stripping method).

In the above-mentioned or the washing mode,
Examples of the method of adding a surfactant to the washing water, the method of adjusting the pH of the washing water to the alkali side or the acidic side, the method of heating the washing water, and the method of irradiating the washing water with ultrasonic waves include the following. But are not limited to these.

[0041] In the cleaning mode of surfactant addition, the surfactant additive means the tube water flows to make the surfactant additive washing water is installed, the interface to the water flowing through the pipe by the surfactant addition means After adding the surfactant, a method of injecting the surfactant-added washing water into the washing tank from the outlet of the tube can be adopted. In the washing mode, after adding a surfactant to the water flowing in the tube in the same manner as described above, a method of directly hitting the surfactant-added washing water from the outlet of the tube to the membrane surface of the filtration membrane may be adopted. it can. In this case, it is effective to simply apply the cleaning water flowing out of the pipe to the membrane surface as it is, but a cleaning water injection unit such as a spray nozzle may be attached to the outlet of the pipe.

When hydrogen-dissolved water or oxidized gas-dissolved water is used as the water for producing the surfactant-added cleaning water, the surface is added to the ultrapure water before dissolving the hydrogen gas or the oxidizable gas in the ultrapure water. An activator may be added, or a surfactant may be added to hydrogen-dissolved water or oxidative-gas-dissolved water after dissolving hydrogen gas or oxidizing gas in ultrapure water. Further, in the case where electrolytic cathode water or electrolytic anode water is used as water for producing surfactant-added cleaning water, a surfactant may be added to ultrapure water before electrolysis of ultrapure water. After electrolyzing the water, a surfactant may be added to the electrolytic cathode water or the electrolytic anode water.

In the pH-adjusting washing mode, a pH adjusting means is installed in a pipe through which the surfactant-added washing water or the water for producing the washing water flows, and the pH of the water flowing through the pipe is adjusted by the pH adjusting means. After adjusting to the acidic side or the acidic side, a method of injecting surfactant-added washing water into the washing tank from the outlet of the tube can be adopted. In the washing mode, the pH of the water flowing in the tube is adjusted to the alkali side or the acidic side in the same manner as described above, and then the surfactant-added washing water is directly applied to the membrane surface of the filtration membrane from the outlet of the tube. Can be adopted. In this case, it is effective to simply apply the cleaning water flowing out of the pipe to the membrane surface as it is, but a cleaning water injection unit such as a spray nozzle may be attached to the outlet of the pipe.

When adjusting the pH of the hydrogen-dissolved water or the oxidizing gas-dissolved water, the pH of the ultrapure water may be adjusted before dissolving the hydrogen gas or the oxidizing gas in the ultrapure water. After dissolving hydrogen gas or oxidizing gas in water, the pH of hydrogen-dissolving water or oxidizing gas-dissolving water may be adjusted. Further, when adjusting the pH of the electrolytic cathode water or the electrolytic anode water, the pH of the ultrapure water may be adjusted before the electrolysis of the ultrapure water, and the electrolytic cathode water or the electrolytic anode may be adjusted after the ultrapure water is electrolyzed. The pH of the water may be adjusted.

In the heating washing mode, a heating means is installed in a tube through which the surfactant-added washing water or the water for producing the washing water flows,
After the water flowing in the pipe is heated to a predetermined temperature by the heating means, a method of injecting the surfactant-added cleaning water into the cleaning tank from the outlet of the pipe can be adopted. In the washing mode described above, after the water flowing in the tube is heated to a predetermined temperature in the same manner as described above, a method of directly hitting the surfactant-added washing water from the outlet of the tube to the membrane surface of the filtration membrane may be employed. it can.
In this case, it is effective to simply apply the cleaning water flowing out of the pipe to the membrane surface as it is, but a cleaning water injection unit such as a spray nozzle may be attached to the outlet of the pipe.

When heating the hydrogen-dissolved water or the oxidizing gas-dissolved water, the ultrapure water may be heated before dissolving the hydrogen gas or the oxidizing gas in the ultrapure water. After dissolving the hydrogen gas or the oxidizing gas, the hydrogen dissolved water or the oxidizing gas dissolved water may be heated. Further, when heating the electrolytic cathode water or the electrolytic anode water, the ultrapure water may be heated before performing the ultrapure water electrolysis, and the electrolytic cathode water or the electrolytic anode water may be heated after the ultrapure water is electrolyzed. It may be heated.

[0047] In the cleaning mode of the ultrasonic irradiation, the washing bath installed ultrasonic irradiation means, to adopt a method of irradiating an ultrasonic wave to surfactant additive washing water in the washing tank by the ultrasonic wave irradiation means it can. In the washing mode, the washing water injection nozzle provided with the ultrasonic irradiation means is connected to the outlet of the pipe through which the surfactant-added washing water flows, and the surfactant flowing in the washing water injection nozzle by the ultrasonic irradiation means. A method can be employed in which the added cleaning water is irradiated with ultrasonic waves, and the surfactant-added cleaning water to which ultrasonic waves have been added is directly applied to the membrane surface of the filtration membrane from the tip of the cleaning water injection nozzle.

In the present invention, when washing is performed by combining two or more of the above-described pH adjustment, heating and ultrasonic irradiation, the above-described pH adjustment method, heating method and ultrasonic irradiation method may be appropriately combined. . The order of addition of the surfactant, heating and pH adjustment described above is not limited, and can be set as appropriate.

In the present invention, it is more appropriate to wash the filtration membrane so that the surfactant remains on the filtration membrane for capturing fine particles in ultrapure water after the washing. That is, although it is preferable that the filtration membrane is washed in a clean room, contamination of the filtration membrane from the atmosphere cannot be completely prevented. In addition, the filtration membrane may be contaminated at the stage of storing and transporting (transporting) the filtration membrane after washing, and at the stage of installing the ultrapure water system at a sampling point. In particular,
Regarding fungi, even a slight contamination at the beginning may increase the contamination by propagation. On the other hand, in the fine particle measurement using the fine particle capturing filtration membrane, the number of filtration days may be several days to several weeks, depending on the quality and pressure of the ultrapure water. In such a case, if the filtration membrane is contaminated with bacteria, the bacteria will propagate during the filtration operation, causing a serious problem in the measurement of fine particles. As a means to avoid this, it is conceivable to store the filtration membrane at a low temperature immediately after washing and immediately before installing it at the sampling point of the ultrapure water system.However, this method can prevent bacteria from growing, but kill bacteria. It is not possible.

On the other hand, since the surfactant has a bactericidal action, the filtration membrane is washed so that the surfactant remains on the filtration membrane for capturing fine particles after washing, and the surfactant is adsorbed on the surface of the filtration membrane. By storing, transporting (transporting) the filter membrane and installing it at the sampling point in the state where it is left as it is, even if there is bacterial contamination during that time, the bacteria can be killed by the action of the surfactant. In addition, even in long-term filtration days, propagation of bacteria can be avoided. Therefore, by washing the filtration membrane for capturing fine particles in ultrapure water using the surfactant-added cleaning water as described above, not only can the particles be effectively removed, but also the propagation of bacteria on the membrane can be avoided. It is possible to do. In this case, the surfactant remaining on the filtration membrane is particularly preferably a cationic surfactant having a high bactericidal effect or an amphoteric surfactant.

In the present invention, the primary cleaning of the filtration membrane is performed by performing the above-described cleaning methods (1) to (10) in the above-described embodiment (overflow method), and then the secondary cleaning of the filtration membrane is further performed. By carrying out in the above-described mode (hitting method), contaminant fine particles adhering to the filtration membrane can be more effectively removed. That is, by removing most of the contaminating fine particles by the first cleaning and then removing the remaining fine particles by the second cleaning, an extremely excellent fine particle removing effect can be obtained.

Although the mode of the primary cleaning and the secondary cleaning is not limited, the cleaning method for performing ultrasonic irradiation, that is, the cleaning methods (9) and (10) includes the overflow method or the ultrasonic irradiation means. After performing the primary cleaning by the hitting method using the washing water injection nozzle, secondary cleaning is performed by the same hitting method using the same washing water as the primary cleaning except that ultrasonic irradiation is not performed. Aspects can be employed. In this case, in the secondary cleaning, the cleaning water may be injected from the cleaning water injection nozzle without irradiating the cleaning water flowing in the cleaning water injection nozzle with ultrasonic waves by the ultrasonic irradiation means. In addition, when cleaning is performed by using a cleaning water injection nozzle provided with ultrasonic irradiation means and applying a cleaning method to the cleaning water to which ultrasonic waves have been applied, the cleaning liquid is attached to the filtration membrane and the membrane by the added ultrasonic waves. Since the particles are vibrated, the particles inside the film or between the film and the holder can be effectively cleaned, and the cleaning is performed very efficiently. In addition, the operation from the primary cleaning to the secondary cleaning is simple, and the risk of film contamination during the operation is extremely low.

Further, a cleaning method without ultrasonic irradiation,
That is, in the cleaning methods (1) to (8), it is preferable to employ an aspect in which after the primary cleaning is performed by the overflow method, the secondary cleaning is performed by the hitting method using the same cleaning water as the primary cleaning. Can be.

In the secondary cleaning by the hitting method described above, the lower part (described later) of the filtration membrane fixing part of the filter of the particulate collection device in ultrapure water using the filtration membrane to be cleaned is used as the membrane holding means. Is appropriate. In this way, the filter can be immediately attached to the filter without moving the filter after the secondary washing, and the time required for the fine particles to adhere to the filter, that is, the time from the end of washing to the time of attaching the filter to the filter is reduced. Since the time can be shortened, the possibility of external contamination of the membrane after the secondary washing can be reduced, and the number of contaminating particles on the filtration membrane can be extremely reduced.

In the present invention, the filtration membrane for capturing fine particles in ultrapure water is used together with the filtration membrane for capturing fine particles in ultrapure water or in place of the filtration membrane for capturing fine particles in ultrapure water. By the cleaning method described above, it is possible to clean one or more of a device for collecting fine particles in ultrapure water and a component constituting a water flow system in which the device is installed. Examples of such components include a filter equipped with a filtration membrane, a joint for collecting water from an ultrapure water flow pipe, and a water flow pipe for extracted ultrapure water. By cleaning such components, it is possible to effectively prevent the particulates attached to the components that were not originally contained in the ultrapure water from being captured by the filtration membrane, thereby causing measurement errors.

In this case, together with the filtration membrane for capturing fine particles in ultrapure water, one or more of a device for collecting fine particles in ultrapure water and a part of a water flow system in which the device is installed are installed. When washing, it is more appropriate to wash the part and the filtration membrane so that the surfactant remains on the part and the filtration membrane after the washing. Further, instead of the filtration membrane for capturing fine particles in ultrapure water, when cleaning one or more of the components that constitute the water collection system and the device for collecting the fine particles in ultrapure water, It is more appropriate to clean the part so that the surfactant remains on the part after cleaning. The reason is the same as in the case where the filtration membrane is washed so that the surfactant remains on the filtration membrane after the washing (described above).

The cleaning method of the present invention can be applied to any filtration membrane for capturing fine particles in ultrapure water, and the filtration method for capturing fine particles in ultrapure water to which the present invention can be particularly suitably applied. Examples of the membrane include a filtration membrane made of alumina and a filtration membrane made of polycarbonate.

By the way, as can be understood from the above description, a filtration membrane membrane for capturing fine particles in ultrapure water, a device for collecting fine particles in ultrapure water, and components constituting a water flow system for installing the collecting device. When storing or transporting one or more of the above, the filtration membrane and the components are held in the detergent-added washing water to prevent contamination by bacteria until the filtration membrane and the components are installed. The effect described above can be obtained. That is,
As a method of suppressing the growth of bacteria, in addition to the method of leaving a surfactant on the filtration membrane and components described above, in a state where the filtration membrane and components after washing are immersed in surfactant-added cleaning water. Alternatively, a method of storing or transporting a filtration membrane or a part can be employed. According to this method, the bacteria can be killed before the filtration membrane and components are installed at the sampling point, even if they are contaminated with bacteria. It is possible to avoid.
Ultrapure water systems are installed in various places, and their sampling points may not be good in terms of working environment, and it is not unusual to be outdoors. The above method is particularly effective when there is a sampling point in an environment susceptible to such bacterial contamination.

Accordingly, the present invention provides a surfactant aqueous solution obtained by adding a surfactant to ultrapure water, and a surfactant solution obtained by adding a surfactant to electrolytic cathode water obtained by electrolyzing ultrapure water. Surfactant aqueous solution, a surfactant aqueous solution obtained by adding a surfactant to hydrogen dissolved water obtained by dissolving hydrogen gas in ultrapure water,
Surfactant aqueous solution obtained by adding a surfactant to electrolytic anode water obtained by electrolyzing ultrapure water, or oxidizing solution in which one selected from oxygen gas, chlorine gas and ozone gas is dissolved in ultrapure water A surfactant aqueous solution obtained by adding a surfactant to gas-dissolved water is composed of a filtration membrane for capturing fine particles in ultrapure water, a device for collecting fine particles in ultrapure water, and a water flow system for installing the device. Storage of a filtration membrane and / or a part for collecting fine particles in ultrapure water, wherein the filtration membrane and / or the part are stored or transported in a state where the filtration membrane and / or the part selected from the parts to be immersed are immersed.・ Provide transportation methods.

In the storage / transport method of the present invention, it is preferable to use a cationic surfactant or an amphoteric surfactant as the surfactant. The concentration of the surfactant in the aqueous surfactant solution is suitably 100 ppm or more.
As for the ultrapure water, electrolytic cathode water, hydrogen-dissolved water, electrolytic anode water, oxidizing gas-dissolved water, and surfactant used for preparing the above-mentioned surfactant aqueous solution, the surfactant-added washing water was described earlier. It is the same as

When carrying out the storage / transportation method of the present invention,
Although the filtration membrane and / or the component may be immersed in the surfactant aqueous solution as it is, the above-described cleaning method (1) to (1) of the present invention is used.
After removing most of the fine particles from the filtration membrane and / or the component in advance by (10), it is more preferable to perform storage and transportation by immersing in a surfactant aqueous solution. In this case, when the filtration membrane and / or parts are immersed in an aqueous solution of an ionic surfactant opposite to the ionic surfactant used in the cleaning method of the present invention, the filtration membrane and / or Or, after removing the surfactant used for washing from the part, by immersing the filtration membrane and / or the part in the aqueous solution of the surfactant, the reaction between the surfactant used for washing and the surfactant used for immersion is performed. It is preferred that this does not happen. By using the washing method of the present invention and the storage / transport method of the present invention in combination as described above, in addition to the bactericidal effect by immersing in the surfactant solution for a long time, the effect of removing fine particles can also be obtained. . In addition, the filtration membrane and / or parts are immersed in a surfactant aqueous solution in an assembled state as much as possible,
Thus, it is desirable to minimize the work at the sampling point.

[0062]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS [First Embodiment] FIG. 1 is a flow chart showing an example of a cleaning apparatus for carrying out the present invention. In FIG. 1, reference numeral 1 denotes a filtration membrane for capturing fine particles in ultrapure water to be cleaned. In the cleaning apparatus of this example, the filtration membrane 1 is immersed in cleaning water in a batch type cleaning tank 2. The filtration membrane 1 is washed by overflowing while supplying the washing water.

In FIG. 1, reference numeral 4 denotes a conventional ultrapure water producing apparatus having a general configuration. The ultrapure water production apparatus 4 is configured such that a primary pure water tank between the primary pure water production system and the secondary pure water production system is connected to an outlet of the secondary pure water (ultra pure water) production system (ultra pure water supply outlet). The circulation system 41 is piped so as to return to the point of use, and ultrapure water is supplied to the use point in the middle of the circulation system 41.

In the cleaning apparatus of this embodiment, a pipe 43 is branched and connected in the middle of the circulation system 41, and a heating means 61 for heating the ultrapure water flowing through the pipe 43 to a predetermined temperature is connected to the pipe 43. Is provided. Further, in the cleaning apparatus of this example, a pH adjusting means 62 for adjusting the pH of the ultrapure water flowing through the pipe 43 to the alkaline side or the acidic side is provided. The pH adjusting means 62 is for injecting the pH adjusting agent from the pH adjusting agent storage tank 64 into the ultrapure water flowing through the pipe 43 via the supply pipe 66 by the pump 65. further,
In the cleaning apparatus of this example, a surfactant adding means 84 for adding a surfactant to ultrapure water flowing through the pipe 43 is provided. The surfactant adding means 84 is for adding a surfactant to ultrapure water flowing through the pipe 43 from the surfactant storage tank 85 via the supply pipe 87 by the pump 86.

In the cleaning apparatus of this embodiment, the cleaning tank 2 is placed in an ultrasonic irradiation tank 67 provided with an ultrasonic oscillator (not shown).
Is provided, and the ultrasonic irradiation tank 67 can irradiate the cleaning water in the cleaning tank 2 with ultrasonic waves. In this case, the cleaning water is supplied from the cleaning tank 2 to the ultrasonic irradiation tank 67.
Overflows. If ultrasonic irradiation is not performed,
Of course, the ultrasonic irradiation tank 67 is unnecessary.

In the drawing, reference numeral 70 denotes a filtration filter provided in the middle of a pipe 55 for supplying the cleaning water with the surfactant added thereto to the cleaning tank 2. It is provided to remove the fine particles from the adding means 84 in consideration of the mixing thereof.

When the cleaning method (1), (4) to (10) of the present invention is carried out using the cleaning apparatus of this example, the following is carried out. Cleaning method (1) The surfactant is added to the ultrapure water flowing through the pipe 43 by the surfactant adding means 84, and the obtained surfactant-added cleaning water is continuously supplied into the cleaning tank 2 via the pipe 55. And overflow. Then, the filtration membrane 1 is immersed in the detergent-added washing water in the washing tank 2.

Cleaning method (4) In the above-mentioned cleaning method (1), the pH of the ultrapure water flowing through the pipe 43 is adjusted to the alkali side by the pH adjusting means 62.

Cleaning method (5) In the cleaning method (4), the surfactant adding means 84
To add the anionic surfactant to the ultrapure water flowing through the pipe 43.

Cleaning method (6) In the cleaning method (1), the pH of the ultrapure water flowing through the pipe 43 is adjusted to the acidic side by the pH adjusting means 62.

Cleaning method (7) In the cleaning method (6), the surfactant adding means 84
To add a cationic surfactant to ultrapure water flowing through the pipe 43.

Cleaning method (8) In the above-mentioned cleaning methods (1), (4) to (7), the ultrapure water flowing through the pipe 43 is heated to a predetermined temperature by the heating means 61.

Cleaning Method (9) In the cleaning methods (1), (4) to (7), ultrasonic waves are applied to the hydrogen-dissolved water in the cleaning tank 2 by the ultrasonic irradiation tank 67.

Cleaning method (10) In the cleaning methods (1), (4) to (7), the ultrapure water flowing through the pipe 43 is heated to a predetermined temperature by the heating means 61 and the ultrasonic irradiation tank 67 is heated. Thus, ultrasonic waves are irradiated to the hydrogen-dissolved water in the cleaning tank 2.

[Second Embodiment] FIG. 2 is a flowchart showing an example of a cleaning apparatus for carrying out the present invention. FIG.
In the figure, reference numeral 1 denotes a filtration membrane for capturing fine particles in ultrapure water to be washed, and the filtration membrane 1 is horizontally held by a membrane holding means 81 such as a membrane holder. Further, in the cleaning device of this example, a cleaning water injection nozzle 82 having an ultrasonic irradiation unit is connected to the outlet of the pipe 55, and the cleaning water flowing in the cleaning water injection nozzle 82 by the ultrasonic irradiation unit is used. In addition to irradiating the ultrasonic waves, the cleaning water to which the ultrasonic waves are added can be jetted from the tip of the cleaning water jet nozzle 82 to strike the membrane surface of the filtration membrane 1. The device of this example is the same as the device of the first embodiment except for the above points. Therefore, in FIG. 2, the same components as those of the device of FIG. Description is omitted.

When the cleaning method (1), (4) to (10) of the present invention is carried out using the cleaning apparatus of this example, the following is performed. Cleaning method (1) The surfactant is added to the ultrapure water flowing through the pipe 43 by the surfactant adding means 84, and the obtained surfactant-added cleaning water is caused to flow from the pipe 55 to the cleaning water injection nozzle 82. Then, without adding ultrasonic waves to the surfactant-added cleaning water flowing through the cleaning water injection nozzle 82 by the ultrasonic irradiation means, the surfactant-added cleaning water is injected from the tip of the cleaning water injection nozzle 82 to filter the membrane. 1 to the film surface. Also,
The surfactant-added cleaning water may be directly applied to the membrane surface of the filtration membrane 1 from the pipe 55 without passing through the cleaning water injection nozzle 82.

Cleaning method (4) In the cleaning method (1), the pH of the ultrapure water flowing through the pipe 43 is adjusted to the alkali side by the pH adjusting means 62.

Cleaning method (5) In the cleaning method (4), the surfactant adding means 84
To add the anionic surfactant to the ultrapure water flowing through the pipe 43.

Cleaning method (6) In the cleaning method (1), the pH of the ultrapure water flowing through the pipe 43 is adjusted to the acidic side by the pH adjusting means 62.

Cleaning method (7) In the cleaning method (6), the surfactant adding means 84
To add a cationic surfactant to ultrapure water flowing through the pipe 43.

Cleaning method (8) In the above-mentioned cleaning methods (1), (4) to (7), the ultrapure water flowing through the pipe 43 is heated to a predetermined temperature by the heating means 61.

Cleaning method (9) In the above-mentioned cleaning methods (1), (4) to (7), ultrasonic waves are applied to the cleaning water flowing through the cleaning water injection nozzle 82 by ultrasonic irradiation means.

Cleaning method (10) In the above-mentioned cleaning methods (1), (4) to (7), the ultrapure water flowing through the pipe 43 is heated to a predetermined temperature by the heating means 61, and the ultrasonic irradiation means is used. Ultrasonic waves are applied to the cleaning water flowing through the cleaning water injection nozzle 82.

[Third Embodiment] FIG. 3 is a flowchart showing an example of a cleaning apparatus for carrying out the present invention. FIG.
In the cleaning apparatus of the present example, reference numeral 1 denotes a filtration membrane for trapping fine particles in ultrapure water to be cleaned. Membrane 1 by the method of overflowing while supplying
Is washed.

In FIG. 3, reference numeral 4 denotes a conventional ultrapure water producing apparatus having the same general configuration as that shown in FIG. In the cleaning apparatus of this example, the pipe 43 is branched and connected in the middle of the circulation system 41 of the ultrapure water production apparatus 4, and the pipes 44 and 45 are further branched and connected to the pipe 43 by the three-way valve 33. Ultrapure water is supplied to the pure water electrolysis device 5 and the gas dissolving tank 75. Then, the hydrogen gas obtained in the ultrapure water electrolysis apparatus 5 is dissolved in ultrapure water in the gas dissolving tank 75 to obtain hydrogen dissolved water obtained by dissolving hydrogen gas in ultrapure water. . In the figure, reference numeral 54 denotes a pipe 44 which is branched into two pipes and connected to the cathode chamber 51 of the pipes connected to supply the ultrapure water to the cathode chamber 51 and the anode chamber 52 of the ultrapure water electrolysis apparatus 5, respectively. Supply pipe.

In the ultrapure water electrolysis apparatus 5, ultrapure water introduced into the apparatus 5 through the pipe 44 is electrolyzed, and high-purity hydrogen gas generated in the cathode chamber 51 is supplied to the hydrogen gas supply pipe 57. It is sent to the gas dissolving tank 75. Gas dissolving tank 75
Is provided with a gas permeable membrane 76, and hydrogen gas supplied from the ultrapure water electrolysis device 5 via the gas permeable membrane 76 is dissolved in ultrapure water supplied from the pipe 45 to the gas dissolving tank 75,
Hydrogen dissolved water is generated. In FIG. 3, 58 is a gas-liquid separator, 59 is a discharge pipe for discharging ultrapure water after electrolysis, 56 is a high-purity ozone gas outlet pipe generated in the anode chamber 52 of the electrolysis apparatus 5, and 102 is hydrogen gas discharge. Show a tube. As in the case of hydrogen gas, a gas dissolving tank is connected to the ozone gas outlet pipe 56, and the ozone gas is dissolved in ultrapure water in this gas dissolving tank, so that the oxidizing agent is dissolved in ultrapure water. Gas dissolved water can also be obtained.

In the cleaning apparatus of this embodiment, the pipe 45 is provided with a heating means 61 for heating the ultrapure water flowing through the pipe 45 to a predetermined temperature. Further, in the cleaning apparatus of the present example, a pH adjusting means 62 for adjusting the pH of the ultrapure water flowing through the pipe 45 to the alkaline side or the acidic side is provided. Further, in the cleaning apparatus of the present embodiment, the surfactant adding means 8 for adding a surfactant to the hydrogen-dissolved water flowing through the pipe 45.
4 are installed. The pH adjusting means 62 and the surfactant adding means 84 are the same as those shown in FIG.

Note that the apparatus of this embodiment is the same as the first embodiment except for the above points.
Since the apparatus is the same as the apparatus of the embodiment, in FIG. 3, the same components as those of the apparatus of FIG. 1 are denoted by the same reference numerals, and the description thereof will be omitted.

When the cleaning method (2), (4) to (10) of the present invention is carried out using the cleaning apparatus of this example, the following is carried out. Cleaning method (2) Ultrapure water is introduced into the gas dissolving tank 75 via the pipes 43 and 45, and a surfactant is added to the obtained hydrogen-dissolved water by the surfactant adding means 84, and the obtained interface is obtained. The activator-added washing water is continuously injected into the washing tank 2 via the pipe 55 to overflow. Then, the filtration membrane 1 is immersed in the detergent-added washing water in the washing tank 2.

Cleaning Method (4) In the cleaning method (2), the pH of the ultrapure water flowing through the pipe 45 is adjusted to the alkali side by the pH adjusting means 62.

Cleaning method (5) In the cleaning method (4), the surfactant adding means 84
To add an anionic surfactant to the ultrapure water flowing through the pipe 45.

Cleaning method (6) In the cleaning method (2), the pH of the ultrapure water flowing through the pipe 45 is adjusted to the acidic side by the pH adjusting means 62.

Cleaning method (7) In the cleaning method (6), the surfactant addition means 84
To add a cationic surfactant to ultrapure water flowing through the pipe 45.

Cleaning method (8) In the above-mentioned cleaning methods (2), (4) to (7), the ultrapure water flowing through the pipe 45 is heated to a predetermined temperature by the heating means 61.

Cleaning method (9) In the cleaning methods (2), (4) to (7), the ultrasonic irradiation tank 67 irradiates the hydrogen-dissolved water in the cleaning tank 2 with ultrasonic waves.

Cleaning method (10) In the cleaning methods (2), (4) to (7), the ultrapure water flowing through the pipe 45 is heated to a predetermined temperature by the heating means 61 and the ultrasonic irradiation tank 67 is heated. Thus, ultrasonic waves are irradiated to the hydrogen-dissolved water in the cleaning tank 2.

[Fourth Embodiment] FIG. 4 is a flowchart showing an example of a cleaning apparatus for carrying out the present invention. FIG.
In the figure, reference numeral 1 denotes a filtration membrane for capturing fine particles in ultrapure water to be washed, and the filtration membrane 1 is horizontally held by a membrane holding means 81 such as a membrane holder. Further, in the cleaning device of this example, a cleaning water injection nozzle 82 having an ultrasonic irradiation unit is connected to the outlet of the pipe 55, and the cleaning water flowing in the cleaning water injection nozzle 82 by the ultrasonic irradiation unit is used. In addition to irradiating the ultrasonic waves, the cleaning water to which the ultrasonic waves are added can be jetted from the tip of the cleaning water jet nozzle 82 to strike the membrane surface of the filtration membrane 1. Since the device of this example is the same as the device of the third embodiment except for the above points, in FIG. 4, the same components as those of the device of FIG. Description is omitted.

When the cleaning method (2), (4) to (10) of the present invention is carried out using the cleaning apparatus of this example, the following is performed. Cleaning method (2) The surfactant is added to the hydrogen-dissolved water flowing through the pipe 45 by the surfactant adding means 84, and the obtained surfactant-added cleaning water is flown from the pipe 55 to the cleaning water injection nozzle 82. Then, without adding ultrasonic waves to the surfactant-added cleaning water flowing through the cleaning water injection nozzle 82 by the ultrasonic irradiation means, the surfactant-added cleaning water is injected from the tip of the cleaning water injection nozzle 82 to filter the membrane. 1 to the film surface. Further, the surfactant-added cleaning water may be directly applied to the membrane surface of the filtration membrane 1 from the pipe 55 without passing through the cleaning water injection nozzle 82.

Cleaning method (4) In the cleaning method (2), the pH of the ultrapure water flowing through the pipe 45 is adjusted to the alkali side by the pH adjusting means 62.

Cleaning method (5) In the cleaning method (4), the surfactant addition means 84
To add an anionic surfactant to the ultrapure water flowing through the pipe 45.

Cleaning Method (6) In the cleaning method (2), the pH of the ultrapure water flowing through the pipe 45 is adjusted to the acidic side by the pH adjusting means 62.

Cleaning method (7) In the cleaning method (6), the surfactant adding means 84
To add a cationic surfactant to ultrapure water flowing through the pipe 45.

Cleaning method (8) In the above-mentioned cleaning methods (2), (4) to (7), the ultrapure water flowing through the pipe 45 is heated to a predetermined temperature by the heating means 61.

Cleaning method (9) In the above-mentioned cleaning methods (2), (4) to (7), ultrasonic waves are applied to the cleaning water flowing in the cleaning water injection nozzle 82 by ultrasonic irradiation means.

Cleaning method (10) In the cleaning methods (2), (4) to (7), the ultrapure water flowing through the pipe 45 is heated to a predetermined temperature by the heating means 61, and the ultrasonic irradiation means is used. Ultrasonic waves are applied to the cleaning water flowing through the cleaning water injection nozzle 82.

[Fifth Embodiment] FIG. 5 is a flowchart showing an example of a cleaning apparatus for carrying out the present invention. FIG.
In the cleaning apparatus of the present example, reference numeral 1 denotes a filtration membrane for trapping fine particles in ultrapure water to be cleaned. Membrane 1 by the method of overflowing while supplying
Is washed.

In FIG. 5, reference numeral 4 denotes a conventional ultrapure water producing apparatus having the same general configuration as that shown in FIG. In the cleaning apparatus of the present embodiment, a pipe 14 for supplying ultrapure water to an electrolysis apparatus (electrolyte aqueous solution electrolysis apparatus) 105 for producing electrolytic cathode water is provided in the circulation system 41 of the ultrapure water production apparatus 4.
3 are connected in a branched manner, and the cathode chamber 15 of the electrolysis apparatus 105 is connected.
1 is supplied to the washing tank 2 via the pipe 55, the inflow end of the pipe 142 is connected to the pipe 143 using the three-way valve 131, and the outflow end of the pipe 142 is connected to the three-way valve 132. The cleaning water (ultra pure water) is supplied to the cleaning tank 2 through the pipe 142 by switching the three-way valves 131 and 132 by connecting the cleaning water to the cleaning tank 2 by connecting the three-way valves 131 and 132. In the figure, reference numeral 154 designates a pipe 143 which is branched into three sections, a cathode chamber 151, an anode chamber 152, and an intermediate chamber 153.
And supply pipes to the cathode chamber 151 among the pipes connected to supply ultrapure water to the cathode chamber 151.

FIG. 6 is an enlarged schematic view of an example of the apparatus for producing electrolytic cathode water in the apparatus of FIG. 5, that is, the relationship between the above-described three-tank type electrolysis apparatus 105 and the connection of the piping of water flowing therethrough. It is shown. The electrolysis apparatus 105 of FIG. 6 includes a cathode chamber 151 and an anode chamber 15.
2, and an intermediate chamber 153 partitioned by ion exchange membranes 115 and 116, which are solid electrolytes provided as partitions between them, is provided so that ultrapure water is supplied to each chamber from an inlet pipe 117. It has become. In addition, the intermediate room 1
53 is filled with an ion exchange resin as a solid electrolyte.

Then, by the DC current applied between the cathode electrode 118 arranged in the cathode chamber 151 and the anode electrode 119 arranged in the anode chamber 152,
The supplied ultrapure water is electrolyzed, and the generated cathode water flows out of the cathode water outlet pipe 120 (the pipe 55 in FIG. 6),
The anode water flows out of the anode water outlet pipe 121. The intermediate chamber water flows out of the outlet pipe 122.

The electrolysis apparatus 105 of FIG.
When the electrolysis of ultrapure water containing almost no electrolyte, the ion exchange membranes 115 and 116, which are solid electrolytes, between the cathode electrode 118 and the anode electrode 119 and the intermediate chamber 153
The ion exchange resin in the inside serves as a carrier for transfer of electrons between the electrodes, and can perform electrolysis of ultrapure water at a low voltage, and by providing the intermediate chamber 153 filled with the ion exchange resin,
Mixing of the liquid between the cathode chamber 151 and the anode chamber 152 can be prevented.

In the cleaning apparatus of this embodiment, a heating means 61 for heating the ultrapure water flowing through the pipe 143 to a predetermined temperature is provided just before the three-way valve 131 in the pipe 143. Further, in the cleaning apparatus of this example, a pH adjusting means 62 for adjusting the pH of the ultrapure water flowing through the pipe 154 or the ultrapure water flowing through the pipe 142 to an alkali side or an acid side is provided. Further, in the cleaning device of this example, the pipe 5
Surfactant addition means 84 for adding a surfactant to the electrolytic cathode water flowing through the water 5 is provided. The pH adjusting means 62 and the surfactant adding means 84 are the same as those shown in FIG.

The apparatus of this example is the same as the first except for the above points.
Since the apparatus is the same as the apparatus of the embodiment, in FIG. 5, the same components as those of the apparatus of FIG. 1 are denoted by the same reference numerals, and the description thereof will be omitted.

When the cleaning methods (3) to (10) of the present invention are carried out using the cleaning apparatus of the present example, the following procedures are performed. Cleaning method (3) Ultrapure water is introduced into the electrolysis apparatus 105 through the pipes 143 and 154, and a surfactant is added to the obtained electrolytic cathode water by the surfactant adding means 84, and the obtained surfactant is added. The agent-added cleaning water is continuously injected into the cleaning tank 2 via the pipe 55 to overflow. Then, the filtration membrane 1 is immersed in the detergent-added washing water in the washing tank 2.

Cleaning Method (4) In the cleaning method (3), the pH of the ultrapure water flowing through the pipe 154 is adjusted to the alkali side by the pH adjusting means 62.

Cleaning method (5) In the cleaning method (4), the surfactant adding means 84
To add an anionic surfactant to the electrolytic cathode water flowing through the pipe 55.

Cleaning method (6) In the cleaning method (3), the pH of the ultrapure water flowing through the pipe 154 is adjusted to the acidic side by the pH adjusting means 62.

Cleaning method (7) In the cleaning method (6), the surfactant adding means 84
To add a cationic surfactant to the electrolytic cathode water flowing through the pipe 55.

Cleaning method (8) In the cleaning methods (3) to (7), the ultrapure water flowing through the pipe 143 is heated to a predetermined temperature by the heating means 61.

Cleaning method (9) In the cleaning methods (3) to (7), the ultrasonic irradiation tank 6
7 irradiates ultrasonic waves to the hydrogen-dissolved water in the cleaning tank 2.

Cleaning method (10) In the cleaning methods (3) to (7), the ultrapure water flowing through the pipe 143 is heated to a predetermined temperature by the heating means 61 and the cleaning tank 2 is heated by the ultrasonic irradiation tank 67. Ultrasonic waves are applied to the hydrogen-dissolved water inside.

[Sixth Embodiment] FIG. 7 is a flowchart showing an example of a cleaning apparatus for carrying out the present invention. FIG.
In the figure, reference numeral 1 denotes a filtration membrane for capturing fine particles in ultrapure water to be washed, and the filtration membrane 1 is horizontally held by a membrane holding means 81 such as a membrane holder. Further, in the cleaning device of this example, a cleaning water injection nozzle 82 having an ultrasonic irradiation unit is connected to the outlet of the pipe 55, and the cleaning water flowing in the cleaning water injection nozzle 82 by the ultrasonic irradiation unit is used. In addition to irradiating the ultrasonic waves, the cleaning water to which the ultrasonic waves are added can be jetted from the tip of the cleaning water jet nozzle 82 to strike the membrane surface of the filtration membrane 1. Since the device of this example is the same as the device of the fifth embodiment except for the above points, in FIG. 7, the same components as those of the device of FIG. Description is omitted.

When the cleaning methods (3) to (10) of the present invention are carried out using the cleaning apparatus of the present example, the following steps are performed. Cleaning method (3) A surfactant is added to the electrolytic cathode water flowing through the pipe 55 by the surfactant adding means 84, and the obtained surfactant-added cleaning water is supplied from the pipe 55 to the cleaning water injection nozzle 8
Pour into 2. Then, without adding ultrasonic waves to the surfactant-added cleaning water flowing through the cleaning water injection nozzle 82 by the ultrasonic irradiation means, the surfactant-added cleaning water is injected from the tip of the cleaning water injection nozzle 82 to filter the membrane. 1 to the film surface.
Further, the surfactant-added cleaning water may be directly applied to the membrane surface of the filtration membrane 1 from the pipe 55 without passing through the cleaning water injection nozzle 82.

Cleaning method (4) In the cleaning method (3), the pH of the ultrapure water flowing through the pipe 154 is adjusted to the alkali side by the pH adjusting means 62.

Cleaning method (5) In the cleaning method (4), the surfactant adding means 84
To add an anionic surfactant to the electrolytic cathode water flowing through the pipe 55.

Cleaning method (6) In the cleaning method (3), the pH of the ultrapure water flowing through the pipe 154 is adjusted to the acidic side by the pH adjusting means 62.

Cleaning method (7) In the cleaning method (6), the surfactant adding means 84
To add a cationic surfactant to the electrolytic cathode water flowing through the pipe 55.

Cleaning method (8) In the cleaning methods (3) to (7), the ultrapure water flowing through the pipe 143 is heated to a predetermined temperature by the heating means 61.

Cleaning method (9) In the above-mentioned cleaning methods (3) to (7), ultrasonic waves are applied to the cleaning water flowing through the cleaning water injection nozzle 82 by the ultrasonic irradiation means.

Cleaning method (10) In the cleaning methods (3) to (7), the ultrapure water flowing through the pipe 143 is heated to a predetermined temperature by the heating means 61, and the cleaning water injection nozzle is heated by the ultrasonic irradiation means. 8
Ultrasonic waves are applied to the washing water flowing through the inside of the container.

In the fifth and sixth embodiments, the cleaning method (2) of the present invention in which a surfactant is added to the electrolytic cathode water has been described. However, the electrolytic anode water flowing out of the anode chamber 152 of the electrolytic device 105 is removed. It goes without saying that the cleaning method (3) of the present invention can be carried out by using this.

When performing the above-described primary cleaning and secondary cleaning using the apparatuses of the first to sixth embodiments, the cleaning method of irradiating ultrasonic waves, ie, the cleaning methods (9) and (10), The overflow type ultrasonic cleaning is performed by the apparatus of the first, third, and fifth embodiments as described above, or the impact method is performed by the apparatus of the second, fourth, and sixth embodiments as described above. After the ultrasonic cleaning of the second,
It is possible to suitably adopt a mode in which the apparatus according to the fourth and sixth embodiments performs the cleaning by the hitting method using the same cleaning water as the primary cleaning without irradiating the cleaning water with ultrasonic waves. Also,
In the cleaning method without ultrasonic irradiation, that is, in the cleaning methods (1) to (8), after performing the overflow-type cleaning as described above using the apparatuses of the first, third, and fifth embodiments, It is possible to suitably adopt a mode in which the apparatus of the second, fourth, and sixth embodiments performs the cleaning of the striking method using the same cleaning water as the primary cleaning. in this case,
Switching between the apparatus of the first, third, and fifth embodiments and the apparatus of the second, fourth, and sixth embodiments is easily performed by attaching and detaching the washing water injection nozzle 82 to and from the outlet of the pipe 55. It can be carried out.

In the above secondary washing, it is appropriate to use, as the membrane holding means, the lower part of the filtration membrane fixing portion of the filter of the device for collecting fine particles in ultrapure water using the filtration membrane to be washed. FIG. 8 shows an example of a filter of the particulate collection device. In FIG. 8, 91 is an assembly ring, 92 is a cap, 93 is an upper support grid, 94 is a flat gasket, 95 is a filtration membrane, 96 is a lower support grid,
Reference numeral 97 denotes an O-ring, and 98 denotes a base (lower stand). O-
The ring 97 and the flat gasket 94 are
And an O-ring may be disposed above the filter membrane 95 depending on the filter. The lower part of the filtration membrane fixing part refers to a part arranged below the filtration membrane to fix the filtration membrane in the filter of the device for collecting fine particles in ultrapure water. In the example of FIG. 8, the lower support grid 96, the O-ring 97, and the base 98 constitute the lower part 99 of the filter membrane fixing portion. When the O-ring is arranged above the filtration membrane 95, the O-ring is not included in the lower part of the filtration membrane fixing part. If the lower part of the filtration membrane fixing part described above is used as the membrane holding means in the secondary cleaning, the filtration membrane can be installed in the particle collection device immediately after the cleaning, so that the possibility of external contamination of the membrane after the secondary cleaning is reduced. Can be.

[0133]

[Experiment 1] The following experiment was conducted. In this case, the filtration membrane for trapping fine particles in ultrapure water shown below is washed with the following wash water, and the number of fine particles on the membrane after the washing is measured using the following measuring device according to JIS-K0554 (ultra pure water). Of fine particle measurement method). Filtration membrane Anopore membrane (manufactured by Whatman Japan KK), pore size 0.02 μm, effective filtration area 283 mm ² scanning electron microscope S-4000 (manufactured by Hitachi, Ltd.), acceleration voltage 10K
v Ultrasonic oscillator Himega Sonic CA-68S-61 (manufactured by Kaijo Co., Ltd.) Heating device Fluororesin pharmaceutical liquid heater ECE-190 (manufactured by Cera Corp.) Cleaning water 1. Ultrapure water 2. 2. Ultrapure water with added surfactant (ultrapure water with added surfactant) 3. Hydrogen dissolved water (hydrogen dissolved water) obtained by dissolving hydrogen gas in ultrapure water. 4. Hydrogen-dissolved water to which a surfactant has been added (surfactant-added hydrogen-dissolved water) 5. Hydrogen-dissolved water adjusted to pH 10 by adding ammonia (alkaline hydrogen-dissolved water) 7. Alkaline hydrogen dissolved water to which a surfactant is added (surfactant added alkaline hydrogen dissolved water) 7.50 ° C. alkaline hydrogen dissolved water (warmed alkaline hydrogen dissolved water) 8. Warmed alkaline hydrogen dissolved water to which a surfactant is added (warmed alkaline hydrogen dissolved water to which a surfactant is added) Electrolytic cathode water obtained by electrolyzing ultrapure water (electrolytic cathode water) Electrolytic cathode water with added surfactant (electrolyte cathode water with added surfactant)

In the experiment, primary cleaning and secondary cleaning were performed. First, as the primary cleaning, while continuously injecting cleaning water into a fluoroplastic beaker, while floating the film in the cleaning water,
Washing by the overflow method was performed for 30 minutes. afterwards,
As a secondary cleaning, a filtration membrane was attached to the holder with its fine particle capturing surface facing upward, and cleaning was performed for 30 minutes by hitting cleaning water against the fine particle capturing surface of the membrane. The primary washing and the secondary washing were performed using the same washing water. As a holder at the time of the secondary washing, a lower part of a filtration membrane fixing portion of a filtration membrane holder (filter) of a device for collecting fine particles in ultrapure water was used. However, in the experiment using the heated alkaline hydrogen dissolved water and the surfactant-added heated alkaline hydrogen dissolved water, the cleaning water was irradiated with ultrasonic waves to perform primary cleaning (ultrasonic irradiation overflow method). In the primary cleaning by this ultrasonic irradiation overflow method,
The film was suspended in a quartz washing tank provided with an ultrasonic irradiation means, and washing was performed for 3 minutes by irradiating washing water with ultrasonic waves having a frequency of 0.95 MHz. As a surfactant, an anionic surfactant (sodium dodecylbenzenesulfonate) was added at a concentration of 200 ppm. Table 1 shows the measurement results of the number of fine particles after the secondary washing in the experiment using each washing water.
Shown in

[0135]

[Table 1]

Table 1 shows that the addition of a surfactant to the washing water significantly increases the effect of the filtration membrane for capturing fine particles in ultrapure water to remove contaminating fine particles. In addition, it can be seen that the effect is further increased by using heating and ultrasonic irradiation together.

[Experiment 2] The filtration membrane was immersed in the following solution for 10 minutes, pulled up, and then diluted with the following concentration of the bacterial solution 10.
0 μl was dropped on the filtration membrane, uniformly contacted with the membrane surface, and left for 1 hour. Thereafter, the membrane surface in contact with the bacteria was brought into contact with the medium, and the medium was left in an incubator set at 30 ° C. for 24 hours, and the growth of the bacteria was counted.

Immersion solution ultrapure water Ultrapure water to which 200 ppm of cationic surfactant is added Cationic surfactant Alkylbenzyldimethylammonium chloride Bacterium name Pseuclomonas putida Bacteria concentration 10 ³ cfu / ml Medium name Nutrint agar (manufactured by Difco) ) Result immersion solution: 90 cfu immersion solution: 0 cfu

As described above, in the case of the filtration membrane immersed in ultrapure water, propagation of bacteria was confirmed. On the other hand, in the case of the filtration membrane immersed in the ultrapure water with the addition of the surfactant, no bacterial growth was observed.

[0140]

According to the present invention, by adding a surfactant to the washing water, it is possible to effectively remove the contaminating fine particles adhering to the filtration membrane for capturing fine particles in ultrapure water, Therefore, it is possible to reduce the amount of ultrapure water passing through the filtration membrane and to reduce the filtration time when capturing fine particles.
In addition, when the pH adjustment of the washing water, the selection of the type of surfactant, the heating of the washing water, and the ultrasonic irradiation of the washing water are performed,
Further, an excellent effect of removing contaminating fine particles can be obtained.
In addition, by leaving the surfactant on the filtration membrane, even if bacteria are contaminated on the membrane, the bacteria can be killed, effectively preventing obstacles to microparticle measurement due to propagation of bacteria. can do.

[Brief description of the drawings]

FIG. 1 is a flowchart showing an example of a cleaning apparatus for carrying out the present invention.

FIG. 2 is a flowchart showing an example of a cleaning apparatus for carrying out the present invention.

FIG. 3 is a flowchart showing an example of a cleaning apparatus for carrying out the present invention.

FIG. 4 is a flowchart showing an example of a cleaning apparatus for carrying out the present invention.

FIG. 5 is a flowchart showing an example of a cleaning apparatus for carrying out the present invention.

FIG. 6 is a schematic view showing an electrolysis apparatus having a three-tank structure.

FIG. 7 is a flowchart showing an example of a cleaning apparatus for carrying out the present invention.

FIG. 8 is an exploded perspective view showing a filter of the device for collecting fine particles in ultrapure water.

[Explanation of symbols]

 Reference Signs List 1 Filtration membrane for capturing fine particles in ultrapure water 2 Cleaning tank 4 Ultrapure water production apparatus 5 Ultrapure water electrolysis apparatus 61 Heating means 62 pH adjusting means 67 Ultrasonic irradiation means 75 Gas dissolving tank 76 Gas permeable membrane 81 Membrane holding Means 82 Cleaning water injection nozzle provided with ultrasonic irradiation means 84 Surfactant addition means 105 Electrolyzer

Continued on front page F term (reference) 4D006 GA02 HA41 KC02 KC07 KC13 KC15 KC16 KC19 KC21 KD04 KD11 KD17 KD21 KD23 KD30 KE11R KE15R KE16R KE30R LA01 LA08 MA03 MA22 MB10 MC03 MC49 PA01 PB20 PC02 PC42

Claims (17)

[Claims] 1. A filtration membrane for capturing fine particles in ultrapure water, wherein the filtration membrane for capturing fine particles in ultrapure water is washed with washing water obtained by adding a surfactant to ultrapure water. Cleaning method. 2. A surfactant is added to washing water obtained by adding a surfactant to electrolytic cathode water obtained by electrolyzing ultrapure water, or a hydrogen-dissolved water obtained by dissolving a hydrogen gas in ultrapure water. A method for cleaning a filtration membrane for capturing fine particles in ultrapure water, comprising cleaning the filtration membrane for capturing fine particles in ultrapure water with the cleaning water thus obtained. 3. A cleaning water obtained by adding a surfactant to electrolytic anode water obtained by electrolyzing ultrapure water, or ultrapure water selected from oxygen gas, chlorine gas and ozone gas.
A filtration membrane for trapping fine particles in ultrapure water, characterized by washing a filtration membrane for trapping fine particles in ultrapure water with cleaning water obtained by adding a surfactant to oxidizing gas-dissolved water in which seeds are dissolved. Cleaning method. 4. The cleaning method according to claim 1, wherein the pH of the cleaning water is adjusted to an alkaline side. 5. The cleaning method according to claim 4, wherein an anionic surfactant and / or an amphoteric surfactant are used as the surfactant. 6. The cleaning method according to claim 1, wherein the pH of the cleaning water is adjusted to an acidic side. 7. The cleaning method according to claim 6, wherein a cationic surfactant and / or an amphoteric surfactant is used as the surfactant. 8. The cleaning method according to claim 1, wherein the cleaning water is heated to 30 to 100 ° C. 9. The cleaning water is irradiated with ultrasonic waves.
The cleaning method according to any one of the above. 10. The cleaning method according to claim 1, wherein the cleaning water is heated to 30 to 100 ° C., and the cleaning water is irradiated with ultrasonic waves. 11. The cleaning method according to claim 9, wherein ultrasonic waves having a frequency of 0.8 MHz to 3 MHz are irradiated. 12. The cleaning method according to claim 1, wherein the filtration membrane is washed so that the surfactant remains on the filtration membrane for capturing fine particles in ultrapure water after the washing. 13. Instead of washing the filtration membrane for capturing fine particles in ultrapure water, at least one of a device for collecting fine particles in ultrapure water and a part of a water flow system for installing the collecting device. The cleaning method according to any one of claims 1 to 11, wherein the cleaning is performed. 14. The cleaning method according to claim 13, wherein the component is cleaned so that the surfactant remains on the component after the cleaning. 15. A filtration device for capturing particulates in ultrapure water together with a device for collecting particulates in ultrapure water and washing at least one of components constituting a water flow system in which the device is installed. The cleaning method according to claim 13, wherein the cleaning is performed. 16. The cleaning method according to claim 15, wherein the component and the filtration membrane are cleaned so that a surfactant remains on the component and the filtration membrane after the cleaning. 17. An aqueous surfactant solution obtained by adding a surfactant to ultrapure water, an aqueous surfactant solution obtained by adding a surfactant to electrolytic cathode water obtained by electrolyzing ultrapure water, Surfactant aqueous solution obtained by adding a surfactant to hydrogen-dissolved water obtained by dissolving hydrogen gas in pure water, and surfactant obtained by adding a surfactant to electrolytic anode water obtained by electrolyzing ultrapure water Particle trapping in ultrapure water in an aqueous solution or a surfactant aqueous solution obtained by adding a surfactant to an oxidizing gas-dissolved water in which one selected from oxygen gas, chlorine gas and ozone gas is dissolved in ultrapure water In the state where the filtration membrane and / or parts selected from the filtration membrane and / or the components constituting the water passage system for installing the particulate collection device and the collection device in ultrapure water are immersed, the filtration membrane and / or the components Ultrapure water characterized by storage or transportation Particle collection for the filtration membrane and parts method storage and transportation of.