JP2000109320A - Metallic substrate for oxide superconductor and its production - Google Patents

Metallic substrate for oxide superconductor and its production

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Publication number
JP2000109320A
JP2000109320A JP10286387A JP28638798A JP2000109320A JP 2000109320 A JP2000109320 A JP 2000109320A JP 10286387 A JP10286387 A JP 10286387A JP 28638798 A JP28638798 A JP 28638798A JP 2000109320 A JP2000109320 A JP 2000109320A
Authority
JP
Japan
Prior art keywords
metal
oxide superconductor
substrate
metal substrate
base material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10286387A
Other languages
Japanese (ja)
Other versions
JP3930163B2 (en
Inventor
Kazuhisa Higashiyama
和寿 東山
Hiroyuki Akata
広幸 赤田
Tetsuo Fujiwara
徹男 藤原
Shigeo Nagaya
重夫 長屋
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Chubu Electric Power Co Inc
Hitachi Ltd
Original Assignee
Chubu Electric Power Co Inc
Hitachi Ltd
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Filing date
Publication date
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Priority to JP28638798A priority Critical patent/JP3930163B2/en
Publication of JP2000109320A publication Critical patent/JP2000109320A/en
Application granted granted Critical
Publication of JP3930163B2 publication Critical patent/JP3930163B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E40/00Technologies for an efficient electrical power generation, transmission or distribution
    • Y02E40/60Superconducting electric elements or equipment; Power systems integrating superconducting elements or equipment

Abstract

PROBLEM TO BE SOLVED: To obtain a metallic substrate having a long size, homogeneity or a large area and having high mechanical strength and excellent smoothness with high productivity at a low cost by constituting the substrate of a metallic film layer having the recrystallization texture grown by contact with a superconducting film and a metallic base material having the yield strength higher than the yield strength thereof. SOLUTION: Ni and Al are alternately laminated and the metallic coating layer of Pt, Ag, etc., forming the recrystallization texture having excellent orientation controllability is formed thereon. This composite is worked as it is to an approximately long-sized tape form, flat planar form, etc. This worked body is rolled to a desired shape, such as a long-sized tape or flat plate, by subjected to the body to intermediate annealing. This molding is then annealed in an inert gaseous atmosphere, etc., and is further fired at need. As a result, the metallic substrate for flexible oxide superconductors which consists of the metallic coating layer 1 formed with the recrystallization texture grown by contact with the superconducting film and the metallic base material 3 of an intermediate metallic compound, 2, such as high-strength Ni3Al, and is preferably >=100 MPa in the yield stress value is obtained.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、液体窒素温度以上
で高い臨界電流密度及び臨界電流を有する長尺・均質の
酸化物超電導線材や大面積膜状デバイスの形成に好適
な、機械強度に優れ、量産性・コストに優れた長尺ある
いは大面積の酸化物超電導体用金属基板及びその製造方
法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention has excellent mechanical strength and is suitable for forming a long and homogeneous oxide superconducting wire or a large-area film device having a high critical current density and a critical current at a temperature of liquid nitrogen or higher. The present invention relates to a long or large-area metal substrate for an oxide superconductor excellent in mass productivity and cost and a method of manufacturing the same.

【0002】[0002]

【従来の技術】現在、液体窒素温度で使用する超電導線
材の材料としてはYBa2Cu37(以下、Y−12
3)や(Hg,Re)Ba2Ca2Cu3Ox(以下、H
g−1223)、(Hg,Re)Ba2Ca1Cu2Ox
(以下、Hg−1212)などが有力である。これら材
料の多結晶体で構成される超電導線材や膜状デバイスで
高い臨界電流密度(以下、Jc)や臨界電流(以下、I
c)を得るためには超電導体の結晶粒界での良好な電気
的接合性を実現しなければならない。超電導材料により
多少の違いはあるが、結晶粒界での良好な接合性を確保
するためには、超電導結晶粒を同一方向に配向すること
が必要とされる。この超電導体の結晶配向を実現するた
め、現在、種々の配向制御用基板が開発されている。
2. Description of the Related Art At present, as a material for a superconducting wire used at a liquid nitrogen temperature, YBa 2 Cu 3 O 7 (hereinafter referred to as Y-12) is used.
3) or (Hg, Re) Ba 2 Ca 2 Cu 3 Ox (hereinafter referred to as H
g-1223), (Hg, Re) Ba 2 Ca 1 Cu 2 Ox
(Hereinafter, Hg-1212) and the like are promising. High critical current densities (hereinafter, Jc) and critical currents (hereinafter, Ic) can be obtained in superconducting wires and film devices composed of polycrystals of these materials.
In order to obtain c), good electrical bonding at the crystal grain boundaries of the superconductor must be realized. Although there are some differences depending on the superconducting material, it is necessary to orient the superconducting crystal grains in the same direction in order to ensure good bonding at the crystal grain boundaries. In order to realize the crystal orientation of the superconductor, various orientation control substrates have been developed at present.

【0003】例えば、Appl. Phys. Let
t. 60 (1992) pp769において飯島ら
はY−123線材の基板としてハステロイ金属テープ上
にIBAD (Ion−Beam− Assisted
− Deposition)と呼ばれる特殊な成膜法に
より面内配向したイットリウム安定化ジルコニア(YS
Z)の中間層を形成したものを使用している。YSZ中
間層の効果でその上に形成されたY−123も面内配向
し、液体窒素の沸点77K、自己磁界下で106A/c
m2 の高いJc と100A程度の臨界電流値が得ら
れている。
[0003] For example, Appl. Phys. Let
t. 60 (1992) pp769, IBAD (Ion-Beam-Assisted) on Hastelloy metal tape as a substrate for Y-123 wire.
-Yttrium-stabilized zirconia (YS) oriented in-plane by a special film formation method called Deposition.
Z) having an intermediate layer formed thereon is used. The Y-123 formed thereon due to the effect of the YSZ intermediate layer is also in-plane oriented, having a boiling point of liquid nitrogen of 77K and a self-magnetic field of 10 6 A / c.
A high Jc of m2 and a critical current value of about 100 A are obtained.

【0004】Advances in Superco
nductivity VIII,Supringer
−Verlag, Tokyo(1996) pp75
9において、山崎らは{110}<001>集合組織を
有した銀テープを基板にしてY−123線材を作製した
ことを報告している。銀は、超電導体と反応せず酸化も
しないため、中間層を形成することなく直接銀テープ上
にY−123が作製できる。
[0004] Advances in Superco
nductivity VIII, Supplinger
-Verlag, Tokyo (1996) pp75
9, Yamazaki et al. Reported that a Y-123 wire was manufactured using a silver tape having a {110} <001> texture as a substrate. Since silver does not react with the superconductor and does not oxidize, Y-123 can be produced directly on a silver tape without forming an intermediate layer.

【0005】同様に、土井らはAdvances in
Superconductivity VIII,
Supringer−Verlag, Tokyo(1
996) pp903において立方体集合組織を有する
銀テープ上に直接Tl−1223酸化物超電導体を形成
した線材について記している。これら銀の有する集合組
織の効果により、Y−123やTl−1223は面内配
向が実現している。結晶配向に好適な集合組織を有する
これらの銀テープは、圧延あるいはそれに引き続く熱処
理のみによって形成できるため、長尺の超電導線材あを
作製する上で有効である。
Similarly, Doi et al. In Advances in
Superconductivity VIII,
Supplinger-Verlag, Tokyo (1
996) pp903 describes a wire rod in which a Tl-1223 oxide superconductor is directly formed on a silver tape having a cubic texture. Due to the effect of the texture of silver, in-plane orientation of Y-123 and Tl-1223 is realized. Since these silver tapes having a texture suitable for crystal orientation can be formed only by rolling or subsequent heat treatment, they are effective in producing a long superconducting wire.

【0006】一方、超電導膜状デバイスの基板には、チ
タン酸ストロンチウム、酸化マグネシウムなどの金属酸
化物単結晶基板が広く使用されている。しかし、これら
単結晶材料の大型化は現状技術では難しく、数cm角の
基板を熱的に接続して大型化する方法が一部で実施され
ている程度である。
On the other hand, a single crystal substrate of a metal oxide such as strontium titanate and magnesium oxide is widely used as a substrate for a superconducting film-like device. However, it is difficult to increase the size of these single crystal materials by the current technology, and only a method of thermally connecting substrates of several cm square to increase the size is partially implemented.

【0007】[0007]

【発明が解決しようとする課題】酸化物超電導線材に用
いる基板は、(a)超電導体の配向制御性、(b)耐反
応性・耐酸化性、(c)可とう性、(d)表面の平滑
性、(e)機械的高強度、(f)長尺化の容易性、
(g)低コスト等の条件を満たしていなければならな
い。また、酸化物超電導デバイスの基板は、(a)超電
導体の配向制御性、(b)耐反応性・耐酸化性、(c)
表面の平滑性、(d)機械的高強度、(e)大面積化の
容易性、(f)低コスト等の条件を満たしていなければ
ならない。
The substrate used for the oxide superconducting wire comprises (a) superconducting orientation controllability, (b) resistance to reaction and oxidation, (c) flexibility, and (d) surface. Smoothness, (e) high mechanical strength, (f) easy lengthening,
(G) It must satisfy conditions such as low cost. In addition, the substrate of the oxide superconducting device includes (a) superconducting orientation controllability, (b) reaction resistance and oxidation resistance, and (c)
It must satisfy conditions such as surface smoothness, (d) high mechanical strength, (e) easy area enlargement, and (f) low cost.

【0008】ハステロイ金属テープ上にYSZ中間層を
形成した線材用基板では、特殊な真空成膜法によりYS
Zを作製しており、その基板作製速度は数十 cm/h
と遅い。そのため、超電導線材の基板に本来求められる
数100m〜数Kmの長さを安定に実現する事が難しい
という問題がある。また、基板に使用したハステロイ金
属テープが0.1mmと厚いため、超電導体のJcは大
きいものの基板を含めたオーバーオールJcは、Jcの
1/100程度と小さくなるという問題もある。
In a wire rod substrate having a YSZ intermediate layer formed on a Hastelloy metal tape, YSZ is formed by a special vacuum film forming method.
Z is manufactured, and the substrate manufacturing speed is several tens cm / h.
And slow. Therefore, there is a problem that it is difficult to stably realize a length of several hundred meters to several kilometers that is originally required for a substrate of a superconducting wire. In addition, since the Hastelloy metal tape used for the substrate is as thick as 0.1 mm, there is a problem that the Jc of the superconductor is large, but the overall Jc including the substrate is as small as about 1/100 of Jc.

【0009】一方、集合組織を有する銀の線材用基板
は、YSZなどの中間層を必要とせず、また、比較的簡
単な加工により作製できるため長尺化や大面積化は容易
である。しかし、その最大の問題は、銀の機械的強度が
低いことである。例えば、銀のテープ状基板を用いて長
尺の線材が得られたとしても、基板の降伏応力が小さい
ため、コイル形成時の張力により断線する可能性があ
る。それ以前に、超電導体形成時に基板は700〜90
0℃に加熱されるため、融点が低く高温ほど降伏応力が
低くなる銀では溶断したり変形するという問題がある。
また、再結晶集合組織は、圧延によって金属内に蓄積さ
れた歪みが加熱され開放される過程で形成される。
On the other hand, a silver wire substrate having a texture does not require an intermediate layer such as YSZ, and can be manufactured by relatively simple processing, so that it is easy to increase the length and the area. However, the biggest problem is the low mechanical strength of silver. For example, even if a long wire is obtained using a silver tape-shaped substrate, there is a possibility that the wire is broken due to the tension at the time of forming the coil because the yield stress of the substrate is small. Before that, when forming the superconductor, the substrate was 700-90.
Since silver is heated to 0 ° C., silver having a lower melting point and a lower yield stress at higher temperatures has a problem of melting or deforming.
The recrystallized texture is formed in a process in which the strain accumulated in the metal by the rolling is heated and released.

【0010】そのため、一旦好適な集合組織が形成され
ても、その後歪みが加わり、更に加熱されると基板とし
て好ましくない別の集合組織に変化するという不安定性
を有している。基板の使用時には頻繁に曲げ歪みが加え
られる事が多いため、本来の集合組織が崩れることを防
ぐ必要があるが、現状の銀テープでは難しい。更に、貴
金属である銀はそのコストが高いという問題もある。
[0010] For this reason, even if a suitable texture is formed, there is an instability that a strain is applied after that, and when heated further, the texture changes to another texture which is not preferable as a substrate. When a substrate is used, bending distortion is frequently applied. Therefore, it is necessary to prevent the original texture from collapsing, but it is difficult with the current silver tape. Furthermore, there is a problem that silver, which is a noble metal, is expensive.

【0011】金属基板の機械的強度を向上させる一つの
簡便な方法として、より強度の高い異種金属と複合化す
ることが考えられる。異種金属を合わせて機械加工する
と、両者の界面に生じた新生面で元素の拡散が生じ、強
固な複合体が得られることは良く知られている。加熱を
加えることで、界面での拡散は一層進み接合強度も高く
なる。
As one simple method for improving the mechanical strength of a metal substrate, it is conceivable to form a composite with a different metal having higher strength. It is well known that, when different kinds of metals are combined and machined, elements are diffused on a new surface generated at the interface between the two, and a strong composite is obtained. By applying heating, diffusion at the interface is further promoted and bonding strength is increased.

【0012】硬さや変形抵抗の異なる金属同士では、加
工途中に両者の硬度が大きく異なり、正常な加工ができ
なくなるため、しばしば焼鈍を加え金属を軟化させるこ
とも行われている。しかし、銀基板の再結晶集合組織の
多くは、圧延による適正な加工度を加えた後、一気に焼
鈍することで得られる。圧延途中に焼鈍を加えたり、焼
鈍の後に再度圧延を加えたりすると、本来の集合組織と
は全く別の集合組織が形成されてしまう。
[0012] Metals having different hardnesses and deformation resistances have different hardnesses during the processing, so that normal processing cannot be performed. Therefore, the metal is often softened by annealing. However, most of the recrystallized texture of the silver substrate can be obtained by annealing at a stretch after adding an appropriate degree of processing by rolling. If annealing is performed during rolling or rolling is performed again after annealing, a texture completely different from the original texture is formed.

【0013】そのため、銀に複合化する金属の硬さが加
工途中で大きく異なり加工が困難になっても、軟化のた
めの焼鈍を加えることができないという問題がある。焼
鈍を加えず圧延を繰り返していくと、最終的には軟らか
い銀が破断や剥がれを起こし、複合基板としての役割を
果たさなくなる。また、再結晶集合組織を有する銀基板
は、結晶粒子が発達しており、結晶粒界での凹凸が大き
く基板としての平滑性に問題が残る。
For this reason, there is a problem that even if the hardness of the metal to be combined with silver is significantly different during processing and processing becomes difficult, annealing for softening cannot be applied. When rolling is repeated without annealing, the soft silver eventually breaks or peels, and does not serve as a composite substrate. Further, the silver substrate having the recrystallized texture has crystal grains developed, and the irregularities at the crystal grain boundaries are large, and the problem remains in the smoothness of the substrate.

【0014】超電導膜状デバイスの基板においても、現
在の線材用基板を作製する技術を適用すれば、大面積基
板の作製は可能である。しかし、やはり線材用基板の場
合と同様に、作製速度や機械強度の観点から必ずしも充
分な性能を有しないことが予想される。
[0014] A large-area substrate can be produced also in the substrate of the superconducting film-shaped device by applying the current technology for producing a wire rod substrate. However, as in the case of the wire rod substrate, it is expected that the substrate will not necessarily have sufficient performance in terms of the production speed and mechanical strength.

【0015】上述のように、従来の線材用基板及びその
作製法は、いずれも(a)〜(g)の条件を同時に満足
しておらず、特に機械的強度や長尺化の容易性、低コス
ト等の要素が不十分である。また、従来のデバイス用基
板も同様である。
As described above, none of the conventional wire rod substrates and the methods for producing the same satisfy the conditions (a) to (g) at the same time. Factors such as low cost are insufficient. The same applies to a conventional device substrate.

【0016】本発明の目的は、上記欠点をなくし、液体
窒素温度以上で高い臨界電流密度及び臨界電流を有する
長尺・均質の酸化物超電導線材や大面積膜状デバイスの
形成に好適な、機械強度が強く断線しにくく、平滑性に
優れ、量産性・コストにも優れた長尺あるいは大面積の
金属基板およびその製造方法を提供することにある。
An object of the present invention is to provide a machine suitable for forming a long and homogeneous oxide superconducting wire having a high critical current density and a critical current at a temperature of liquid nitrogen or higher and a large-area film device. An object of the present invention is to provide a long or large-area metal substrate having high strength, hard to be broken, excellent in smoothness, excellent in mass productivity and cost, and a method of manufacturing the same.

【0017】[0017]

【課題を解決するための手段】上記目的は、超電導膜が
接触して成長するための再結晶集合組織を有する金属被
覆層と、金属被覆層より降伏応力の大きい金属母材とか
ら構成されることを特徴とする酸化物超電導体用金属基
板とすることで達成される。そのなかでも特に、金属被
覆層がFCC金属或いはその合金で、金属母材が金属間
化合物あるいは析出硬化型金属である場合に顕著な効果
が得られる。
An object of the present invention is to provide a superconducting film comprising a metal coating layer having a recrystallized texture for growing in contact with a metal, and a metal base material having a higher yield stress than the metal coating layer. This is achieved by providing a metal substrate for an oxide superconductor characterized by the above. In particular, a remarkable effect is obtained when the metal coating layer is an FCC metal or an alloy thereof and the metal base material is an intermetallic compound or a precipitation hardening metal.

【0018】本発明の酸化物超電導体用金属基板は、金
属母材を構成する各金属を集合化する工程、該金属母材
集合体を金属被覆層と複合化する工程、該複合体を概略
形状に加工する一次成形工程、該一次成形体を途中焼鈍
することなく圧延する工程、該圧延成形体を不活性雰囲
気乃至は真空中で再結晶化のために焼鈍をする工程、さ
らに金属母材形成のための焼成工程から成る製造方法を
採用することで得られる。
The metal substrate for an oxide superconductor according to the present invention comprises a step of assembling each metal constituting a metal base material, a step of forming a composite of the metal base material assembly with a metal coating layer, and an outline of the composite. A primary forming step of processing into a shape, a step of rolling the primary formed body without annealing in the middle, a step of annealing the rolled formed body for recrystallization in an inert atmosphere or vacuum, and a metal base material. It is obtained by adopting a manufacturing method including a firing step for forming.

【0019】また、本発明の酸化物超電導体用金属基板
を用いることでY−123線材、Hg−1223線材さ
らには電力用及びエレクトロニクス用デバイスが得られ
る。
By using the metal substrate for an oxide superconductor of the present invention, a Y-123 wire, a Hg-1223 wire, and a device for electric power and electronics can be obtained.

【0020】[0020]

【発明の実施の形態】本発明は、基板に求められる要素
のうち、配向制御性と耐反応性・耐酸化性は再結晶集合
組織を有する金属被覆層で受け持たせ、可とう性や機械
的強度についてはより機械強度の強い金属母材で受け持
たせた金属のみの複合基板を供給するものである。本発
明における酸化物超電導体用金属基板の代表的な一例を
図1(a),(b)に示す。
BEST MODE FOR CARRYING OUT THE INVENTION According to the present invention, among the elements required for a substrate, orientation controllability, reaction resistance and oxidation resistance are provided by a metal coating layer having a recrystallized texture, and the flexibility and mechanical properties are improved. As for the mechanical strength, a composite substrate made of only a metal provided by a metal base material having higher mechanical strength is supplied. A typical example of the metal substrate for an oxide superconductor according to the present invention is shown in FIGS. 1 (a) and 1 (b).

【0021】再結晶集合組織を有する上下の金属被覆層
1の間に層状に成長した金属間化合物2から成る金属母
材3が埋め込まれている。金属被覆層としては、{10
0}<001>、{110}<001>さらには{hk
0}<001>等の再結晶集合組織を形成する銀や白金
などである。これらの金属被覆層1は、基板上で超電導
多結晶層が成長する際、個々の結晶粒の結晶軸を一定方
向に揃える効果を示す。銀については上記再結晶集合組
織が形成されることは既に知られているが、我々は、そ
れ以外の金属について鋭意検討した結果、白金に於いて
も同様の再結晶集合組織が得られることを見出すと共
に、銀以上に優れた配向制御性を示すことを確認した。
白金は融点が1770℃と銀の961℃に比べて高いた
め、再結晶集合組織を形成しても結晶粒子は銀ほど大き
く成長せず、基板としての平滑性でも優れている。
Between the upper and lower metal coating layers 1 having a recrystallization texture, a metal base material 3 made of an intermetallic compound 2 grown in a layer form is embedded. As the metal coating layer, $ 10
0} <001>, {110} <001>, and even {hk
Silver or platinum which forms a recrystallization texture such as 0 集合 <001>. These metal coating layers 1 have the effect of aligning the crystal axes of the individual crystal grains in a certain direction when the superconducting polycrystalline layer grows on the substrate. It is already known that the above-mentioned recrystallization texture is formed in silver, but we have conducted intensive studies on other metals and found that similar recrystallization texture can be obtained in platinum. In addition to the above, it was confirmed that the composition exhibited better orientation controllability than silver.
Since platinum has a melting point of 1770 ° C., which is higher than that of silver at 961 ° C., even when a recrystallized texture is formed, the crystal grains do not grow as large as silver and have excellent smoothness as a substrate.

【0022】一方、金属母材は、例えば、Ni3Al、
NiAl、Ni2Al3、NiAl3、NiAl3+bor
on及びその混合体や、更にはNi3(Al,Cr)、
Ni3(Al,Ti)、Ni3(Al,Nb)、Ni3(AlM
n)、Co3Ti、Pt3In、Pt3Al、Pt3Ga、
Pt3Ga+boron など、一般にA3Bと記される
金属間化合物およびその混合体である。
On the other hand, the metal base material is, for example, Ni 3 Al,
NiAl, Ni 2 Al 3 , NiAl 3 , NiAl 3 + bor
on and a mixture thereof, and further, Ni 3 (Al, Cr),
Ni 3 (Al, Ti), Ni 3 (Al, Nb), Ni 3 (AlM
n), Co 3 Ti, Pt 3 In, Pt 3 Al, Pt 3 Ga,
An intermetallic compound generally referred to as A 3 B, such as Pt 3 Ga + boron, and a mixture thereof.

【0023】これらの化合物は室温で200〜600M
Paの高い降伏応力を示す。再結晶集合組織は、圧延加
工した金属を数百℃で焼鈍して形成させるため、その降
伏応力は、例えば白金で60〜80MPa、銀で40〜
50MPaと100MPaよりも小さい。しかし、上記
金属母材を組み込む事で基板としての降伏応力を室温で
100MPa以上にすることが可能になる。また、特に
金属間化合物は、温度が高いほど降伏応力が増加するも
のが多いため、超電導体形成時の高温状態ではむしろ降
伏応力が増加し基板の断線や溶断は生じなくなる。
These compounds are 200 to 600 M at room temperature.
It shows a high yield stress of Pa. Since the recrystallized texture is formed by annealing a rolled metal at several hundred degrees Celsius, its yield stress is, for example, 60 to 80 MPa for platinum and 40 to 80 MPa for silver.
It is smaller than 50 MPa and 100 MPa. However, by incorporating the metal base material, the yield stress as a substrate can be made 100 MPa or more at room temperature. In particular, many intermetallic compounds increase the yield stress as the temperature becomes higher. Therefore, the yield stress increases rather in a high temperature state at the time of forming the superconductor, so that disconnection or fusing of the substrate does not occur.

【0024】基板の使用時に加えられる曲げ歪みに対し
ても、本発明の基板構成では本来の集合組織を安定に保
持することが可能になる。何故なら、基板の機械的強度
を金属母材が受け持つため、被覆金属自体の厚さは大幅
に薄くでき、そのため同じ曲げが加えられても、被覆金
属に生ずる歪みは小さくなるためである。その結果、再
結晶集合組織を安定に保つことが可能になる。
The substrate structure of the present invention can stably maintain the original texture even with respect to bending strain applied when the substrate is used. This is because the metal base material takes on the mechanical strength of the substrate, so that the thickness of the coated metal itself can be significantly reduced, and therefore, even if the same bending is applied, the strain generated in the coated metal is reduced. As a result, the recrystallized texture can be kept stable.

【0025】また、銀や白金、なかでも特に白金は他の
金属に比較すると高価であるが、上記金属母材と複合化
することで、単位面積当たりの貴金属使用量を削減で
き、基板のコストを低減することが可能になる。
Although silver and platinum, especially platinum are particularly expensive as compared with other metals, the use of the above-mentioned metal base material can reduce the amount of noble metal used per unit area, thereby reducing the cost of the substrate. Can be reduced.

【0026】本発明における酸化物超電導体用金属基板
の作製方法の一例を図2に示す。本方法は、金属母材集
合化工程、金属母材集合体と被覆金属との複合化工程、
一次成形工程、圧延工程、再結晶化焼鈍工程、さらに焼
成工程からなる。最初の集合化工程では、例えば図2
(a)の様に、金属母材がNi3Al金属間化合物であ
る場合、金属間化合物を構成するニッケルシート4およ
びアルミシート5を金属棒6にとも巻きし、集合体7を
得る。
FIG. 2 shows an example of a method for manufacturing a metal substrate for an oxide superconductor according to the present invention. The method includes a metal base material assembling step, a metal base material aggregate and a composite step of coating metal,
It comprises a primary forming step, a rolling step, a recrystallization annealing step, and a firing step. In the first aggregation process, for example, FIG.
As shown in (a), when the metal base material is a Ni 3 Al intermetallic compound, a nickel sheet 4 and an aluminum sheet 5 constituting the intermetallic compound are wound around a metal rod 6 to obtain an aggregate 7.

【0027】次の図2(b)の複合化工程では、酸化物
超電導体の配向制御に好適な再結晶集合組織が得られる
被覆金属のパイプ8に先の集合体7を挿入し所定位置に
配置する。本発明の作製方法の特徴の一つは、被覆金属
に組み込む材料を機械的強度の高い金属母材そのもので
はなく、それを構成する金属としたところにある。例え
ば、A3B金属間化合物の室温における降伏応力は約2
00〜600MPaであるが、これらを構成する金属自
体の降伏応力はおおむね100MPa以下で白金や銀に
近い値である。
In the subsequent compounding step shown in FIG. 2 (b), the preceding aggregate 7 is inserted into the coated metal pipe 8 where a recrystallized texture suitable for controlling the orientation of the oxide superconductor is obtained, and is placed at a predetermined position. Deploy. One of the features of the manufacturing method of the present invention is that the material to be incorporated into the coated metal is not the metal base material having high mechanical strength itself, but the metal constituting the material. For example, the yield stress at room temperature of the A 3 B intermetallic compound is about 2
The yield stress of the metal itself constituting these components is generally 100 MPa or less, which is close to that of platinum or silver.

【0028】このような集合材体を構成することによ
り、図2(c)の一次成形工程と圧延工程で中間焼鈍を
入れることなく容易に加工することが可能となり、製造
工程に中間焼鈍を入れた従来技術に比べて、本発明では
製造工程を簡素化することが出来き、製品コストを下げ
ことが出来る。一次成形工程では、線材用の長尺テープ
状基板を得る場合には押し出し加工、引き抜き加工、ス
エジャー加工等によりテープ概略形状体9に成形する。
By constructing such an aggregated material, it is possible to easily work without intermediate annealing in the primary forming step and the rolling step of FIG. Compared with the related art, the present invention can simplify the manufacturing process and reduce the product cost. In the primary forming step, when a long tape-shaped substrate for a wire is obtained, the tape-shaped body 9 is formed by extrusion, drawing, swaging, or the like.

【0029】一方、大面積のウエハー状基板を得る場合
には、鍛造、プレス等でウエハー概略形状に成形する。
次の図2(d)の圧延工程では、長尺テープ状基板、ウ
エハー状基板いずれの場合も圧延により最終形状、厚さ
に加工し、最終寸法に金属基板10に加工される。
On the other hand, when a wafer-shaped substrate having a large area is to be obtained, the wafer is roughly shaped into a shape by forging, pressing or the like.
In the rolling step shown in FIG. 2D, both the long tape-shaped substrate and the wafer-shaped substrate are processed into a final shape and thickness by rolling, and are processed into the metal substrate 10 to have final dimensions.

【0030】金属基板10は、再結晶化焼鈍工程でN2
やArなどの不活性雰ガス或いは真空下で加熱され、図
2(e)のように再結晶集合組織を有する金属被覆層1
1が形成される。焼成雰囲気は、酸素あるいは空気でも
目的とする再結晶集合組織は得られるが、被覆層表面の
平滑性向上とニッケルシート4およびアルミシート5の
酸化を抑制するためには、不活性雰ガスあるいは真空下
で実施した方が好ましい。
The metal substrate 10 is treated with N 2 in the recrystallization annealing step.
The metal coating layer 1 is heated under an inert atmosphere gas such as Al or Ar or under vacuum and has a recrystallized texture as shown in FIG.
1 is formed. The desired recrystallized texture can be obtained even with oxygen or air. However, in order to improve the smoothness of the surface of the coating layer and to suppress the oxidation of the nickel sheet 4 and the aluminum sheet 5, an inert atmosphere gas or vacuum is used. It is preferable to carry out below.

【0031】この再結晶化焼鈍工程においても、ニッケ
ルシート4およびアルミシート5は一部反応し金属間化
合物12を形成するが、さらに焼成工程では金属間化合
物12と金属被覆層11とを反応を完結させ高強度の金
属母材13を形成する。この際、雰囲気は酸素、空気で
も形成される金属母材には影響しない。得られた基板
は、超電導体形成時に加熱されるが、その加熱中に金属
母材が充分反応することが可能であれば、最後の焼成工
程を除くこともできる。
Also in this recrystallization annealing step, the nickel sheet 4 and the aluminum sheet 5 partially react to form an intermetallic compound 12, but in the firing step, the intermetallic compound 12 and the metal coating layer 11 react. It is completed to form a high-strength metal base material 13. At this time, the atmosphere does not affect the metal base material formed by oxygen or air. The obtained substrate is heated at the time of forming the superconductor. If the metal base material can sufficiently react during the heating, the final firing step can be omitted.

【0032】(比較例1)白金と金属母材として充分な
機械的強度を持つステンレス鋼の複合化について検討し
た。複合化には白金パイプ中にステンレス鋼の丸棒ある
いはパイプを組込み、引抜きと圧延加工により一体化す
る方法をとった。使用した各金属材料の寸法及び加工条
件を表1に示す。ここで、最終的に超電導膜の配向制御
性は銀被覆層の再結晶集合組織が担うことになるため、
引き抜き、圧延の各加工は中間焼鈍を行わず、全て冷間
で実施した。この基板構造の場合、母材のステンレス鋼
は、白金の使用量低減と基板強度の向上が主な役目であ
るため、特にその集合組織の制約はない。そのため、組
込み前に真空中で焼鈍し充分軟化したものを使用した。
ステンレス丸棒を組み込んだものは、引き抜きができな
かった。
(Comparative Example 1) A study was made on the formation of a composite of platinum and stainless steel having sufficient mechanical strength as a metal base material. For the compounding, a method of incorporating a stainless steel round bar or pipe into a platinum pipe and drawing and rolling to integrate it was adopted. Table 1 shows dimensions and processing conditions of each metal material used. Here, the orientation controllability of the superconducting film is ultimately borne by the recrystallization texture of the silver coating layer.
The processes of drawing and rolling were all performed cold without performing intermediate annealing. In the case of this substrate structure, the stainless steel as the base material has no particular restriction on the texture because its main role is to reduce the amount of platinum used and to improve the substrate strength. For this reason, those which were annealed in a vacuum and sufficiently softened before assembling were used.
The one incorporating the stainless steel round bar could not be pulled out.

【0033】一方、ステンレスパイプを組込みんだもの
は約4.7mmφから引抜き材に大きな曲がりが確認さ
れるようになり、最終的に4.5mmφで引抜き工程を
終了せざるを得なかった。
On the other hand, in the case where the stainless steel pipe was incorporated, a large bending was found in the drawn material from about 4.7 mmφ, and the drawing process had to be finally terminated at 4.5 mmφ.

【0034】[0034]

【表1】 [Table 1]

【0035】引き抜きで得られた4.5mmφの組込み
材に対し、次に冷間での圧延を実施した。白金とステン
レス鋼では硬度、展延性に大きな違いがあり、また引き
抜き後に焼鈍を実施していないため、白金とステンレス
鋼の界面での接合性も弱いことが予想される。正常な圧
延を可能にするため、圧延は同種のステンレス鋼シート
の間に試料を挟んで行う方法を採用した。しかし、この
様な考慮をしても約130mm厚の段階で白金層がステ
ンレス鋼母材から剥離した。
Next, the 4.5 mmφ embedded material obtained by drawing was cold-rolled. Since there is a great difference in hardness and ductility between platinum and stainless steel, and since annealing is not performed after drawing, it is expected that the bonding property at the interface between platinum and stainless steel is weak. In order to enable normal rolling, a method of rolling a sample between stainless steel sheets of the same kind was adopted. However, even with such considerations, the platinum layer was separated from the stainless steel base material at the stage of about 130 mm thickness.

【0036】圧延試料先端部から白金層が大きく剥離す
ると伴に、それ以降の部分にも白金層の剥離が皺となっ
て認められた。圧延後、白金層のみを切り取り、空気中
700℃1時間の焼鈍を行った後、エックス線極点図を
測定したが、圧延率が充分でないため、超電導体の配向
制御に好適な再結晶集合組織の形成は認められなかっ
た。
A large peeling of the platinum layer from the tip of the rolled sample was observed, and the subsequent peeling of the platinum layer was observed as wrinkles. After rolling, only the platinum layer was cut off and annealed at 700 ° C. for 1 hour in air, and then the X-ray pole figure was measured. However, since the rolling ratio was not sufficient, the recrystallization texture suitable for controlling the orientation of the superconductor was obtained. No formation was observed.

【0037】(実施例1)以下、本発明の一実施例を説
明する。
(Embodiment 1) An embodiment of the present invention will be described below.

【0038】最初に、金属棒6例えば銀棒にニッケルシ
ート4とアルミニウムシート5とを巻き付け集合体7を
形成し、集合体7の内周側と外周側とにニッケルシート
4Aを巻き付け、ニッケルシート4Aの外側をパイプ8
例えば白金パイプ内に挿入し端部を封入し、図3の断面
を有する集合体を作製した。Ni3Alの化学量論組成
に合わせるためシートの厚み比はNi:Al=2:1と
した。また、銀棒及び白金に接する部分にはニッケルシ
ート4Aを余分に巻き付け、銀及び白金が融点が低くか
つ反応しやすいアルミニウムと直接接触することを防ぐ
構成にした。
First, a nickel sheet 4 and an aluminum sheet 5 are wrapped around a metal rod 6 such as a silver rod to form an aggregate 7, and a nickel sheet 4A is wound around the inner and outer peripheral sides of the aggregate 7 to form a nickel sheet. Pipe 8 outside 4A
For example, the assembly was inserted into a platinum pipe and the end was sealed to produce an assembly having the cross section of FIG. The thickness ratio of the sheet was set to Ni: Al = 2: 1 to match the stoichiometric composition of Ni 3 Al. Further, a nickel sheet 4A is wrapped around a portion in contact with the silver bar and platinum to prevent silver and platinum from directly contacting aluminum having a low melting point and easily reacting.

【0039】各構成材料の寸法を表2に示す。その後、
引抜き加工により外径3mmまで縮径した。さらに、冷
間圧延によって厚さ50ミクロン、幅10mmのテープ
状に加工した。引き抜き及び圧延の途中では一切の焼鈍
を行わなくても比較的容易にテープへの加工ができた。
この段階で白金層の厚さは約5ミクロンとなり、50ミ
クロン厚のテープが全て白金である場合に比べて71%
の白金を低減したことになる。この圧延テープに対し、
空気中700℃1時間の再結晶化焼鈍を施した。
Table 2 shows the dimensions of each constituent material. afterwards,
The outer diameter was reduced to 3 mm by drawing. Further, it was processed into a tape shape having a thickness of 50 μm and a width of 10 mm by cold rolling. During the drawing and the rolling, the tape could be processed relatively easily without any annealing.
At this stage, the thickness of the platinum layer is about 5 microns, which is 71% compared to the case where all 50-micron thick tapes are made of platinum.
Is reduced. For this rolled tape,
A recrystallization annealing at 700 ° C. for 1 hour in air was performed.

【0040】[0040]

【表2】 [Table 2]

【0041】テープ端部のニッケル及びアルミニウムが
露出している部分では空気によるアルミニウムの酸化が
認められたが、金属母材内部の断面写真の図4から分か
るように内部では酸化は生じておらず、また組成分析値
図5(a)から層状のニッケルとアルミニウムが一部反
応している様子がわかる。また、金属被覆層の白金の
(200)エックス線極点図を図6に示す。対称性のあ
る2つのピークは白金層が超電導体の配向に好適な{1
10}<001>再結晶集合組織を形成していることを
示している。また、図7は金属被覆層である白金層表面
14の金属顕微鏡写真である。表面に大きな白金結晶の
成長は認められず、平滑な表面を呈していることが分か
る。この後、超電導体形成条件に相当する850℃1時
間の焼鈍を空気中で行い、引っ張り試験を実施した。尚
15は凹凸の疵である。
At the end of the tape where nickel and aluminum were exposed, aluminum was oxidized by air. However, as can be seen from FIG. 4 of a cross-sectional photograph of the inside of the metal base material, no oxidation occurred inside. In addition, it can be seen from FIG. 5A that the layered nickel and aluminum partially react with each other. FIG. 6 shows a (200) X-ray pole figure of platinum in the metal coating layer. The two symmetrical peaks indicate that the platinum layer is suitable for the superconductor orientation.
10 <<001> indicates that a recrystallized texture is formed. FIG. 7 is a metal microscope photograph of the platinum layer surface 14 which is a metal coating layer. No large platinum crystal growth was observed on the surface, indicating that the surface had a smooth surface. Thereafter, annealing at 850 ° C. for 1 hour corresponding to the conditions for forming a superconductor was performed in air, and a tensile test was performed. In addition, 15 is a flaw of unevenness.

【0042】その結果、降伏応力は175MPaであっ
た。その時の金属母材13の断面写真を図8に示すよう
に、図5(b)の組成分布が示すように、ほぼ目的とす
るNi3Alが層状に形成されている。層状はニッケル
シート4とニッケルシート4との間のアルミニウムシー
ト5はニッケルシート4より凹んでいる。
As a result, the yield stress was 175 MPa. A photograph of a cross section of the metal base material 13 at that time is shown in FIG. 8, and as shown by the composition distribution in FIG. 5B, almost the target Ni 3 Al is formed in a layer. In the layered structure, the aluminum sheet 5 between the nickel sheets 4 is recessed from the nickel sheet 4.

【0043】(実施例2)本発明の第2の実施例として
被覆層に銀をまた金属母材にボロン添加のNi3Alを
使用した場合を示す。金属母材の集合化と被覆金属との
複合化の工程は実施例1とほぼ同様である。アルミニウ
ムシートにはボロンを0.1mol%添加したものを使
用した。複合体の構成寸法を表3に示す。
(Embodiment 2) As a second embodiment of the present invention, a case is described in which silver is used for the coating layer and Ni 3 Al with boron is used for the metal base material. The steps of assembling the metal base material and combining with the coating metal are almost the same as those in the first embodiment. An aluminum sheet to which 0.1 mol% of boron was added was used. Table 3 shows the constituent dimensions of the composite.

【0044】[0044]

【表3】 [Table 3]

【0045】複合体外径が大きいため、本実施例では一
次成形工程では静水圧押し出し法と引き抜き法を採用し
た。押し出しにより6.7mm外径まで一段で縮径し
た。その後、引き抜き加工でさらに3mm外径まで縮径
し長さ5mの丸棒を得た。この丸棒を、110℃の雰囲
気下で繰り返し圧延することで、最終的に幅10mm、
厚さ50ミクロン、長さ70mのテープを得た。ここ
で、圧延を110℃で実施しているのは加工材の軟化の
為ではなく、好適な集合組織を得るためである。110
℃程度の低温では、圧延材の硬さは全く変化しないこと
が確認されている。これを700℃に設定した管状電気
炉内に滞留時間1時間で連続的に通過させることによ
り、再結晶化焼鈍を実施した。雰囲気は空気中とした。
In this embodiment, the hydrostatic extrusion method and the drawing method were employed in the primary molding step because of the large outer diameter of the composite. The diameter was reduced in one step to an outer diameter of 6.7 mm by extrusion. Thereafter, the diameter was further reduced to an outer diameter of 3 mm by a drawing process to obtain a round bar having a length of 5 m. This round bar is repeatedly rolled in an atmosphere of 110 ° C. to finally have a width of 10 mm,
A tape having a thickness of 50 microns and a length of 70 m was obtained. Here, the reason why the rolling is performed at 110 ° C. is not to soften the work material but to obtain a suitable texture. 110
It has been confirmed that the hardness of the rolled material does not change at all at a low temperature of about ° C. This was continuously passed through a tubular electric furnace set at 700 ° C. for a residence time of 1 hour to carry out recrystallization annealing. The atmosphere was in the air.

【0046】断面を観察したところほぼNi3Alの組
成であることが確認された。本実施例では、最終的なニ
ッケルとアルミニウムの層厚が実施例1より薄くなった
ため、より低い700℃においても、Ni3Alが形成
されたものと思う。テープの引っ張り試験を実施したと
ころ、降伏応力は約150MPaであった。またボロン
の添加による特徴として応力−歪み図で延びが改善され
ていることが分かった。これはNi3AlのAlモル濃
度をわずかに減少させることでも同様であった。得られ
たテープの(220)エックス線極点図を測定したとこ
ろ{100}<001>再結晶集合組織の形成が確認さ
れた。{100}<001>の強度の割合は98%であ
った。
When the cross section was observed, it was confirmed that the composition was almost Ni 3 Al. In this embodiment, since the final layer thickness of nickel and aluminum is thinner than that in Embodiment 1, it is considered that Ni 3 Al was formed even at a lower 700 ° C. When a tensile test was performed on the tape, the yield stress was about 150 MPa. It was also found that the elongation was improved in the stress-strain diagram as a characteristic by the addition of boron. This was the same even when the Al molarity of Ni 3 Al was slightly reduced. When the (220) X-ray pole figure of the obtained tape was measured, it was confirmed that {100} <001> recrystallization texture was formed. The ratio of the intensity of {100} <001> was 98%.

【0047】図9にテープに種々の曲げ歪みを加え70
0℃で30分間加熱した時の{100}<001>強度
を曲線16に示す。曲線16は従来の銀基板の曲げ歪の
特性図である。50ミクロン厚の銀単独のテープの曲線
17も合わせて示した。曲線17は本発明による基板の
曲げ歪の特性図である。曲げ歪みによる集合組織の乱れ
が大きく抑制されていることが分かる。これは、複合化
により銀層の厚さが減少した効果と考えられる。
FIG. 9 shows that the tape was subjected to various bending strains,
Curve 16 shows the {100} <001> intensity when heated at 0 ° C. for 30 minutes. Curve 16 is a characteristic diagram of the bending strain of a conventional silver substrate. Curve 17 for a 50 micron thick tape of silver alone is also shown. Curve 17 is a characteristic diagram of the bending strain of the substrate according to the present invention. It can be seen that disturbance of the texture due to bending strain is greatly suppressed. This is considered to be the effect of reducing the thickness of the silver layer due to the composite.

【0048】(実施例3)実施例2と全く同様の圧延工
程後テープを空気にかえて窒素雰囲気中で同じ温度・時
間で再結晶化焼鈍を行った。銀被覆層の表面写真を図1
0に示す。図10(a)の空気中の場合に比較して図1
0(b)に示す窒素中焼鈍の方が、表面が平坦であるこ
とがわかる。
Example 3 After the same rolling process as in Example 2, the tape was replaced with air and recrystallization annealing was performed in a nitrogen atmosphere at the same temperature and time. Fig. 1 shows a photograph of the surface of the silver coating layer.
0 is shown. FIG. 1 is compared with FIG.
It can be seen that the surface in annealed in nitrogen shown in FIG.

【0049】(実施例4)実施例1と同サイズのアルミ
ニウムシートに平均粒径20ミクロンのニッケル粒子を
含むスラリーを塗布した。シートを乾燥後重量を計測
し、Ni3Alのモル比に相当する所定ニッケル量にな
るように再度塗布・乾燥を繰り返した。得られたシート
を金属棒に巻き付け、後は実施例1と同様の方法でテー
プ状基板を作製した。
Example 4 A slurry containing nickel particles having an average particle diameter of 20 μm was applied to an aluminum sheet having the same size as in Example 1. After the sheet was dried, the weight was measured, and the application and drying were repeated again so as to obtain a predetermined nickel amount corresponding to the molar ratio of Ni 3 Al. The obtained sheet was wound around a metal rod, and thereafter a tape-like substrate was produced in the same manner as in Example 1.

【0050】テープ内部を観察したところ、層内部に一
部空隙を含むもののNi3Alに相当する組成比の金属
母材が確認された。引っ張り試験による降伏応力は約1
10MPaであった。
When the inside of the tape was observed, it was confirmed that a metal base material having a composition ratio corresponding to Ni 3 Al, although a part of the inside of the layer contained voids. Yield stress by tensile test is about 1
It was 10 MPa.

【0051】(実施例5)本発明の第5の実施例とし
て、白金を金属被覆層としPt3Alを金属母材とする
ウエハー状基板を作製した。Pt:Alの比がモル比で
3:1に成るように5cm×20cm角の白金シートと
アルミニウムシートを交互に厚さ約2mmまで積層し
た。最上部の白金シート上にサイズがやや大きい7cm
×22cm角で、厚さが20ミクロンのニッケルシート
をアルミニウムの拡散バリアとして重ねた。さらにその
上部に5cm×20cm、厚さ1mmの白金板を被覆金
属として乗せた。
(Example 5) As a fifth example of the present invention, a wafer-like substrate having platinum as a metal coating layer and Pt 3 Al as a metal base material was manufactured. Platinum sheets and aluminum sheets of 5 cm × 20 cm square were alternately laminated to a thickness of about 2 mm so that the molar ratio of Pt: Al became 3: 1. 7cm slightly larger on the top platinum sheet
A nickel sheet of 22 cm square and 20 microns thick was overlaid as a diffusion barrier for aluminum. Further, a platinum plate having a size of 5 cm × 20 cm and a thickness of 1 mm was placed thereon as a coating metal.

【0052】この積層体の四隅を厚着溶接した後、鍛造
プレスにより全体の厚さが半分に成るまで冷間で加工し
た。その後、冷間の圧延機により厚さが均一に0.5m
mになるまで、試料の短軸方向に圧延を繰り返した。得
られた圧延基板を高純度アルゴン雰囲気のマッフル炉内
で700℃1時間の再結晶化焼鈍を実施した。この時、
焼成中に基板が変形しないように荷重を軽くかけなが
ら、加熱を行った。得られた基板は、約25cm角の大
きさであった。周辺部のバリと余剰のバリア用のニッケ
ルシートを切り落とし、24.5cm角のウエハー状基
板を得た。
After thick-welding the four corners of the laminate, the laminate was cold worked by a forging press until the entire thickness became half. Thereafter, the thickness is uniformly 0.5 m by a cold rolling mill.
The rolling was repeated in the minor axis direction of the sample until the value reached m. The obtained rolled substrate was subjected to recrystallization annealing at 700 ° C. for 1 hour in a muffle furnace in a high-purity argon atmosphere. At this time,
Heating was performed while applying a light load so that the substrate was not deformed during firing. The obtained substrate had a size of about 25 cm square. The peripheral burrs and excess nickel sheet for the barrier were cut off to obtain a 24.5 cm square wafer-like substrate.

【0053】白金被覆層の性状は実施例1とほぼ同様で
あった。成型時に積層したニッケルシートの効果で、白
金層にはアルミニウムの混入は認められなかった。ま
た、白金層下部に接合した金属母材には、室温での降伏
応力が600MPaであるPt3Alと同じ組成比の層
状構造が確認できた。約0.5mmの薄さにも係わらず
硬い大面積ウエハー状基板が得られた。
The properties of the platinum coating layer were almost the same as in Example 1. Due to the effect of the nickel sheet laminated at the time of molding, no contamination of the platinum layer with aluminum was recognized. In addition, a layered structure having the same composition ratio as Pt 3 Al having a yield stress at room temperature of 600 MPa was confirmed in the metal base material bonded to the lower portion of the platinum layer. A hard large-area wafer-like substrate was obtained despite its thickness of about 0.5 mm.

【0054】(実施例6)最初に、銀棒にアルミニウム
シートとニッケルシートをニッケルシートが外周部にく
るように巻き付けた。その後これを肉厚0.2mmのニ
ッケルパイプ内に挿入し、端部を封止し集合体を作製し
た。
(Example 6) First, an aluminum sheet and a nickel sheet were wound around a silver bar so that the nickel sheet came to the outer periphery. Thereafter, this was inserted into a nickel pipe having a thickness of 0.2 mm, and the end was sealed to produce an assembly.

【0055】Ni3Alの化学量論組成に合わせるため
シートの厚み比はNi:Al=2:1とした。また、銀
棒に接する部分にはニッケルシートを余分に巻き付け、
アルミニウムと直接接触することを防ぐ構成にした。ニ
ッケルパイプ以外は各構成材料の寸法は表2と同様であ
る。その後、引抜き加工により外径3mmまで縮径し
た。さらに、冷間圧延によって厚さ50ミクロン、幅1
0mmのテープ状に加工した。この圧延テープを高純度
アルゴン中900℃1時間の再結晶化焼鈍を施した。こ
の時点でニッケル被覆層は{100}<001>再結晶
集合組織を示した。その後、1300℃で10分の短時
間でNi3Alを形成するための焼成を実施した。
The thickness ratio of the sheet was set to Ni: Al = 2: 1 in order to match the stoichiometric composition of Ni 3 Al. Also, extra nickel sheet is wrapped around the part in contact with the silver bar,
The structure prevents direct contact with aluminum. Except for the nickel pipe, the dimensions of each constituent material are the same as in Table 2. Thereafter, the outer diameter was reduced to 3 mm by drawing. Furthermore, the thickness is 50 microns and the width is 1 by cold rolling.
It was processed into a 0 mm tape shape. This rolled tape was subjected to recrystallization annealing at 900 ° C. for 1 hour in high-purity argon. At this time, the nickel coating layer showed a {100} <001> recrystallization texture. Thereafter, baking for forming Ni 3 Al was performed at 1300 ° C. for a short time of 10 minutes.

【0056】最終的に得られたテープ状基板のうち10
mを連続搬送装置にセットし、空気中700℃に加熱し
た領域に、硝酸バリウム、硝酸カルシウム、硝酸銅及び
酸化レニウムを金属モル比でRe:Ba:Ca:Cu=
0.2:2:2:3に成るように溶解した水溶液から発
生させた粒径10ミクロン程度のミストを噴射した。
0.8m/hの搬送速度で厚さ約2ミクロンのアモルフ
ァス層が基板全長に形成できた。このアモルファス層の
金属組成は、使用した水溶液の金属組成に合致してい
た。
Of the finally obtained tape-shaped substrates, 10
m was set in a continuous conveyance device, and barium nitrate, calcium nitrate, copper nitrate and rhenium oxide were added to the region heated to 700 ° C. in the air at a metal molar ratio of Re: Ba: Ca: Cu =
A mist having a particle diameter of about 10 μm generated from an aqueous solution dissolved to have a ratio of 0.2: 2: 2: 3 was sprayed.
An amorphous layer having a thickness of about 2 μm was formed over the entire length of the substrate at a transport speed of 0.8 m / h. The metal composition of this amorphous layer matched the metal composition of the aqueous solution used.

【0057】アモルファス層を形成した基板をアルゴン
3気圧、830℃に加熱した加圧反応器の中に連続的に
搬送しながら、400℃の平衡蒸気圧の水銀蒸気を含む
アルゴンキャリアガスを接触させた。30分の滞留時間
で反応させた後、その表面をエックス線回折計で測定し
た。アモルファス層は水銀蒸気との接触によりHg−1
223が主相で、僅かにHg−1212相が混入した超
電導膜になっていることが確認できた。
While continuously transporting the substrate on which the amorphous layer is formed into a pressurized reactor heated to 830 ° C. at 3 atm of argon, an argon carrier gas containing mercury vapor having an equilibrium vapor pressure of 400 ° C. is brought into contact. Was. After reacting for a residence time of 30 minutes, the surface was measured with an X-ray diffractometer. The amorphous layer is Hg-1 by contact with mercury vapor.
223 was the main phase, and it was confirmed that the superconducting film was slightly mixed with the Hg-1212 phase.

【0058】エックス線極点図を計測したところ、Hg
−1223のc軸が基板面に垂直で、a軸が基板の長手
方向に揃った、いわゆる面内配向膜が形成されているこ
とが確認できた。作製したHg系超電導線材1mのJc
を液体窒素中で測定したところ50万A/cm2であっ
た。また、2cm間隔で測定したJcの分布で最も高い
Jcは100万A/cm2であった。
When the X-ray pole figure was measured, Hg
It was confirmed that a so-called in-plane alignment film was formed in which the c-axis of -1223 was perpendicular to the substrate surface and the a-axis was aligned in the longitudinal direction of the substrate. Jc of 1m of prepared Hg-based superconducting wire
Was 500,000 A / cm 2 when measured in liquid nitrogen. The highest Jc in the distribution of Jc measured at 2 cm intervals was 1,000,000 A / cm 2.

【0059】[0059]

【発明の効果】以上のように、本発明によれば、被覆金
属のパイプに集合体を挿入し、所望の形状に冷間圧延加
工し、金属基板を形成する。金属基板には、焼鈍工程で
金属被覆層と金属間化合物とを形成する。金属被覆層と
金属間化合物とは強硬に密着し金属母材を形成する。
As described above, according to the present invention, a metal substrate is formed by inserting an assembly into a coated metal pipe and cold rolling it into a desired shape. A metal coating layer and an intermetallic compound are formed on a metal substrate in an annealing step. The metal coating layer and the intermetallic compound firmly adhere to each other to form a metal base material.

【0060】この結果、酸化物超電導体の為の可とう性
を有する長尺テープ状金属基板あるいは大面積ウエハー
状金属基板に対し、高い配向制御性、表面平滑性、機械
的高強度、高い量産性および低コストを同時に付与する
ことが可能である。更に、本発明の基板を使用すること
で、液体窒素温度以上で高い臨界電流密度(Jc,オー
バーオールJc)及び臨界電流を有する長尺・均質の酸
化物超電導線材や大面積膜状デバイスを形成できる効果
もある。
As a result, high orientation controllability, surface smoothness, high mechanical strength, and high mass production can be achieved with respect to a long tape-shaped metal substrate or a large-area wafer-shaped metal substrate having flexibility for an oxide superconductor. And low cost can be simultaneously provided. Further, by using the substrate of the present invention, a long and homogeneous oxide superconducting wire or a large-area film device having a high critical current density (Jc, overall Jc) and a critical current at a temperature of liquid nitrogen or higher can be formed. There is also an effect.

【図面の簡単な説明】[Brief description of the drawings]

【図1】(a)及び(b)は本発明の酸化物超電導体用
金属基板の一例を示す模式斜視図。
FIGS. 1A and 1B are schematic perspective views showing an example of a metal substrate for an oxide superconductor of the present invention.

【図2】(a)から(f)は本発明の酸化物超電導体用
金属基板の製造工程順を示す模式斜視図。
FIGS. 2A to 2F are schematic perspective views showing a manufacturing process sequence of a metal substrate for an oxide superconductor of the present invention.

【図3】本発明の一実施例のテープ状金属基板作製過程
における複合材断面の写真による断面図。
FIG. 3 is a cross-sectional view showing a photograph of a cross-section of a composite material during a tape-shaped metal substrate manufacturing process according to one embodiment of the present invention.

【図4】テープ状金属基板作製過程における金属母材の
積層を写真で示した断面図。
FIG. 4 is a cross-sectional view showing a photograph of lamination of a metal base material in a tape-shaped metal substrate manufacturing process.

【図5】(a)及び(b)はテープ状金属基板の金属母
材の組成分布を示す特性図。
FIGS. 5A and 5B are characteristic diagrams showing a composition distribution of a metal base material of a tape-shaped metal substrate.

【図6】テープ状金属基板の金属被覆層のエックス線極
点図。
FIG. 6 is an X-ray pole figure of the metal coating layer of the tape-shaped metal substrate.

【図7】テープ状金属基板の金属被覆層表面の写真によ
る平面図。
FIG. 7 is a plan view by a photograph of the surface of a metal coating layer of the tape-shaped metal substrate.

【図8】テープ状金属基板の金属母材の断面を示す写真
による断面図。
FIG. 8 is a sectional view by a photograph showing a section of a metal base material of the tape-shaped metal substrate.

【図9】本発明の別の一実施例のテープ状金属基板にお
ける再結晶集合組織の耐曲げ歪み特性を示す図。
FIG. 9 is a view showing a bending strain resistance characteristic of a recrystallized texture in a tape-shaped metal substrate according to another embodiment of the present invention.

【図10】(a)及び(b)は本発明の別の一実施例の
テープ状金属基板における金属被覆層表面を示す写真に
よる平面図。
10 (a) and (b) are plan views of photographs showing the surface of a metal coating layer on a tape-shaped metal substrate according to another embodiment of the present invention.

【符号の説明】[Explanation of symbols]

1…金属被覆層、2…金属間化合物、3…金属母材、4
…ニッケルシート、5…アルミシート、6…金属棒、7
…集合体、8…パイプ、9…テープ概略形状体、10…
金属基板、11…金属被覆層、12…金属間化合物、1
3…金属母材。
DESCRIPTION OF SYMBOLS 1 ... Metal coating layer, 2 ... Intermetallic compound, 3 ... Metal base material, 4
... nickel sheet, 5 ... aluminum sheet, 6 ... metal bar, 7
... Assembly, 8 ... Pipe, 9 ... Schematic tape, 10 ...
Metal substrate, 11: metal coating layer, 12: intermetallic compound, 1
3. Metal base material.

フロントページの続き (72)発明者 赤田 広幸 茨城県日立市大みか町七丁目1番1号 株 式会社日立製作所日立研究所内 (72)発明者 藤原 徹男 茨城県日立市大みか町七丁目1番1号 株 式会社日立製作所日立研究所内 (72)発明者 長屋 重夫 愛知県名古屋市緑区大高町字北関山20番地 の1 中部電力株式会社内 Fターム(参考) 4G047 JA04 JB06 JC20 KB04 KB14 KB17 KD10 5G321 AA01 AA04 BA01 BA07 CA03 CA04 CA18 CA20 CA27 DB26Continued on the front page (72) Inventor Hiroyuki Akada 7-1-1, Omika-cho, Hitachi City, Ibaraki Prefecture Inside Hitachi Research Laboratory, Hitachi, Ltd. (72) Inventor Tetsuo Fujiwara 7-1-1, Omika-cho, Hitachi City, Ibaraki Prefecture Hitachi, Ltd. Hitachi Research Laboratories (72) Inventor Shigeo Nagaya 20-1, Kitakanyama, Odaka-cho, Midori-ku, Nagoya-shi, Aichi F-term in Chubu Electric Power Co., Inc. 4G047 JA04 JB06 JC20 KB04 KB14 KB17 KD10 5G321 AA01 AA04 BA01 BA07 CA03 CA04 CA18 CA20 CA27 DB26

Claims (14)

【特許請求の範囲】[Claims] 【請求項1】 酸化物超電導膜が密着して形成される金
属基板において、超電導膜が接触して成長する再結晶集
合組織を有する金属被覆層と、該金属被覆層より降伏応
力の大きい金属母材とから構成することを特徴とする酸
化物超電導体用金属基板。
1. A metal substrate on which an oxide superconducting film is formed in close contact, a metal coating layer having a recrystallized texture grown by contacting the superconducting film, and a metal mother having a higher yield stress than the metal coating layer. A metal substrate for an oxide superconductor characterized by comprising:
【請求項2】 請求項1記載の酸化物超電導体用金属基
板において、該金属基板全体での降伏応力値が100M
Paより大きいことを特徴とする酸化物超電導体用金属
基板。
2. The metal substrate for an oxide superconductor according to claim 1, wherein a yield stress value of the entire metal substrate is 100M.
A metal substrate for an oxide superconductor characterized by being larger than Pa.
【請求項3】 請求項1又は2記載の酸化物超電導体用
金属基板がフレキシブルな長尺テープ形状であることを
特徴とする酸化物超電導体用金属基板。
3. The metal substrate for an oxide superconductor according to claim 1, wherein the metal substrate for an oxide superconductor is a flexible long tape shape.
【請求項4】 請求項1又は2記載の酸化物超電導体用
金属基板が堅いウエハー形状であることを特徴とする酸
化物超電導体用金属基板。
4. A metal substrate for an oxide superconductor according to claim 1, wherein the metal substrate for an oxide superconductor is in a hard wafer shape.
【請求項5】 請求項1から4のいずれか1項記載の酸
化物超電導体用金属基板において、該金属被覆層がFC
C金属或いはその合金であることを特徴とする酸化物超
電導体用金属基板。
5. The oxide superconductor metal substrate according to claim 1, wherein the metal coating layer is formed of FC
A metal substrate for an oxide superconductor, which is a C metal or an alloy thereof.
【請求項6】 請求項1から4のいずれか1項記載の酸
化物超電導体用金属基板において、該金属母材が金属間
化合物あるいは析出硬化型金属であることを特徴とする
酸化物超電導体用金属基板。
6. The oxide superconductor according to claim 1, wherein the metal base material is an intermetallic compound or a precipitation hardening metal. For metal substrate.
【請求項7】 請求項5記載の酸化物超電導体用金属基
板の金属被覆層がFCC金属のうち特にPt,Agある
いはその合金であることを特徴とする酸化物超電導体用
金属基板。
7. The metal substrate for an oxide superconductor according to claim 5, wherein the metal coating layer of the metal substrate for an oxide superconductor according to claim 5 is one of FCC metals, particularly Pt, Ag or an alloy thereof.
【請求項8】 請求項6記載の酸化物超電導体用金属基
板の金属母材がA3B金属間化合物で特にNi3Alある
いはNiとAlの化合物であることを特徴とする酸化物
超電導体用金属基板。
8. The oxide superconductor according to claim 6, wherein the metal base material of the metal substrate for an oxide superconductor is an A 3 B intermetallic compound, particularly Ni 3 Al or a compound of Ni and Al. For metal substrate.
【請求項9】 請求項1から4のいずれか1項記載の酸
化物超電導体用金属基板において、該金属被覆層がPt
でかつ該金属母材がホウ素添加型あるいはNi過剰型の
Ni3Alであることを特徴とする酸化物超電導体用金
属基板。
9. The metal substrate for an oxide superconductor according to claim 1, wherein said metal coating layer is made of Pt.
A metal substrate for an oxide superconductor, wherein the metal base material is boron-added or Ni-rich Ni 3 Al.
【請求項10】 金属母材を構成する各金属を集合化す
る工程、該金属母材集合体を金属被覆層と複合化する工
程、該複合体を概略形状に加工する一次成形工程、該一
次成形体を途中焼鈍することなく圧延する工程、該圧延
成形体を不活性雰囲気乃至は真空中で再結晶化のために
焼鈍をする工程、更に金属母材形成のための焼成工程か
ら成ることを特徴とする酸化物超電導体用金属基板の製
造方法。
10. A step of assembling each metal constituting the metal base material, a step of compounding the metal base material aggregate with a metal coating layer, a primary forming step of processing the composite into a general shape, Rolling the compact without annealing in the middle, annealing the roll compact in an inert atmosphere or vacuum for recrystallization, and further comprising a firing step for forming a metal base material. A method for producing a metal substrate for an oxide superconductor, which is characterized in that:
【請求項11】 請求項10記載の酸化物超電導体用金
属基板の製造方法において、金属母材の集合化工程が金
属母材を構成する金属シートを合せ巻きにすることから
成り、かつ金属母材と金属被覆層の複合化工程が該合せ
巻きしたシート集合体を金属被覆材パイプ内に設置する
ことから成る事を特徴とする酸化物超電導体用金属基板
の製造方法。
11. The method for manufacturing a metal substrate for an oxide superconductor according to claim 10, wherein the step of assembling the metal base material comprises winding together a metal sheet constituting the metal base material, and A method for manufacturing a metal substrate for an oxide superconductor, wherein the step of compounding the material and the metal coating layer comprises placing the rolled sheet assembly in a metal coating material pipe.
【請求項12】 請求項3記載の酸化物超電導体用金属
基板上にYBa2Cu37超電導膜が密着して形成され
た酸化物超電導線材あることを特徴とする酸化物超電導
体用金属基板。
12. A metal for an oxide superconductor, comprising an oxide superconducting wire formed by closely contacting a YBa 2 Cu 3 O 7 superconducting film on the metal substrate for an oxide superconductor according to claim 3. substrate.
【請求項13】 請求項3に記載の酸化物超電導体用金
属基板において、金属被覆層がNiで、かつ金属母材が
ホウ素添加型あるいはNi過剰型のNi3Alで、該金
属基板上にHg系超電導膜が密着して形成された酸化物
超電導線材であることを特徴とする酸化物超電導体用金
属基板。
13. The metal substrate for an oxide superconductor according to claim 3, wherein the metal coating layer is Ni, and the metal base material is boron-added or Ni-rich Ni 3 Al, and A metal substrate for an oxide superconductor, which is an oxide superconducting wire formed by closely attaching an Hg-based superconducting film.
【請求項14】 請求項4記載の酸化物超電導体用金属
基板上に酸化物超電導膜が密着して形成された電力用及
びエレクトロニクス用デバイスであることを特徴とする
酸化物超電導体用金属基板。
14. A metal substrate for an oxide superconductor, wherein the metal substrate for an oxide superconductor is a device for power and electronics formed by closely attaching an oxide superconducting film on the metal substrate for an oxide superconductor according to claim 4. .
JP28638798A 1998-10-08 1998-10-08 Method for manufacturing metal substrate for oxide superconductor Expired - Lifetime JP3930163B2 (en)

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Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004515650A (en) * 2000-12-07 2004-05-27 インスティトゥート フュア フェストケルパー− ウント ヴェルクシュトッフオルシュング ドレースデン エー ファウ Metal strip for epitaxy coating and method of making same
KR100736374B1 (en) 2005-04-28 2007-07-06 한국전기연구원 113[121] textured Ag substrate and Tl-1223 high temperature superconducting coated conductors prepared using the substrate
JP2008266686A (en) * 2007-04-17 2008-11-06 Chubu Electric Power Co Inc Clad textured metal substrate for forming epitaxial thin film thereon and method for manufacturing the same
KR100912273B1 (en) 2007-05-14 2009-08-17 한국전력공사 Low temperature resistance switch contact manufacturing method for superconduction fault current limiter
CN110392485A (en) * 2019-06-18 2019-10-29 昆山维嘉益材料科技有限公司 A kind of LP316L STA high-order camera module FPC base plate processing method
CN110392485B (en) * 2019-06-18 2022-04-12 淮安维嘉益集成科技有限公司 LP316L STA high-order camera module FPC substrate processing method

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