JP2000100571A - Distributed type electroluminescent device - Google Patents
Distributed type electroluminescent deviceInfo
- Publication number
- JP2000100571A JP2000100571A JP10269168A JP26916898A JP2000100571A JP 2000100571 A JP2000100571 A JP 2000100571A JP 10269168 A JP10269168 A JP 10269168A JP 26916898 A JP26916898 A JP 26916898A JP 2000100571 A JP2000100571 A JP 2000100571A
- Authority
- JP
- Japan
- Prior art keywords
- phosphor
- cover film
- moisture
- layer
- emitting layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000010410 layer Substances 0.000 claims abstract description 60
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 claims abstract description 55
- 239000013039 cover film Substances 0.000 claims abstract description 36
- -1 polypropylene Polymers 0.000 claims abstract description 20
- 239000011248 coating agent Substances 0.000 claims abstract description 18
- 238000000576 coating method Methods 0.000 claims abstract description 18
- 239000011247 coating layer Substances 0.000 claims abstract description 16
- 230000035699 permeability Effects 0.000 claims abstract description 16
- 239000000463 material Substances 0.000 claims abstract description 12
- 229920000139 polyethylene terephthalate Polymers 0.000 claims abstract description 10
- 239000005020 polyethylene terephthalate Substances 0.000 claims abstract description 10
- 229920005989 resin Polymers 0.000 claims abstract description 9
- 239000011347 resin Substances 0.000 claims abstract description 9
- 239000004698 Polyethylene Substances 0.000 claims abstract description 7
- 229920003002 synthetic resin Polymers 0.000 claims abstract description 7
- 239000000057 synthetic resin Substances 0.000 claims abstract description 7
- 239000004743 Polypropylene Substances 0.000 claims abstract description 6
- 229920000573 polyethylene Polymers 0.000 claims abstract description 6
- 229920001155 polypropylene Polymers 0.000 claims abstract description 6
- 239000006185 dispersion Substances 0.000 claims description 24
- 230000004888 barrier function Effects 0.000 claims description 21
- 230000000903 blocking effect Effects 0.000 claims description 21
- 239000010408 film Substances 0.000 claims description 14
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 23
- 229910052782 aluminium Inorganic materials 0.000 abstract description 7
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract description 7
- 239000003960 organic solvent Substances 0.000 abstract description 3
- 238000001291 vacuum drying Methods 0.000 abstract description 2
- 238000007278 cyanoethylation reaction Methods 0.000 abstract 1
- 238000005098 hot rolling Methods 0.000 abstract 1
- 238000000034 method Methods 0.000 description 8
- 239000011230 binding agent Substances 0.000 description 7
- 239000000843 powder Substances 0.000 description 7
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 6
- 229920002493 poly(chlorotrifluoroethylene) Polymers 0.000 description 6
- 239000005023 polychlorotrifluoroethylene (PCTFE) polymer Substances 0.000 description 6
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 5
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 239000011888 foil Substances 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 239000011701 zinc Substances 0.000 description 4
- 239000002033 PVDF binder Substances 0.000 description 3
- 239000004373 Pullulan Substances 0.000 description 3
- 229920001218 Pullulan Polymers 0.000 description 3
- 239000012190 activator Substances 0.000 description 3
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 3
- 229910002113 barium titanate Inorganic materials 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 3
- 235000019423 pullulan Nutrition 0.000 description 3
- 229920002799 BoPET Polymers 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 239000004677 Nylon Substances 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 238000004833 X-ray photoelectron spectroscopy Methods 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000007606 doctor blade method Methods 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 229920001038 ethylene copolymer Polymers 0.000 description 2
- 229910052731 fluorine Inorganic materials 0.000 description 2
- 239000011737 fluorine Substances 0.000 description 2
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 2
- 238000010030 laminating Methods 0.000 description 2
- 239000011572 manganese Substances 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229920001778 nylon Polymers 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- SQGYOTSLMSWVJD-UHFFFAOYSA-N silver(1+) nitrate Chemical compound [Ag+].[O-]N(=O)=O SQGYOTSLMSWVJD-UHFFFAOYSA-N 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- VXUYXOFXAQZZMF-UHFFFAOYSA-N titanium(IV) isopropoxide Chemical compound CC(C)O[Ti](OC(C)C)(OC(C)C)OC(C)C VXUYXOFXAQZZMF-UHFFFAOYSA-N 0.000 description 2
- SVONRAPFKPVNKG-UHFFFAOYSA-N 2-ethoxyethyl acetate Chemical compound CCOCCOC(C)=O SVONRAPFKPVNKG-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- PYVHTIWHNXTVPF-UHFFFAOYSA-N F.F.F.F.C=C Chemical compound F.F.F.F.C=C PYVHTIWHNXTVPF-UHFFFAOYSA-N 0.000 description 1
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 1
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 229920001328 Polyvinylidene chloride Polymers 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- CZMRCDWAGMRECN-UGDNZRGBSA-N Sucrose Chemical class O[C@H]1[C@H](O)[C@@H](CO)O[C@@]1(CO)O[C@@H]1[C@H](O)[C@@H](O)[C@H](O)[C@@H](CO)O1 CZMRCDWAGMRECN-UGDNZRGBSA-N 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 238000010306 acid treatment Methods 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 150000004703 alkoxides Chemical class 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 235000011114 ammonium hydroxide Nutrition 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000007864 aqueous solution Substances 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- 239000001913 cellulose Substances 0.000 description 1
- 229920002678 cellulose Polymers 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 230000003081 coactivator Effects 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000001066 destructive effect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- NKZSPGSOXYXWQA-UHFFFAOYSA-N dioxido(oxo)titanium;lead(2+) Chemical compound [Pb+2].[O-][Ti]([O-])=O NKZSPGSOXYXWQA-UHFFFAOYSA-N 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 235000019441 ethanol Nutrition 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 229910052748 manganese Inorganic materials 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 235000019422 polyvinyl alcohol Nutrition 0.000 description 1
- 229920000915 polyvinyl chloride Polymers 0.000 description 1
- 239000004800 polyvinyl chloride Substances 0.000 description 1
- 229920002620 polyvinyl fluoride Polymers 0.000 description 1
- 239000005033 polyvinylidene chloride Substances 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000007873 sieving Methods 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910001961 silver nitrate Inorganic materials 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- PBCFLUZVCVVTBY-UHFFFAOYSA-N tantalum pentoxide Inorganic materials O=[Ta](=O)O[Ta](=O)=O PBCFLUZVCVVTBY-UHFFFAOYSA-N 0.000 description 1
- BFKJFAAPBSQJPD-UHFFFAOYSA-N tetrafluoroethene Chemical group FC(F)=C(F)F BFKJFAAPBSQJPD-UHFFFAOYSA-N 0.000 description 1
- 238000002230 thermal chemical vapour deposition Methods 0.000 description 1
- 150000003568 thioethers Chemical class 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Landscapes
- Electroluminescent Light Sources (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、高輝度、長寿命か
つフレキシブルで低コストな有機分散型EL素子に関す
るものである。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a high-brightness, long-life, flexible and low-cost organic dispersion type EL device.
【0002】[0002]
【従来の技術】有機分散型EL素子は、面光源や発光表
示素子、例えば液晶表示装置のバックライトとして薄
型、均一発光、軽量等の理由から使用されてきた。ま
た、大面積体も製造容易なため、看板や標識等のバック
ライト、サインボード等にも利用されている。一般に、
有機分散型EL素子は、アルミ電極等の背面電極上に粒
径1〜10μのチタン酸バリウム等の高誘電率無機物を
高誘電率有機バインダー中に分散した厚さ10〜30μ
の誘電層と、粒径10〜50μの蛍光体を高誘電率有機
バインダー中に分散した厚さ20〜70μの発光層とを
順次積層して形成し、発光層上にさらにPETなどの透
明フィルムに形成されたインジウムースズ酸化物(IT
O)等からなる厚さ0.05〜1μ透明電極を設けてこ
れらをPCTFE(ポリクロロトリフルオロエチレン)
等の高防湿性のカバーフィルムで封止したものである。
有機分散型EL素子の寿命は蛍光体の水分劣化によって
決まるため、高防湿性のカバーフィルムで封止する前に
ナイロン性の捕水フィルムを、透明電極と背面電極の外
側に設けて、更に防湿性を高めて、カバーフィルムで封
止したものが一般的である。そのような観点から、最近
では、アルミナやシリカで水分遮断被覆を施した蛍光体
粉末が知られており、例えば、特開平6−338389
では発光層をこの蛍光体粉末と吸湿性の低いフッ素樹脂
から形成して、高防湿性のカバーフィルムを取り除いた
薄型の分散型EL素子が知られている。2. Description of the Related Art An organic dispersion type EL device has been used as a surface light source or a light emitting display device, for example, a backlight of a liquid crystal display device because of its thinness, uniform light emission, light weight, and the like. In addition, since large-area bodies are easy to manufacture, they are also used as backlights for signboards and signs, signboards, and the like. In general,
The organic dispersion type EL element has a thickness of 10 to 30 μm in which a high dielectric constant inorganic substance such as barium titanate having a particle size of 1 to 10 μ is dispersed in a high dielectric constant organic binder on a back electrode such as an aluminum electrode.
And a light emitting layer having a thickness of 20 to 70 μ in which a phosphor having a particle diameter of 10 to 50 μ is dispersed in a high dielectric constant organic binder is formed in order, and a transparent film such as PET is further formed on the light emitting layer. Indium oxide (IT)
O) or the like, and a transparent electrode having a thickness of 0.05 to 1 μm is provided, and these electrodes are made of PCTFE (polychlorotrifluoroethylene).
And sealed with a highly moisture-proof cover film.
Since the lifetime of the organic dispersion type EL element is determined by the moisture deterioration of the phosphor, a nylon water-trapping film is provided outside the transparent electrode and the back electrode before sealing with a highly moisture-proof cover film, and the moisture-proof property is further improved. In general, it is sealed with a cover film to enhance the properties. From such a viewpoint, recently, a phosphor powder coated with a moisture barrier with alumina or silica has been known.
There is known a thin dispersion type EL element in which a light emitting layer is formed of this phosphor powder and a fluororesin having low hygroscopicity, and a cover film having high moistureproofness is removed.
【0003】[0003]
【発明が解決しようとする課題】従来の水分遮断被覆さ
れてない蛍光体を用いた分散型EL素子ではPCTFE
カバーフィルムやナイロン製捕水フィルムを用いても水
分遮断性は不十分であり、現状以上の性能を引き出すこ
とは難しい。従来の蛍光体を水分遮断被覆を施した蛍光
体粉末に置き換えた分散型EL素子では、寿命の点では
延びたものの、水分遮断被覆層で完全に覆ってしまった
分、輝度が低下するという問題がある。また、発光層を
形成する有機バインダーとしてフッ素樹脂を用いた場
合、透明電極との接着強度が著しく低く剥がれやすいと
いう問題がある。A conventional dispersion-type EL device using a phosphor which is not coated with a moisture barrier is PCTFE.
Even if a cover film or a water catching film made of nylon is used, the water barrier property is insufficient, and it is difficult to bring out the performance exceeding the present condition. In a dispersive EL device in which a conventional phosphor is replaced with a phosphor powder coated with a moisture barrier coating, although the life is extended, the brightness is reduced due to the complete coverage with the moisture barrier coating layer. There is. Further, when a fluororesin is used as the organic binder for forming the light emitting layer, there is a problem that the adhesive strength with the transparent electrode is extremely low and the resin is easily peeled off.
【0004】[0004]
【課題を解決するための手段】本発明者は上述のような
観点から種々検討を行った結果、従来の水分遮断被覆さ
れてない蛍光体を用いた分散型EL素子では、吸湿する
ほど初期輝度が増加することに着目すると、外部からE
L素子の発光層に進入する水分量を最適化することによ
り、初期輝度を向上させ、かつ寿命をも延ばすことが可
能であることが判明した。すなわち、水分遮断被覆を施
した蛍光体の未被覆部分に進入する水分量を水分遮断被
覆層の平均面積占有度とカバーフィルムの材質にてコン
トロールすることにより高輝度、長寿命かつ低コスト化
を達成させるものであり、(1)分散型EL素子におい
て、少なくとも片方が透明電極である一対の電極間に絶
縁誘電層と水分遮断被覆を施した電場発光性蛍光体を含
む発光層とを有する分散型EL発光素子で、上記水分遮
断被覆を施した電場発光性蛍光体の蛍光体に対する水分
遮断被覆層の平均面積占有率が75〜98%であること
を特徴とし、(2)少なくとも片方が透明電極である一
対の電極間に絶縁誘電層と水分遮断被覆を施した電場発
光性蛍光体含む発光層とを有する素子本体をカバーフィ
ルムで封止した分散型EL素子において、上記カバーフ
ィルムが低防湿性の合成樹脂フィルムからなることを特
徴とし、(3)発光層が電場発光性蛍光体とシアノエチ
ル化高誘電率結合樹脂からなり、(4)カバーフィルム
の透湿度が8g/m2・24hr以上であり、(5)カ
バーフィルムの材質がポリプロピレン、ポリエチレン、
ポリエチレンテレフタレートから選ばれる合成樹脂であ
る分散型EL素子であるという知見を得た。As a result of various studies from the above-mentioned viewpoints, the present inventor has found that in a conventional dispersion type EL device using a phosphor which is not coated with a moisture barrier coating, the initial luminance becomes higher as moisture is absorbed. Paying attention to the increase in
It has been found that by optimizing the amount of water entering the light emitting layer of the L element, it is possible to improve the initial luminance and extend the life. In other words, by controlling the amount of water entering the uncoated portion of the phosphor coated with the moisture-blocking coating by the average area occupancy of the moisture-blocking coating layer and the material of the cover film, high brightness, long life and low cost can be achieved. (1) A dispersion-type EL element comprising a pair of electrodes, at least one of which is a transparent electrode, comprising an insulating dielectric layer and a light-emitting layer containing an electroluminescent phosphor coated with a moisture-blocking coating. Wherein the average area occupancy of the moisture blocking coating layer with respect to the phosphor of the electroluminescent phosphor having the moisture blocking coating is 75 to 98%, and (2) at least one of them is transparent. In a dispersion-type EL device in which an element body having an insulating dielectric layer and a light-emitting layer containing an electroluminescent phosphor coated with a moisture barrier between a pair of electrodes is sealed with a cover film, The cover film is made of a low moisture-proof synthetic resin film, (3) the light-emitting layer is made of an electroluminescent phosphor and a cyanoethylated high dielectric constant binding resin, and (4) the moisture permeability of the cover film is 8 g / m or 2 · 24 hr or more, (5) the material of the cover film of polypropylene, polyethylene,
It has been found that the device is a dispersion type EL device which is a synthetic resin selected from polyethylene terephthalate.
【0005】[0005]
【発明の実施の形態】以下、本発明について実施例と共
に詳しく説明する。アルミ箔背面電極上1に絶縁層2、
発光層3アルミ箔1上にドクターブレード法などによっ
て順次積層塗工し、各層に残留する有機溶媒を除去する
ために真空乾燥を行う。次に透明電極4と発光層3上表
部とを熱間ロールによるプレスで貼り合せ、最後に低防
湿性のカバーフィルム5で挟み込んでラミネートするこ
とにより素子を完成される(図1)。BEST MODE FOR CARRYING OUT THE INVENTION Hereinafter, the present invention will be described in detail with examples. An insulating layer 2 on an aluminum foil back electrode 1
The light emitting layer 3 is sequentially coated on the aluminum foil 1 by a doctor blade method or the like, and vacuum dried to remove the organic solvent remaining in each layer. Next, the element is completed by laminating the transparent electrode 4 and the upper surface of the light emitting layer 3 by pressing with a hot roll, and finally sandwiching the film with a low moisture-proof cover film 5 (FIG. 1).
【0006】背面電極1の成分や構造は導電性を有する
限り特に制限されない。好ましくは金属の箔や薄板を用
いることが出来る。金属としてはアルミニウム、銅及び
その合金、ニッケルなどが挙げられ、カーボンでも良
い。後述の透明電極と同様な材料でも良い。次に絶縁層
2は高誘電性絶縁粉末と有機バインダーからなり、高誘
電性絶縁粉末としては、好ましくはチタン酸バリウム、
チタン酸ジルコニウム、チタン酸鉛、酸化チタンなどを
用いることが出来る。また、発光層3は水分遮断被膜を
施した蛍光体粉末、有機バインダーからなる。蛍光体粉
末は母体材料に発光中心となる付活剤や共付活剤を添加
してなる。母体材料の例としてはZnS、CdS等硫化
物が挙げられ、付活剤、共付活剤の例としては、銅(C
u)、塩素(Cl)、臭素(Br)、沃素(I)、マン
ガン(Mn)、アルミニウム(Al)等が挙げられる。The components and structure of the back electrode 1 are not particularly limited as long as they have conductivity. Preferably, a metal foil or a thin plate can be used. Examples of the metal include aluminum, copper and its alloys, nickel and the like, and carbon may be used. The same material as the transparent electrode described later may be used. Next, the insulating layer 2 is made of a high dielectric insulating powder and an organic binder. As the high dielectric insulating powder, barium titanate,
Zirconium titanate, lead titanate, titanium oxide, or the like can be used. The light emitting layer 3 is made of a phosphor powder having a moisture barrier coating and an organic binder. The phosphor powder is obtained by adding an activator or a coactivator serving as a luminescent center to a base material. Examples of the base material include sulfides such as ZnS and CdS, and examples of the activator and the co-activator include copper (C
u), chlorine (Cl), bromine (Br), iodine (I), manganese (Mn), aluminum (Al) and the like.
【0007】蛍光体の水分遮断層の形成材料は、SiO
2、TiO2−SiO2、ZrO2−SiO2等のガラ
ス系化合物や、アルミナ、酸化チタン、酸化ジルコニウ
ム、五酸化タンタル、窒化珪素等の透光性セラミックス
からなる無機化合物が挙げられる。水分遮断層の形成は
ゾルゲル法、スパッタリング法、液層析出法、熱CVD
法、プラズマCVD法等で行える。水分遮断層の厚さは
0.1μm〜3μmの範囲で選択することが望ましい。
水分遮断被覆を施した電場発光性蛍光体に対する水分遮
断被覆層の平均面積占有率(平均被覆率(水分遮断被膜
の面積/蛍光体の表面積))は被覆層形成時の条件を変
えたり、一旦100%被覆形成したものを酸処理等の化
学処理や、例えばボールミルなどを用いて物理的に被覆
層を剥離させ調節することが出来る。The material for forming the moisture blocking layer of the phosphor is SiO.
2, glass-based compounds such as TiO 2 —SiO 2 and ZrO 2 —SiO 2, and inorganic compounds made of translucent ceramics such as alumina, titanium oxide, zirconium oxide, tantalum pentoxide, and silicon nitride. The water barrier layer is formed by sol-gel method, sputtering method, liquid layer deposition method, thermal CVD
Method, a plasma CVD method, or the like. It is desirable to select the thickness of the moisture barrier layer in the range of 0.1 μm to 3 μm.
The average area occupancy (average coverage (area of the moisture-blocking coating / surface area of the phosphor)) of the moisture-blocking coating layer with respect to the electroluminescent phosphor to which the moisture-blocking coating has been applied can be changed by changing the conditions when forming the coating layer, The coating layer can be adjusted by chemical treatment such as acid treatment or the like, or by physically peeling the coating layer using a ball mill or the like.
【0008】絶縁層2や発光層3に用いられる、有機バ
インダーとしては、容量性の素子であることを考慮する
と、高誘電性のものが良く、フッ素樹脂(誘電率約6
%)やシアノエチル化樹脂(誘電率10%以上)などが
挙げられる。フッ素樹脂は、電場印加状態下水分関与の
もとで分解されフッ素イオン乃至フッ酸が発生して水分
遮断被膜層を破壊してしまうことが知られている。また
透明電極との密着性も著しく弱いため、折り曲げなどに
より発光層との間で剥離が起き、素子の安定した動作が
得られないという問題があり適当でない。それに比べて
シアノエチル化樹脂は、透明電極との密着性も良く、ま
して水分遮断被膜層破壊成分も発生しないので好適であ
る。より具体的には、シアノエチル化プルラン、シアノ
エチル化サッカロース、シアノエチル化セルロース、シ
アノエチル化ポリビニアルアルコール、シアノエチル化
ヒドロキシサッカロース、シアノエチル化ヒドロキシセ
ルロース等のシアノエチル化合物やポリフッ化ビニリデ
ン等のポリフッ化物系の樹脂が挙げられ、絶縁層、発光
層とも同じでも異なっても良い。またこれらの混合物で
も良い。Considering that the organic binder used for the insulating layer 2 and the light emitting layer 3 is a capacitive element, a high dielectric material is preferable, and a fluorine resin (having a dielectric constant of about 6) is preferred.
%) And cyanoethylated resin (dielectric constant 10% or more). It is known that a fluororesin is decomposed under the influence of moisture under an applied electric field to generate fluorine ions or hydrofluoric acid, thereby destroying the moisture barrier coating layer. Further, since the adhesiveness with the transparent electrode is extremely weak, peeling occurs between the light emitting layer and the device due to bending or the like, and there is a problem that stable operation of the element cannot be obtained, which is not appropriate. In contrast, a cyanoethylated resin is preferable because it has good adhesion to a transparent electrode and, moreover, does not generate a moisture barrier coating layer destructive component. More specifically, cyanoethylated pullulan, cyanoethylated saccharose, cyanoethylated cellulose, cyanoethylated polyvinylalcohol, cyanoethylated hydroxysaccharose, cyanoethylated compounds such as cyanoethylated hydroxycellulose and polyfluorinated resins such as polyvinylidene fluoride. The insulating layer and the light emitting layer may be the same or different. Further, a mixture thereof may be used.
【0009】水分遮断被覆されていない電場発光蛍光
体、例えばZnS:Cu,Cは水分存在下で発光させる
と初期輝度が著しく大きい反面、寿命が著しく低下す
る。例えば図1の構造でカバーフィルム5の無い薄型素
子で条件を一定にし、発光層の蛍光体にアルミナの水分
遮断被膜の膜厚が一定になるようにして被膜率を調整し
た蛍光体を含むEL素子の輝度、寿命を評価すると、輝
度は被覆率の増加に対して単調減少していくが、寿命は
80〜98%の辺りで最大値になり、それ以上も以下で
も寿命は減少する(図2)。すなわち、ほぼ完全に水分
を遮断するより適当量水分を素子内に導入する方が、素
子の寿命は延びることになる。また透明電極4は例えば
インジウムや錫の酸化物からなる透明導電性薄膜をPE
Tフィルム上に蒸着してなる透明導電性フィルム等を用
いることが出来る。Electroluminescent phosphors not coated with moisture barrier, for example, ZnS: Cu, C, emit light in the presence of moisture, but their initial luminance is remarkably large, but their life is significantly reduced. For example, in the structure shown in FIG. 1, an EL including a phosphor in which the conditions are constant with a thin element without the cover film 5 and the coating rate of the phosphor of the light emitting layer is adjusted so that the thickness of the moisture barrier coating of alumina is constant. When the luminance and the life of the device are evaluated, the luminance monotonously decreases with an increase in the coverage, but the life reaches a maximum around 80 to 98%, and the life decreases even more than that (see FIG. 2). In other words, the life of the device is extended by introducing an appropriate amount of water into the device rather than by completely blocking the water. The transparent electrode 4 is made of a transparent conductive thin film made of, for example, an oxide of indium or tin.
A transparent conductive film deposited on a T film can be used.
【0010】カバーフィルム5は上述の観点から付けな
くとも良い。しかし、電極等が絶縁物による保護が無く
なるなど、電気的な安全性を欠くので透明で適度な透湿
度を有する合成樹脂フィルムで封止することが好適であ
る。素子の寿命を考慮すると透湿度が8g/m2・24
hr以上を有する合成樹脂フィルムがよく、より好まし
くは10g/m2・24hr以上のものがよい。具体的
には上記透湿度やフレキシブル性を考慮すると、300
μm以下の厚さを有するポリエチレン、ポリエチレンテ
レフタレート、ポリプロピレン、ポリエステル、ポリ塩
化ビニル、ポリ塩化ビニリデン、ポリカーボネート、ポ
リスチレン、ポリフッ化ビニル、ポリフッ化ビニリデ
ン、四フッ化エチレン・エチレン共重合体等が挙げられ
る。低コスト化や廃棄物処理後の環境に与える影響、1
00℃以下での形状安定性を考慮すると、ポリエチレ
ン、ポリプロピレン、ポリエチレンテレフタレートがよ
り好適である。The cover film 5 need not be provided from the above viewpoint. However, it is preferable to seal with a synthetic resin film which is transparent and has an appropriate moisture permeability, since the electrode or the like lacks electrical safety such that protection by an insulator is lost. Considering the life of the element, the moisture permeability is 8 g / m 2 · 24.
It is preferable to use a synthetic resin film having an hour or more, more preferably 10 g / m 2 · 24 hr or more. Specifically, considering the above moisture permeability and flexibility, 300
Examples include polyethylene, polyethylene terephthalate, polypropylene, polyester, polyvinyl chloride, polyvinylidene chloride, polycarbonate, polystyrene, polyvinyl fluoride, polyvinylidene fluoride, and tetrafluoroethylene / ethylene copolymer having a thickness of not more than μm. Impact on the environment after cost reduction and waste disposal, 1
Considering the shape stability at 00 ° C. or lower, polyethylene, polypropylene, and polyethylene terephthalate are more preferable.
【0011】蛍光体の水分遮断被覆層の平均被覆率は7
5〜98%が好ましく、80〜95%がより好ましい。
PCTFE等の高防湿性のカバーフィルムを用いる場合
には蛍光体の水分遮断被覆層の平均被覆率を上記範囲外
でも優れた特性を引き出すことはできるが、フィルムが
高価なため低コスト化をはかることができない。有機分
散型EL素子に用いられる水分遮断被覆を施していない
蛍光体は、紫外線照射下では結晶表面で吸着水分と反応
して金属亜鉛が析出するため、体色が黒化して大幅に輝
度が低下することが知られている。カバーフィルム等に
耐紫外線処理を施すことにより屋外での素子の使用が可
能である。例えばカバーフィルムに紫外線遮断層とし
て、ZnO等の金属酸化物薄膜層を設けたり、カバーフ
ィルムの接着糊層に紫外線吸収剤を含有させる等の方法
が挙げられる。[0011] The average coverage of the moisture barrier coating layer of the phosphor is 7
It is preferably from 5 to 98%, more preferably from 80 to 95%.
When a high moisture-proof cover film such as PCTFE is used, excellent characteristics can be obtained even if the average coverage of the moisture barrier coating layer of the phosphor is out of the above range, but the cost is reduced because the film is expensive. Can not do. The phosphor without moisture blocking coating used in the organic dispersion type EL device reacts with the adsorbed moisture on the crystal surface under ultraviolet irradiation to precipitate metallic zinc, so that the body color is blackened and the brightness is greatly reduced. It is known to The device can be used outdoors by subjecting the cover film or the like to UV treatment. For example, a method of providing a thin film layer of a metal oxide such as ZnO as an ultraviolet blocking layer on a cover film, or a method of including an ultraviolet absorbent in an adhesive layer of the cover film can be used.
【0012】[0012]
【実施例】(水分遮断層の被覆)以下、本発明を実施例
によって具体的に示す。平均粒径25μのZnS:C
u,Clからなる電場発光蛍光体の表面に例えば酸化チ
タンの水分遮断層を被覆する方法を説明する。未被覆Z
nS蛍光体10重量部を300℃で1時間加熱処理した
ものを特級エチルアルコール(99.5%)100重量
部に分散させた後、チタニウムテトライソプロポキシド
0.2重量部を加えて2時間十分に混合した。その後濾
過して溶媒を除去した後、0.2Nアンモニア水100
重量部にZnS蛍光体を1時間分散させ、再度濾過し
て、200℃で4時間真空乾燥し、酸化チタンで水分遮
断被覆した蛍光体を得た。ここで得た水分遮断被覆を施
した蛍光体の表面Zn元素強度をX線光電子分光分析
(XPS)により測定し、処理前の蛍光体の表面Zn元
素強度と比較したところ、処理前に対して100%であ
った。またArエッチングにより深さ方向の分析を行っ
たところ、1分のエッチングでZn強度が90%、3分
で95%、5分で99%となり蛍光体表面が酸化チタン
で被覆されていることも確かめた。更にSEM観察、稀
硝酸銀水溶液浸漬によって黒色のAgSが析出しないこ
とを確認して被覆率が100%であることを決定した。
尚、チタニウムテトライソプロキシドなどの金属アルコ
キシドの種類を変えることにより、アルミナやシリカ、
上述の方法で得られた、水分遮断被覆蛍光体をアルミナ
ボールとともに容器に入れて、ボールミルにかけ物理的
に被覆層を剥離させ、剥離片を篩にかけて取り除き、平
均被覆率70%、75%、90%、98%の水分遮断被
覆蛍光体を得た。EXAMPLES (Coating of Moisture Shielding Layer) Hereinafter, the present invention will be specifically described with reference to Examples. ZnS: C with an average particle size of 25μ
A method of coating the surface of the electroluminescent phosphor composed of u and Cl with a moisture barrier layer of, for example, titanium oxide will be described. Uncoated Z
10 parts by weight of the nS phosphor was heat-treated at 300 ° C. for 1 hour, dispersed in 100 parts by weight of special grade ethyl alcohol (99.5%), and 0.2 parts by weight of titanium tetraisopropoxide was added thereto for 2 hours. Mix well. Then, after filtration to remove the solvent, 0.2N ammonia water 100
The ZnS phosphor was dispersed in parts by weight for 1 hour, filtered again, vacuum-dried at 200 ° C. for 4 hours, and a phosphor covered with titanium oxide in a moisture-proof manner was obtained. The surface Zn element intensity of the phosphor thus provided with the moisture barrier coating was measured by X-ray photoelectron spectroscopy (XPS) and compared with the surface Zn element intensity of the phosphor before treatment. 100%. Analysis in the depth direction by Ar etching showed that the Zn intensity was 90% in 1 minute etching, 95% in 3 minutes, and 99% in 5 minutes, indicating that the phosphor surface was coated with titanium oxide. I confirmed. Further, it was confirmed by SEM observation that black AgS was not precipitated by immersion in a dilute silver nitrate aqueous solution, and it was determined that the coverage was 100%.
By changing the type of metal alkoxide such as titanium tetraisoproxide, alumina, silica,
The moisture-blocking coated phosphor obtained by the above-mentioned method is put into a container together with alumina balls, and the coating layer is physically peeled off by a ball mill, and the peeled pieces are removed by sieving. %, 98% of a moisture blocking coated phosphor.
【0013】(素子の作製) <実施例1>チタン酸バリウム(平均粒径5μ)67重
量部、シアノエチル化プルラン10重量部、ジメチルホ
ルムアミド23重量部を混合攪拌し、絶縁層用ペースト
として作製したものを80μのアルミ箔上にドクターブ
レード法にて塗工し、130℃で3分間熱風乾燥した。
更に前述の水分遮断被膜率75%の蛍光体55重量部、
シアノエチル化プルラン16重量部、ジメチルホルムア
ミド29重量部を混合攪拌し、発光層用ペーストとして
作製したものを絶縁層上に同様にして塗工し、100℃
で3分間熱風乾燥した。この積層体を10cm×15c
mの大きさに切り出したものを75℃、20時間真空乾
燥した。尚、各層厚は真空乾燥後、絶縁層25μ、発光
層50μになるようブレードのギャップをあらかじめ調
整しておいた。乾燥後PETフィルム透明電極を発光層
上に150℃、30Kgf/cm2、40cm/min
の条件で熱間ロールプレスにて貼り合わせた。最後に透
湿度20g/m2・24hrの150μmのPET製の
カバーフィルムをラミネートし、有機分散型EL素子を
作製した。(Preparation of Device) Example 1 67 parts by weight of barium titanate (average particle size: 5 μm), 10 parts by weight of cyanoethylated pullulan, and 23 parts by weight of dimethylformamide were mixed and stirred to prepare a paste for an insulating layer. The product was coated on an 80 μm aluminum foil by a doctor blade method, and dried with hot air at 130 ° C. for 3 minutes.
Further, 55 parts by weight of the above-mentioned phosphor having a moisture blocking film ratio of 75%,
16 parts by weight of cyanoethylated pullulan and 29 parts by weight of dimethylformamide were mixed and stirred, and a paste prepared as a light emitting layer paste was coated on the insulating layer in the same manner, and then heated at 100 ° C.
For 3 minutes with hot air. This laminated body is 10cm × 15c
Those cut into a size of m were vacuum dried at 75 ° C. for 20 hours. The thickness of each layer was adjusted in advance so that after vacuum drying, the blade gap was adjusted so that the insulating layer was 25 μm and the light emitting layer was 50 μm. After drying, a PET film transparent electrode was placed on the light emitting layer at 150 ° C., 30 kgf / cm 2, 40 cm / min.
Under a condition of the following. Finally, a 150 μm PET cover film having a moisture permeability of 20 g / m 2 · 24 hr was laminated to produce an organic dispersion type EL device.
【0014】<実施例2>前述の発光層の蛍光体を水分
遮断平均被覆率90%を用いて実施例1と同様にして、
透湿度20g/m2・24hrの150μmのPET製
のカバーフィルムをラミネートし、有機分散型EL素子
を作製した。<Example 2> [0014] The phosphor of the above-mentioned light emitting layer was treated in the same manner as in Example 1 using an average water blocking rate of 90%.
A 150 μm PET cover film having a moisture permeability of 20 g / m 2 · 24 hr was laminated to produce an organic dispersion type EL device.
【0015】<実施例3>前述の発光層の蛍光体を水分
遮断平均被覆率98%を用いて実施例1と同様にして、
透湿度20g/m2・24hrの150μmのPET製
のカバーフィルムをラミネートし、有機分散型EL素子
を作製した。<Example 3> The phosphor of the above-mentioned light emitting layer was prepared in the same manner as in Example 1 by using an average water blocking rate of 98%.
A 150 μm PET cover film having a moisture permeability of 20 g / m 2 · 24 hr was laminated to produce an organic dispersion type EL device.
【0016】<実施例4>前述の発光層の蛍光体を水分
遮断平均被覆率90%を用いて実施例1と同様にして、
カバーフィルムのない薄型有機分散型EL素子を作製し
た。<Example 4> The phosphor of the above-mentioned light emitting layer was treated in the same manner as in Example 1 by using an average water blocking rate of 90%.
A thin organic dispersion type EL element without a cover film was produced.
【0017】<実施例5>前述の発光層の蛍光体を水分
遮断平均被覆率90%を用いて実施例1と同様にして、
透湿度25g/m2・24hrの200μmのポリエチ
レン製のカバーフィルムをラミネートし、有機分散型E
L素子を作製した。<Embodiment 5> The phosphor of the above-mentioned light emitting layer was prepared in the same manner as in Embodiment 1 by using an average water blocking rate of 90%.
A 200 μm polyethylene cover film having a moisture permeability of 25 g / m 2 · 24 hr is laminated, and an organic dispersion type E is laminated.
An L element was produced.
【0018】<実施例6>前述の発光層の蛍光体を水分
遮断平均被覆率90%を用いて実施例1と同様にして、
透湿度22g/m2・24hrの100μmのポリプロ
ピレン製のカバーフィルムをラミネートし、有機分散型
EL素子を作製した。<Example 6> The phosphor of the above-mentioned light emitting layer was prepared in the same manner as in Example 1 by using an average water blocking rate of 90%.
A 100 μm polypropylene cover film having a moisture permeability of 22 g / m 2 · 24 hr was laminated to produce an organic dispersion type EL device.
【0019】<実施例7>前述の発光層の蛍光体を水分
遮断平均被覆率90%を用いて実施例1と同様にして、
透湿度8g/m2・24hrの100μmの四フッ化エ
チレン・エチレン共重合樹脂製のカバーフィルムをラミ
ネートし、有機分散型EL素子を作製した。<Example 7> The phosphor of the above-mentioned light emitting layer was prepared in the same manner as in Example 1 by using an average water blocking rate of 90%.
A 100 μm cover film made of ethylene tetrafluoride / ethylene copolymer resin having a moisture permeability of 8 g / m 2 · 24 hr was laminated to produce an organic dispersion type EL device.
【0020】<比較例1>前述の発光層の蛍光体を水分
遮断平均被覆率100%を用いて実施例1と同様にし
て、透湿度20g/m2・24hrの150μmのPE
T製のカバーフィルムをラミネートし、有機分散型EL
素子を作製した。 <比較例2>前述の発光層の蛍光体を水分遮断平均被覆
率70%を用いて実施例1と同様にして、透湿度20g
/m2・24hrの150μmのPET製のカバーフィ
ルムをラミネートし、有機分散型EL素子を作製した。 <比較例3>前述の発光層の蛍光体を水分遮断平均被覆
率90%を用いて実施例1と同様にして、透湿度0.1
g/m2・24hrの250μmのPCTFE製カバー
フィルムをラミネートし、有機分散型EL素子を作製し
た。 <比較例4>前述の発光層の蛍光体を水分遮断平均被覆
率90%を用いて有機バインダーとしてポリフッ化ビニ
リデン、有機溶媒として酢酸セロソルブに変えて実施例
1と同様にして、透湿度20g/m2・24hrの15
0μmのPETフィルムをラミネートし、有機分散型E
L素子を作製した。 <比較例5>前述の発光層の蛍光体を水分遮断平均被覆
率100%を用いて実施例1と同様にして、透湿度0.
1g/m2・24hrの250μmのPCTFEフィル
ムをラミネートし、有機分散型EL素子を作製した。<Comparative Example 1> A 150 μm PE having a moisture permeability of 20 g / m 2 · 24 hr was prepared in the same manner as in Example 1 except that the above-mentioned phosphor of the light emitting layer was used with an average water blocking rate of 100%.
Laminated T cover film, organic dispersion EL
An element was manufactured. <Comparative Example 2> The above-described phosphor of the light-emitting layer was subjected to moisture permeability of 20 g in the same manner as in Example 1 using an average water blocking rate of 70%.
An organic dispersion type EL device was produced by laminating a 150 μm PET cover film of / m 2 · 24 hr. <Comparative Example 3> The above-mentioned phosphor of the light-emitting layer was subjected to moisture permeability of 0.1 in the same manner as in Example 1 using an average water blocking rate of 90%.
A 250 μm cover film made of PCTFE of g / m 2 · 24 hr was laminated to produce an organic dispersion type EL device. <Comparative Example 4> In the same manner as in Example 1 except that the above-mentioned phosphor of the light emitting layer was changed to polyvinylidene fluoride as an organic binder and cellosolve acetate as an organic solvent using an average water blocking rate of 90%, the moisture permeability was 20 g / 15 m 2 · 24hr
A PET film of 0 μm is laminated, and an organic dispersion type E
An L element was produced. <Comparative Example 5> The phosphor of the light emitting layer described above was used in the same manner as in Example 1 using an average water blocking average coverage of 100%.
A 250 μm PCTFE film of 1 g / m 2 · 24 hr was laminated to produce an organic dispersion type EL device.
【0021】各々作製した有機分散型EL素子は20
℃、65%RHの条件下で初期輝度を測定した。また、
40℃90%RHの恒温恒湿層内で加速試験を行った。
測定にはともに100V400Hzを印加した。尚、加
速試験寿命は、初期輝度の半分の輝度に低下するまでの
連続点灯時間である。結果をまとめ表1に示す。Each of the organic dispersion type EL devices produced was 20
The initial luminance was measured under the conditions of ° C. and 65% RH. Also,
An acceleration test was performed in a constant temperature and humidity layer at 40 ° C. and 90% RH.
In both cases, 100 V and 400 Hz were applied. The accelerated test life is a continuous lighting time until the luminance decreases to half of the initial luminance. The results are summarized in Table 1.
【0022】[0022]
【表1】 [Table 1]
【0023】[0023]
【発明の効果】以上述べたように、本発明の分散型EL
素子は水分遮断被膜をほどこした蛍光体の未被覆部分に
進入する水分量を水分遮断被覆層の平均面積占有度とカ
バーフィルムの材質にてコントロールすることで高輝
度、長寿命かつ低コスト化を達成することにより、従来
以上の性能を発揮するので好適に用いることができる。As described above, the dispersion type EL of the present invention is used.
The device controls the amount of water that enters the uncoated part of the phosphor coated with the moisture barrier coating by controlling the average area occupancy of the moisture barrier coating layer and the material of the cover film to achieve high brightness, long life and low cost. By achieving the above, performances higher than those of the related art can be exhibited, and therefore, it can be suitably used.
【手続補正書】[Procedure amendment]
【提出日】平成10年12月3日(1998.12.
3)[Submission date] December 3, 1998 (1998.12.
3)
【手続補正1】[Procedure amendment 1]
【補正対象書類名】明細書[Document name to be amended] Statement
【補正対象項目名】図面の簡単な説明[Correction target item name] Brief description of drawings
【補正方法】追加[Correction method] Added
【補正内容】[Correction contents]
【図面の簡単な説明】[Brief description of the drawings]
【図1】 本発明の分散型EL素子の構成を示す断面
図。FIG. 1 is a cross-sectional view illustrating a configuration of a dispersion-type EL element of the present invention.
【図2】 本発明の分散型EL素子の輝度と寿命を評価
した状態を示すグラフ。FIG. 2 is a graph showing a state in which the luminance and the lifetime of the dispersion type EL element of the present invention are evaluated.
【符号の説明】 1―背面電極、2―絶縁層、3―発光層、4―透明電
極、5―防湿フィルム。[Description of Signs] 1-back electrode, 2-insulating layer, 3-light-emitting layer, 4-transparent electrode, 5-moisture-proof film.
───────────────────────────────────────────────────── フロントページの続き (72)発明者 神田 稔 埼玉県大宮市北袋町一丁目297番地 三菱 マテリアル株式会社総合研究所内 (72)発明者 石渡 正治 埼玉県大宮市北袋町一丁目297番地 三菱 マテリアル株式会社総合研究所内 ──────────────────────────────────────────────────続 き Continued on the front page (72) Inventor Minoru Kanda 1-297 Kitabukurocho, Omiya City, Saitama Prefecture Inside Mitsubishi Materials Research Institute (72) Inventor Masaharu Ishiwata 1-297 Kitabukurocho, Omiya City, Saitama Mitsubishi Materials Inside Research Institute Co., Ltd.
Claims (5)
方が透明電極である一対の電極間に絶縁誘電層と水分遮
断被覆を施した電場発光性蛍光体を含む発光層とを有す
る分散型EL発光素子で、上記水分遮断被覆を施した電
場発光性蛍光体の蛍光体に対する水分遮断被覆層の平均
面積占有率が75〜98%であることを特徴とする分散
型EL素子。1. A dispersion-type EL device comprising a pair of electrodes, at least one of which is a transparent electrode, having an insulating dielectric layer and a light-emitting layer containing an electroluminescent phosphor coated with a moisture-blocking coating. Wherein the average area occupancy of the moisture blocking coating layer with respect to the phosphor of the electroluminescent phosphor provided with the moisture blocking coating is 75 to 98%.
電極間に絶縁誘電層と水分遮断被覆を施した電場発光性
蛍光体含む発光層とを有する素子本体をカバーフィルム
で封止した分散型EL素子において、上記カバーフィル
ムが低防湿性の合成樹脂フィルムからなることを特徴と
する請求項1記載の分散型EL素子。2. A dispersion-type EL in which an element body having an insulating dielectric layer and a light-emitting layer containing an electroluminescent phosphor coated with a moisture barrier between at least one of a pair of transparent electrodes is sealed with a cover film. 2. The dispersion-type EL device according to claim 1, wherein said cover film is made of a low moisture-proof synthetic resin film.
ル化高誘電率結合樹脂からなる請求項2記載の分散型E
L素子。3. The dispersion type E according to claim 2, wherein the light emitting layer comprises an electroluminescent phosphor and a cyanoethylated high dielectric constant bonding resin.
L element.
24hr以上である請求項3記載の分散型EL素子。4. A cover film having a moisture permeability of 8 g / m 2 ···
4. The dispersion-type EL device according to claim 3, which is 24 hours or longer.
ン、ポリエチレン、ポリエチレンテレフタレートから選
ばれる合成樹脂である請求項4記載の分散型EL素子。5. The dispersion-type EL device according to claim 4, wherein the material of the cover film is a synthetic resin selected from polypropylene, polyethylene, and polyethylene terephthalate.
Priority Applications (1)
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JP10269168A JP2000100571A (en) | 1998-09-24 | 1998-09-24 | Distributed type electroluminescent device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10269168A JP2000100571A (en) | 1998-09-24 | 1998-09-24 | Distributed type electroluminescent device |
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Publication Number | Publication Date |
---|---|
JP2000100571A true JP2000100571A (en) | 2000-04-07 |
Family
ID=17468637
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10269168A Withdrawn JP2000100571A (en) | 1998-09-24 | 1998-09-24 | Distributed type electroluminescent device |
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JP (1) | JP2000100571A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008033095A (en) * | 2006-07-31 | 2008-02-14 | Toppan Printing Co Ltd | Display device |
WO2011052432A1 (en) * | 2009-10-29 | 2011-05-05 | リンテック株式会社 | Light-emitting composition, electroluminescent sheet, and method for producing same |
CN106571309A (en) * | 2016-10-27 | 2017-04-19 | 江西沃格光电股份有限公司 | Flat panel display (FPD) processing method |
-
1998
- 1998-09-24 JP JP10269168A patent/JP2000100571A/en not_active Withdrawn
Cited By (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2008033095A (en) * | 2006-07-31 | 2008-02-14 | Toppan Printing Co Ltd | Display device |
WO2011052432A1 (en) * | 2009-10-29 | 2011-05-05 | リンテック株式会社 | Light-emitting composition, electroluminescent sheet, and method for producing same |
CN102630391A (en) * | 2009-10-29 | 2012-08-08 | 琳得科株式会社 | Light-emitting composition, electroluminescent sheet, and method for producing same |
US8648529B2 (en) | 2009-10-29 | 2014-02-11 | Lintec Corporation | Light-emitting composition, electroluminescent sheet, and method for producing same |
JP5706828B2 (en) * | 2009-10-29 | 2015-04-22 | リンテック株式会社 | Luminescent composition, electroluminescent sheet and method for producing the same |
CN102630391B (en) * | 2009-10-29 | 2016-05-11 | 琳得科株式会社 | Photism composition and EL sheet and preparation method thereof |
CN106571309A (en) * | 2016-10-27 | 2017-04-19 | 江西沃格光电股份有限公司 | Flat panel display (FPD) processing method |
CN106571309B (en) * | 2016-10-27 | 2019-11-05 | 江西沃格光电股份有限公司 | Flat-panel monitor processing method |
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