JP2000098618A - Exposing method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To decrease variance of temp. inside the cooling face of a substrate stage by multi-systemizing cooling water passages which control the temp. of a glass substrate in the substrate stage and shortening the passage length per one system to decrease temp. irregularity in the glass substrate face. SOLUTION: An aluminum stage 3 for exposure of a color filter pattern for a liquid crystal display device is provided with passages 9 to pass cooling water and the temp. of the cooling water passed through the passages 9 is controlled. By multi-systemizing the passages 9, the length of the passage per one system is shortened to decrease a temp. difference between an injection part and an exit side for each passage and to decrease irregularity in the whole temp. distribution. Further, the arrangement of the passages 9 is made in the shape that the injection part side and exit side of one passage are always adjacent to each other. In each part of the passages 9, since the injection part side at a low temp. and the exit side at a high temp. are always adjacent to each other to cancel each other, the temp. as a whole is averaged and macroscopic temp. distribution becomes more uniform.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to a method for exposing a large area pattern such as a color filter used in a liquid crystal display device.

[0002]

2. Description of the Related Art FIG. 4 is a view schematically showing a mechanism of a collective exposure device for a color filter for a liquid crystal display device. The exposure mechanism is generally, for example, as follows. That is, light emitted from the light source 4 using a high-pressure mercury lamp or the like is regulated in one direction by the concave reflecting mirror 5. The light is then applied to mask 1
Infrared rays are cut by an infrared ray cut mirror 6 in order to prevent thermal expansion of the color filter substrate 2 which is to be processed.
Next, after the difference in the amount of light in the cross section of the optical path is reduced by the fly-eye lens (compound eye lens) 7, the light passes through the condenser mirror 8 to become substantially parallel incident light and enters the mask 1. Thereafter, the light becomes exposure light through the mask 1 and reaches the color filter substrate 2 on the stage 3.

In the stage 3 for exposing a color filter pattern for a liquid crystal display device, the glass substrate 2 expands and contracts (expands and contracts) due to heat generated from a light source, thereby impairing dimensional accuracy and pattern pitch accuracy. In order to avoid this, a path for passing cooling water is provided in the aluminum stage 3 to control the temperature rise of the substrate 2 and to control the temperature of the cooling water passing through the path so that dimensional accuracy and pattern pitch accuracy are within allowable ranges. It is carried out.

However, with the recent increase in the size of the substrate, the area of the cooling surface on the stage has increased, and the distance from the injection portion to the outlet of the cooling water path has become considerably long, so that the cooling water flows through the table. Meanwhile, the temperature of the cooling water rises significantly, and a difference of 0.5 ° C. or more is generated between the injection part and the outlet. For this reason, a large temperature variation occurs in the cooling surface of the stage, and high-precision temperature control is impossible.

[0005]

SUMMARY OF THE INVENTION It is an object of the present invention to provide a means for reducing a temperature variation in a cooling surface of a stage as described above.

[0006]

According to the present invention, in a method of exposing a color filter pattern of a liquid crystal display device, a cooling water path for controlling the temperature of a glass substrate in a substrate stage is provided. (B) The position of the route is such that the inlet side and the outlet side of one route are adjacent to each other. (C) or both (A) and (B) An exposure method characterized in that the temperature unevenness in the glass substrate surface is reduced by using any of the filled paths.

[0007]

DESCRIPTION OF THE PREFERRED EMBODIMENTS In the present invention, in order to solve the problem of temperature variation in the cooling surface of the stage,
The following method is used. (A) As shown in the example of FIG. 2, by making the cooling water path 9 multi-path, the length of the path per path is shortened,
The temperature difference between the injection part and the outlet for each path is reduced, thereby reducing the unevenness of the entire temperature distribution. (B) As shown in the example of FIG.
The injection part side and the outlet side of one path are always adjacent to each other. Various actual forms of this form are conceivable, for example, as shown in FIG. According to this method, since each part of the path 9 is such that the low-temperature injection part side and the high-temperature outlet side always cancel each other, the temperatures are averaged as a whole, and the macroscopic temperature distribution is more uniform. Becomes Further, as shown in the example of FIG. 1, by combining both of the above-mentioned means (A) and (B), the unevenness of the temperature distribution can be reduced more effectively. The arrows in the above figures are
9 shows the flow direction of the cooling water in the passage 9.

[0008]

According to the above-mentioned means (A), that is, the method based on the multi-path arrangement, the length of one path is shortened, so that the temperature rise in the path from the injection part side to the outlet side is reduced. There is an effect that the width becomes small and unevenness of the entire temperature distribution is reduced. In the means of the above (B), that is, in the method using the parallel path arrangement, the cooling water that has just entered from the injection part side and the cooling water in the part near the outlet side are adjacent to each other.
Although the loss is large in the application where the cooling effect is the first, the uniformity of the temperature distribution is extremely important in the application like this case, and the cooling water injection part side and the outlet (discharge The fact that the side is always adjacent to the side has an effect of reducing the variation in the macroscopic temperature distribution in the cooling surface, which is very effective. The combined use of the above two methods further enhances the effect of reducing unevenness.

[0009]

[Brief description of the drawings]

FIG. 1 is an explanatory diagram showing an example of implementation of the method (C) (a combination of the methods (A) and (B)) of the present invention.

FIG. 2 is an explanatory diagram showing an example of implementation of the method (A) of the present invention.

FIG. 3 is an explanatory view showing an example of the implementation of the method (B) of the present invention.

FIG. 4 is an explanatory diagram illustrating an example of a mechanism of the collective exposure apparatus.

[Description of Signs] 1 Mask 2 Substrate 3 Stage 4 Light Source 5 Reflecting Mirror 6 Infrared Cut Mirror 7 Fly Eye Lens 8 Condensing Mirror 9 Path

Claims (3)

[Claims] In a method for exposing a large area pattern such as a color filter for a liquid crystal display device, a cooling water path for controlling the temperature of a glass substrate in a substrate stage is provided with multiple cooling paths, and a cooling path is provided for each system. An exposure method, wherein the length of a path is shortened to reduce temperature unevenness in a glass substrate surface. 2. The exposure method according to claim 1, wherein the position of the cooling water path in the substrate stage is determined by using a path in which an inlet side and an outlet side of one path are adjacent to each other. An exposure method characterized in that temperature unevenness in the inside is reduced. 3. An exposure method according to claim 1, wherein a path that satisfies both characteristics of claim 1 and 2 is used.