JP2000095527A - Reduced-pressure defoaming system - Google Patents
Reduced-pressure defoaming systemInfo
- Publication number
- JP2000095527A JP2000095527A JP10268290A JP26829098A JP2000095527A JP 2000095527 A JP2000095527 A JP 2000095527A JP 10268290 A JP10268290 A JP 10268290A JP 26829098 A JP26829098 A JP 26829098A JP 2000095527 A JP2000095527 A JP 2000095527A
- Authority
- JP
- Japan
- Prior art keywords
- tank
- vacuum degassing
- pipe
- degassing tank
- pressure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B5/00—Melting in furnaces; Furnaces so far as specially adapted for glass manufacture
- C03B5/16—Special features of the melting process; Auxiliary means specially adapted for glass-melting furnaces
- C03B5/225—Refining
- C03B5/2252—Refining under reduced pressure, e.g. with vacuum refiners
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Degasification And Air Bubble Elimination (AREA)
- Waste-Gas Treatment And Other Accessory Devices For Furnaces (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は減圧脱泡システムに
係り、特に溶融ガラスや溶融金属等の高温溶融物の清澄
工程において、高温溶融物内の気泡を除去する減圧脱泡
槽を備えた減圧脱泡システムに関する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a decompression degassing system, and more particularly to a decompression degassing tank provided with a decompression degassing tank for removing air bubbles in a high-temperature melt in a fining step of a high-temperature melt such as molten glass or molten metal. It relates to a defoaming system.
【０００２】[0002]
【従来の技術】この種の減圧脱泡槽としては、サイフォ
ン式、水平式等の減圧脱泡槽が知られており、特開平３
−３３０２０号公報には、サイフォン式の減圧脱泡槽が
適用されたガラス製品製造装置の一例が開示されてい
る。前記ガラス製品製造装置は、主として溶融槽、上昇
管、減圧脱泡槽、下降管、及び貯留槽から構成されてい
る。脱泡前の溶融ガラスは、前記溶融槽に溜められた
後、サイフォンの原理によって前記上昇管から減圧脱泡
槽に導かれ、ここで脱泡される。そして、脱泡された溶
融ガラスは、前記下降管から貯留槽に導かれ、そして、
成形工程に導かれる。以上が前記ガラス製品製造装置に
よる溶融ガラスの流れである。2. Description of the Related Art As a vacuum degassing tank of this kind, a vacuum degassing tank of a siphon type, a horizontal type or the like is known.
Japanese Patent No. 33020 discloses an example of a glass product manufacturing apparatus to which a siphon-type vacuum degassing tank is applied. The glass product manufacturing apparatus mainly includes a melting tank, an ascending pipe, a vacuum degassing tank, a descending pipe, and a storage tank. After the molten glass before defoaming is stored in the melting tank, the molten glass is guided from the riser pipe to a reduced-pressure defoaming tank by the siphon principle, where it is defoamed. Then, the defoamed molten glass is led from the downcomer to a storage tank, and
Guided to the molding process. The above is the flow of the molten glass by the glass product manufacturing apparatus.
【０００３】ところで、前記減圧脱泡槽は、大気圧より
も減圧下で運転されるため、この減圧脱泡槽には、大気
側から減圧脱泡槽への空気の漏れ込み（リーク）を防止
するシール機構が設けられている。しかし、前記シール
機構では、完全な気密状態を保持することは困難であ
り、多少のリークが生じる。そこで、従来の減圧脱泡槽
は、減圧脱泡槽に減圧装置を設け、この減圧装置の真空
ポンプ（減圧手段）によって大気側からのリーク量以上
の空気を吸引することにより、減圧脱泡槽内の減圧度を
保持している。Since the vacuum degassing tank is operated at a pressure lower than the atmospheric pressure, leakage of air from the atmosphere side to the vacuum degassing tank is prevented. A sealing mechanism is provided. However, it is difficult for the seal mechanism to maintain a completely airtight state, and some leakage occurs. Therefore, the conventional vacuum degassing tank is provided with a decompression device in the decompression degassing tank, and a vacuum pump (decompression means) of the depressurizing device sucks air having a leak amount or more from the atmosphere side to form a decompression degassing tank. The degree of decompression inside is maintained.
【０００４】[0004]
【発明が解決しようとする課題】ところで、前記減圧装
置の排気配管には、運転中の減圧脱泡槽から発生した
水、ＳＯx ガス、カーボン等の多種類の揮散物等が気
体、液体、固体の状態で高温気体と一緒に進入してく
る。しかしながら、従来の減圧装置には、前記揮散物等
を除去する手段が設けられいないので、前記揮散物が配
管等に詰まり、これが原因で減圧装置及び減圧脱泡槽の
運転が不安定になるという欠点があった。Meanwhile [0008], wherein the exhaust pipe of the decompressor, the water generated from the vacuum degassing vessel during operation, SO x gas, various types of volatilization, etc. are gases such as carbon, a liquid, It enters in a solid state with hot gas. However, since the conventional decompression device is not provided with a means for removing the volatile matter or the like, the volatile matter is clogged in a pipe or the like, and the operation of the decompression device and the vacuum degassing tank becomes unstable due to this. There were drawbacks.
【０００５】本発明はこのような事情に鑑みてなされた
もので、減圧脱泡槽から発生した揮散物を除去すること
により、減圧装置及び減圧脱泡槽を安定して運転するこ
とができる減圧脱泡システムを提供することを目的とす
る。[0005] The present invention has been made in view of such circumstances, and by removing volatile matter generated from a vacuum degassing tank, the pressure reducing apparatus and the vacuum degassing tank can be operated stably. It is intended to provide a defoaming system.
【０００６】[0006]
【課題を解決するための手段】本発明は、前記目的を達
成するために、高温溶融物を脱泡する減圧脱泡槽と、前
記減圧脱泡槽に配管を介して連結されるとともに、駆動
されることにより減圧脱泡槽内の高温気体を前記配管を
介して吸引し、減圧脱泡槽を減圧させる減圧手段と、前
記配管に設けられ、前記減圧手段で吸引された前記減圧
脱泡槽内の高温気体中の揮散物を除去する除去手段と、
を備えたことを特徴とする。SUMMARY OF THE INVENTION In order to achieve the above object, the present invention provides a vacuum degassing tank for defoaming a high-temperature melt, and is connected to the vacuum degassing tank via a pipe, The decompression means for sucking high-temperature gas in the decompression degassing tank through the pipe by being performed, and decompressing the decompression degassing tank, and the decompression degassing tank provided in the pipe and sucked by the decompression means Removing means for removing volatile matter in the high-temperature gas in the
It is characterized by having.
【０００７】請求項１記載の発明によれば、減圧装置の
配管に除去手段を設け、この除去手段によって、減圧脱
泡槽から発生した高温気体中の揮散物を除去したので、
揮散物が配管に詰まることはない。これにより、本発明
によれば、減圧装置及び減圧脱泡槽を安定して運転する
ことができる。請求項２記載の発明によれば、除去手段
と減圧手段との間に位置する配管に集塵手段を設け、こ
の集塵手段によって、除去手段から排出された気体中の
塵を除去したので、減圧脱泡槽から発生した高温気体を
浄化することができる。According to the first aspect of the present invention, a removing means is provided in the pipe of the pressure reducing device, and the removing means removes the volatile matter in the high-temperature gas generated from the vacuum degassing tank.
Volatiles do not clog the piping. Thereby, according to the present invention, the decompression device and the decompression degassing tank can be operated stably. According to the second aspect of the present invention, dust collecting means is provided in the pipe located between the removing means and the pressure reducing means, and dust in the gas discharged from the removing means is removed by the dust collecting means. High temperature gas generated from the vacuum degassing tank can be purified.
【０００８】請求項３記載の発明は、前記除去手段とし
て冷却手段を適用し、この冷却手段によって、前記高温
気体中の揮散物を露点以下に冷却して除去する。これに
より、前記揮散物を確実に除去することができる。According to a third aspect of the present invention, cooling means is applied as the removing means, and the volatile means in the high-temperature gas is cooled to a dew point or less and removed by the cooling means. Thereby, the volatile matter can be reliably removed.
【０００９】[0009]
【発明の実施の形態】以下、添付図面に従って、溶融ガ
ラスの清澄工程に適用された本発明に係る減圧脱泡シス
テムの実施の形態について詳説する。図１は、本実施の
形態の減圧脱泡システム１０を示す全体構造図であり、
当該減圧脱泡システム１０は図１の如く、減圧脱泡槽１
２を含めて構成されている。そこで、減圧脱泡システム
１０の主要部分を説明するまえに、前記減圧脱泡槽１２
について説明する。BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 is a perspective view of a vacuum degassing system according to the present invention applied to a process for refining molten glass. FIG. 1 is an overall structural diagram showing a vacuum degassing system 10 of the present embodiment,
As shown in FIG. 1, the vacuum degassing system 10 includes a vacuum degassing tank 1.
2 is included. Therefore, before explaining the main part of the vacuum degassing system 10, the vacuum degassing tank 12
Will be described.
【００１０】図２に示すように前記減圧脱泡槽１２は、
サイフォン式の脱泡槽であり、その左端部には、白金か
らなる上昇管１４が取り付けられ、この上昇管１４の下
端部は、溶融槽１６に貯留されている溶融ガラスＧに浸
漬されている。また、前記溶融槽１６にはスターラー１
８が設置され、このスターラー１８の回転駆動によって
溶融槽１６内の溶融ガラスＧが攪拌される。一方、減圧
脱泡槽１２の図３上右端部には、下降管２０が取り付け
られ、この下降管２０は上昇管１４と同じく白金で形成
されている。前記下降管２０の下端部は、貯留槽２２の
溶融ガラスＧに浸漬されており、この貯留槽２２にも、
貯留槽２２内の溶融ガラスＧを攪拌するスターラ２４が
設置されている。[0010] As shown in FIG.
It is a siphon type defoaming tank, and a rising pipe 14 made of platinum is attached to the left end thereof, and the lower end of the rising pipe 14 is immersed in the molten glass G stored in the melting tank 16. . Further, the stirrer 1 is provided in the melting tank 16.
The molten glass G in the melting tank 16 is stirred by the rotation of the stirrer 18. On the other hand, a downcomer 20 is attached to the lower right end of the vacuum degassing tank 12 in FIG. 3, and the downcomer 20 is made of platinum, like the upcomer 14. The lower end of the downcomer pipe 20 is immersed in the molten glass G of the storage tank 22.
A stirrer 24 that stirs the molten glass G in the storage tank 22 is provided.
【００１１】前記上昇管１４、減圧脱泡槽１２、及び下
降管２０は図示しない電気加熱装置又はその他の加熱手
段によって加熱され、温度制御系によって所定の温度、
例えば１２００〜１４５０℃程度に加熱されている。ま
た、前記上昇管１４、減圧脱泡槽１２、及び下降管２０
はケーシング２６に収納されるとともに、それらの間に
充填された断熱材２８によって放熱が防止されている。The riser pipe 14, the vacuum degassing tank 12, and the descender pipe 20 are heated by an electric heating device or other heating means (not shown), and a predetermined temperature is controlled by a temperature control system.
For example, it is heated to about 1200 to 1450 ° C. In addition, the riser pipe 14, the vacuum degassing tank 12, and the descender pipe 20
Are housed in a casing 26 and heat radiation is prevented by a heat insulating material 28 filled between them.
【００１２】このように構成された減圧脱泡槽１２は、
ステンレス製、又は鉄（ＳＳ）製の真空ハウジング３０
に包囲され、この真空ハウジング３０に減圧脱泡システ
ム１０の第１減圧装置３２が排気配管３４を介して接続
されるとともに、第２減圧装置３６が排気配管３８を介
して接続されている。これらの減圧装置３２、３６によ
って減圧脱泡槽１２が所定の減圧度に減圧されると、溶
融槽１６内の溶融ガラスＧがサイフォンの原理によって
上昇管１４を介して減圧脱泡槽１２内に導かれ、ここで
脱泡される。脱泡された溶融ガラスＧは、下降管２０か
ら貯留槽２２に導かれた後、図示しない成形工程に導か
れる。以上が前記減圧脱泡槽１２の作用である。なお、
本実施の形態では、減圧脱泡槽１２としてサイフォン式
のものを適用したが、これに限られるものではなく、水
平式の脱泡槽のような他の減圧脱泡槽にも適用すること
ができる。The vacuum degassing tank 12 constructed as described above is
Stainless steel or iron (SS) vacuum housing 30
The first pressure reducing device 32 of the vacuum degassing system 10 is connected to the vacuum housing 30 via an exhaust pipe 34, and the second pressure reducing device 36 is connected to the vacuum housing 30 via an exhaust pipe 38. When the pressure in the vacuum degassing tank 12 is reduced to a predetermined degree by the pressure reducing devices 32 and 36, the molten glass G in the melting tank 16 enters the vacuum degassing tank 12 via the rising pipe 14 by the siphon principle. It is led and defoamed here. The defoamed molten glass G is guided from the downcomer pipe 20 to the storage tank 22 and then to a forming step (not shown). The above is the operation of the vacuum degassing tank 12. In addition,
In the present embodiment, the siphon type degassing tank 12 is applied as the decompression degassing tank 12, but the present invention is not limited to this, and may be applied to other decompression degassing tanks such as a horizontal degassing tank. it can.
【００１３】次に、図１を参照して減圧脱泡システム１
０について説明する。前述したように前記減圧脱泡シス
テム１０は、減圧脱泡槽１２を有するほか、主として第
１減圧装置３２、及び第２減圧装置３６から構成されて
いる。前記第１減圧装置３２は、配管３４に設けられた
手動弁４０を介して減圧脱泡槽１２側に接続され、ま
た、第２減圧装置３６も同様に配管３８に設けられた手
動弁４２を介して減圧脱泡槽１２側に接続されている。Next, with reference to FIG.
0 will be described. As described above, the reduced-pressure defoaming system 10 includes the reduced-pressure defoaming tank 12, and mainly includes the first decompressor 32 and the second depressurizer 36. The first pressure reducing device 32 is connected to the vacuum degassing tank 12 via a manual valve 40 provided in a pipe 34, and the second pressure reducing device 36 also has a manual valve 42 provided in a pipe 38. It is connected to the vacuum degassing tank 12 side via.
【００１４】これらの減圧装置３２、３６は同時に使用
されるものではなく、一方が使用されている場合には他
方がメンテナンスされるように交互に切り替えて使用さ
れる。例えば、第１減圧装置３２を使用する場合には、
前記手動弁４０を開いて減圧脱泡槽１２側と第１減圧装
置３２とを連通させる。そして、手動弁４２を閉じて減
圧脱泡槽１２側と第２減圧装置３６とを遮断させる。こ
の時に、第２減圧装置３６はメンテナンスされ、第２減
圧装置３６の配管３８等に付着した塵（揮散物に起因す
る塵）が除去される。These decompression devices 32 and 36 are not used at the same time, and when one is used, they are alternately used so that the other is maintained. For example, when using the first decompression device 32,
The manual valve 40 is opened to connect the reduced-pressure defoaming tank 12 with the first pressure reducing device 32. Then, the manual valve 42 is closed to shut off the vacuum degassing tank 12 side from the second pressure reducing device 36. At this time, the second pressure reducing device 36 is maintained, and dust (dust resulting from volatile matter) attached to the pipe 38 and the like of the second pressure reducing device 36 is removed.
【００１５】前記減圧装置３２、３６について説明する
と、この減圧装置３２、３６は同一の構成なので、ここ
では第１減圧装置３２について説明し、第２減圧装置３
６については、第１減圧装置３２と同一の符号を付すこ
とにより、その説明は省略する。前記第１減圧装置３２
は、主として真空ポンプ（減圧手段に相当）４４、コン
デンサー（除去手段（冷却手段）に相当）４６、及びリ
ーク弁４８から構成されている。前記コンデンサー４６
は配管３４の最も上流側に配置され、これから下流側に
向けて薬剤散布装置５０、集塵機（集塵手段に相当）５
２、フイルタ５４、レシーバータンク５６、遮断弁５
８、及び前記真空ポンプ４４が順に配設されている。し
たがって、真空ポンプ４４が駆動されると、減圧脱泡槽
１２内の高温気体が、コンデンサー４６→薬剤散布装置
５０→集塵機５２→フイルタ５４→レシーバータンク５
６→遮断弁５８を介して真空ポンプ４４から大気に放出
される。The decompression devices 32 and 36 will be described. Since the decompression devices 32 and 36 have the same structure, the first decompression device 32 will be described here and the second decompression device 3 will be described.
For 6, the same reference numerals as those of the first decompression device 32 are used, and the description thereof is omitted. The first decompression device 32
Is mainly composed of a vacuum pump (corresponding to pressure reducing means) 44, a condenser (corresponding to removing means (cooling means)) 46, and a leak valve 48. The condenser 46
Is disposed at the most upstream side of the pipe 34, and the medicine spraying device 50 and the dust collector (corresponding to dust collecting means) 5
2. Filter 54, receiver tank 56, shutoff valve 5
8 and the vacuum pump 44 are arranged in this order. Therefore, when the vacuum pump 44 is driven, the high-temperature gas in the vacuum degassing tank 12 is discharged from the condenser 46 → the chemical spraying device 50 → the dust collector 52 → the filter 54 → the receiver tank 5.
6 → discharged from the vacuum pump 44 to the atmosphere via the shut-off valve 58.
【００１６】前記リーク弁４８は分岐管６０に配設さ
れ、この分岐管６０は、コンデンサー４６と薬剤散布装
置５８との間に位置する配管３４Ａ（※第２減圧装置３
６側では配管３８Ａ）に接続されている。前記リーク弁
４８の下流側には、遮断弁６２及び吸込フイルタ６４が
順に配設されている。したがって、前記リーク弁４８が
開放されると、配管３４Ａ内が負圧に維持されているの
で、外気が吸込フイルタ６４→遮断弁６２→リーク弁４
８を介して配管３４Ａに導入される。なお、リーク弁４
８の開度と真空ポンプ４４の回転数とは、減圧脱泡槽１
２内の減圧度が一定に保持されるように、制御装置６６
によって制御されている。The leak valve 48 is disposed in a branch pipe 60. This branch pipe 60 is connected to a pipe 34A (* the second pressure reducing device 3) located between the condenser 46 and the medicine spraying device 58.
On the 6 side, it is connected to a pipe 38A). On the downstream side of the leak valve 48, a shutoff valve 62 and a suction filter 64 are sequentially arranged. Therefore, when the leak valve 48 is opened, since the inside of the pipe 34A is maintained at a negative pressure, the outside air flows through the suction filter 64 → the shutoff valve 62 → the leak valve 4
8, and is introduced into the pipe 34A. The leak valve 4
8 and the number of rotations of the vacuum pump 44,
The control device 66 controls the pressure reduction degree in
Is controlled by
【００１７】ところで、本実施の形態のような減圧装置
３２では、減圧脱泡槽１２を大気圧より減圧下で運転す
るため、排気配管３４には、運転中の減圧脱泡槽１２か
ら発生した水、ＳＯx ガス、カーボン等の多種類の発生
物質（揮散物等）が気体、液体、固体の状態で高温気体
と一緒に進入してくる。これらの発生物質は、除去機構
を設置する等して適当な処置を行わないと、配管３４等
に詰まり、付着を発生させるので、安定した運転の妨げ
となる。In the decompression device 32 according to the present embodiment, the decompression degassing tank 12 is operated at a pressure lower than the atmospheric pressure. water, SO x gas, various types of generating substance such as carbon (volatilization, etc.) is a gas, a liquid, comes to enter with hot gas in the solid state. Unless proper treatment is performed by installing a removal mechanism or the like, these generated substances clog the pipes 34 and the like and cause adhesion, thereby hindering stable operation.
【００１８】そこで、本実施の形態では、減圧脱泡槽１
２側の出口に前記コンデンサー４６を設置し、このコン
デンサー４６によって、前記高温気体を揮散物の露点以
下に冷却し、揮散物及び水分を除去するようにしてい
る。図３は、前記コンデンサー４６の要部断面図であ
る。同図に示すコンデンサー４６は、高温気体が通過す
る空間部６８が形成されたケーシング７０を有し、この
ケーシング７０の空間部６８に複数本の熱交換用チュー
ブ７１、７１…配設されている。また、前記ケーシング
の図３上左側面には、高温気体の導入管７２が設けられ
ており、この導入管７２を介して減圧脱泡槽１２からの
高温気体がケーシング７０の空間部６８に導入される。
また、ケーシングの図３上右側面には、排気管７４が設
けられており、この排気管７４の後流側に薬剤散布装置
５０（図１参照）が連結されている。したがって、薬剤
散布装置５０には、揮散物と水とが除去された気体が導
入される。Therefore, in the present embodiment, the vacuum degassing tank 1
The condenser 46 is provided at the outlet on the second side, and the condenser 46 cools the high-temperature gas to a temperature lower than the dew point of the volatile matter, thereby removing the volatile matter and moisture. FIG. 3 is a sectional view of a main part of the condenser 46. The condenser 46 shown in the drawing has a casing 70 in which a space 68 through which a high-temperature gas passes is formed, and a plurality of heat exchange tubes 71 are arranged in the space 68 of the casing 70. . A high-temperature gas introduction pipe 72 is provided on the upper left side of the casing in FIG. 3, and the high-temperature gas from the vacuum degassing tank 12 is introduced into the space 68 of the casing 70 via the introduction pipe 72. Is done.
An exhaust pipe 74 is provided on the upper right side of the casing in FIG. 3, and the medicine spraying device 50 (see FIG. 1) is connected to the downstream side of the exhaust pipe 74. Therefore, a gas from which volatile matter and water have been removed is introduced into the chemical spraying device 50.
【００１９】図３に示した前記チューブ７１、７１…は
前記空間部６８において、中央部が垂れ下がるように垂
設されている。また、チューブ７１、７１…の両端部は
それぞれ結束され、その一端部が冷却水導入管７６に接
続され、他端部が冷却水排出管７８に接続されている。
前記冷却水導入管７６は、冷媒である冷水の供給管（不
図示）を介して冷却源（不図示）に接続されており、前
記冷却水排出管７８は排水管（不図示）を介して前記冷
却源に接続されている。即ち、前記冷水は、冷却源とコ
ンデンサー４６との間で循環使用される。なお、冷媒は
水に限定されるものではない。The tubes 71 shown in FIG. 3 are suspended from the space 68 so that the central portion thereof hangs down. Also, both ends of the tubes 71, 71... Are bound, one end of which is connected to the cooling water introduction pipe 76, and the other end of which is connected to the cooling water discharge pipe 78.
The cooling water introduction pipe 76 is connected to a cooling source (not shown) through a supply pipe (not shown) of cold water as a refrigerant, and the cooling water discharge pipe 78 is connected through a drain pipe (not shown). It is connected to the cooling source. That is, the cold water is circulated between the cooling source and the condenser 46. Note that the refrigerant is not limited to water.
【００２０】一方、ケーシング７０の空間部６８には、
遮蔽板８０が垂設されている。この遮蔽板８０によって
空間部６８は、遮蔽板８０の下部空間８２を介して左室
８４と右室８６とに仕切られている。このような遮蔽板
８０を設けると、導入管７２から導入された高温気体
は、左室８４を下降流となって流れ、そして、下部空間
８２から右室８６に回り込み、右室８６を上昇流となっ
て流れた後、排気管７４から後流側に排出される。した
がって、遮蔽板８０を設けると、限られたスペースの空
間部６８で高温気体の流路長を長くとることができるの
で、高温気体との熱交換を効率良く行うことができる。
これによって、揮散物と水とが効率良く除去される。な
お、図３上符号８８は、ケーシング７０の下部開口部７
０Ａを開放するバルブである。このバルブ８８で前記開
口部７０Ａを開放すると、ケーシング７０に溜められ
た、即ちコンデンサー４６で除去された揮散物と水との
混合液９０がドレンパン９２に排出される。On the other hand, in the space 68 of the casing 70,
A shielding plate 80 is provided vertically. The space 68 is partitioned by the shielding plate 80 into a left chamber 84 and a right chamber 86 via a lower space 82 of the shielding plate 80. When such a shielding plate 80 is provided, the high-temperature gas introduced from the introduction pipe 72 flows in the left chamber 84 as a downward flow, and then flows from the lower space 82 to the right chamber 86, and flows upward in the right chamber 86. After that, it is discharged from the exhaust pipe 74 to the downstream side. Therefore, when the shielding plate 80 is provided, the flow path length of the high-temperature gas can be increased in the limited space 68, so that heat exchange with the high-temperature gas can be performed efficiently.
Thereby, volatile matter and water are efficiently removed. The upper reference numeral 88 in FIG.
This is a valve that opens 0A. When the opening 70A is opened by the valve 88, the mixed liquid 90 of the volatile matter and water stored in the casing 70, that is, removed by the condenser 46, is discharged to the drain pan 92.
【００２１】図１に示す薬剤散布装置５０は、コンデン
サー４６を通過した気体中の酸性物質を除去する装置で
ある。前記薬剤散布装置５０は、苛性ソーダ、ソーダ
灰、軽灰等の中和物質を散布するノズルを有しており、
このノズルから中和物質を散布することによって、前記
気体中に含有する硫酸等の酸性物質が除去される。この
ような薬剤散布装置５０を設けると、薬剤散布装置５０
から下流側の配管３４や真空ポンプ４４等を酸性物質か
ら保護することができる。The chemical spraying device 50 shown in FIG. 1 is a device for removing acidic substances in the gas that has passed through the condenser 46. The chemical spraying device 50 has a nozzle for spraying a neutralizing substance such as caustic soda, soda ash, and light ash,
By spraying a neutralizing substance from this nozzle, acidic substances such as sulfuric acid contained in the gas are removed. When such a medicine spraying device 50 is provided, the medicine spraying device 50
The piping 34 and the vacuum pump 44 on the downstream side can be protected from acidic substances.
【００２２】前記薬剤散布装置５０から排出された気体
は、即ち、酸性物質が除去された気体は、集塵機５２に
導入される。この集塵機５２によって前記気体中に含有
するカーボン粉（有害物質）等の固体物質が粗取りされ
る。そして、集塵機５２から排出された気体は、即ち、
カーボン粉等の微粒子が残存する気体は、フイルタ５４
を通過することにより、その微粒子が最終的に除去され
る。これによって、減圧脱泡槽１２から排気された高温
気体が完全に浄化される。そして、浄化された気体は、
レシーバータンク５６、及び遮断弁５８を介して真空ポ
ンプ４４から大気に放出される。The gas discharged from the medicine spraying device 50, that is, the gas from which the acidic substance has been removed, is introduced into the dust collector 52. The dust collector 52 roughly removes a solid substance such as carbon powder (hazardous substance) contained in the gas. And the gas discharged from the dust collector 52 is
The gas in which the fine particles such as carbon powder remain is filtered by the filter 54.
, The fine particles are finally removed. Thereby, the high-temperature gas exhausted from the vacuum degassing tank 12 is completely purified. And the purified gas is
The air is discharged from the vacuum pump 44 to the atmosphere via the receiver tank 56 and the shutoff valve 58.
【００２３】前記レシーバータンク５６は、真空ポンプ
４４の運転時において略真空状態に維持され、真空バッ
ファタンクとして使用されている。このようなレシーバ
ータンク５６を設けると、真空ポンプ４４が故障等の原
因で緊急停止した場合に便利である。即ち、レシーバー
タンク５６が真空ポンプ４４と同様のリーク空気吸引機
能を発揮し、減圧脱泡槽１２を減圧させることができる
からである。この時、前記遮断弁５８は閉じられ、レシ
ーバータンク５６と大気とが遮断される。そして、レシ
ーバータンク５６の機能中に、前記真空ポンプ４４を修
理すればよい。これによって、真空ポンプ４４が緊急停
止した場合でも、減圧装置３４を継続して運転すること
ができる。なお、遮断弁５８は電磁弁であり、真空ポン
プ４４が緊急停止した時に閉じるように制御されてい
る。The receiver tank 56 is maintained in a substantially vacuum state when the vacuum pump 44 is operated, and is used as a vacuum buffer tank. Providing such a receiver tank 56 is convenient when the vacuum pump 44 is emergency stopped due to a failure or the like. That is, the receiver tank 56 exhibits the same leak air suction function as the vacuum pump 44, and can reduce the pressure in the vacuum degassing tank 12. At this time, the shut-off valve 58 is closed to shut off the receiver tank 56 from the atmosphere. Then, the vacuum pump 44 may be repaired while the receiver tank 56 is functioning. Thus, even when the vacuum pump 44 is stopped in an emergency, the pressure reducing device 34 can be continuously operated. The shutoff valve 58 is an electromagnetic valve, and is controlled so as to close when the vacuum pump 44 is stopped in an emergency.
【００２４】一方、前記リーク弁４８は電動弁であり、
制御装置６６によってその開度が制御されている。制御
装置６６によってリーク弁４８が開放されると、外気が
吸込フイルタ６４から吸引され、そして遮断弁６２、及
びリーク弁４８を介して配管３４Ａに外気が導入され
る。この外気の導入量を決定するリーク弁４８の開度
と、前記真空ポンプ４４の回転数とが制御装置６６によ
って制御されている。これにより、減圧脱泡槽１２の減
圧度が一定に保持されている。なお、遮断弁６２は電磁
弁であり、遮断弁５８と同様に真空ポンプ４４が緊急停
止した場合に閉じられるように制御されている。On the other hand, the leak valve 48 is an electric valve,
The opening is controlled by the control device 66. When the leak valve 48 is opened by the control device 66, the outside air is sucked from the suction filter 64, and the outside air is introduced into the pipe 34 </ b> A via the shutoff valve 62 and the leak valve 48. The opening of the leak valve 48 for determining the amount of outside air introduced and the number of revolutions of the vacuum pump 44 are controlled by a control device 66. As a result, the degree of pressure reduction in the vacuum degassing tank 12 is kept constant. The shutoff valve 62 is an electromagnetic valve, and is controlled so as to be closed when the vacuum pump 44 is stopped in an emergency, like the shutoff valve 58.
【００２５】このように構成された本実施の形態の減圧
脱泡システム１０によれば、減圧脱泡システム１０にコ
ンデンサー４６を設け、このコンデンサー４６によっ
て、減圧脱泡槽１２から発生した高温気体中の揮散物を
除去したので、揮散物が配管３４、３８に詰まることは
ない。これにより、本発明によれば、減圧脱泡システム
１０及び減圧脱泡槽１２を安定して運転することができ
る。According to the vacuum degassing system 10 of the present embodiment configured as described above, the condenser 46 is provided in the vacuum degassing system 10, and the condenser 46 is used to remove the high-temperature gas generated from the vacuum degassing tank 12. The volatile matter is not clogged in the pipes 34 and 38. Thus, according to the present invention, the vacuum degassing system 10 and the vacuum degassing tank 12 can be operated stably.
【００２６】また、前記減圧脱泡システム１０によれ
ば、コンデンサー４６と真空ポンプ４４との間に位置す
る配管３４に集塵機５２を設け、この集塵機５２によっ
て、コンデンサー４６から排出された気体中の有害物質
を除去したので、減圧脱泡槽１２から発生した高温気体
を浄化することができる。また、集塵機５２から下流側
の装置（フイルタ５４、レシーバータンク５６、遮断弁
５８、及び真空ポンプ４４）を前記有害物質から保護す
る。Further, according to the vacuum degassing system 10, a dust collector 52 is provided in the pipe 34 located between the condenser 46 and the vacuum pump 44, and the dust collector 52 causes the harmful gas contained in the gas discharged from the condenser 46 to be removed. Since the substance has been removed, the high-temperature gas generated from the vacuum degassing tank 12 can be purified. In addition, devices downstream of the dust collector 52 (the filter 54, the receiver tank 56, the shut-off valve 58, and the vacuum pump 44) are protected from the harmful substances.
【００２７】[0027]
【発明の効果】以上述べたように本発明に係る減圧脱泡
システムによれば、減圧装置の配管に除去手段を設け、
この除去手段によって、減圧脱泡槽から発生した高温気
体中の揮散物を除去したので、減圧装置及び減圧脱泡槽
を安定して運転することができる。As described above, according to the vacuum degassing system according to the present invention, a removing means is provided in the pipe of the pressure reducing device,
Since the volatiles in the high-temperature gas generated from the vacuum degassing tank are removed by this removing means, the pressure reducing device and the vacuum degassing tank can be operated stably.
【００２８】また、本発明によれば、除去手段と減圧手
段との間に位置する配管に集塵手段を設け、この集塵手
段によって、除去手段から排出された気体中の塵を除去
したので、減圧脱泡槽から発生した高温気体を浄化する
ことができる。Further, according to the present invention, the dust collecting means is provided in the pipe located between the removing means and the pressure reducing means, and the dust in the gas discharged from the removing means is removed by the dust collecting means. In addition, high temperature gas generated from the vacuum degassing tank can be purified.
【図１】本発明の実施の形態に係る減圧脱泡システムの
全体構成図FIG. 1 is an overall configuration diagram of a vacuum degassing system according to an embodiment of the present invention.
【図２】サイフォン式の減圧脱泡槽が適用された減圧脱
泡システムの断面図FIG. 2 is a sectional view of a vacuum degassing system to which a siphon type vacuum degassing tank is applied.
【図３】図１に示したコンデンサーの要部断面図FIG. 3 is a sectional view of a main part of the condenser shown in FIG. 1;
１０…減圧装置 １２…減圧脱泡槽 ４４…真空ポンプ ４６…コンデンサー ４８…リーク弁 ５０…薬剤散布装置 ５２…集塵機 ５６…レシーバータンク ５８、６２…遮断弁 ７１…チューブ ８０…遮蔽板 DESCRIPTION OF SYMBOLS 10 ... Decompression device 12 ... Decompression degassing tank 44 ... Vacuum pump 46 ... Condenser 48 ... Leak valve 50 ... Chemical spraying device 52 ... Dust collector 56 ... Receiver tank 58, 62 ... Shut-off valve 71 ... Tube 80 ... Shielding plate
───────────────────────────────────────────────────── フロントページの続き (72)発明者 竹居 祐輔 神奈川県横浜市鶴見区末広町１丁目１番地 旭硝子株式会社内 (72)発明者 内野 晃成 千葉県船橋市北本町１丁目10番１号 旭硝 子株式会社内 ──────────────────────────────────────────────────続 き Continued on the front page (72) Inventor Yusuke Takei 1-1-1 Suehirocho, Tsurumi-ku, Yokohama-shi, Kanagawa Prefecture Inside Asahi Glass Co., Ltd. Asahi Glass Co., Ltd.
Claims (3)
動されることにより減圧脱泡槽内の高温気体を前記配管
を介して吸引し、減圧脱泡槽を減圧させる減圧手段と、 前記配管に設けられ、前記減圧手段で吸引された前記減
圧脱泡槽内の高温気体中の揮散物を除去する除去手段
と、 を備えたことを特徴とする減圧脱泡システム。1. A vacuum degassing tank for defoaming a high-temperature melt, connected to the vacuum degassing tank via a pipe, and driven to drive high-temperature gas in the vacuum degassing tank through the pipe. A decompression means for sucking through and decompressing the vacuum degassing tank; and a removing means provided on the pipe and removing volatile matter in the high-temperature gas in the vacuum degassing tank sucked by the pressure reducing means. A vacuum degassing system characterized by comprising:
置する前記配管に集塵手段を設け、該集塵手段によっ
て、前記除去手段から排出された気体中の塵を除去する
ことを特徴とする請求項１記載の減圧脱泡システム。2. A dust collecting means is provided in the pipe located between the removing means and the pressure reducing means, and the dust in the gas discharged from the removing means is removed by the dust collecting means. The vacuum degassing system according to claim 1, wherein
物を露点以下に冷却して除去する冷却手段であることを
特徴とする請求項１記載の減圧脱泡システム。3. The reduced-pressure defoaming system according to claim 1, wherein said removing means is a cooling means for cooling and removing volatile matter in said high-temperature gas below a dew point.
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26829098A JP3890768B2 (en) | 1998-09-22 | 1998-09-22 | Pressure reducing device for vacuum degassing system |
| US09/396,360 US6294005B1 (en) | 1998-09-22 | 1999-09-15 | Vacuum gas releasing system |
| EP99118015A EP0989099B1 (en) | 1998-09-22 | 1999-09-21 | Apparatus for refining high temperature molten materials under reduced pressure |
| DE69917551T DE69917551T2 (en) | 1998-09-22 | 1999-09-21 | The vacuum degassing |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP26829098A JP3890768B2 (en) | 1998-09-22 | 1998-09-22 | Pressure reducing device for vacuum degassing system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2000095527A true JP2000095527A (en) | 2000-04-04 |
| JP3890768B2 JP3890768B2 (en) | 2007-03-07 |
Family
ID=17456485
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP26829098A Expired - Fee Related JP3890768B2 (en) | 1998-09-22 | 1998-09-22 | Pressure reducing device for vacuum degassing system |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3890768B2 (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005119958A (en) * | 2003-10-13 | 2005-05-12 | Schott Ag | Glass molten body refining apparatus |
| JP2008183765A (en) * | 2007-01-29 | 2008-08-14 | Meiki Co Ltd | Molding die for disc substrate, molding method of disc substrate and disc substrate |
| CN101959808B (en) * | 2008-02-27 | 2013-08-07 | 旭硝子株式会社 | Vacuum defoaming equipment and vacuum defoaming method of molten glass |
| JP2016069262A (en) * | 2014-10-01 | 2016-05-09 | ＡｖａｎＳｔｒａｔｅ株式会社 | Manufacturing method for glass substrate and manufacturing apparatus for glass substrate |
-
1998
- 1998-09-22 JP JP26829098A patent/JP3890768B2/en not_active Expired - Fee Related
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2005119958A (en) * | 2003-10-13 | 2005-05-12 | Schott Ag | Glass molten body refining apparatus |
| JP2008183765A (en) * | 2007-01-29 | 2008-08-14 | Meiki Co Ltd | Molding die for disc substrate, molding method of disc substrate and disc substrate |
| CN101959808B (en) * | 2008-02-27 | 2013-08-07 | 旭硝子株式会社 | Vacuum defoaming equipment and vacuum defoaming method of molten glass |
| JP2016069262A (en) * | 2014-10-01 | 2016-05-09 | ＡｖａｎＳｔｒａｔｅ株式会社 | Manufacturing method for glass substrate and manufacturing apparatus for glass substrate |
Also Published As
| Publication number | Publication date |
|---|---|
| JP3890768B2 (en) | 2007-03-07 |
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