JP2000088531A - Apparatus and method for measuring thickness of thin film - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a film-thickness measuring apparatus for thin films and its method for measuring and controlling the thickness of a film formed on a board by real time. SOLUTION: This is a film-thickness measuring apparatus 10 for thin films to be used in an apparatus which arranges a board on a rotary drum 8 and forms a thin film on the board, and it is provided with a sheet of measuring glass arranged on the board, a shaft 2 for the rotary drum 8 being a hollow shaft, total reflection mirrors 3, 4 arranged inside the shaft 2 and on an axial extension of this shaft 2 respectively, a light source 5 which irradiates the total reflection mirror 4 arranged on the extension of the shaft through a half mirror 6, and a photodetector 7 which receives light from the total reflection mirror 4 arranged on the extension line of the shaft through the half mirror 6.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a thin film thickness measuring apparatus, and more particularly to a thin film thickness measuring apparatus used for a rotary drum type film forming apparatus.

[0002]

2. Description of the Related Art It is generally known that arbitrary optical characteristics can be designed by combining several types of derivative thin films. The design of an optical multilayer film basically consists of the number of multilayer film layers, the refractive index of each layer, the thickness of each layer, and a combination of these.The desired spectral characteristics are designed, and optimization is performed based on this. ing.

In general, the refractive index of each layer is often determined from characteristics inherent to each derivative material, and efforts are made to stabilize the conditions during film formation in order to obtain a stable refractive index. When controlling the derivative multilayer thin film, it can be said that the thickness of each layer is controlled. Therefore, when forming the designed dielectric multilayer thin film, the optical film thickness (n
Precise control of d) is important in producing an arbitrary spectral characteristic.

[0004] In general, the conventional method of heating a derivative multilayer thin film by resistance heating or vacuum evaporation using an electron gun evaporation source has been mainly used. For example, in the technique shown in FIG. 9, a measurement glass 110, a revolving dome or a revolving dome 120, and an evaporation source 130 are formed in a vacuum evaporation apparatus 100. And the revolving dome and the revolving dome 12
The measurement glass 110 is arranged at the center of the substrate dome on which the substrate is mounted, and the final film thickness on the substrate is detected from the relationship between the optical film ratio of the measurement glass 110 and the substrate which has been checked in advance. Adopt a way to. This technology is used in many production devices because of its good reproducibility.

Also, an optical thin film sputtering apparatus 150
Also, as shown in FIG. 10, a method for measuring the final film thickness similar to the above-mentioned vapor deposition method was partially adopted. Reference numeral 140
Is a sputtering target.

[0006] However, the sputtering apparatus using the substrate dome has disadvantages that it is difficult to increase the size, the film thickness distribution is poor, and it is difficult to obtain a mass production effect. For this purpose, a rotary drum type sputtering apparatus 160 as shown in FIG. 11 has been used.

Rotary drum type sputtering apparatus 1
Reference numeral 60 denotes a rotary drum 170 and a sputtering 180 disposed in the apparatus. In this apparatus, when forming a dielectric multilayer thin film by sputtering, generally, compared to evaporation,
Because of the high stability of the film forming speed (d / s) and the refractive index (n), the method of controlling the final film thickness by time has been mainly used.

In the case of a simple film structure having a single layer or several layers, a method for controlling the final film thickness by time is sufficient. However, when a high-precision dielectric multilayer thin film having several tens of layers is formed, it is necessary to control the error of each layer more precisely. At this time, the tolerance of each layer is +/- 0.01% to +/- 0.05% in each layer. Sputtering, due to its characteristics, the erosion shape of the sputtering target, the discharge state and the temporal change in vacuum, the film deposition rate gradually changes, and when this change is completed as a multilayer film, the multilayer There is a problem that the error of the thin film exceeds the allowable range.

For this reason, there is a need for a technique for measuring and controlling the film thickness formed on a substrate in real time even in a rotary drum type sputtering apparatus. Therefore, although not known at the time of filing the present invention, the present inventors have paid attention to the fact that the center axis of the rotary drum type sputtering apparatus does not move similarly to the revolving dome when considering a rotary drum type sputtering apparatus. By utilizing this, a technique of measuring with a transmission measurement optical system is considered.

As an apparatus for measuring by a transmission measuring optical system, as shown in FIG.
0, a light source lamp 190, a light receiver 200, a rotating drum 170, and a device 210 having a transmitted light receiver (not shown) as main components.

[0011]

However, the problem of the transmission measurement optical system 210 is that, as shown in FIG.
The rotating drum 170 holds the glass 1 for measurement during sputtering.
10 rotates, the time for measuring the glass for measurement 110 is very short. / N ratio is bad. In addition, since the glass for measurement 10 is rotated at the time of measurement, the angle of light incident on the glass for measurement 110 is changed at any time, and there is a disadvantage that optically accurate measurement cannot be performed.

[0012] Even in the technique using reflection photometry as shown in Fig. 14, the above-mentioned problem remains similarly. In the case of reflection photometry, in addition to the above-mentioned disadvantages, there is also a disadvantage that the shake and vibration of the rotating drum 170 greatly affect the measurement.

FIG. 13 is a top view of thin film measurement in the transmission optical system, and FIG. 14 is a top view of thin film measurement in the reflective optical system. Reference numeral 110 in FIGS.
Is a glass for measurement 1, reference numeral 170 is a rotating drum, reference numeral 19
Reference numeral 0 denotes a light source, and reference numeral 120 denotes a light receiver.

SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned disadvantages, and an object of the present invention is to provide a thin film thickness measuring apparatus and method for measuring and controlling the thickness of a film formed on a substrate in real time. .

[0015]

According to the first aspect of the present invention, there is provided an apparatus for measuring the thickness of a thin film in an apparatus for arranging a substrate on a rotating drum and forming a thin film on the substrate. Glass for measurement arranged on a substrate, a rotating shaft of the rotating drum as a hollow shaft, and total reflection mirrors respectively arranged in the rotating shaft and on an axis extension of the rotating shaft,
A light source that irradiates the total reflection mirror disposed on the rotation axis extension via a half mirror, and a light receiver that receives light from the total reflection mirror disposed on the rotation axis extension via the half mirror , Is solved.

According to a second aspect of the present invention, there is provided an apparatus for measuring the thickness of a thin film in an apparatus for forming a thin film on a substrate by arranging the substrate on a rotating drum. A measuring glass, a rotating shaft of the rotating drum having a hollow shaft, an optical fiber connected to a light source and introduced into the rotating shaft, and a reflection obtained by irradiating the measuring glass with the light source light from the optical fiber and reflecting the light. An optical fiber that receives the photometry and guides the photometry from the rotation axis to the photodetector is provided.

At this time, it is more preferable that the end of the optical fiber connected to the light source and introduced into the rotary shaft is arranged up to a position immediately before the glass for measurement.

According to a fourth aspect of the present invention, there is provided a method for measuring the thickness of a thin film in an apparatus for forming a thin film on a substrate by arranging the substrate on a rotary drum. Glass is disposed, the rotating shaft of the rotating drum is hollow, and measurement light from a light source is irradiated on the measuring glass disposed on the substrate via the hollow rotating shaft, and reflected light is transmitted through the hollow rotating shaft. The problem is solved by receiving light with a light receiver.

According to a fifth aspect of the present invention, there is provided a method for measuring the thickness of a thin film in an apparatus for forming a thin film on a substrate by disposing the substrate on a rotating drum. Glass, the rotating shaft of the rotating drum is hollow, an optical fiber connected to a light source is introduced into the rotating shaft, the light source light is irradiated on the measuring glass via the optical fiber, and the reflected light is reflected. The problem is solved by a configuration in which photometry is guided to a light receiver by an optical fiber.

According to a sixth aspect of the present invention, there is provided a method for measuring the thickness of a thin film in an apparatus for arranging a substrate on a rotating drum and forming the thin film on the substrate.
A glass for measurement is arranged on the substrate, the rotating shaft of the rotary drum is hollow, an optical fiber connected to a light source is introduced into the rotating shaft, and the end of the optical fiber is further positioned at a position immediately before the glass for measurement. This is solved by arranging the light source light on the glass for measurement via the optical fiber and guiding the reflected photometry to the light receiver by the optical fiber.

[0021]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The characteristic gist of the present invention is that the rotary shaft of a rotary drum is hollow and this rotary shaft is used, and that the rotary shaft does not move. That is, the present invention is a thin film thickness measuring apparatus in an apparatus for forming a thin film on a substrate by disposing the substrate on a rotating drum.

A measuring glass arranged on a substrate, a rotating shaft of the rotating drum having a hollow shaft, a total reflection mirror arranged in the rotating shaft and on an axis extension of the rotating shaft, and a half mirror A light source that irradiates the total reflection mirror disposed on the rotation axis extension via a light source that receives light from the total reflection mirror disposed on the rotation axis extension via a half mirror, A configuration is provided.

Since the glass for measurement also rotates at the same position with the rotation of the rotating shaft, the predetermined position of the rotating shaft and the position of the measuring glass are always constant. Therefore, if light is irradiated from a predetermined position on the rotation axis, it is possible to always obtain a constant reflected light. For this reason, the irradiation light from the light source is guided to the total reflection mirror in the hollow rotation axis by the total reflection mirror disposed on the axis extension of the rotation axis via the half mirror, and reflected by this total reflection mirror for measurement. Irradiate the glass for use. Next, the reflected light reflected by the glass for measurement is reflected by a total reflection mirror in the rotation axis, further reflected by a total reflection mirror disposed on the axis extension of the rotation axis, and received through a half mirror. And measure it with a light receiver. This makes it possible to measure the thickness of the thin film formed on the substrate in real time and measure the thickness of the thin film to be controlled.

According to another aspect of the present invention, an optical fiber is connected to a light source, enters an optical axis in the axis of rotation, irradiates the glass for measurement with light from the fiber, and the optical fiber transmits the light from the glass for measurement. When it is configured to receive the reflected photometry and guide it from the rotation axis to the photodetector, it is possible to irradiate the measurement glass to a predetermined position. Can be derived. Further, it is not necessary to consider the influence in the hollow rotary shaft.

At this time, if the end of the optical fiber connected to the light source and introduced into the rotation axis is arranged to the position immediately before the glass for measurement, more accurate measurement of the reflected light is possible. In addition to the above, it is possible to obtain reflected light from a predetermined portion of the glass for measurement.

Other advantages of the present invention will become more apparent in the claims of the present invention, the description of the embodiments described below, and the like.

[0027]

Embodiments of the present invention will be described below with reference to the drawings. The members, arrangements, and the like described below do not limit the present invention, and can be variously modified within the scope of the present invention.

1 and 2 show an embodiment of the present invention. FIG. 1 is a schematic explanatory view of a thin film forming apparatus using a rotating drum, and FIG. 2 is a schematic view illustrating a thin film thickness measuring apparatus. It is a block diagram. FIG. 7 is an explanatory view of the reflection of the glass on which the optical film is deposited, and FIG. 8 is a graph showing the change in the reflectance with respect to the optical thickness of the derivative single-layer thin film.

The apparatus for measuring the thickness of a thin film in this embodiment is shown in FIG.
As shown in FIG. 1, the present invention is used in a thin film forming apparatus 10 in which a substrate is arranged on a rotating drum 8 and a thin film is formed on the substrate. In FIG. 1, reference numeral 9 denotes a sputter, and reference numeral 11 denotes a vacuum chamber.

The film thickness measuring apparatus of the present embodiment uses a measuring glass 1
, A rotating shaft 2, total reflection mirrors 3, 4, a light source 5, a half mirror 6, and a light receiver 7 as main components.

The measuring glass 1 of this embodiment is arranged on a substrate held by a substrate holder (not shown) held by a rotating drum 8 described later.

The rotating shaft 2 of the present embodiment is a central shaft for rotating the rotating drum 8 in the thin film forming apparatus 10.
Is supported by a bearing (not shown). The rotating shaft 2 of this example is a hollow shaft. The rotation of the rotating shaft 2 is performed by a known means. As the known means, for example, it is possible to directly connect to the output shaft of the motor whose rotation can be controlled, or to connect to the output shaft of the motor via a reduction gear such as a gear or a belt, or to use various means. is there.

The total reflection mirrors 3 and 4 of this embodiment are respectively disposed at predetermined positions in the rotating shaft 2 and opposed to each other on an axial extension of the rotating shaft 2. That is, as shown in FIG. 2, the total reflection mirror 3 disposed in the rotation axis 2 is disposed at a position where the irradiation light and the reflected light impinge on the measuring glass 1.

In this embodiment, the center of the rotation axis 2 is arranged at an angle of 45 degrees, and the center of the measuring glass 1 and the center position of the total reflection mirror 3 coincide with each other. Further, the total reflection mirror 4 disposed on the axis extension of the rotation shaft 2 faces the total reflection mirror 3 disposed in the rotation shaft 2 and is disposed so that its angle is 90 degrees. In this example, they are arranged at an angle of 45 degrees (90 degrees for both sides) on the extension of the rotating shaft 2.

The half mirror 6 of this embodiment is arranged so as to face the total reflection mirror 4 arranged on the axis extension of the rotating shaft 2 in the horizontal direction. The light source 5 is disposed behind the half mirror 6 (in other words, the half mirror 6 is disposed in front of the light source 5). The light source 5 of the present example includes a power supply (not shown) and a projector connected to the power supply.

The light receiver 7 of this embodiment receives the measurement light from the total reflection mirror 3 in the rotation axis 2 and the total reflection mirror 4 arranged on the extension of the rotation axis 2 via the half mirror 6,
The film thickness is measured by a change in the amount of the received measurement light. It is to be noted that a known light receiver 7 can be used, for example, a fixed filter holder, a filter changer, or the like is arranged on the front surface of the light receiver 7.

Then, as described above, the light source 5 irradiates the total reflection mirror 4 disposed on the extension of the rotation axis 2 via the half mirror 6, and the measurement light reflected by the total reflection mirror 4 rotates. The glass for measurement 1 is irradiated by the total reflection mirror 3 disposed in the axis 2, and the light reflected by the glass for measurement 1 is further reflected by the total reflection mirror 3 and positioned on the extension of the rotation axis 2. To the total reflection mirror 4. The measurement light guided to the total reflection mirror 4 is reflected by the half mirror 6 and introduced to the light receiver 7.

Next, the principle of measurement will be described.
As shown in FIG. 8 and FIG. 8, when a transparent substance is deposited on glass or the like, light reflected on the surface of the optical film and light reflected on the boundary between the glass and the optical film cause interference, resulting in an overall energy reflectance (hereinafter referred to as an energy reflectance). “Reflectance” changes depending on the optical film thickness (hereinafter, referred to as “film thickness”). When such an optical film is formed on a transparent substrate having a refractive index of ns, the reflectance can be represented by a predetermined formula (the refractive index of the medium is 1). Since the reflectance shows a peak where the film thickness nd becomes an integral multiple of λ / 4, the film thickness is measured using such a change in the amount of light.

That is, the reflectance of the glass for measurement 1 is guided to the light receiver 7 by the total reflection mirrors 3 and 4 (further, the half mirror 6), and the peak where the film thickness nd becomes an integral multiple of λ / 4 is obtained. The film thickness is measured using the change in the light amount and the change in the light amount.

The positional relationship between the total reflection mirror and the half mirror in the above embodiment is not limited to the above-described positional relationship. Irradiation light from the light source is irradiated from the half mirror to the total reflection mirror, and the measuring glass is used. The positional relationship is not particularly limited as long as the reflected light from the mirror can be reflected by the total reflection mirror and the reflected light can be introduced into the light receiver 7 by the half mirror.

The above embodiment shows an example in which the light source and the photodetector 7 are separated by the half mirror 6, and the total reflection mirrors 3 and 4 are provided one each in the rotary shaft 2 and on the extension of the rotary shaft 2. In this example, two total reflection mirrors 4 are disposed on the extension of the rotation axis 2, and the total reflection mirror for reflecting the light emitted from the light source 5 and the reflection from the measurement glass 1 are provided. A total reflection mirror that reflects the measured light toward the half mirror 6 may be provided separately.

Also, as for the total reflection mirror 3 in the rotation shaft 2, similarly to the total reflection mirror 4 arranged on the extension of the rotation shaft 2, the irradiation light side and the measurement light side may be separately provided. it can.

FIG. 3 shows another example of the present invention.
1 is a schematic configuration diagram illustrating a thin film thickness measuring device. 4 is a schematic structural explanatory view showing an atmosphere side optical fiber and a vacuum side fiber, FIG. 5 is a schematic structural explanatory view showing another atmosphere side optical fiber and a vacuum side fiber, and FIG. 6 is a partially enlarged view of FIG. In the above embodiment, an example using a total reflection mirror is shown, but in this example, an example using an optical fiber is shown. The same members as those in the embodiment shown in FIGS. 1 and 2 are denoted by the same reference numerals, and description thereof will be omitted.

In this embodiment, an optical fiber 20 connected to the light source 5 and introduced into the rotary shaft 2 is provided.
Irradiates the measuring glass 1 with light source light from the
It is configured to receive the reflection photometry (measurement light) reflected by the optical fiber 20 and guide it from the hollow rotary shaft 2 to the light receiver 7 by the optical fiber 20. In this example, the optical fibers will be described as being divided into an atmosphere-side optical fiber 21 and a vacuum-side fiber 22.

The relationship between the atmosphere side optical fiber 21 and the vacuum side fiber 22 is configured as shown in FIG. That is, the atmosphere-side optical fiber 21 and the vacuum-side fiber 22 are mechanically separated from each other, but the vacuum-side optical fiber 22 rotates together with the rotating drum. Rotating drum 8
A rotary shaft 2 is formed at the center of the rotary shaft.
Is rotatably disposed via a vacuum seal 23 in a vacuum chamber 11 constituting the thin film forming apparatus 10.

The upper end side of the vacuum side fiber 22 is located at the center position of the rotating shaft 2, and the fiber fixing jig 24,
24. At the end of the vacuum-side fiber 22, a window glass 25 that separates the atmosphere from the vacuum is disposed, whereby the vacuum in the vacuum chamber 11 is ensured. The window glass 25 of the present example is arranged diagonally to avoid reflection of the window glass 25. Rotating shaft 2 extended from vacuum chamber 11
Is formed with a pulley 26a, and a rotary belt 27 is suspended between the pulley 26b and an output shaft provided on the output shaft of the motor M. As a result, the motor M
Is configured to rotate the rotating shaft 2 via the rotating belt 27 with the output of (1).

On the other hand, the atmosphere-side optical fiber 21 is fixed by a fixing means (not shown) so as to correspond to the center of rotation of the rotating shaft 2. Then, the atmosphere side optical fiber 21
Emits light from the light source (light emitter) 5 and enters reflected light from the monitor substrate 1 from the vacuum-side fiber 22. The atmosphere-side optical fiber 21 and the vacuum-side fiber 22 are mechanically separated but optically coupled. That is,
An optical fiber has NA (optical fiber emits and enters light at a spread angle).

When the atmosphere-side optical fiber 21 and the vacuum-side fiber 22 are separated from each other, by disposing a collimator lens (not shown) between them, light loss is reduced.

FIG. 5 is a schematic structural explanatory view showing another atmospheric-side optical fiber and vacuum-side fiber, and FIG. 6 is a partially enlarged view of FIG. 5, in which the same members and arrangements as those in FIG. The description is omitted.

This embodiment shows an example in which the end of the vacuum side optical fiber 22 is evacuated. In this example, an example is shown in which the ends of the vacuum-side optical fibers are vacuum-sealed and can be connected by a connector. This makes it possible to reduce the size of the device at the vacuum seal portion, and facilitate replacement even if there is a problem with the vacuum-side optical fiber arranged in the vacuum chamber 11.

That is, the vacuum seal 30 of this embodiment is different from that of FIG.
As shown in the figure, an optical rod holder 32 having an optical rod 31 is used. The optical rod holder 32 of this example is made of stainless steel (SUS303
And a hollow cylindrical body. Then, it passes through an optical rod mounting hole 34 provided in the flange 33 at the end, and is fixed to the flange 33 by a hexagon nut 35 and a contact portion 37 described below inside the vacuum chamber 11. The optical rod holder 32 is provided with an O-ring 36 at a contact portion 37 formed of a surface where the optical rod holder 32 and the flange 33 are in contact. By providing the O-ring 36, it is possible to prevent air from flowing into the vacuum chamber 11 more reliably than in a conventional device that seals an optical fiber with an adhesive and maintains a vacuum. The optical rod holder 32 is detachably fixed inside the vacuum chamber 11 by a flat knurl and a lock nut.

The flange 33 in this embodiment is provided with an optical rod mounting hole 34 for mounting the optical rod 31. Optical rod holder 3
A connector 39 is provided at the end of the second vacuum chamber 11. The connector 39 is formed of a hollow cylindrical body.

The connector 39 has three setscrews 3 at positions that divide the circumference of a circle which is a cross section of the connector 39 into three equal parts.
9a is provided. The connector 39 is fixed to the optical rod holder 32 by three set screws 39a. A flat knurl (not shown) and a lock nut are screwed into the connector 39. In this flat knurl,
A flat knurled side engaging portion is formed, and the flat knurled side engaging portion is engaged with a fiber side locking portion formed at an end of the optical fiber. With this configuration, the optical rod holder 32 and the vacuum-side fiber 22 are connected.

The optical rod 31 is housed inside the optical rod holder 32. The optical rod 31 of this example has a core / cladding diameter of 1.6 /
Two types of 1.8 mm rod-shaped glass and 5 / 5.5 mm rod-shaped glass are used. Optical rod 31 of this example
, The NA value of the core 31a and the cladding 31b is.
Use two or more. The NA value of the core 31a and the clad 31b is selected so that the light transmitted by the core 5a is totally reflected at the boundary between the core 31a and the clad 31b. At this time, at least the NA value of the clad 31b is selected to be larger than the NA value of the core 31a.
The optical rod 31 and the optical rod holder 32 are adhesives (Super back seal made by Nidec Anelva)
It is adhered by.

As described above, the optical fiber 20 may be a bundle of a plurality of irradiation fibers and a plurality of reflection fibers, or may be separate members. In the case where the one for irradiation and the one for reflection are separated, they are connected to an optical fiber outside the rotating shaft 2 by joints which can be rotated respectively.

By arranging the end of the optical fiber 20 on the measuring glass 1 side to a position close to the measuring glass 1, more accurate measurement of the reflected light becomes possible.
For this reason, it is possible to make a system that is easier to adjust and more resistant to vibration than an optical system using a mirror by using an optical fiber that is handled.

[0057]

According to the present invention, it is always possible to measure the glass for measurement even though the rotating drum is rotating,
S. / N ratio can be sufficiently ensured. Further, there is no change in the angle of light incident on the measuring glass at the time of measurement, and optically accurate measurement is possible.

Even in the case of reflection photometry, it is possible to reduce the influence of vibration and vibration of the rotating drum on the measurement. According to the present invention, it is possible to measure the film thickness formed on the substrate in real time and measure the film thickness of the thin film to be controlled.

[Brief description of the drawings]

FIG. 1 is a schematic explanatory view of a thin film forming apparatus using a rotating drum according to the present invention.

FIG. 2 is a schematic configuration diagram illustrating a thin film thickness measuring apparatus according to an embodiment of the present invention.

FIG. 3 is a schematic configuration diagram illustrating a thin film thickness measuring apparatus according to another embodiment of the present invention.

FIG. 4 is a schematic structural explanatory view showing an atmosphere side optical fiber and a vacuum side fiber.

FIG. 5 is a schematic configuration explanatory view showing another atmospheric side optical fiber and a vacuum side fiber.

FIG. 6 is a partially enlarged view of FIG. 5;

FIG. 7 is an explanatory diagram of reflection of glass on which an optical film is deposited.

FIG. 8 is a graph showing a change in reflectance with respect to an optical thickness of a derivative single-layer thin film.

FIG. 9 is an explanatory diagram of measurement of a thin film in a vacuum evaporation apparatus.

FIG. 10 is an explanatory diagram of a measurement of a thin film in a sputtering apparatus.

FIG. 11 is an explanatory view of a conventional rotary drum type sputtering apparatus.

FIG. 12 is an explanatory diagram of measurement of a thin film in a conventional rotary drum type sputtering apparatus.

FIG. 13 is a top view of a thin film measurement in the transmission measurement optical system.

FIG. 14 is a top view of a thin film measurement in the reflection optical system.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Measurement glass 2 Rotation axis 3, 4 Total reflection mirror 5 Light source 6 Half mirror 7 Light receiver 8 Rotating drum 9 Sputter 11 Vacuum tank 21 Atmosphere side optical fiber 22 Vacuum side fiber 23 Vacuum seal 24 Fiber fixing jig 25 Window glass 26a Pulley 26b Rotary pulley 27 Rotating belt 30 Vacuum seal 31 Optical rod 31a Core 31b Cladding 32 Optical rod holder 33 Flange 34 Optical rod mounting hole 35 Hex nut 36 O-ring 37 Contact part 39 Connector 39a Set screw M Motor

Claims (6)

[Claims] 1. A thin film thickness measuring device in an apparatus for forming a thin film on a substrate by arranging the substrate on a rotating drum, wherein the measuring glass disposed on the substrate and the rotating shaft having a hollow shaft A rotation axis of the drum, and a total reflection mirror disposed in the rotation axis and on an axis extension of the rotation axis,
A light source that irradiates the total reflection mirror disposed on the rotation axis extension via a half mirror, and a light receiver that receives light from the total reflection mirror disposed on the rotation axis extension via the half mirror And a film thickness measuring device for a thin film. 2. An apparatus for measuring the thickness of a thin film in an apparatus for forming a thin film on a substrate by arranging the substrate on a rotating drum, comprising: a measuring glass disposed on the substrate; A rotating shaft of the drum, an optical fiber connected to the light source and introduced into the rotating shaft, irradiating the glass for measurement with the light source light from the optical fiber, receiving the reflected photometry and guiding the light from the rotating shaft to the light receiver; An apparatus for measuring the thickness of a thin film, comprising: an optical fiber. 3. The film thickness measurement of a thin film according to claim 2, wherein an end of the optical fiber connected to the light source and introduced into the rotating shaft is arranged up to a position immediately before the glass for measurement. apparatus. 4. A method for measuring the thickness of a thin film in an apparatus for forming a thin film on a substrate by arranging the substrate on a rotating drum, wherein a measuring glass is arranged on the substrate, and a rotation axis of the rotating drum is adjusted. Hollow, irradiating measurement light from a light source to the measurement glass disposed on the substrate via the hollow rotation shaft, and receiving reflected light with a light receiver via the hollow rotation shaft. Method for measuring the thickness of a thin film. 5. A method for measuring the thickness of a thin film in an apparatus for forming a thin film on a substrate by disposing the substrate on a rotating drum, comprising: placing a measuring glass on the substrate; Hollow, an optical fiber connected to the light source is introduced into the rotation shaft,
A method for measuring the thickness of a thin film, comprising irradiating the measuring glass with the light from the light source via the optical fiber, and guiding the reflected photometric light to a light receiver via an optical fiber. 6. A method for measuring the thickness of a thin film in an apparatus for forming a thin film on a substrate by disposing the substrate on a rotating drum, comprising: placing a measuring glass on the substrate; Hollow, an optical fiber connected to the light source is introduced into the rotation shaft,
Further, the end of the optical fiber is arranged up to a position immediately before the glass for measurement, the light source light is radiated to the glass for measurement via the optical fiber, and the reflected photometry is guided to the light receiver by the optical fiber. A method for measuring the thickness of a thin film, characterized in that: