JP2000058499A - Processing liquid supplying nozzle and supplying unit - Google Patents

Abstract

PROBLEM TO BE SOLVED: To suppress processing liquid in a processing liquid tank from bubbling or scattering. SOLUTION: A chemical introduction pipe 16 penetrating the side wall of the body 11 of a chemical tank 10 introduces chemical at a position higher than the upper limit UL of the liquid level of chemical. A processing liquid supply nozzle N1 is fixed to the forward end of the chemical introduction pipe 16. The processing liquid supply nozzle N1 has substantially tubular shape and receives chemical from the chemical introduction pipe 16 through an inlet made in one end plate and then damping the chemical flow by bringing it into collision against the other end plate. The chemical standing in the drum part of the processing liquid supply nozzle N1 drops naturally from an outlet 35 made at the lowermost part.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

[0001] The present invention relates to a semiconductor wafer,
Applied to equipment that handles various types of processing liquids, such as processing liquids for processing substrates such as glass substrates for liquid crystal display devices and glass substrates for PDPs (plasma display panels), and supplies the processing liquid into the processing liquid tank. To a processing liquid supply nozzle and a processing liquid supply device.

[0002]

2. Description of the Related Art In a process of processing a substrate such as a semiconductor wafer or a glass substrate for a liquid crystal display device, the substrate is cleaned as required. A substrate cleaning apparatus for cleaning a substrate includes, for example, a chemical cleaning unit that supplies a cleaning chemical to the substrate surface and uses a chemical reaction to remove contaminants on the substrate surface, and a chemical cleaning unit after the chemical processing by the chemical cleaning unit. A rinse unit for washing away the chemical solution remaining on the substrate surface with pure water.

The chemical cleaning unit is supplied with a chemical from a chemical cabinet. The chemical solution cabinet is provided with a chemical solution tank for storing the chemical solution, and the chemical solution tank is replenished with a chemical solution from a separately provided supply unit as needed. The replenishment of the chemical is performed by pumping the chemical from a plastic tank provided in the supply unit via a chemical supply pipe by a supply pump.

[0004] The upper limit and the lower limit of the liquid level of the chemical are defined in the chemical tank, and the liquid level of the chemical can be detected by a sensor at these upper and lower levels. When the liquid level of the chemical drops to the lower limit level, the supply pump is operated to replenish the chemical,
When the liquid level of the chemical reaches the upper limit level, the supply pump is stopped, and the replenishment of the chemical is stopped.

The chemical liquid tank has a tank body composed of a box-like container having an open top, and an upper lid for closing the opening of the tank body. The chemical solution inlet through which the chemical solution from the chemical supply pipe is introduced is located on the side wall of the tank body.
It is formed above the upper limit level. This is because if the liquid inlet is below the liquid level of the liquid, a large amount of foam will be generated when the plastic tank of the supply unit is emptied and air is pumped from the liquid supply pipe. is there. Since a cleaning chemical solution often contains a surfactant, when a small amount of air is introduced into the chemical solution, foaming occurs immediately. Then, a large amount of foam easily reaches the upper lid of the chemical tank, and the highly permeable chemical penetrates the seal portion between the upper lid and the tank main body and seeps out.
As a result, the outer surface of the chemical solution tank and the inside of the chemical solution cabinet are contaminated. Therefore, in this type of device, the chemical solution inlet must be arranged above the upper limit level of the liquid level of the chemical solution.

[0006]

However, in particular, when the liquid level of the chemical is low or when the chemical tank is empty, the chemical introduced into the chemical tank from the chemical inlet and falling is the chemical. Collides vigorously with the liquid surface or the bottom of the chemical liquid tank. As a result, the problem of generating large amounts of bubbles, though to varying degrees, cannot be completely overcome, and contamination on the outer wall surface of the chemical solution tank and in the chemical solution cabinet still occurs.

[0007] Further, since the chemical solution is supplied to the chemical solution tank in a vigorous manner, the chemical solution droplets sometimes reach the upper lid, and this also causes the same problem. Accordingly, an object of the present invention is to solve the above-mentioned technical problem and to provide a processing liquid supply nozzle capable of suppressing bubbling and scattering of a processing liquid in a processing liquid tank.

It is another object of the present invention to provide a processing liquid supply apparatus capable of suppressing bubbling and scattering of a processing liquid in a processing liquid tank.

[0009]

According to the first aspect of the present invention, there is provided a processing liquid supply nozzle attached to a processing liquid introduction pipe for introducing a processing liquid into a processing liquid tank. There is an inlet part for receiving the processing liquid from the processing liquid introduction pipe, and an outlet part formed at the lowermost part for allowing the processing liquid to fall naturally, and the processing liquid introduced from the inlet part is retained. A casing forming a retention space for introducing the retained processing liquid to the outlet, and a buffer surface intersecting with a flow direction of the processing liquid introduced into the casing from the inlet, and a force of the processing liquid. And a buffer member for attenuating the processing liquid.

According to the above configuration, the processing liquid from the processing liquid introduction pipe is received in the casing through the inlet, and collides with the buffer surface of the buffer member to reduce its momentum. After that, the processing liquid stays in the stay space in the casing, and then falls naturally through an outlet formed at the lowermost part of the casing. Thus, the processing liquid from the processing liquid introduction pipe is released into the processing liquid tank after being sufficiently weakened, so that bubbling and scattering of the processing liquid in the processing liquid tank can be suppressed. Therefore, for example, it is possible to avoid a situation in which the processing liquid leaks to the outside by penetrating the seal portion between the main body and the lid of the processing liquid tank.

Further, since the outlet is disposed at the lowermost portion of the casing, there is no possibility that the processing liquid remains in the casing. Therefore, when supplying the processing liquid to the processing liquid tank, there is no possibility that old processing liquid is mixed. In addition,
The buffer member may be constituted by a part of a casing. For example, when the casing has a substantially cylindrical shape, an inlet portion (opening) connected to the processing liquid introduction pipe is formed at one end of the cylindrical casing,
The other end of the casing may be provided with an end plate as the buffer member (FIGS. 3, 4, 5, 6, 7, 8).

In this case, an outlet (opening) for allowing the processing liquid to fall naturally may be formed in the cylindrical side wall of the casing (FIGS. 3, 4, and 5). That is, the casing may be attached such that the outlet is directed downward. Further, an inlet portion (opening) connected to the processing liquid inlet may be formed in one end plate of the cylindrical casing, and an outlet portion (opening) may be formed at a lower end position of this end plate (FIG. 6). 7 and 8).

On the other hand, the casing may be formed in a substantially cup shape, and the opening of the cup-shaped casing may be arranged so as to face the outlet of the processing liquid introduction pipe (FIG. 9). In this case, a part of the opening of the cup-shaped casing forms an inlet portion, a portion located below the opening forms an outlet portion, and a bottom portion of the cup-shaped casing forms a buffer member.
In this case, it is preferable that the outlet of the processing liquid introduction pipe is directed upward, and the cup-shaped casing is disposed with the opening directed downward accordingly. At this time, the bottom surface of the cup-shaped casing is located above and forms a top surface.

Further, the outlet of the processing liquid introduction pipe is directed downward, the casing is formed in a substantially cylindrical shape, and an inlet (opening) connected to the processing liquid introduction pipe is formed in the upper end plate of the cylindrical casing. An outlet for allowing the lower end plate of the cylindrical casing to face the outlet of the processing liquid inlet so as to function as the buffer member, and for allowing the processing liquid to naturally drop to the lower end edge of the side surface of the cylindrical casing. (Openings) may be formed (FIG. 10).

[0015] The cushioning member may be an obstacle arranged in the casing. Specifically, the obstacle may be a rod-shaped member (FIG. 11), a massive member (for example, a spherical member (FIG. 12)), a mesh member (FIG. 13), or the like. Furthermore, a path forming member that guides the processing liquid to the outlet while passing through the zigzag path may be arranged in the casing (FIG. 14).

In any case, the processing liquid introduction pipe and the casing may be fixed and integrated. That is, the processing liquid introduction pipe may substantially form a part of the processing liquid supply nozzle. In this case, for example, the processing liquid introduction pipe is inserted and arranged to the inside of the cylindrical casing to form a double pipe structure, and the processing liquid introduction pipe is treated on the pipe wall of the portion accommodated inside the cylindrical casing. A liquid discharge port may be formed (FIG. 7). In this configuration, since the processing liquid discharged from the processing liquid discharge port of the processing liquid introduction pipe collides with the inner surface of the casing, the momentum of the processing liquid can be effectively attenuated.

Further, an intermediate cylinder is disposed between the cylindrical casing and the processing liquid introduction pipe inserted and disposed therein to form a triple pipe structure, and the processing liquid introduction pipe is provided inside the cylindrical casing. The processing liquid discharge port may be formed on the tube wall of the accommodated portion, and the processing liquid outlet may be formed on the wall of the intermediate cylinder (FIG. 8). In this configuration, the processing liquid discharged from the processing liquid discharge port of the processing liquid introduction pipe collides with the inner surface of the intermediate cylinder, and the processing liquid discharged from the processing liquid outlet of the intermediate cylinder collides with the inner surface of the casing. Therefore, the momentum of the processing liquid can be more effectively attenuated.

The casing may further include a secondary buffer member having a secondary buffer surface intersecting the flow direction of the processing liquid after the momentum is attenuated by the buffer member. In this case, the secondary buffer member may be the path forming member. When the processing liquid introduction pipe is inserted and arranged in the cylindrical casing to form a double pipe structure, the cylindrical wall portion of the cylindrical casing against which the chemical solution coming out of the processing liquid discharge port collides as a secondary buffer member. Be grasped. Similarly, in the case of the triple pipe structure using the above-described intermediate cylinder, the cylinder wall of the intermediate cylinder and the cylindrical casing can be grasped as secondary buffer members, respectively.

According to a second aspect of the present invention, there is provided a processing liquid supply device for supplying a processing liquid to a processing liquid tank, wherein the processing liquid supply pipe connected to the processing liquid tank and the processing liquid supply pipe via the processing liquid supply pipe. A pump for pumping the processing liquid into the processing liquid tank and the processing liquid from the processing liquid supply pipe are introduced into the processing liquid tank above the upper limit of the level of the processing liquid in the processing liquid tank. A processing solution inlet pipe
A processing liquid supply nozzle attached to an outlet of the processing liquid introduction pipe, for attenuating the force of the processing liquid from the processing liquid introduction pipe, and then allowing the processing liquid to fall naturally. It is.

According to this structure, the force of the processing liquid which is pumped vigorously by the pump is attenuated by the processing liquid supply nozzle, so that the processing liquid introduction pipe is located above the upper limit of the liquid level in the processing liquid tank. Despite the introduction of the processing liquid from above, foaming and scattering of the processing liquid in the processing liquid tank can be suppressed. The processing liquid supply pipe and the processing liquid introduction pipe may be formed by one continuous pipe member, or may be formed by separate pipe members and connected to each other by a pipe joint.

Further, the processing liquid introduction pipe and the processing liquid supply nozzle may be substantially integrated. The processing liquid supply nozzle has an inlet part for receiving the processing liquid from the processing liquid introduction pipe and an outlet part formed at the lowermost part for allowing the processing liquid to fall naturally. And a casing that forms a stagnation space in which the processing liquid introduced from the inlet section is retained and guides the accumulated processing liquid to the outlet section, and a flow direction of the processing liquid introduced into the casing from the inlet section. And a buffer member that attenuates the momentum of the treatment liquid.

With this configuration, the same effect as the first aspect of the invention can be achieved.

[0023]

Embodiments of the present invention will be described below in detail with reference to the accompanying drawings. FIG. 1 is a conceptual diagram showing a configuration of a substrate processing apparatus to which a processing liquid supply device according to an embodiment of the present invention is applied. The substrate processing apparatus is, for example, a substrate cleaning apparatus for cleaning a substrate such as a semiconductor wafer or a glass substrate for a liquid crystal display,
A chemical cleaning unit U is provided for supplying a cleaning chemical (treatment liquid) to the surface of the substrate and removing contaminants from the substrate surface. The cleaning chemical is, for example, a mixed solution of hydrofluoric acid and a surfactant.

This chemical solution is sent from the chemical solution cabinet 1 disposed, for example, behind the substrate processing apparatus, to the chemical solution cleaning unit U via the chemical solution piping 2 by the chemical solution supply pump P1. The chemical solution cabinet 1 is provided with a chemical solution tank 10 (treatment liquid tank) for storing a chemical solution. The replenishment of the chemical solution into the chemical solution tank 10 is performed from a separate supply unit 3 via a chemical solution supply pipe 4 (treatment liquid supply pipe). That is, the supply unit 3 can be provided with a plastic tank 3A capable of containing and transporting a chemical solution, and the chemical solution in the polytank 3A is supplied to the chemical solution tank 10 via the chemical solution supply pipe 4. Can be supplied to A chemical solution supply pump P2 is interposed in the middle of the chemical solution supply pipe 4, and a new chemical solution in the poly tank 3A can be replenished to the chemical solution tank 10 by driving the chemical solution supply pump P2 as needed. Reference numeral 3B indicates a door that is opened and closed when the plastic tank 3A is replaced.

FIG. 2 is a sectional view showing the internal structure of the chemical liquid tank 10. As shown in FIG. The chemical liquid tank 10 includes a tank body 11 having a bottomed square tubular shape (that is, a container shape),
And an upper lid 12 for closing an upper opening of the tank body 11, and is configured to store a chemical solution in the tank body 11. A seal member 13 is interposed between the tank main body 11 and the upper lid 12 to prevent the entry of impurities from the outside.

A through hole 15 is formed in the side wall of the tank body 11, and a chemical solution introduction pipe 16 is formed in the through hole 15.
(Processing liquid introduction pipe) is a pipe joint (through fitting)
17. The chemical liquid introduction pipe 16 is connected to the chemical liquid supply pipe 4 from the supply unit 3 by a pipe joint 18 outside the chemical liquid tank 10. A processing liquid supply nozzle N1 is attached to an end (outlet) of the chemical liquid introduction pipe 16 on the side of the internal space of the chemical liquid tank 10.

A chemical solution outlet 19 is formed on the bottom surface of the tank body 11, and the chemical solution outlet 19 is connected to the chemical solution pipe 2. Further, a lower limit sensor SL and an upper limit sensor SU are arranged at intervals in the vertical direction in relation to the tank body 11. The lower limit sensor SL detects the chemical at the lower limit liquid level LL of the chemical to be held in the chemical tank 10. The upper limit sensor SU is the chemical liquid tank 1
The chemical is detected at the upper limit liquid level UL of the chemical that can be held within zero. Based on the output signals of these sensors SL and SU, the control device (not shown) controls the chemical liquid supply pump P2
Drive / stop is controlled.

That is, when the liquid level of the chemical solution falls below the detection height of the lower limit sensor SL with the use of the chemical solution, this is detected based on the output signal of the lower limit sensor SL, and the control device switches the pump P2. Drive. Thereby, the chemical solution is replenished from the supply unit 3 to the chemical solution tank 10. When the level of the chemical in the chemical tank 10 rises with the replenishment of the chemical and reaches the detection height of the upper limit sensor SU, this is detected based on the output signal of the upper limit sensor SU.
The control device stops the pump P2. In this way, during the use period of the substrate processing apparatus, the liquid level of the chemical in the chemical tank 10 is maintained between the lower limit liquid level LL and the upper limit liquid level UL, and the liquid level to the chemical cleaning unit U is stabilized. Chemical solution supply can be realized.

The chemical solution introduction pipe 16 is mounted substantially horizontally through the side wall of the tank body 11 above the upper limit liquid level height UL, and from the processing nozzle N1 attached at the tip thereof, the upper limit liquid level. The chemical is dropped from above the surface height UL. 3 is a bottom view of the processing liquid supply nozzle N1 viewed from the direction of arrow A1 in FIG. 2, FIG. 4 is an enlarged cross-sectional view showing the configuration of the processing liquid supply nozzle N1, and FIG. It is a perspective view. The processing liquid supply nozzle N1 has a cylindrical body 31 and the body 31
The casing 30 has a pair of circular end plates 32 and 33 for closing both ends of the casing 30. In one end plate 32, an entrance opening (entrance portion) 34 is formed substantially at the center. The distal end of the chemical solution introducing pipe 16 is inserted into the inlet opening 34, and the two are joined together by, for example, welding to be substantially integrated. The central axis of the chemical solution introduction pipe 16 and the central axis of the body 31 are substantially coaxial.

An exit opening (exit portion) 35 is formed in the body 31. In this embodiment, the outlet opening 35 has a single elongated hole shape extending along the central axis of the body portion 31, but may have a round hole or a square hole, or may have two or more outlets. An opening may be formed. When the processing liquid supply nozzle N1 integrated with the chemical liquid introduction pipe 16 is mounted on the side wall of the tank body 11, the mounting position of the processing liquid supply nozzle N1 is adjusted such that the outlet opening 35 is located at the lowest position.

The chemical from the chemical introduction pipe 16 is vigorously urged by the operation of the chemical supply pump P2.
Is introduced into the internal space (residence space) of the casing 30. Then, as shown in FIG. 4, this chemical solution is supplied to an end plate 3 arranged along a plane intersecting the direction of introduction of the chemical solution.
The inner surface 33a of the casing 3 collides with the inner surface 33a to reduce its momentum, stays in the inner space of the casing 30, and then falls naturally from the outlet opening 35. That is, in this case, the end plate 33 functions as a buffer member, and its inner surface 33a is grasped as a buffer surface.

In this way, the chemical liquid pressure-fed from the supply unit 3 naturally falls after its momentum is weakened. Therefore, when the chemical liquid tank 10 is empty or when the liquid level in the chemical liquid tank 10 Is low, foaming during replenishment of the drug solution can be suppressed. Also, the chemical solution does not splatter violently. Accordingly, bubbles and splashes of the chemical do not reach the upper lid 12, so that even a highly permeable chemical does not leak through the gap between the seal member 13 and the upper lid 12 or the tank body 11. Thereby, the outer surface of the tank main body 11 and the inside of the chemical liquid cabinet 1 are not contaminated by the chemical liquid.

Since the outlet opening 35 is located at the lowermost part of the casing 30, no chemical liquid remains therein, and there is no possibility that the chemical liquid will be degraded in the casing 30. FIG. 6A is a sectional view of a processing liquid supply nozzle N2 according to a second embodiment that can be used in place of the processing liquid supply nozzle N1, and FIG. 6B is a sectional view of FIG. It is the side view seen from VI-VI. In these drawings, parts equivalent to the respective parts shown in FIG. 4 described above are denoted by the same reference numerals as in FIG.

The processing liquid supply nozzle N2 has a cylindrical casing 30A similarly to the processing liquid supply nozzle N1, but one end plate 32A is eccentric upward from the central axis 31a of the body 31A. An inlet opening 34 is formed at the position where the chemical solution introduction pipe 16 is joined. Further, below the inlet opening 34, an arc-shaped outlet opening 35A is formed along the periphery of the end plate 32A. The lower edge of the outlet opening 35A is aligned with the inner surface of the body 31A, so that the liquid medicine retained in the casing 30A can be dropped without leaving. An outlet opening is not formed in the body 31A.

With this configuration, the processing liquid supply nozzle N
The same effect as in the case of using No. 1 can be achieved. As shown in FIG. 6A, it is preferable that the processing liquid supply nozzle N2 is disposed so that the outlet opening 35A is opposed to a position close to the side wall of the tank body 11. More specifically, the chemical liquid flowing out of the outlet opening 35A and naturally falling,
The outlet opening 35A and the tank body 1 are so contacted with the side wall of the tank body 11 before reaching the upper limit liquid level height UL.
The distance between the first side wall and the first side wall may be determined. As a result, the chemical liquid flowing out from the outlet opening 35A descends along the side wall of the tank body 11, so that bubbling and scattering of the chemical liquid can be suppressed more effectively.

FIG. 7A is a cross-sectional view showing a configuration of a processing liquid supply nozzle N2A according to a modification of the processing liquid supply nozzle N2 of the second embodiment, and FIG. 7B is a sectional view of FIG. FIG. 7 is a cross-sectional view taken along line VII-VII of FIG. In FIG. 7, the same parts as those shown in FIG. 6 are denoted by the same reference numerals. In the processing liquid supply nozzle N2A, the chemical liquid introduction pipe 160 is inserted into the internal space of the casing 30A through the end plate 32A, and the tip thereof is
It is held and closed by a recess 331 formed on the inner surface of the end plate 33A. In the chemical solution introducing pipe 160, the portion 16 accommodated in the internal space of the casing 30A
A plurality of chemical solution discharge ports 162 are formed in one tube wall. In this embodiment, the plurality of chemical solution outlets 162 are arranged along the longitudinal direction of the chemical solution introduction tube 160 at each of the upper portion, the lower portion, and the side portion of the chemical solution introduction tube 160. In order to prevent the chemical solution from remaining in the chemical solution introduction pipe 160, at least one of the chemical solution discharge ports 162
Is preferably formed below the chemical solution introduction tube 160.

By adopting such a structure, the chemical solution supply nozzle N2A has a double tube structure together with the chemical solution introduction tube 160. As a result, the chemical solution guided through the chemical solution introduction pipe 160 collides with the inner surface (buffer surface) of the end plate 33A (buffer member) serving as a buffer member, and its momentum is attenuated.
After colliding with the inner wall surface (secondary buffer surface) of the 0A trunk portion 31A (secondary buffer member) and being further weakened, after staying in the space between the inner wall of the casing 30A and the chemical solution introducing pipe 160 , Exits from the outlet opening 35A and falls naturally. In this case, the casing 30 of the chemical solution introduction pipe 160
The entrance of the portion 161 housed in A (near the end plate 32A) is grasped as an entrance for receiving the chemical solution in the casing 30A.

The processing liquid supply nozzle N2A of this modification is
Due to the double tube structure, the path of the chemical solution until the chemical solution falls naturally is more complicated. That is, the chemical passing through the chemical introduction pipe 160 collides with the end plate 33 </ b> A arranged so as to intersect with the flow direction thereof, so that the momentum is weakened. Further, the chemical intersects with the flow direction of the chemical discharged from the chemical discharge opening 162. The flow force is further attenuated by the inner wall surface of the body 31A. Therefore, the momentum of the chemical can be more effectively attenuated than in the processing liquid supply nozzle N2 shown in FIG. 6, and the foaming and scattering of the chemical can be suppressed more favorably.

It should be noted that, in this modification as well, FIG.
As in the case of the processing liquid supply nozzle N2, the outlet opening 35
It is preferable that A is disposed close to the side wall of the tank body 11 so that the chemical solution descends along this side wall. FIG. 8A is a cross-sectional view illustrating a configuration of a processing liquid supply nozzle N2B according to still another modification of the processing liquid supply nozzle N2 of the second embodiment, and FIG. ) Line VIIIB-VIII
FIG. 8C is a side view as viewed from B, and FIG. 8C is a cross-sectional view as viewed from the section line VIIIC-VIIIC in FIG. 8A. In FIG. 8, portions equivalent to the respective portions shown in FIG.
The same reference numerals as in the case of are used.

As is clear from FIGS. 8A and 8C, the processing liquid supply nozzle N2B has a triple pipe structure. That is, the processing liquid supply nozzle N2B has the cylindrical casing 30B, and the intermediate cylinder 300
Are coaxially arranged, and further inside the intermediate cylinder 300,
Chemical solution introduction pipe 16 having a plurality of chemical solution discharge ports 162 on the tube wall
A part 161 of 0 is inserted coaxially. Chemical solution introduction pipe 1
The tip of 60 is held in a recess 335 formed in the end plate 33B of the casing 30B and is closed. Similarly, one end of the intermediate cylinder 300 is held by a recess 336 formed in the end plate 33B and is closed. An end plate 301 is fixed to the other end of the intermediate cylinder 300,
In the center of the end plate 301, a through-hole 302 through which the chemical solution introducing pipe 160 is formed is formed. The end plate 301 is connected to the end plate 3 on the side facing the side wall of the tank body 11.
It is fitted and fixed in a mounting hole 321 formed in the center of 2B. In the end plate 32B, a semi-annular outlet opening 35B is formed at a position corresponding to a position below the mounting hole 321 as shown in FIG. 8B. The lower edge of the outlet opening 35B is connected to the body 31 of the casing 30B.
B, and therefore the outlet opening 35B
Can be said to be formed at the bottom of the casing 30B.

The intermediate tube 300 is provided with a plurality of chemical solution outlets 30 at the lowermost position in a sectional view (FIG. 8C) and at positions spaced by a predetermined angular interval (for example, 60 degrees) on both sides thereof.
3 are arranged along the axial direction. However, the chemical solution outlet 303 is preferably formed at a position that does not face the chemical solution discharge port 162 of the chemical solution introduction pipe 160. In the example of FIG.
3 is displaced with respect to the longitudinal direction of the chemical solution introducing tube 160.

With such a configuration, the chemical solution introduction pipe 160
The chemical liquid guided by the liquid jet collides with the inner surface (buffer surface) of the end plate 33B (buffer member) disposed to intersect with the flow direction thereof, and its force is weakened. The momentum is further attenuated by colliding with the inner wall surface (secondary cushioning surface) of the intermediate cylinder 300 (secondary cushioning member) intersecting the direction, and then exits from the chemical solution outlet 303 and intersects with the flow direction at that time. Body 31 of casing 30B
Collision with the inner wall surface (secondary buffer surface) of B (secondary buffer member) further dampens its momentum. And the casing 30B
The chemical liquid retained in the space between the intermediate tube 303 and the intermediate tube 303 exits the casing 30B through the outlet opening 35B and falls naturally.

As described above, the processing liquid supply nozzle N2B of this modified example forms a more complicated chemical liquid path than the processing liquid supply nozzle N2A of FIG. 7, so that the chemical liquid bubbles inside the chemical liquid tank 10. And scattering can be more effectively suppressed. In this modification, as in the case of the processing liquid supply nozzle N2 in FIG.
Is disposed close to the side wall of the tank body 11 and the chemical solution is lowered along the side wall, whereby the foaming and scattering of the chemical solution can be further suppressed.

FIG. 9 is a cross-sectional view showing the structure of a chemical solution introduction pipe 16A to be used in place of the above-mentioned chemical solution introduction pipe 16, and a treatment liquid supply nozzle N3 of the third embodiment used in combination therewith. . The distal end portion 50 of the chemical liquid introducing tube 16A is bent upward at a substantially right angle. A processing liquid supply nozzle N3 composed of a cup-shaped casing 40 is disposed so as to face an end surface 50a (outlet) of the tip end portion 50. The casing 40 has the opening 4
1 is directed downward, that is, toward the end face 50a, so that the top plate 42 is attached to the end face 50a.
It takes a substantially horizontal posture so as to intersect with the flow direction of the chemical solution discharged upward from a.

The liquid chemical discharged from the liquid supply pipe 16A vigorously collides with the top plate 42 of the casing 40 and its power is weakened. , Falls naturally through the opening 41. Since the opening 41 faces downward,
The chemical does not stay in the casing 40. In this case, the top plate 42 of the casing 40 functions as a buffer member for buffering the momentum of the chemical solution, and the surface facing the end surface 50a, that is, the lower surface of the top plate 42 is grasped as a buffer surface.
Then, at the opening 41, the end face 50 of the chemical solution introducing pipe 16A
The region facing a is grasped as an inlet for introducing a chemical solution into the casing 40, and the region around the end face 50a is grasped as an outlet for allowing the chemical solution in the casing 40 to fall naturally.

The casing 40 may be attached to the chemical solution introducing pipe 16A using an appropriate attachment member, or may be attached to the lower surface of the upper lid 12 (see FIG. 2) using an appropriate attachment member. Good. Note that the processing liquid supply nozzle N3 can also be disposed laterally with the opening 41 facing the discharge port of the straight chemical liquid introduction pipe 16 shown in FIG. 2 and the like. Thus, the momentum of the chemical from the chemical introduction pipe 16 can be reduced.

FIG. 10 (a) shows a chemical solution introduction pipe 16B to be used in place of the above-mentioned chemical solution introduction pipe 16, and a treatment liquid supply nozzle N4 of the fourth embodiment used in combination therewith.
FIG. 10 (b) is a cross-sectional view showing the configuration of FIG.
It is sectional drawing seen from the cutting surface line XX. Chemical solution introduction pipe 1
As for 6B, the front-end | tip part 60 is bent substantially perpendicularly downward. And the lower end (exit) of this tip portion 60
Is provided with a processing liquid supply nozzle N4.

The processing liquid supply nozzle N4 has a cylindrical body 7
1 and a pair of end plates 7 for closing the upper and lower ends of the body 71
2 and 73 are provided. An inlet opening 74 is formed substantially at the center of the upper end plate 72 to be disposed above, and the distal end portion 60 of the chemical solution introducing pipe 16B is joined to the inlet opening 74 by, for example, welding.

The lower end plate 73 to be disposed below
Takes a horizontal posture that intersects the flow direction of the chemical solution discharged downward from the chemical solution introduction pipe 16B. The body 71 is formed with, for example, four outlet openings 75 arranged at equal angular intervals in plan view.
The lowermost edge of the outlet opening 75 is aligned with the upper surface of the end plate 73.

With this configuration, the chemical liquid discharged downward from the chemical liquid introduction pipe 16B collides with the inner surface (upper surface) of the lower end plate 73, is weakened, and stays in the casing 70. The casing 7 from the four outlet openings 75
It flows out of 0 and falls naturally. In this case, the end plate 73 is grasped as a buffer member, and its inner surface (upper surface) corresponds to a buffer surface.

Since the lowermost edge of the outlet opening 75 is aligned with the upper surface of the end plate 73, when the supply of the chemical is stopped,
There is no possibility that the chemical solution remains in the casing 70. FIG.
1 is a cross-sectional view illustrating a configuration of a processing liquid supply nozzle N5 according to a fifth embodiment that can be used in place of the processing liquid supply nozzle N1. The processing liquid supply nozzle N5 has a box-shaped casing 80 and a plurality of round bars 85 arranged substantially in parallel in the casing 80. Casing 80
An inlet opening 82 is formed in one side wall 81, and the distal end of the chemical solution introducing pipe 16 is joined to the inlet opening 82. The bottom plate 83 of the casing 80 is inclined so as to go downward as the distance from the inlet opening 82 increases, and an outlet opening 84 is formed at the lowermost position.

The central axis of the round bar 85 extends in a direction (horizontal direction in the illustrated example) intersecting with the central axis of the chemical solution introducing tube 16, and a surface 85 a of the round bar 85 facing the chemical solution introducing tube 16. Has a cushioning surface for weakening the momentum of the chemical solution. That is, in the processing liquid supply nozzle N5,
The round bar 85 plays a role as a buffer member. Of course, the side wall 8 of the casing 80 facing the chemical solution introduction pipe 16
6 can also function as a cushioning member.

As described above, in the processing liquid supply nozzle N5, the chemical introduced into the casing 80 from the chemical introduction pipe 16 through the inlet opening 82 is supplied to the round bar 85 and the side wall 8
6, the momentum is weakened, stays in the casing 80, and then falls naturally from the outlet opening 84. In addition, not only a round bar but also a bar-shaped member such as a square bar, or a lump-shaped member such as a spherical member or a square block member may be introduced into the casing 80 as an obstacle.

As an example, FIG. 12 shows a processing liquid supply nozzle N5A in which a spherical member 85A is accommodated in a cylindrical casing 80A arranged horizontally. Cylindrical casing 8
An outlet opening 84A is formed at the lowermost position of the body of 0A. In addition, one end plate of the casing 80A has an inlet opening 8 for receiving a chemical solution from the chemical solution introduction pipe 16.
2A is formed.

FIG. 13 shows a processing liquid supply nozzle N5B using a mesh member 85b as still another example of the obstacle. In this example, a pair of net-like members 85b are arranged substantially parallel to the middle of the body of the cylindrical casing 80B arranged horizontally so as to be orthogonal to the central axis of the chemical solution introduction pipe 16. In addition, an inlet opening 82B for receiving the chemical solution from the chemical solution introducing pipe 16 is formed in one end plate of the cylindrical casing 80B, and an outlet opening 84B is formed in the other end plate at the lowest position. .

As a result, the force of the chemical solution is weakened by the pair of net-like members 85b, and the chemical solution stays in the casing 80B, and then falls out of the outlet opening 84B and falls naturally. If the force of the chemical solution can be sufficiently buffered by one net-like member, only one net-like member may be used. If the buffer effect of two net-like members is insufficient, three or more net-like members may be used. You may. In this case, the plurality of mesh members need not necessarily be arranged in parallel. Further, the net-like member and the above-mentioned rod-like member or lump-like member can be used in combination.

FIG. 14 shows a processing liquid supply nozzle N according to a sixth embodiment which can be used in place of the processing liquid supply nozzle N1.
6 is a cross-sectional view illustrating a configuration of FIG. This processing liquid supply nozzle N
6 includes a box-shaped casing 90 and path forming members 96 and 97 for forming a zigzag chemical liquid path 100 in the casing 90. The casing 90 is
A side wall 91 formed with an inlet opening 94 to which the distal end of the chemical solution introducing tube 16 is joined, a side wall 92 opposed thereto, and a side wall 9
And a bottom plate 93 inclined downward from the second side toward the side wall 91. An outlet opening 95 is formed in the side wall 91, and the lower edge of the outlet opening 95 is aligned with the bottom plate 93.

On the inner surface of the side wall 92, a triangular-prism-shaped path forming member 96 having a right-angled triangular cross section is fixed so as to extend in a horizontal direction intersecting with the central axis of the chemical solution introducing tube 16. A surface 96a corresponding to the hypotenuse of the right-angled triangular cross section is opposed to the end face 16a (exit) of the chemical solution introduction tube 16, and this surface 96a functions as a buffer surface for weakening the force of the chemical solution from the solution introduction tube 16. That is, the path forming member 96
It corresponds to a buffer member.

On the other hand, the inner surface of the side wall 91 has an entrance opening 94.
Below and above the outlet opening 95,
A triangular-prism-shaped path forming member 97 having a right-angled triangular cross section is fixed so as to extend in a horizontal direction intersecting with the center axis of the chemical solution introducing tube 16. A surface 97a corresponding to the oblique side of the right-angled triangular cross section faces the ridge line 96b of the path forming member 96 from below.

As described above, in the casing 90,
From the entrance opening 94 to the surface 96a of the path forming member 96, the surface 97 of the path forming member 97 passes through the ridge 96b.
a, and further through the ridge line 97b, the bottom plate 93
A zigzag chemical solution path 100 that is folded back to reach the outlet opening 95 is formed. With this configuration, the chemical from the chemical introduction pipe 16 is applied to the surface 96 a of the path forming member 96.
Momentum is weakened by hitting, the zigzag chemical solution path 10
By passing through zero, the momentum is further weakened and stays in the casing 90, and then falls out of the outlet opening 95 formed at the lowest position of the casing 90 and falls naturally.

Although some embodiments of the present invention have been described, the present invention can be implemented in other embodiments. For example, as shown in FIG. 2, the chemical liquid guide member 3 is associated with the outlet opening 35 of the processing liquid supply nozzle N1.
8 may be arranged in a hanging manner so that the chemical liquid that naturally falls from the outlet opening 35 is transmitted to the chemical liquid guide member 38. Similar modifications can be made for the processing liquid supply nozzles N2 to N6.

The processing liquid supply nozzle N1 has a cylindrical casing 30, but the casing is not necessarily required to be cylindrical. For example, a square cylindrical casing may be used. . Regarding the processing liquid supply nozzles N2 to N6, shapes different from the illustrated shapes can be employed. Further, in the above-described embodiment, the supply unit 3 supplies the chemical solution to the chemical solution tank 10.
However, the method of replenishing the processing liquid is not limited to this, and for example, the processing liquid may be supplied to the processing liquid tank from a utility line in a factory.

In addition, various design changes can be made within the scope of the technical matters described in the claims.

[Brief description of the drawings]

FIG. 1 is a conceptual diagram showing a configuration of a substrate processing apparatus to which a processing liquid supply device according to an embodiment of the present invention is applied.

FIG. 2 is a cross-sectional view illustrating an internal configuration of the chemical liquid tank 10.

FIG. 3 is a bottom view of the processing liquid supply nozzle N1 according to the first embodiment of the present invention as viewed from the direction of arrow A1 in FIG. 2;

FIG. 4 is an enlarged cross-sectional view illustrating a configuration of a processing liquid supply nozzle N1.

FIG. 5 is a perspective view of a processing liquid supply nozzle N1.

FIG. 6 is a sectional view (a) and a side view (b) showing a configuration of a processing liquid supply nozzle N2 according to a second embodiment of the present invention.

FIGS. 7A and 7B are a vertical sectional view (a) and a horizontal sectional view (b) of a processing liquid supply nozzle N2A according to a modification of the second embodiment.

FIG. 8 is a longitudinal sectional view (a), a side view (b), and a transverse sectional view of a processing liquid supply nozzle N2B according to another modification of the second embodiment.
(c).

FIG. 9 is a cross-sectional view illustrating a configuration of a processing liquid supply nozzle N3 according to a third embodiment of the present invention.

FIG. 10 is a longitudinal sectional view (a) and a transverse sectional view (b) showing a configuration of a processing liquid supply nozzle N4 according to a fourth embodiment of the present invention.
It is.

FIG. 11 is a sectional view illustrating a configuration of a processing liquid supply nozzle N5 according to a fifth embodiment of the present invention.

FIG. 12 is a sectional view showing a processing liquid supply nozzle N5A according to a modification of the fifth embodiment.

FIG. 13 is a cross-sectional view illustrating a processing liquid supply nozzle N5B according to another modification of the fifth embodiment.

FIG. 14 is a cross-sectional view illustrating a configuration of a processing liquid supply nozzle N6 according to a sixth embodiment of the present invention.

[Explanation of symbols]

 Reference Signs List 3 supply unit 4 chemical liquid supply pipe P2 chemical liquid supply pump 10 chemical liquid tank 11 tank body 12 top lid 16 chemical liquid introduction pipe N1 processing liquid supply nozzle 30 casing 32, 33 end plate 34 inlet opening 35 outlet opening N2 processing liquid supply nozzle 30A casing 32A end Plate 35A Outlet opening N2A 160 Chemical liquid introduction tube 162 Chemical liquid discharge port N2B 30B Casing 32B, 33B End plate 300 Intermediate cylinder 303 Chemical liquid outlet N3 Treatment liquid supply nozzle 16A Chemical liquid introduction tube 40 Casing 41 Open 42 Top plate N4 Treatment liquid supply nozzle 16B Inlet tube 70 Casing 72 Upper end plate 73 Lower end plate 74 Inlet opening 75 Outlet opening N5 Processing liquid supply nozzle 80 Casing 81 Side wall 82 Inlet opening 83 Bottom plate 84 Outlet opening 85 Round bar 86 Side wall N5A Processing liquid supply nozzle 8 0A Casing 82A Inlet opening 84A Outlet opening 85A Spherical member N5B Processing liquid supply nozzle 80B Casing 82B Inlet opening 84B Outlet opening 85b Mesh member N6 Processing liquid supply nozzle 90 Casing 91 Side wall 92 Side wall 93 Bottom plate 94 Inlet opening 95 Outlet opening 96, 97 Path Forming member

Claims (3)

[Claims] 1. A processing liquid supply nozzle attached to a processing liquid introduction pipe for introducing a processing liquid into a processing liquid tank, wherein an inlet for receiving the processing liquid from the processing liquid introduction pipe, and a processing liquid for allowing the processing liquid to fall naturally. Having an outlet formed at the lowermost portion, to retain the processing liquid introduced from the inlet,
A casing that forms a retention space that guides the retained processing liquid to the outlet, and a buffer surface that intersects a flow direction of the processing liquid introduced into the casing from the inlet, and that a force of the processing liquid is generated. A processing liquid supply nozzle comprising: a damping member for damping. 2. A processing liquid supply device for supplying a processing liquid to a processing liquid tank, comprising: a processing liquid supply pipe connected to the processing liquid tank; and a processing liquid supplied to the processing liquid tank via the processing liquid supply pipe. And a processing liquid introduction pipe for introducing the processing liquid from the processing liquid supply pipe into the processing liquid tank above the upper limit of the level of the processing liquid in the processing liquid tank. A processing liquid supply nozzle attached to an outlet of the processing liquid introduction pipe, for attenuating the force of the processing liquid from the processing liquid introduction pipe, and then allowing the processing liquid to drop naturally. apparatus. 3. The processing liquid supply nozzle has an inlet for receiving a processing liquid from the processing liquid introduction pipe;
An outlet portion formed at the lowermost portion for allowing the processing liquid to fall naturally, and for holding the processing liquid introduced from the inlet portion, and forming a stay space for guiding the held processing solution to the outlet portion. 3. The apparatus according to claim 2, further comprising: a casing; and a buffer member having a buffer surface intersecting with a flow direction of the processing liquid introduced into the casing from the inlet, and attenuating the momentum of the processing liquid. The processing liquid supply device according to any one of the preceding claims.