JP2000047190A - Electro-optic device and its production - Google Patents

Abstract

PROBLEM TO BE SOLVED: To efficiently produce an electro-optic device including a working process for light-shielding by forming a light-shielding layer by a non-contact transfer method to shield at least a part of a region except for pixels from light. SOLUTION: Inks such as a red ink, green ink, blue ink and black ink are injected through ink injection nozzles 7 corresponding to the respective pixel lines formed on a driving substrate 2, and the injection pitch is smaller than the pitch of the pixels. As for the ink, a soln. containing a dye or pigment is used. In this state, the red ink, green ink and blue ink are injected through the ink injection nozzles 7 at one time to the respective pixel lines on the surface of a photosensitive resin film 23A, while the black ink is simultaneously injected on the peripheral part except for the pixels. Thus, the red, green, blue and black inks are directly and simultaneously injected through the ink injection nozzles 7 to the photosensitive substrate 23A.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to an electro-optical device having a color filter, such as a color liquid crystal display device, and a method of manufacturing the same.

[0002]

2. Description of the Related Art In recent years, with the development of personal computers, portable televisions, on-vehicle navigation systems, and the like, the demand for color liquid crystal display devices has been increasing.

[0003] However, in order to expand its use and further increase its demand, there is an urgent need to further reduce its manufacturing cost. Among them, the color filter, which is one of the components, has a high cost ratio in the entire device,
There is a strong demand for cost reduction of color filters.

In general, a color liquid crystal display device has a structure in which a driving substrate having pixels including pixel electrodes and a counter substrate on which a counter electrode and a black matrix are formed are bonded with a liquid crystal material layer interposed therebetween. The driving substrate is provided with a TFT (thin film transistor) for controlling each pixel, a storage capacitor, and the like. The color filter is a pixel unit of the driving substrate (that is, red, green, and blue portions).
For obtaining basic colors (red, green, and blue) by color separation of incident light to the substrate, and is usually formed on the inner surface of the counter substrate.

However, in a color liquid crystal display device having a color filter of this type, when a drive substrate and a counter substrate are bonded together and assembled, a color error occurs between the color filter and the pixel electrode due to a bonding error. However, there is a problem that display quality is deteriorated.

In order to prevent the color misregistration, precise alignment (alignment) between the driving substrate and the counter substrate is necessary. However, as the definition of pixels increases, the precise alignment is required. It has become difficult. As a countermeasure, it is conceivable to hide the color misregistration area by enlarging the light-shielding area. There is.

For this reason, a so-called on-chip color filter structure in which a color filter is formed on the drive substrate side has been proposed (for example, Japanese Patent Application Laid-Open No. 2-54217). In the liquid crystal display device having the on-chip color filter structure, there is almost no positioning error between the pixel electrode and the color filter as compared with the structure in which the color filter is formed on the counter substrate side, and a high aperture ratio is obtained even when the pixel portion is miniaturized. In addition, since the color filters overlap the individual pixel electrodes, there is an advantage that parallax does not occur between the two and the effective aperture ratio of the pixel portion can be increased.

By the way, as a method for forming such a color filter on a substrate, a dyeing method has hitherto been mainly used.

In this dyeing method, a pattern is formed on a photosensitive layer to be dyed by a photolithography method, and the pattern is immersed in a dyeing solution for coloring. This process is repeated to obtain three color filters. On the other hand, recently, the pigment dispersion method has come into wide use in place of the above-mentioned dyeing method. this is,
A color filter is manufactured by dispersing a coloring pigment in a photosensitive resin, forming a pattern by photolithography, and repeating this process for three colors.

Further, recently, a method using an ink jet nozzle has been proposed. According to this method, since the three colors can be simultaneously colored at required portions of the dyed layer by ejecting ink from the ejection nozzles, the steps are simplified as compared with other methods.

[0011]

By the way, in order to improve the display contrast of a color liquid crystal display device, it is necessary to completely block light except for the openings of the pixels so as to prevent light leakage. Therefore, conventionally, when a color filter is formed on a counter substrate, peripheral portions other than pixels, between pixels are shielded by a black matrix, and when an on-chip color filter is formed, a metal film or a black resist is used. Is shielded from light, but there is a problem that the number of steps such as photolithography increases.

The present invention has been made in view of such a problem, and an object of the present invention is to form a color filter with high efficiency in an electro-optical device such as a color liquid crystal display device having a color filter. not only,
An object of the present invention is to provide an electro-optical device and a method of manufacturing the same, which can achieve high efficiency of shielding light from a region other than a pixel.

[0013]

An electro-optical device according to the present invention comprises a first base including a plurality of pixels and having pixel electrodes corresponding to the pixels, and an electrode opposed to the pixel electrodes. A second substrate facing the first substrate via a material layer, and at least one of the first and second substrates formed using a non-contact transfer method corresponding to the pixels; And a color filter,
At least a part of a region other than the pixel is shielded from light by a light-shielding layer formed by using the non-contact transfer method.

Further, a method of manufacturing an electro-optical device according to the present invention
A first base including a plurality of pixels and having pixel electrodes corresponding to the pixels, and a second base having an electrode facing the pixel electrodes and facing the first base via an optical material layer And a color filter formed on at least one of the first and second bases using a non-contact transfer method corresponding to the pixel. A light-shielding layer is formed on at least a part of the other region by using the non-contact transfer method.

As described above, in the present invention, the non-contact transfer method applied to the manufacture of the color filter is used as it is for the purpose of shielding a part or the whole of the area other than the pixel, that is, for forming the light shielding layer. In the present invention, the above color filters are provided not only for each of red, green and blue (for full color), but also for at least one of these basic colors.
It may be formed in a color (so-called monocolor or multicolor).

The above-mentioned pixels are, for example, red, green, and blue color parts or a set of these in the case of full color.
A color may constitute one pixel. ) Means that one color constitutes one pixel in the case of mono color.

Only by the new device of the present invention, it becomes possible to increase the efficiency of the light shielding work process of the above-described region for the first time, which has always been low in efficiency.

[0018]

DESCRIPTION OF THE PREFERRED EMBODIMENTS In the present invention, in order to form a light-shielding film in a specific area, the same non-contacting method as used for forming a color filter is applied to a dye-receiving layer, preferably a photosensitive resin film, constituting a color filter. It is preferable to apply coloring using black or a basic color ink using a pattern transfer method.

When a color filter that is shielded in this way is mounted, the color liquid crystal display device can effectively improve the display contrast. However, the technical idea of the present invention is not only for a color liquid crystal display device using liquid crystal as an optical material but also for a color liquid crystal display device. For example, EL (electroluminescence), FE
The present invention can be applied to an electro-optical device using D (field emission display), LEP (light emission polymer), or the like.

The non-contact transfer system used in the present invention is a transfer system in which coloring is performed in a non-contact manner, unlike the dyeing method and the pigment dispersion method, which are known, and include the following three systems. be able to. (A) Ink-jet transfer method: Ink droplets are ejected from an ejection nozzle toward a surface to be colored at high speed by a heater, a piezo element, or the like. (B) Ink vaporization or sublimation type transfer method: The ink is vaporized or sublimated once by a heater or the like to form a mist,
Fly from the nozzle to the surface to be colored. (C) Ink dilution type transfer method: After the ink and the solvent are expanded by a heater or a piezo element or the like and merged near the ejection port to dilute the ink, the diluted ink liquid is ejected from the nozzle to the surface to be colored.

Hereinafter, preferred embodiments of the present invention will be described more specifically with reference to the drawings based on a color liquid crystal display device and a method of manufacturing the same.

FIG. 10 shows a cross-sectional structure of a color liquid crystal display device 1 according to one embodiment of the present invention. FIG. 11 shows a drive substrate 2 and a counter substrate 3 of the color liquid crystal display device 1, which are taken out and a main part thereof. 2 shows a configuration. The liquid crystal display device 1 includes a driving substrate 2 and an opposing substrate 3 opposed to the driving substrate 2, and the driving substrate 2 and the opposing substrate 3
The liquid crystal layer 4 is formed by injecting a liquid crystal into a gap between the liquid crystal layer and the liquid crystal layer 4, and the liquid crystal layer 4 is sealed with a sealant 5.

The drive substrate 2 includes a glass substrate 21 as a support substrate, and a plurality of pixel units corresponding to a plurality of basic colors are provided in a matrix on the glass substrate 21, and a pixel corresponding to each of these pixel units is provided. Thin film transistor (TFT) as a switching element for controlling electrodes
A plurality of pixels each including a pixel unit 22 (hereinafter simply referred to as a TFT 22) including a thin film transistor) are provided. A color filter layer 23 is formed on the TFT 22 so as to shield the peripheral part other than the pixel part from light. A transparent pixel electrode 24 is formed on the color filter layer 23 via a protective film (not shown) for each pixel, and an alignment film 25 is formed on the pixel electrode 24.

Further, as shown in FIG. 11, a gate line 26 is provided on the drive substrate 2 along the row direction of the pixels in a matrix, and the TFTs are arranged in columns along the column direction.
A signal line 27 for supplying an image signal to 22 is provided. The gate line 26 is electrically connected to each gate electrode of the plurality of TFTs 22. The color filter layer 23 includes a red filter 23a, a green filter 23b (not shown in FIG. 10), a blue filter 2
3c and a light-shielding layer 23d (not shown) in which peripheral portions other than the pixels are shielded from light by black or a basic color are alternately arranged in the row direction. Color filter layer 2
As described later, No. 3 is formed by, for example, directly jetting ink (a coloring solution containing a dye or a pigment) onto the photosensitive resin film.

On the other hand, as shown in FIG. 10, on the opposite substrate 3, the pixel electrode 24 on the driving substrate 2 side is placed on the glass substrate 31.
At the same time, a transparent counter electrode 32 for applying a predetermined potential to the liquid crystal layer 4 is formed.
An alignment film 33 is formed thereon. Although not shown, a black matrix portion is formed on the counter substrate 3 corresponding to a region between the pixels.

The liquid crystal display device 1 has a so-called on-chip color filter structure in which a color filter layer 23 is provided on the drive substrate 2 side. Therefore, when the opposing substrate 3 is bonded to the driving substrate 2, there is almost no positioning error between the pixel electrode 24 and the color filter layer 23,
A high aperture ratio can be maintained even when the pixel portion is miniaturized. Further, since the color filter layer 23 overlaps with the individual pixel electrodes, no parallax occurs between the two, and the effective aperture ratio of the pixel portion can be increased.

Hereinafter, a method of manufacturing the color liquid crystal display device 1 will be described with reference to the steps shown in FIGS.
Here, a method of manufacturing a light-shielding layer and a color filter on the driving substrate 2 which is a feature of the present invention will be mainly described, and specific description of other steps will be omitted.

First, as shown in FIG. 3, a plurality of TFTs 22 are formed for each pixel on a glass substrate 21 by a known method such as a photolithography technique. TFT22
As shown in FIG. 6B, a gate electrode 22a is formed on the glass substrate 21 by, for example, molybdenum (Mo) and forms a part of a gate line, and is formed on the gate electrode 22a. For example, a gate insulating film 22 composed of a laminated film of a nitride film (SiN _x ) and an oxide film (SiO ₂ )
b, a polycrystalline silicon film 22c formed on the gate insulating film 22b, and a protective film 22d formed by a laminated film of, for example, an oxide film (SiO ₂ ) and a nitride film (SiN _x ).
It is composed of

Gate electrode 22 of polycrystalline silicon film 22c
The region facing a is the channel region of the TFT 22,
The regions on both sides of the channel region serve as a source region or a drain region. The source region of the polycrystalline silicon film 22c is electrically connected to a signal line 27 made of, for example, aluminum (Al) through a connection hole (contact hole) provided in the protective film 22d. The drain region of the polycrystalline silicon film 22c is connected to the pixel electrode 2 via a contact hole (contact hole) 201 as described later.
4 is electrically connected.

Returning to FIG. 3, the description will be continued. In this step, the alignment marks 28a and 28b are formed on the glass substrate 21 simultaneously with the TFT 22. The alignment marks 28a and 28b serve as a reference for alignment in the step of forming the color filter layer 23 as described later. Note that these alignment marks 28a and 28b can also be used as marks that serve as a reference for bonding the drive substrate 2 and the counter substrate 3. Alignment mark 28a,
28b can be formed in the same step by using at least one layer when forming a metal layer such as wiring or a polycrystalline silicon layer in the manufacturing process of the TFT 22.

Next, as shown in FIG. 4, a film thickness of 0.5 to 5.0 μm, for example, is formed on the drive substrate 2 on which the TFT 22 and the alignment marks 28a and 28b are formed by a spin coating method or another method. A photosensitive resin film 23A of 1.0 μm is formed. The photosensitive resin film 23A corresponds to a color filter film and a light shielding film in a peripheral portion other than the pixels. Examples of the material of the photosensitive resin 23A include a mixture of an acrylic resin and PVA (polyvinyl alcohol) with known photosensitizers such as naphthoquinonediazide and triazole.

Subsequently, a temperature in the range of 30 ° C. to 120 ° C.,
For example, the photosensitive resin film 2 is subjected to a heat treatment at 60 ° C.
Dry 3A. Next, the photosensitive resin film 23A is irradiated with ultraviolet rays through a photomask (not shown), and unnecessary portions are selectively removed with a developing solution.
After forming a contact hole (contact hole) 201 that reaches the drain region of the polycrystalline silicon film 22c, it is washed with water. Thereafter, the photosensitive resin film 23A reflows (reflow).
For a temperature in the range of 100 ° C. to 300 ° C., for example 1
Heat at 50 ° C.

Next, as shown in FIG. 6, the alignment scopes 6a and 6b are used to align the alignment marks 28a and 28a.
By detecting 8b, the position of the ink jet nozzle 7 and the drive substrate 2 are aligned.

The ink jet nozzles 7 correspond to, for example, red ink 7a,
It can eject green ink 7b, blue ink 7c and black ink 7d, and the pitch is smaller than the pitch between pixels. A solution containing a dye or a pigment is used as the ink. In this state, the red ink 7a, the green ink 7b, and the blue ink 7c are simultaneously ejected from the ink ejecting nozzle 7 to the surface of the photosensitive resin film 23A for each pixel row, and the peripheral portion other than the pixels is ejected. On the other hand, the black ink 7d is simultaneously ejected. At this time, one of the driving substrate 2 and the ink jet nozzle 7, for example, the driving substrate 2 side is scanned, and ink is jetted onto the entire surface of the photosensitive resin film 23 </ b> A on the driving substrate 2. At this time, the positions of the drive substrate 2 in the x, y, and θ directions can be accurately detected by, for example, a laser interferometer provided on the substrate suction stage. The drive board 2 can be moved by, for example, a motor or a linear motor.

After each color ink is jetted onto the photosensitive resin film 23A, the photosensitive resin film 23A is
Heat at a temperature of ° C. Through the above steps, as shown in FIG. 1, the ink is absorbed by the photosensitive resin film 23A.
As a result, the photosensitive resin film 23A becomes the color filter layer 23 including the red filter 23a, the green filter 23b, and the blue filter 23c corresponding to each pixel column, and the light-shielding layer 23d is formed in the peripheral portion other than the pixels. .

Subsequently, as shown in FIGS. 7, 8 and 9, for example, a film thickness of 0.3 to 2.0 is applied so as to cover the color filter layer 23 on the driving substrate 2 by, for example, spin coating.
A photosensitive resin film 29 as a μm protective film is formed. Next, the photosensitive resin film 29 is irradiated with ultraviolet rays through a photomask (not shown), and further, a region corresponding to the connection hole 201 and an unnecessary portion are selectively removed with a developing solution, so that the polycrystal is removed. After forming a contact hole (contact hole) 202 reaching the drain region of the silicon film 22c, the contact hole is washed with water. Thereafter, the photosensitive resin film 29 is heated at a temperature in the range of 100 ° C. to 300 ° C., for example, 200 ° C., for reflow (reflow). Next, in order to remove a residue such as a dye and organic matter deposited in the contact hole 202, etching by oxygen plasma is performed.
Further, in order to remove the oxygen film formed by the oxygen plasma, etching is performed using, for example, dilute hydrofluoric acid.

Next, as shown in FIG.
9, a transparent conductive material by, for example, a sputtering method,
For example, ITO (Indium-Tin Oxide: a mixed oxide film of indium and tin) is formed, and the ITO film is patterned by photolithography and etching to form a transparent pixel electrode 24. Note that this pixel electrode 24
May be formed of a metal such as aluminum (Al) or silver (Ag) depending on a device to be manufactured.
After that, after forming an alignment film by a known method, the driving substrate 2 and the counter substrate 3 are bonded to each other, whereby the liquid crystal display device 1 can be manufactured.

As described above, in the embodiment of the present invention, the red, green, blue and black inks are directly and simultaneously ejected from the ink ejecting nozzles 7 to the photosensitive resin film 23A. The three-color filter layer 23 and the light-shielding layer 23d can be manufactured in one step, and the manufacturing process is simplified as compared with the related art. In addition, the ink ejection nozzle 7
Can be used to form the color filter layer 23 on the drive substrate 2 side, so that there is no sticking misalignment in the step of sticking the drive substrate 2 and the counter substrate 3, thereby preventing the occurrence of color misregistration. .

Further, in this method, the ink jet nozzle 7
Since it is possible to arbitrarily select the ink to be ejected from the printer, it is easy to change the color. The optical density can be adjusted by changing the thickness of the photosensitive resin film 23A that absorbs ink. Further, the ink jet nozzle 7
Is used to color the photosensitive resin film 23A, so that the ink can be selectively ejected to a required portion, and the amount of ink used can be greatly reduced.

In the embodiment of the present invention, since the color filter layer 23 and the protective film thereof are formed of a photosensitive material, the connection hole 201 for electrically connecting the pixel electrode 24 and the TFT 22 is formed. , 202 can be easily formed.

As described above, the present invention has been described with reference to the embodiments. However, the present invention is not limited to the above embodiments, and various modifications are possible. For example, the light shielding layer 23d
As shown in FIG. 2, instead of black, three color inks of red, green, and blue are applied to the photosensitive resin 2 from the ink jet nozzle.
3 may be sprayed and applied again. Even in this case, the same light shielding effect as in the case of the black ink can be obtained. Such a light-shielding layer may be provided in a non-opening portion between pixels other than the above-described peripheral portion or together with the peripheral portion. Further, the light-shielding layer may be provided not on the drive substrate 2 but on the counter substrate 3 (in this case, a color filter may be provided on the counter substrate), or may be provided on both substrates 2 and 3 respectively. Good.

When the light shielding layer 23d is formed, the outer peripheral portion of the XY stage on which the glass substrate 21 is mounted may be stained by the ejection of ink from the ink ejection nozzle.
In order to avoid such a situation, as shown in FIG. 5, the outer peripheral surface of the XY stage 31 which protrudes from the glass substrate 21 is preferably covered with an ink-proof mask 32 to avoid painting the portion. Thereby, generation of dust on the back surface of the substrate due to coloring can be prevented, yield can be improved, and clean coloring can be performed. Even if the mask 32 is not used, if the ink is not selectively ejected by controlling the ink ejection signal, it is possible to similarly avoid painting on the above-mentioned portions.

In the above embodiment, the length of the ink jet nozzle 7 is set to be the entire length of the pixels on the drive substrate 2 in the row direction. However, the length of the ink jet nozzle 7 is arbitrary, May be. In the above embodiment,
Three color inks 7a are provided by an array of ink jet nozzles 7.
7c are ejected simultaneously, but coloring may be performed using individual nozzles corresponding to each color.
Also, the number of nozzles (spout ports) corresponding to the pixels of each color is arbitrary, and it is sufficient that at least one nozzle corresponds to one pixel.

Further, in the above-described embodiment, the color arrangement of the pixels may have various configurations such as a stripe shape or a grid shape. The color arrangement of the pixels may have another configuration, for example, a configuration in which the color differs between adjacent pixels in the column direction and the row direction.

Further, in the above embodiment, the color filter and the light-shielding layer are constituted by the photosensitive resin film, but other materials can be used as long as they can accept ink. However, it is desirable to use a photosensitive resin to form a connection hole for electrical connection between the pixel electrode and the TFT as in the above embodiment.

The electro-optical device of the present invention may be a transmissive liquid crystal display device or a reflective liquid crystal display device. The driving method is not limited to the above-described active matrix driving method using TFTs, but may be a passive matrix driving method. You may.

[0047]

As described above, according to the electro-optical device and the method of manufacturing the same according to the present invention, the non-contact transfer method applied to the manufacture of a color filter can be used for forming a light-shielding layer in a region other than a pixel as it is. Since it is used, an electro-optical device can be manufactured for the first time with high efficiency, including a work step of shielding light in the same area, which has been low in efficiency.

[Brief description of the drawings]

FIG. 1 illustrates a liquid crystal display device according to an embodiment of the present invention.
It is sectional drawing (A) and top view (B) which show the formation process of a color filter and a light shielding layer.

FIGS. 2A and 2B are a cross-sectional view and a plan view, respectively, showing a step of forming a color filter and a light-shielding layer in a liquid crystal display device according to another embodiment of the present invention.

FIGS. 3A to 3C are cross-sectional views for explaining steps of manufacturing a TFT in the liquid crystal display device shown in FIGS.

FIG. 4 is a cross-sectional view illustrating a step of forming a photosensitive resin film subsequent to the step of FIG. 3;

FIG. 5 is a cross-sectional view showing a color filter forming step of a liquid crystal display device according to still another embodiment of the present invention.

FIG. 6 is a cross-sectional view showing a color filter forming step (coloring) following the step of FIG. 4;

FIG. 7 is a plan view of the color filter obtained in the step of FIG.

8 is a cross-sectional view showing a step of forming a photosensitive resin film subsequent to the step of FIG.

FIG. 9 is a cross-sectional view illustrating a step of forming a pixel electrode subsequent to the step of FIG. 8;

FIG. 10 is a schematic sectional view of a color liquid crystal display device of the present invention.

11 is an enlarged perspective view of a main part of FIG.

[Explanation of symbols]

DESCRIPTION OF SYMBOLS 1 ... Color liquid crystal display device, 2 ..., drive substrate, 3 ... counter substrate, 4 ... liquid crystal layer, 7 ... nozzle, 7a, 7b, 7c ... ink, 21 ... glass substrate, 22 ... TFT, 23 ... color filter layer, 23A: photosensitive resin film, 23a: red filter, 23b: green filter, 23c: blue filter, 2
3d: light shielding film (layer), 24: pixel electrode

Continued on the front page (72) Inventor Shinji Nakamura 6-35 Kita-Shinagawa, Shinagawa-ku, Tokyo Sony Corporation F-term (reference) 2H091 FA02Y FA34Y FA35Y FB02 FB12 FB13 FC01 FC29 FD06 GA13 GA16 LA12 LA17 5C094 AA08 AA16 AA43 AA46 BA03 BA43 CA14 DA13 ED03

Claims (19)

[Claims] A first substrate including a plurality of pixels and having pixel electrodes corresponding to the pixels; an electrode facing the pixel electrodes, facing the first substrate via an optical material layer; A second base, and a color filter formed on at least one of the first and second bases using a non-contact transfer method corresponding to the pixels;
An electro-optical device, comprising: a light-shielding layer formed by using the non-contact transfer method, wherein at least a part of a region other than the pixel is shielded from light. 2. The method according to claim 1, wherein the first substrate including a plurality of pixels corresponding to a plurality of basic colors is a driving substrate having a switching element for controlling driving of a pixel electrode. The electricity according to claim 1, wherein at least a part of a region other than the pixels is shielded from light by a light-shielding ink film formed by the non-contact ink transfer method by transferring ink using a contact ink transfer method. Optical device. 3. A peripheral portion other than a pixel portion composed of the pixels is shielded from light by a black ink film.
An electro-optical device according to claim 1. 4. The electro-optical device according to claim 2, wherein a peripheral portion other than the pixel portion constituted by the pixels is shielded from light by an ink film in which red, green, and blue inks are overlapped. 5. The electro-optical device according to claim 1, wherein the non-contact transfer method is an ink jet transfer method. 6. The electro-optical device according to claim 1, wherein the non-contact ink transfer system is an ink vaporization or sublimation transfer system. 7. The electro-optical device according to claim 1, wherein the non-contact type ink transfer system is an ink dilution type transfer system. 8. The electro-optical device according to claim 1, wherein the electro-optical device is of an active type or a passive type. 9. The electro-optical device according to claim 1, wherein the optical material layer is made of a liquid crystal. 10. A first base including a plurality of pixels and having pixel electrodes corresponding to these pixels, and an electrode facing the pixel electrodes, wherein the first base has an optical material layer therebetween.
And a color filter formed on at least one of the first and second substrates by using a non-contact transfer method corresponding to the pixel unit. A method for manufacturing an electro-optical device, comprising: forming a light shielding layer on at least a part of a region other than the pixel unit by using the non-contact transfer method when manufacturing the electro-optical device. 11. A non-contact type ink containing a plurality of pixel units corresponding to a plurality of basic colors, a driving substrate having a switching element for driving a pixel electrode, and a non-contact type ink formed on a dye receiving layer formed on the driving substrate. 11. A light-shielding ink film is formed on at least a part of a region other than the pixel unit by transferring ink using a transfer method.
3. The method for manufacturing an electro-optical device according to claim 1. 12. The method of manufacturing an electro-optical device according to claim 11, wherein a peripheral portion other than a pixel portion including the pixel is shielded from light by a black ink film. 13. The method of manufacturing an electro-optical device according to claim 11, wherein a peripheral portion other than a pixel portion constituted by the pixels is shielded from light by an ink film in which red, green, and blue inks are overlapped. . 14. The method according to claim 10, wherein an ink jet transfer method is used as the non-contact transfer method. 15. The method according to claim 10, wherein an ink vaporization or sublimation transfer method is used as the non-contact ink transfer method. 16. The method according to claim 10, wherein an ink dilution transfer method is used as the non-contact ink transfer method. 17. The method of manufacturing an electro-optical device according to claim 10, wherein the method is configured as an active or passive matrix driving method. 18. The method according to claim 10, wherein the optical material is formed of a liquid crystal. 19. The method of manufacturing an electro-optical device according to claim 10, wherein, when the transfer is performed by the non-contact transfer method, a pixel portion including the pixel and a region outside the outer periphery thereof are covered with a mask. .