JP2000029166A - Heat developable photographic sensitive material - Google Patents

Abstract

PROBLEM TO BE SOLVED: To obtain a photosensitive material having a film excellent in dimensional stability as a supporting body by controlling the humidity to a specified range of relative humidity and then packaging the material in a bag. SOLUTION: Since a general use environment of a photosensitive material is at 45 to 55% RH, it is preferable to control the humidity of the material to >=56% RH and <=85% RH, preferably >=60% RH and <=83% RH, and more preferably >=65% RH and <=80% RH and then to package the material in a bag and deliver. The humidity control in the packaging process can be carried out by controlling the work environment of the cutting and packaging processes of the heat developable material to the humidity range above described. To prevent volatilization of the water content from the supporting body such as a plastic film caused during the heat development, a barrier layer is formed to prevent dimensional changes due to rapid moisture absorption after the heat development. It is effective to form moisture preventing layers (barrier layers) to prevent volatilization of the water content on both surfaces of the film, and for example, a moisture preventing layer having >=0 and <=1×10-8 (cm3.(STP)cm-1.sec-1.cmHg-1) is preferably formed.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a photothermographic material using a low heat shrinkable plastic film as a support.

[0002]

2. Description of the Related Art Since silver halide photographic materials are subjected to complicated processing using an aqueous processing solution after photographing, they cannot be used by some users. Therefore, US Pat.
No. 52904, U.S. Pat. No. 3,457,075, JP-B-43-4921, JP-B-43-492.
A photographic light-sensitive material using a developing method using heat at 80 to 150 ° C. (hereinafter, may be abbreviated as heat development) as described in Japanese Patent Publication No. 4 (1999) -1994 is proposed. However, when a photosensitive material of this type was used as a photosensitive material for printing, image distortion and color misregistration of four plates (blue, green, red, and black) occurred due to dimensional changes occurring during thermal development. . To solve this, Japanese Patent Application Laid-Open No. 8-
Japanese Patent Application Laid-Open No. 211547 discloses a technique for performing heat treatment at low tension.

[0003]

However, the prior art has a problem that the dimensions change within 3 hours after the heat development and color shift occurs. This is a particularly serious problem in newspaper applications where exposure, development and printing must be performed in a short time. Accordingly, an object of the present invention is to provide a photothermographic material using a low heat shrinkable film having excellent dimensional stability as a support.

[0004]

SUMMARY OF THE INVENTION The present invention relates to a method for controlling a relative humidity of 56%.
% To 85% and improved dimensional stability due to bagging after humidity control, and in particular, heat using a low heat shrinkable plastic film as a support. Achieved by developed photographic materials.

[0005]

BEST MODE FOR CARRYING OUT THE INVENTION In order to reduce the dimensional change of a heat-developable photographic material immediately after heat development, it is most effective to previously include a large amount of water volatilized by heat development in a film serving as a support. . This can be achieved by adjusting the humidity of the heat-developable photosensitive material to be higher than the use environment (the environment in which the heat development is performed). Since the general use environment is 45 to 55% RH,
56% RH or more and 85% RH or less, more preferably 60%
RH to 83% RH, more preferably 65% RH
It is preferable that after humidity control at 80% RH or less, bags are shipped. Humidity control at the time of bagging can be achieved by adjusting the working environment in the step of cutting and bagging the heat-developable photosensitive material to the above humidity.

In the heat-developable photographic material of the present invention, the dimensional change immediately after heat development is 0% or more in both MD (vertical direction) and TD (horizontal direction).
0.05% or less, more preferably 0% or more + 0.04%
And more preferably 0% or more and + 0.03% or less. The dimensional change (ΔL) immediately after thermal development in the present invention is defined as
It is a value obtained by Equation 1. In addition, "+" means that the dimension increases with time. ΔL (%) = 100 × (L120−L3) / L3 (Equation 1) ΔL: Dimensional change immediately after thermal development L120: Dimension after thermal development (115 ° C for 30 seconds) at 25 ° C and 75% RH for 120 minutes L3: Dimensions after standing at 25 ° C and 75% RH for 3 minutes after thermal development (115 ° C for 30 seconds)

Further, the dimensional change of the plastic film and the photosensitive material used as the support of the present invention before and after thermal development is -0.04% or more in both the MD and TD directions.
0.04% or less, more preferably -0.03% or more
0.04% or less, more preferably -0.02% or more
0.03% or less. Here, the dimensional change (δ) before and after the thermal development can be obtained by two equations. δ (%) = 100 × (Lf−Ld) / Lf (Equation 2) Lf; Equilibrium dimension before heat development conditioned at 25 ° C. and 55% RH for 1 day Ld; 25% after heat development at 115 ° C. for 30 seconds Equilibrium dimensions adjusted for one day at 55 ° C and 55% RH

[0008] One of the solutions is to prevent volatilization of water generated during thermal development from a plastic film used as a support. By providing such a barrier layer, the amount of water volatilized during thermal development can be reduced, and
The dimensional change due to rapid moisture absorption after the thermal development is eliminated, and the dimensional change due to the time difference after the 4-plate thermal development can be reduced. For this purpose, it is effective to provide a moisture-proof layer (barrier layer) on both sides of the film for preventing the evaporation of water, and the water vapor transmission coefficient is 0 or more and 1 × 10 ⁻⁸ (cm ³ (STP) · cm ⁻¹ ).・ Sec
^-1 · cmHg ^-1 ) or less, more preferably 0 or more and 5 × 10
^-9 (cm ³ (STP) · cm ^-1 · sec ^-1 · cm Hg ^-1 ) or less, more preferably 0 or more and 3 × 10 ^-9 (cm ³ (STP) · cm ^-1 · sec ^-1 · c
mHg ^-1 ) It is preferable to provide a moisture-proof layer of the following. As a result, the water absorption rate after thermal development was also reduced, and was １ ／ of the saturated moisture absorption.
The required arrival time is 1 hour or more and 100 hours or less, more preferably 1 hour 30 minutes or more and 50 hours or less, and still more preferably 2 hours or more and 20 hours or less. On the other hand, in order to reach 100 hours or more, these layers need to be 10 μm or more, which is difficult in the coating process. In addition, "1 of saturated moisture absorption"
"The time required to reach / 2" means that a sample conditioned at 25 ° C and 20% RH is transferred to 25 ° C and 75% RH, and reaches the equilibrium size of 20% RH to 70% RH. The time to reach the average size.

Materials for the moisture-proof layer include the following. Water vapor transmission coefficient (cm ³ (STP) · cm ^-1 · sec ^-1 · cmHg ^-1 ) # 1 polyvinylidene chloride 1 × 10 ^-9 # 2 polyvinyl fluoride 1 × 10 ^-9 # 3 high density polyethylene 1 × 10 ^-9 # 4 Low density polyethylene 1 × 10 ^-8 # 5 Hydrochloric acid rubber 1 × 10 ^-9 # 6 Polyvinyl alcohol 9 × 10 ^-10 # 7 Polyethylene vinyl alcohol copolymer 6 × 10 ^-10 # 8 Vinyl chloride-acrylonitrile Copolymer 2 × 10 ^-9 # 9 Polypropylene 6 × 10 ^-9 # 10 Tetrafluoroethylene-ethylene copolymer 1 × 10 ^-8 # 11 Polyethylene naphthalate 5 × 10 ^-9 # 12 Silicon dioxide 0 # 13 Alumina 0 # 14 Talc 0 # 15 Metal aluminum 0 # 16 Mica 0 # 17 Diatomaceous earth 0 # 18 Titanium oxide 0

The organic compounds # 1 to # 11 are preferably applied on both sides of the film, and the thickness is preferably 1 μm or more and less than 10 μm on one side, more preferably 1.2 μm.
Not less than 7 μm, more preferably not less than 1.5 μm and 4 μm
It is as follows. Of these compounds, # 1, # 6, # 3, # 8, and # 11 are more preferred, and # 1 and # 6 are even more preferred. These compounds may be applied by dissolving these compounds in a solvent, or may be applied after forming a latex dispersed in water.
Further, they may be co-extruded on a base film. These compounds may be used alone, or two or more of them may be laminated or mixed. Further, fine particles such as SiO ₂ , TiO ₂ , BaSO ₄ , CaCO ₃ , talc, and kaolin for imparting lubricity, and crystalline gold oxides (for example, ZnO, TiO ₂ , SnO ₂₎ for imparting conductivity. etc)
Alternatively, the composite oxide fine particles may be added. It is also preferable to disperse the dye as a solid.

The inorganic compounds # 12 to # 18 may be provided by a method such as vacuum deposition, sputtering, or ion plating (vacuum method), or a method of mixing with a small amount of a binder (binder method) is also preferable. In the case of a vacuum method, a vacuum evaporation method is preferred from the viewpoint of productivity. Among these compounds, # 12 is particularly preferable from the viewpoint of transparency. Further, in the case of # 12, it is preferable to further vapor-deposit a fluoride or magnesium oxide of an alkaline earth metal described in Japanese Patent Application Laid-Open No. H8-224795, because the barrier property is further improved.
These vapor deposition layers may be a single layer or a stack of two or more compounds. The preferred thickness of these layers is 10 nm or more and 1000 nm or less on one side, more preferably 20 nm or less.
nm to 800 nm, more preferably 30 nm to 500 nm. # 12 for binder method
~ 18 inorganic compounds to the binder in a volume ratio of 0.1
% To 100%, more preferably 0.5% to 50%
% Or less, more preferably 1.0% or more and 30% or less.

The binder is not particularly limited as long as it is a polymer material. More preferably, the binder is a polyester polymer (PET, PEN, etc.), a polyamide polymer (nylon, gelatin, etc.), a polyvinyl polymer (polyethylene, polypropylene, polyvinylidene chloride). , Syndiotactic and atactic and isotactic polystyrene, etc.), cellulose derivatives (cellulose nitrate,
Cellulose acetate), polycarbonate, polyolefin-based polymers (polyethylene, polypropylene, styrene-butadiene rubber, etc.). Among them, gelatin, polyolefin, vinylidene chloride and styrene butadiene rubber are particularly preferred. In the case of the binder method, the binder and the inorganic compound of # 12 to # 18 may be mixed with an organic solvent and applied on a support, or may be mixed with a latex-dispersed aqueous binder solution and applied on a film. Further, these inorganic compounds may be kneaded in a binder melted at a high temperature and then co-extruded. In the case of the binder method, calendering is preferably performed in order to reduce the gap between the inorganic compounds. Further, these inorganic compound layers and the organic compound layers # 1 to # 10 may be used in combination.

The film serving as the substrate on which the moisture-proof layer is mounted is preferably a thermoplastic resin, and a polyester resin is particularly preferred in terms of mechanical strength, thermal dimensional stability, and transparency. More preferred are aromatic polyester resins, and specific examples include polyethylene terephthalate and polyethylene naphthalate. The thickness of these films is preferably 50 μm or more and 500 μm or less,
More preferably 75 μm or more and 300 μm or less, 90 μm
It is more preferably at least 200 μm. Before applying these layers, the film surface is subjected to a glow discharge treatment (for example, JP-A-8-194286) and a corona treatment (for example,
No. 8-5043), ultraviolet treatment (for example, Japanese Patent Publication No. 43-2)
No. 603) or a flame treatment is also preferable for increasing the adhesion.

Further, a plastic for a support after thermal development
It is also important to terminate the moisture absorption of the film promptly. heat
Water evaporates from the film for support due to development.
If the film quickly absorbs moisture up to the saturated moisture absorption,
The amount of change can be reduced. Film preferred
Moisture absorption rate: time to reach 1/2 of saturated moisture absorption is 0 minutes or more 3
0 minutes or less, more preferably 0 minutes or more and 15 minutes or less,
Preferably it is 0 minutes or more and 5 minutes or less. Such a fill
It is better that the water vapor permeates easily.
5 × 10^-8(cm^Three(STP) cm^-1・ Sec^-1・ CmHg^-1) More than 5
× 10^-Five(cm^Three(STP) cm^-1・ Sec^-1・ CmHg^-1)
Best, 7 × 10^-8(cm^Three(STP) cm^-1・ Sec^-1・ CmH
g ^-1) More than 1 × 10^-Five(cm^Three(STP) cm^-1・ Sec^-1・ CmHg
^-1The following is preferable, and 8 × 10^-8(cm^Three(STP) cm^-1・ Se
c^-1・ CmHg^-1) More than 5 × 10^-6(cm^Three(STP) cm^-1・ Sec
^-1・ CmHg^-1The following are more preferred. Such a fill
The following specific examples can be given as raw material polymers for
Wear. Water vapor transmission coefficient (cm^Three(STP) cm^-1・ Sec^-1・ CmHg^-1) # A syndiotactic polystyrene (s-PS) 8 × 10^-8 #b Atactic-polystyrene (a-PS) 9 × 10^-8 #c Polycarbonate (PC) 1 × 10^-7 #d Cellulose triacetate (CTA) 1 × 10^-6 #e Polymethyl methacrylate (PMMA) 2 × 10^-7 #f Polyimide (Kapton) (PI) 5 × 10^-8 #g Nylon 66 (PA) 7 × 10^-8 #h Cellulose diacetate (CDA) 1 × 10^-Five

Among these polymers, more preferred are polycarbonate (PC) or syndiotactic-
Polystyrene (s-PS). These also have the characteristic that they have high heat resistance and do not easily shrink even when subjected to thermal development. further
s-PS is preferable because it has a high elastic modulus. s-PS can be prepared, for example, by the method described in JP-A-3-131843. These polymers can be used in both melt-casting and solution-casting. s-PS, PMMA and PA are preferably melt-formed films, and CTA, PI and CDA are preferably solution-formed films. a-PS and PC can be carried out by any method of solution casting and melt casting. Melt film formation can be carried out according to a conventional method.
The pellets dried at 00 ° C. to 200 ° C. for 10 minutes or more are melted at the melting point of each polymer to the melting point + 50 ° C., and then extruded onto a casting drum having a glass transition temperature (Tg) of each polymer of −50 ° C. to Tg. Film. At this time, a better surface state can be achieved by increasing the close contact with the casting drum by a method such as an electrostatic application method.

Although the sheet thus obtained can be used as it is, it is preferable to form a stretched film which is further stretched uniaxially or more. Stretching is performed between Tg and Tg of each polymer.
It is preferable that the film is stretched 2 to 5 times at + 60 ° C. or lower. Stretching is preferably performed at least once in the vertical and horizontal directions, and more preferably, sequential biaxial stretching is performed in the horizontal direction after the vertical stretching. Thereafter, the melting point (Tm) of each polymer is -60 ° C.
It is also preferable to heat-set at ~ Tm -10 ° C for 5 seconds to 3 minutes. At this time, at least one of the MD direction and the TD direction is 0 to
Preferably, it relaxes by 10%.

In a solution casting method, each polymer is dissolved in a good solvent to prepare a 5 to 30% high concentration solution (dope) according to a conventional method.
This is cast on a belt and then heated to evaporate the solvent. Thereafter, after removing the polymer from the belt, the film is further dried to form a film. Further, a method is also used in which the dope is cast on a cooling drum, gelled, peeled off, and the solvent is volatilized. The unstretched base thus obtained may be used as it is, or may be stretched in the same manner as in the melt casting method.

A photosensitive material is prepared using the above-mentioned film as a support. Prior to coating the photosensitive layer, a back layer (BC layer) is provided on the side opposite to the photosensitive layer, and an undercoat layer is provided on the photosensitive layer side. These layers may be applied directly to the support, and the support is subjected to glow discharge treatment (for example, JP-A-8-194286), corona treatment (for example, JP-B-48-5043), and ultraviolet treatment (for example, JP-B-43-2603). It is also preferable to apply after performing the flame treatment or flame treatment.

It is preferable to apply a back layer for the purpose of imparting scratch resistance, slipperiness, curl compensation and antistatic ability to the back surface. The back layer may be made of a hydrophilic colloid as a binder, a hydrophobic polymer as a binder, and preferably gelatin. As the binder for the hydrophobic polymer layer, (meth) acrylate polymers such as polymethyl methacrylate and ethyl acrylate, olefin polymers such as polyethylene, styrene polymers, urethane polymers, and rubber polymers such as butadiene are used. This layer may be a single layer or two or more layers.

If necessary, a matting agent, a slipping agent, a charge controlling agent, a surfactant, and a crosslinking agent may be added to the back layer and / or the undercoat layer. Be conductive crystalline metal oxides or surface resistivity by adding the composite oxide fine particles as a charge control agent to 10 ¹² or less is preferable. The fine particles of the conductive crystalline oxide or its composite oxide have a volume resistivity of 10 ⁷ Ωcm or less, more preferably 10 ⁵ Ωcm.
The following are desirable: The particle size is 0.01
It is preferably from 0.7 to 0.7 μm, particularly preferably from 0.02 to 0.5 μm. A method for producing these conductive crystalline metal oxide or composite oxide fine particles is disclosed in
This is described in detail in the specification of JP-A-143430.
That is, first, a metal oxide fine particle is produced by aging and heat-treated in the presence of a heteroatom for improving conductivity,
Secondly, a method of coexisting different kinds of atoms for improving conductivity when producing metal oxide fine particles by firing,
It is easy to introduce an oxygen defect by lowering the oxygen concentration in the atmosphere when producing fine metal particles by baking. Examples of including metal atoms include ZnO, Al, I
Examples include n and the like, Nb and Ta for TiO ₂ , and Sb, Nb and halogen elements for SnO ₂ . The addition amount of the hetero atom is preferably in the range of 0.01 to 30 mol%, and particularly preferably 0.1 to 10 mol%. Of these, SnO ₂ composite metal oxide fine particles to which Sb is added are most preferred.

Further, a dyed non-photosensitive hydrophilic colloid layer (hereinafter referred to as a dyed layer) may be provided for the purpose of preventing halation, improving safelight safety, and improving front / back discrimination. Among them, a method in which the dye is dispersed in a solid state is preferable. Such a back layer may be a single layer or a multilayer, and each layer has a thickness of 0.02 to 10 μm, more preferably 0.1 to 10 μm.
７7 μm is preferred, and the total thickness of these layers is
5 μm is preferred.

It is preferable that the support is heat-treated at a low tension. As a result, the dimensional change of the support before and after thermal development can be reduced in the MD and TD directions from -0.04% to + 0.04%, more preferably from -0.03% to + 0.04%, and still more preferably -0.04% or less. 02% or more and + 0.03% or less. Such a low tension heat treatment is used for 13
5 ° C to 200 ° C, more preferably 145 ° C to 1
It is preferably carried out at a temperature of 80 ° C. or lower, more preferably 155 ° C. or higher and 170 ° C. or lower, for 20 seconds to 5 minutes, more preferably 30 seconds to 4 minutes, further preferably 40 seconds to 3 minutes. Furthermore the tension of when subjected to heat treatment 0.3 kg / cm ² or more 15 kg / cm ² or less, more preferably 0.5 kg / cm ² or more 8 kg / cm ² or less, more preferably 0.
It is preferable to carry out at a rate of 8 kg / cm ² or more and 3 kg / cm ² or less. This heat treatment is most preferably performed after the application of the back layer and the undercoat layer and before the application of the photosensitive layer.

Further, in the present invention, it is more preferable to perform a heat treatment at a low temperature (low temperature treatment of the moisture-proof layer) in order to improve the barrier property of the moisture-proof layer. The heat treatment temperature is 35 to 140 ° C, more preferably 40 to 130 ° C, still more preferably 45 to 1 ° C.
20 ° C., and heat treatment time is 12 hours to 1 in the case of 35 ° C.
Weeks are preferred, more preferably 16 hours to 4 days, even more preferably 20 hours to 2 days. At 140 ° C., 0.1 to 1 hour is preferable, 0.2 to 20 minutes is more preferable, and 0.4 to 5 minutes is further preferable.
Such a heat treatment may be performed while transporting the film, or may be performed after the film is wound around a roll.

In particular, when polyvinylidene chloride is used as the barrier layer, such a heat treatment increases the crystallinity and improves the barrier properties. This can be measured using ATR-IR (total reflection infrared spectroscopy) under the following conditions. That is, the absorbance at 1043 cm ⁻¹ (I
(C)) and the ratio I (c) / I (a) of the absorbance (I (a)) at 1069 cm ⁻¹ derived from amorphousness is 1.2 or more.
It is preferably set to 5 or less, more preferably 1.3 or more and 2.3 or less, and most preferably 1.4 or more and 2.0 or less. A
For the TR-IR measurement, a KRS-5 crystal plate was used, and the incident angle was 6
Measure by integrating 50 times at 0 degree. 1210 cm ^-1 and 92
Connected by a straight line between 0 cm ^-1, determine the absorbance of 1043 ^-1 and 1069cm ^-1 this as baseline.

On the support thus obtained, a photothermographic layer is coated. As the preferred photothermographic layer, those described in JP-A-5-224371 and JP-A-10-10676 can be used. That is, the photosensitive layer is formed by adding silver halide, organic acid silver and the like to a binder. As a binder, styrene / butadiene / acrylonitrile copolymer (SBR), polyacrylate polymer, vinyl acetate resin, polyurethane resin,
Examples thereof include a polyolefin resin and a latex of a polymethacrylate polymer. These molecular weights (Mw
) Is preferably 5,000 to 1,000,000, more preferably 10,000 to 200,000. More specifically, as the acrylic resin, Sebian A-4635, 4658, 4601 (manufactured by Daicel Chemical Industries) and Nipol Lx811,814,824,820,857 (manufactured by Nippon Zeon), and as the rubber resin, LACSTAR7310K, 3307B, 4700H, 7
132C (manufactured by Dainippon Ink and Chemicals), Nipol Lx416,410,438c, 2
507 (manufactured by Zeon Corporation), and olefin resins include Chemipearl S120 and SA100 (manufactured by Mitsui Petrochemical). These may be used alone or as a mixture. The solids concentration in these latexes is 10% or more and 80% or less,
More preferably, it is more preferably 20% or more and 70% or less. Gelatin, water-soluble polyester (for example, PET obtained by copolymerizing sulfoisophthalic acid), polyvinylpyrrolidone, starch, gum arabic, polyvinyl alcohol, polyacrylic acid, polymethacrylic acid, chitin,
It is also preferable to use a water-soluble polymer such as chitosan.
The molecular weight (Mw) of these is preferably 5,000 to 1,000,000,
10,000 to 200,000 is more preferable. These may be used alone or as a mixture.

Further, it is preferable to add a silver salt of an organic acid to the photosensitive layer. Preferred organic acid silver salts have 10 to 30 carbon atoms.
Aliphatic carboxylic acids are preferable, and silver behenate, silver arachidate, silver stearate, silver oleate, silver laurate, silver caproate, silver myristate, silver palmitate, silver maleate, silver maleate and silver fumarate are more preferable. And silver linoleate, silver butyrate, silver tartrate and the like. Among them, silver behenate is preferred. These organic silver salts are preferably dispersed and applied, and polyvinyl alcohol, polyethylene glycol, polyacrylic acid, a copolymer of acrylic acid, a maleic acid copolymer, an acryloylmethylpropanesulfonic acid copolymer, carboxymethylcellulose, It is also preferable to use a polymer such as carboxymethyl starch, an anionic surfactant described in JP-A-52-92716, WO 88/049744, or a known anionic, nonionic or cationic surfactant.

In the photosensitive layer, photosensitive silver halide is used. For example, Research Disclosure No. 17029, June 1978, and US Pat. No. 3,700,458 can be used. It is preferable to use 0.01 to 0.5 mol per 1 mol of the organic acid silver salt. Rhodium, rhenium, ruthenium, osnium,
At least one complex of a metal selected from iridium, cobalt, mercury, and iron is used in an amount of 1 nmol to 1 mol per mol of silver.
More preferably, it contains 0 mmol. Further, a sulfur sensitization method, a selenium sensitization method, and a tellurium sensitization method can be used. Further, it is preferable to add a nucleating agent. As nucleating agents, amine derivatives, onium salts, disulfide derivatives,
Examples thereof include a hydroxymethyl derivative, a hydroxam derivative, an acylhydrazide derivative, an acrylonitrile derivative, and a hydrogen donor. Among them, a hydrazine derivative having a structure represented by the following formula is preferable.

R ² —NA ¹ —NA ² — (G ¹ ) _m1 —R ^{1 wherein} R ² represents an aliphatic group, an aromatic group or a hetero group;
R ¹ represents a hydrogen atom or a block group, and G ¹ represents —CO
-, - COCO -, - C = S -, - SO 2 -, - SO
-, - PO (R ³⁾ group (R ³ is selected from the same range as radical as defined R ^1, may be different from the R ^1), or an iminomethylene group. A ¹ and A ^{2 each} represent a hydrogen atom, or one of them represents a hydrogen atom and the other represents a substituted or unsubstituted alkylsulfonyl group, a substituted or unsubstituted arylsulfonyl group, or a substituted or unsubstituted acyl group. m ₁ is 0 or 1, and when m ₁ is 0, R
¹ represents an aliphatic group, an aromatic group or a heterocyclic group.

Further, cyanine dyes, merocyanine dyes,
Complex cyanine dye, complex merocyanine dye, holo-holer cyanine dye, styryl dye,
It is also preferable to use a sensitizing dye such as a hemicyanine dye, an oxonol dye, or a hemioxonol dye. Thiazonium salts, azaindene, urazole, mercury salts, organic halogen compounds (etc.) can be used as the antifoggant. It is also preferable to use a mercapto compound, a disulfide compound, or a thione compound to control development. Dyes and pigments are also preferably used in the photosensitive layer for the purpose of antihalation, and pyrazoloazole dyes, anthraquinone dyes, azo dyes, azomethine dyes, oxonol dyes, carbocyanine dyes, styryl dyes , Tolphenylmethane dye,
Examples include indoaniline dyes, indophenol dyes, and phthalocyanines. These may be added to the photosensitive layer or may be added to the back layer. The sum of the thicknesses of these photosensitive layers is preferably 5 μm or more and 25 μm or less, and 8 μm or more and 20 μm or less.

Although various other photographic additives can be used in the present invention, all of them are described in RD, and relevant portions are shown below. Type of additive RD17643 RD18716 RD307105 Chemical sensitizer page 23, page 648, right column, page 866 2. 2. Sensitivity enhancer, page 648, right column 3. Spectral sensitizer, pages 23 to 24, page 648, right column, pages 866 to 868 Super sensitizer, page 649, right column Brightener page 24 page 647 page right column page 868 5. 5. Light absorbers, pages 25 to 26, page 649, right column, page 873 Filters, page 650, left column, dyes, ultraviolet absorbers Binder page 26 page 651 left column pages 873 to 874 7. 7. Plasticizer, page 27 page 650, right column, page 876 Lubricant Coating aid, pages 26 to 27, page 650, right column, pages 875 to 876 Surfactant 9. Static 27 pages 650 pages right column pages 876-877 Inhibitors 10. Matsuto 878-879

The measuring method used in the present invention will be described below. (1) Dimensional change immediately after thermal development 5cm width x 25cm length in width direction (TD), longitudinal direction (MD)
A sample is cut out and holes are made at intervals of 20 cm. This is brought into contact with a heat block heated to 115 ° C. for 30 seconds and thermally developed under no tension. The dimensional change is measured at 25 ° C. and 60% RH. That is, the dimension (L3) three minutes after the thermal development and the dimension 120 minutes (L60) after the thermal development are measured using a pin gauge, and the dimensional change immediately after the thermal development is determined according to the following equation. Dimensional change immediately after thermal development (%) = 100 x (L120-L3) / L3

(2) Dimensional change before and after thermal development A sample was cut out into MD and TD to a width of 5 cm and a length of 25 cm.
After humidity control at 25 ° C. and 60% RH for 24 hours, holes are formed at intervals of 20 cm, and the distance between the holes is measured using a pin gauge (this length is defined as L (f)). This is brought into contact with a heat block heated to 115 ° C. for 30 seconds and thermally developed under no tension. This is humidified at 25 ° C. and 60% RH for 24 hours, and then the distance between the holes is measured using a pin gauge (this length is defined as L (d)). From this, the dimensional change before and after thermal development is determined according to the following equation. Dimensional change before and after thermal development (%) = 100 × ｛L (d) -L
(F)｝ / L (f)

(3) Time to reach 1/2 of the saturated moisture absorption amount A sample is cut out into MD and TD with a width of 5 cm and a length of 25 cm.
After conditioning for 24 hours at 25 ° C. and 20% RH, holes at 20 cm intervals are made, and the distance between the holes is measured using a pin gauge (this length is L). This is transferred to a room at 25 ° C. and 70% RH. From this time, the distance between the holes is measured at intervals of 30 minutes. The dimensions elongate over time and converge to a constant value. This length is defined as L ′. The time required to reach the length of (L + L ') / 2 is obtained by interpolation, and is defined as "the time to reach 1/2 of the saturated moisture absorption". (4) Water vapor transmission coefficient Vacuum is applied to the two containers separated by the sample film, and 92% RH water vapor is introduced into the primary side. The amount of water vapor passing through the film and emerging on the secondary side is measured at 25 ° C. using a vacuum gauge. This is measured over time, and the transmission curve is created by taking the secondary water vapor pressure (cmHg) on the vertical axis and time (second) on the horizontal axis. The water vapor transmission coefficient is determined from the gradient of the linear portion of the transmission curve according to the following equation. Water vapor transmission coefficient (cm ³ (STP) · cm ^-1 · sec ^-1 · cmHg ^-1 ) =
(Δp / Δt) × (V / 760) × (l / pa · a) Δp / Δt: gradient of the linear portion of the transmission curve V: secondary volume (cm ³ ) l: film thickness (cm) p : Atmospheric pressure on the primary side (cmHg) a: Film thickness (cm)

[0034]

EXAMPLES Examples are shown below, but the present invention is not limited to these without departing from the spirit of the invention. Example -1 (1) Preparation of film (hereinafter referred to as support) (1-1) Preparation of supports -1 to 6 Polymerization of PET Using terephthalic acid and ethylene glycol, IV = 0.66 ( Phenol / tetrachloroethane = 6
/ 4 (measured at 25 ° C. in a weight ratio). Using a DSC, a 10 mg sample was placed in a stream of nitrogen for 20 minutes.
Tg = 70 ° C., Tm
= 255 ° C. PET film formation After pelletizing and drying at 130 ° C for 4 hours, 300 ° C
After being extruded from a T-die after being melted, the mixture was rapidly cooled, and an unstretched film having a thickness of 120 μm after heat fixing was prepared. This was MD stretched 3.3 times at 100 ° C., and then transversely stretched 4.0 times at 110 ° C. Then 240 ° C
At 90 ° for 90 seconds and 0% in the TD direction at 235 ° C.
It was wound up after having been relaxed by%.

Coating of Vinylidene Chloride Layer / Undercoat Layer Vinylidene chloride latex (PV
dC: L551B manufactured by Asahi Kasei Corporation was diluted to 1/2 with water, applied using a wire bar to a thickness shown in Table 1, and dried at 120 ° C for 2 minutes. An aqueous solution of an undercoat layer having the following composition was applied to one surface (the side coated with the photosensitive layer) using a wire bar so that the dry film thickness was 0.14 μm.
Dry at 0 ° C. for 3 minutes. Gelatin 0.9 g Methyl cellulose 0.1 g (Metroze SM15 substitution degree 1.79 to 1.83) Acetic acid (concentration 99%) 0.02 ml Distilled water 99 ml

Back 1st layer (conductive layer) Acrylic latex aqueous dispersion containing a conductive material having the following composition is applied to the opposite side of the undercoating surface so as to have a dry film thickness of 0.04 μm. After drying for 2 seconds, a support having a surface electric resistance of 10 ⁶ Ω was prepared. Acrylic resin aqueous dispersion 2.0 parts by weight (Jurimar ET410, solid content 20% by weight, manufactured by Nippon Pure Chemical Co., Ltd.) Tin oxide-antimony oxide aqueous dispersion 18.1 parts by weight (average particle size 0.1 μm, 17) % By weight) Polyoxyethylene phenyl ether 0.1 part by weight Distilled water was added thereto to prepare 100 parts by weight.

Back second layer (coloring / matte layer) On the first back layer, a coating solution having the following composition was applied so that the optical density at 660 nm after coating and drying was 0.7.

(Preparation of Coloring Agent Dispersion A) Ethyl acetate 35
2.5 g of the following compound 1 was added to 1 g of the crosslinked PMMA fine particles having an average particle size of 5 μm, followed by stirring. 50 g of a 10% by weight solution of polyvinyl alcohol previously dissolved in this liquid
Was added and dispersed with a homogenizer for 5 minutes. afterwards,
Ethyl acetate was removed by solvent removal, and then diluted with water to prepare a color former dispersion.

[0039]

Embedded image

Back Third Layer (Polyolefin Layer: Sliding Layer) An aqueous dispersion of polyolefin latex having the following composition was applied on the coloring layer so that the dry film thickness was 0.15 μm. This was dried at 185 ° C. for 3 minutes. Polyolefin 3.0 parts by weight (Chemipearl S-120, 27% by weight, manufactured by Mitsui Petrochemical Co., Ltd.) Colloidal silica 2.0 parts by weight (Snowtex C, Nissan Chemical Co., Ltd.) Epoxy compound 0.3 parts by weight (Denacol EX-614B, manufactured by Nagase Kasei Co., Ltd.) Distilled water was added to adjust the total to 100 parts by weight.

[0041]

[Table 1]

(1-2) Film-7 (hereinafter referred to as a support)
The silica layer described in Example 1 of JP-A-8-224795 was formed on both sides of a PET support formed in the same manner as Support-1 by a sputtering method. This one side (photosensitive layer application side)
A vinylidene chloride layer and an undercoat layer were formed thereon in the same manner as in Support-1. The back first to third layers were coated on the opposite surface in the same manner as in the case of the support 1. (1-3) Preparation of Supports 8 and 9 (hereinafter, referred to as Support) Mica dispersion liquids 1 and 2 having the following composition were coated on both surfaces of a PET support formed in the same manner as Support 1 in Table 1. Was applied to obtain a dry film thickness. This was dried at 115 ° C. for 3 minutes. Mica dispersion liquid-1 Vinylidene chloride latex (L551B manufactured by Asahi Kasei Corporation) 20 parts by weight Synthetic mica powder aqueous dispersion (average particle size 0.1 μm, 20% by weight) 15 parts by weight Polyoxyethylene phenyl ether 0.1 parts by weight Distilled water was added to the mixture, and the mixture was adjusted to 100 parts by weight.

Mica Dispersion-2 Gelatin 5 parts by weight Synthetic mica powder aqueous dispersion (average particle size 0.1 μm, 5% by weight) 2.5 parts by weight Polyoxyethylene phenyl ether 0.1 parts by weight Distilled water was added thereto. In addition, it was adjusted to be 100 parts by weight. An undercoat layer was formed on one surface (the side coated with the photosensitive layer) in the same manner as in Support-1. The back first to third layers were coated on the opposite surface in the same manner as in the case of the support 1. The support coated with Mica Dispersion-1 was named Support 8, and the support coated with Mica Dispersion-2 was named Support 9. (1-4) Preparation of Support 10 (hereinafter referred to as support) A polyvinyl alcohol resin dispersion (PVOH: PVA117 manufactured by Kuraray Co., Ltd.) is applied on both sides of a PET support formed in the same manner as Support-1. Was applied so as to have a dry film thickness shown in Table 1. This was dried at 115 ° C. for 3 minutes. An undercoat layer was formed on one surface (the side coated with the photosensitive layer) in the same manner as in Support-1. The back first to third layers were coated on the opposite surface in the same manner as in the case of the support 1.

(1-4) Support-11 (hereinafter referred to as support)
Preparation of PET Polymerized in the same manner as Support-1 and a polyethylene vinyl alcohol copolymer (EVOH: EVAL EP101 manufactured by Kuraray Co., Ltd.) were co-extruded at 300 ° C. using a multi-manifold die. After quenching this, 1
After MD stretching at 00 ° C. to 3.3 times, 4.0 stretch at 110 ° C.
Laterally stretched twice. Thereafter, the film was heat-set at 240 ° C. for 90 seconds, relaxed by 0% and 3% in the TD direction at 235 ° C., and wound up. In this way, a support was obtained in which EVOH having the thickness shown in Table 1 was laminated on both sides of 120 μm PET. A vinylidene chloride layer and an undercoat layer were formed on one surface (the side on which the photosensitive layer was coated) in the same manner as in Support-1. The back first to third layers were coated on the opposite surface in the same manner as in the case of the support 1.

(1-5) Support -12 (hereinafter referred to as support)
Preparation of PET polymerized in the same manner as Support-1 and JP-A-8-1
60565 Polyethylene naphthalate (PEN) polymerized according to Example 1 was co-extruded at 300 ° C. using a multi-manifold die. After quenching this, 1
After MD stretching to 3.3 times at 30 ° C., 4.0 at 135 ° C.
Laterally stretched twice. Thereafter, the film was heat-set at 240 ° C. for 90 seconds, relaxed by 0% and 3% in the TD direction at 235 ° C., and wound up. In this way, a support in which PEN having the thickness shown in Table 1 was laminated on both sides of 120 μm PET was obtained. A vinylidene chloride layer and an undercoat layer were formed on one surface (the side on which the photosensitive layer was coated) in the same manner as in Support-1. The back first to third layers were coated on the opposite surface in the same manner as in the case of the support 1.

(2) Low Tensile Heat Treatment To reduce the dimensional change before and after thermal development, low tension heat treatment was performed under the conditions shown in Table 1 after the undercoating and the back layer were applied. In addition, all the levels were carried out while transporting at a tension of 1.0 kg / cm ² . (3) Low-temperature treatment of moisture-proof layer In order to enhance the moisture-proof property, the support after the low-tension heat treatment was heat-treated under the conditions shown in Table 1. (4) Evaluation of Support The dimensional change immediately after thermal development, the dimensional change before and after thermal development, and the time to reach half of the saturated moisture absorption were measured for the support thus obtained in accordance with the above method. The results are shown in Table 1. (5) Preparation of photosensitive material The following photosensitive layer was provided on the undercoat layer side of the support obtained by the above method.

(5-1) SBR photosensitive layer (Preparation of silver halide grains A) 22 g of phthalated gelatin and 30 mg of potassium bromide are dissolved in 700 ml of water, and the pH is adjusted to 5.0 at a temperature of 40 ° C. After that, 159 ml of an aqueous solution containing 18.6 g of silver nitrate and an aqueous solution containing potassium bromide were added over 10 minutes by a control double jet method while keeping the pAg at 7.7. K ₃ [Ir
An aqueous solution containing 8 × 10 ^-6 mol / l of Cl ₆ ] ^3- and 1 mol / l of potassium bromide was added over 30 minutes by the control double jet method while keeping the pAg at 7.7. Thereafter, the pH was adjusted to 5.9 and pAg to 8.0. The obtained particles were cubic particles having an average particle size of 0.07 μm, a variation coefficient of the projected area diameter of 8%, and a (100) area ratio of 86%. The above silver halide grains C were heated to a temperature of 60 ° C., and 8.5 × 10 ⁻⁵ mol of sodium thiosulfate and 1.1 × 10 ⁻⁵ mol of 2,3,
4,5,6-pentafluorophenyldiphenylsulfin selenide, 2 × 10 ^-6 mol of tellurium compound 1,3.
3 × 10 ^-6 mol of chloroauric acid and 2.3 × 10 ^-4 mol of thiocyanic acid were added, and the mixture was aged for 120 minutes. Thereafter, the temperature was raised to 50 ° C., 8 × 10 ⁻⁴ mol of sensitizing dye C was added with stirring, and 3.5 × 10 ⁻² mol of potassium iodide was further added, followed by stirring for 30 minutes. And the preparation of silver halide was completed.

[0048]

Embedded image

(Preparation of Organic Acid Silver Crystalline Dispersion) 9 g of behenic acid, 7.3 g of stearic acid and 500 ml of distilled water
Mix at 0 ° C. for 15 minutes, and add 1N-Na with vigorous stirring.
187 ml of an aqueous OH solution was added over 15 minutes, and 1N-
A nitric acid aqueous solution (61 ml) was added, and the temperature was lowered to 50 ° C. Next, 124 ml of a 1N aqueous nitric acid solution was added, and 3
Stirred for 0 minutes. Then, the solid content was filtered by suction filtration,
The solid content was washed with water until the conductivity of the filtrate reached 30 μS / cm. The solid content thus obtained was handled as a wet cake without drying, and 12 g of polyvinyl alcohol was added to a wet cake equivalent to 34.8 g of dry solid content.
And 150 ml of water were added and mixed well to form a slurry. Prepare 840 g of zirconia beads having an average diameter of 0.5 mm, put them in a vessel together with the slurry, and use a disperser (1
/ 4G-Sand Grinder Mill: IMEX Co., Ltd.
For 5 hours to obtain an organic acid silver microcrystal dispersion having a volume weighted average of 1.5 μm. The measurement of the particle size is calculated using Ma
lvern Instruments Ltd. Made
The measurement was performed using Master SaizerX.

(Preparation of Material Solid Fine Particle Dispersion) Tetrachlorophthalic acid, 4-methylphthalic acid, 1,1-bis (2
-Hydroxy-3,5-dimethylphenyl) -3,5
Solid fine particle dispersions were prepared for 5-trimethylhexane, phthalazine, and tribromomethylsulfonylbenzene. 0.81 g of hydroxypropylcellulose and 94.2 ml of water were added to tetrachlorophthalic acid, stirred well, and left as a slurry for 10 hours. Then, zirconia beads having an average diameter of 0.5 mm
ml and the slurry were put together in a vessel, and mixed with the same type of dispersing machine as used in the preparation of the organic acid silver microcrystal dispersion.
After time dispersion, a solid microcrystalline dispersion of tetrachlorophthalic acid was obtained. The particle size of the solid fine particles is 1.0% by 70 wt%.
μm.

(Preparation of Emulsion Layer Coating Solution) The following composition was added to the previously prepared organic acid silver microcrystal dispersion to prepare an emulsion coating solution. Organic acid microcrystal dispersion 1 mol Halogen particles A 0.05 mol Binder, SBR latex (LACSTAR 3307B Dainippon Ink and Chemicals, Inc.) 430 g Material for development: Tetrachlorophthalic acid 5 g 1,1-bis (2-hydroxy -3,5-dimethylphenyl) -3,5,5-trimethylhexane 98 g phthalazine 9.2 g tribromomethylphenolphenol 12 g 4-methylphthalic acid 7 g hydrazine nucleating agent 5.0 × 10 ⁻³ mol / Ag 1 mol

(Preparation of Coating Solution for Emulsion Protective Layer) The following compositions were added to inert gelatin to prepare a coating solution for emulsifying protective layer. Inert gelatin 10 g Surfactant A 0.26 g Surfactant B 0.09 g Matting agent (PMMA having an average particle size of 3 μm) 1 g 1,2- (bisvinylsulfone acetamide) ethane 0.3 g Water 64 g

[0053]

Embedded image

(6) Packaging of photosensitive material The photosensitive material was equilibrated at 25 ° C. with the humidity shown in Table 2, and then packaged. (7) Evaluation of photosensitive material The dimensional change immediately after thermal development and the dimensional change before and after thermal development were measured for the thus obtained support according to the above-mentioned method.
The results are shown in Table 2. Furthermore, a square having a side of 60 cm was written on these photosensitive materials using a scanner, and 3
Heat development was performed for 0 seconds. The plate was placed under 25 ° C. and 60% RH for 2 hours, and the plate immediately after the same pattern was written and heat-developed was overlapped. The present invention achieved better dimensional stability than Comparative Example 1 prepared according to Example 1 of JP-A-8-211547.

[0055]

[Table 2]

Example-2 (1) Preparation of a film (hereinafter referred to as a support) (1-1) Preparation of a syndiotactic-polystyrene (s-PS) support 6 l of toluene was used as a reaction solvent and a catalyst was used as a catalyst. 5 mmol of tetraethoxytitanium and 500 mmol of methylaluminoxane as aluminum atoms were added, and styrene 48.94: p-
1.06 methyl styrene was added, and a polymerization reaction was performed for 2 hours. After the reaction, the product was washed with a mixed solution of hydrochloric acid and methanol to decompose and remove the catalyst component. Next, 640 g of a copolymer was obtained by drying. The weight average molecular weight (Mw) of this copolymer was 440,000, and the number average molecular weight (Mn) was 240,000. The content of the p-methylstyrene unit in this copolymer was 5% by weight. Also,
This copolymer was analyzed by 13 C-NMR to find that it had a 145.
11 ppm, 145.22 ppm, 142.09 ppm
And the syndiotacticity of racemic pentad of styrene units calculated from the peak area was 72%. This was dried under reduced pressure at 150 ° C. for 5 hours and extruded at 280 ° C. to obtain an unstretched sheet on a cooling drum at 50 ° C. This was longitudinally stretched 3.3 times at 115 ° C., then transversely stretched 3.5 times at 120 ° C., heat-set at 180 ° C. for 30 seconds, and then 3% in the transverse direction.
Thermal relaxation was performed at 220 ° C. while relaxing. Thus, the biaxially stretched s-PS film of 120 μm (support-1
4) was obtained.

(1-2) Preparation of Polycarbonate (PC) Support PC resin (Iupilon MB2210NU manufactured by Teijin Limited)
Was dried under reduced pressure at 170 ° C. for 5 hours and extruded at 280 ° C.
An unstretched sheet was obtained on a cooling drum at 80 ° C. This was longitudinally stretched 3.3 times at 155 ° C., and then transversely stretched 3.5 times at 160 ° C. In this way, 120 μm
Of a stretched PC film (Support 15) was obtained. Further, Iupilon MB2210NU is similarly extruded at 280 ° C., and a 120 μm unstretched PC is placed on a cooling drum at 80 ° C.
A film (Support 16) was obtained. (1-3) Preparation of atactic-polystyrene (a-PS) support a-PS resin (Dialex manufactured by Mitsubishi Kasei Polytech Co., Ltd.) was dried under reduced pressure at 140 ° C. for 5 hours, extruded at 280 ° C., and extruded at 50 ° C. An unstretched sheet was obtained on the cooling drum. This was longitudinally stretched 3.3 times at 115 ° C., and then 120 ° C.
Was performed to stretch 3.5 times. In this way, 120μ
Thus, an a-PS stretched film (Support 17) of m was obtained. Further extrude Dialex at 280 ° C and 50 ° C
To obtain a 120 μm a-PS unstretched film (Support 18).

(1-4) Polymethyl methacrylate (PMM
A) Preparation of support 1 PMMA resin (Acrylite-IR manufactured by Mitsubishi Rayon)
Extruded at 280 ° C after drying under reduced pressure at 40 ° C for 5 hours,
An unstretched sheet was obtained on a cooling drum at 0 ° C. This is 11
After stretching longitudinally 3.3 times at 5 ° C., 3.5 at 120 ° C.
Lateral stretching was performed twice. In this way, 120 μm PM
An MA stretched film (Support 19) was obtained. Further, Dialex was similarly extruded at 280 ° C. to obtain a 120 μm unstretched PMMA film (support 20) on a cooling drum at 50 ° C. (1-5) Preparation of Cellulose Triacetate (CTA) Support JP-B-5-17844 According to the method of Example 1, a film thickness of 120 μm was obtained by a solution casting method using a dichloromethane-based dope.
Of CTA unstretched film (Support 21) was obtained.

(2) Coating of Undercoat and Back Layer The following surface treatment, undercoat layer and back layer were applied to s-PS, PC and PET supports. Surface treatment Corona treatment was performed on both sides of the support for coating. Equipment: Pillar solid state corona treatment machine 6KV
A model conditions: temperature = room temperature, processing speed = 20 m / min, strength = 0.
375 kV · A · min / m ² , processing frequency = 9.6 kHz
z, gap clearance between electrode and dielectric roll = 1.
6 mm Undercoat First Layer Coating A water-dispersed latex having the following composition was applied to both sides of the support using a wire bar so that the dry film thickness was 0.3 μm.
Dry at 120 ° C. for 2 minutes. Butadiene-styrene copolymer latex 13 ml (solid content 43%, butadiene / styrene weight ratio = 32/68) 2,4-dichloro-6-hydroxy-S-triazine sodium 7 ml salt 8% aqueous solution sodium laurylbenzenesulfonate 1% Aqueous solution 1.6ml distilled water 80ml

Application of Second Undercoat Layer An aqueous solution having the following composition was applied on the first undercoat layer using a wire bar so that the dry film thickness was 0.14 μm.
Dried at 80 ° C. for 2 minutes. Gelatin 0.9 g Methyl cellulose 0.1 g (Metroose SM15 substitution degree 1.79 to 1.83) Acetic acid (concentration 99%) 0.02 ml Distilled water 99 ml Back layer First back layer (conductive layer) as in Example 1. And a back second layer (coloring / matte layer) and a third back layer (polyolefin layer: slip layer).

(3) Low tension heat treatment Low tension heat treatment was carried out under the conditions shown in Table 3 in order to reduce the dimensional change before and after thermal development. However, each level was carried out while conveying at 0.8 kg / cm ² . (4) Evaluation of Support The water vapor transmission coefficient, the dimensional change immediately after thermal development, the dimensional change before and after thermal development, and the time to reach 1/2 of the saturated water absorption were measured for the support thus obtained in accordance with the above methods. The results are shown in Table 3.

[0062]

[Table 3]

(5) Preparation of photosensitive material The same photosensitive layer as in Example 1 was applied on the undercoat layer side of the support obtained by the above method. This was packaged at 25 ° C. at the humidity shown in Table 4. (6) Evaluation of photosensitive material The dimensional change immediately after thermal development and the dimensional change before and after thermal development were measured for the thus obtained support according to the method described above.
The results are shown in Table 4. Furthermore, a square having a side of 60 cm was written on these photosensitive materials using a scanner, and 3
Heat development was performed for 0 seconds. The plate was placed under 25 ° C. and 60% RH for 2 hours, and the plate immediately after the same pattern was written and heat-developed was overlapped.

[0064]

[Table 4]

[0065]

According to the present invention, a low heat shrinkable support having excellent dimensional stability and a photothermographic material can be provided.

Claims (9)

[Claims] 1. A heat-developable photographic light-sensitive material, characterized in that dimensional stability is improved by stuffing a bag after humidity control at a relative humidity of 56% to 85%. 2. The photothermographic material according to claim 1, wherein the photothermographic material is a low heat shrinkable plastic film as a support. 3. The dimensional change immediately after thermal development is 0% or more and + 0.05% or less in both the machine direction (MD) and the transverse direction (TD) of the plastic film.
2. The photothermographic material according to item 1. 4. The photothermographic material according to claim 1, wherein the dimensional change before and after thermal development is in the range of -0.04% to + 0.04% in both the MD and TD directions. 5. The photothermographic material according to claim 1, wherein the time required to reach half the saturated moisture absorption of the support is from 1 hour to 100 hours. 6. A water vapor transmission coefficient of 0 or more and 1 × 10^-8(cm
^Three(STP) cm^-1・ Sec ^-1・ CmHg^-1) The following moisture-proof layer is the support
6. The device according to claim 5, wherein
Photothermographic material. 7. The photothermographic material according to claim 5, wherein the plastic film comprises an aromatic polyester. 8. The photothermographic material according to claim 1, wherein the time to reach a half of the saturated moisture absorption is 0 to 30 minutes. 9. The low heat shrinkable support having a water vapor permeability coefficient of 9.
5 × 10^-8(cm^Three(STP) cm^-1・ Sec^-1 ・ CmHg^-1)that's all
5 × 10^-Five(cm^Three(STP) cm^-1・ Sec^-1・ CmHg ^-1Below)
9. The photothermographic material according to claim 8, wherein
material.