JP2000011363A - Magnetic recording medium - Google Patents

Magnetic recording medium

Info

Publication number
JP2000011363A
JP2000011363A JP10177597A JP17759798A JP2000011363A JP 2000011363 A JP2000011363 A JP 2000011363A JP 10177597 A JP10177597 A JP 10177597A JP 17759798 A JP17759798 A JP 17759798A JP 2000011363 A JP2000011363 A JP 2000011363A
Authority
JP
Japan
Prior art keywords
film
magnetic layer
magnetic
recording medium
magnetic recording
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10177597A
Other languages
Japanese (ja)
Inventor
Nobuaki Ito
伸明 伊藤
Wasuke Yoneyama
和祐 米山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Priority to JP10177597A priority Critical patent/JP2000011363A/en
Publication of JP2000011363A publication Critical patent/JP2000011363A/en
Pending legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To improve productivity by forming a magnetic layer on the surface of an aromatic polyamide film having equal to or below a specific slack quantity under a specific condition to prevent the deformation due to heat or the like to secure smoothness and to improve travelling property. SOLUTION: The deformation of the film caused by separating from a supporting body such as a drum at the time of vapor depositing the magnetic layer and the damage of the film caused by the poor contacting with a guide roll at the time of travelling are prevented by providing the magnetic layer on the surface of the aromatic polyamide film having <=60 mm, preferably <=30 mm slack quantity when 0.5 kg/mm2 weight is loaded on the 610 mm wide 2 m long film. And the generation of wrinkles caused by the sliding defect of the film at the time of vapor deposition is suppressed by controlling the friction coefficient of the surface of the non-magnetic layer opposed to the surface of the magnetic layer to <=2 and the deterioration of the magnetic properties is suppressed by controlling the 10 points average roughness of the film surface of the magnetic layer side to 1-100.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は耐熱性、平面性の良
好な芳香族ポリアミドフィルムの上に磁性層を設けた磁
気記録媒体に関するものである。
The present invention relates to a magnetic recording medium having a magnetic layer provided on an aromatic polyamide film having good heat resistance and flatness.

【0002】[0002]

【従来の技術】芳香族ポリアミドフィルムは、その優れ
た耐熱性、機械特性を活かして種々の用途が検討されて
いる。特にパラ配向系の芳香族ポリアミドは剛性、強度
等の機械特性が他のポリマーより優れているため、フィ
ルムの薄物化あるいはフィルム基材強度の向上に有利で
あり、プリンターリボン、磁気記録媒体、コンデンサ
ー、太陽電池等の用途が検討されている。
2. Description of the Related Art Various applications of aromatic polyamide films are being studied by utilizing their excellent heat resistance and mechanical properties. In particular, para-oriented aromatic polyamides are superior to other polymers in mechanical properties such as rigidity and strength, and are therefore advantageous for thinning films or improving the strength of film base materials, such as printer ribbons, magnetic recording media, and capacitors. Applications such as solar cells and the like are being studied.

【0003】磁気記録媒体としては特開昭58ー168655、
特開昭62ー112218号公報などで知られている。磁気記録
媒体としては、磁性粉をバインダーとともにフィルムの
表面に塗布して製造された塗布型や、真空蒸着、スパタ
リング、イオンプレーテイングなどの方法によりCo、
Ni、Crなどを基材フィルム上に形成させた金属薄膜
型の磁気記録媒体があり、後者は記録密度の向上に特に
有望視されている。
As a magnetic recording medium, JP-A-58-168655,
This is known from JP-A-62-112218. As a magnetic recording medium, Co, a coating type manufactured by applying a magnetic powder together with a binder to the surface of a film, a method such as vacuum evaporation, sputtering, or ion plating, may be used.
There is a metal thin-film type magnetic recording medium in which Ni, Cr, etc. are formed on a base film, and the latter is particularly expected to improve the recording density.

【0004】[0004]

【発明が解決しようとする課題】磁気記録媒体を製造す
る方法としては、金属薄膜型の場合は真空中でフィルム
に連続的に真空蒸着、スパッタリング等の方法で作成す
る方法がある。生産性や磁気特性の向上のために製造工
程の改良が種々行われているが、走行速度を上げたり、
高温で蒸着が行われるようになり、フィルムの耐熱性や
平面性の向上が重要になっている。特に金属薄膜型の磁
気記録媒体の製造ではフィルムの平面性が悪いと蒸着の
際にフィルムがドラムなどの支持体から浮き上がり、そ
の部分のフィルムが熱変形する問題が発生する。また走
行速度の向上に伴い、平面性が悪いために走行性にむら
が生じ、フィルムに傷が入るなど膜特性の劣化の問題も
生じている。
As a method of manufacturing a magnetic recording medium, in the case of a metal thin film type, there is a method in which a film is continuously formed on a film in a vacuum by a method such as vacuum evaporation or sputtering. Various improvements have been made to the manufacturing process to improve productivity and magnetic properties.
As vapor deposition is performed at a high temperature, it is important to improve heat resistance and flatness of a film. In particular, in the production of a metal thin film type magnetic recording medium, if the flatness of the film is poor, the film floats up from a support such as a drum at the time of vapor deposition, and a problem that the film in that portion is thermally deformed occurs. Further, with the improvement of the running speed, unevenness of the running property occurs due to poor flatness, and there is a problem of deterioration of film characteristics such as damage to the film.

【0005】本発明はかかる問題点を解決し、芳香族ポ
リアミドの優れた高剛性、耐熱性を活かし、平坦で生産
性の向上にも耐えられるフィルムを使用した磁気記録媒
体を提供することを目的とする。
An object of the present invention is to solve the above-mentioned problems and to provide a magnetic recording medium using a film which is flat and can withstand an improvement in productivity by utilizing the excellent high rigidity and heat resistance of aromatic polyamide. And

【0006】[0006]

【課題を解決するための手段】本発明は、610mm幅
で2m長のフィルムに0.5kg/mm2の荷重をかけ
た際の中央部でのフィルムのタルミ量が60mm以下で
ある芳香族ポリアミドフィルムの表面に磁性層を設けた
ことを特徴とする磁気記録媒体である。
The present invention relates to an aromatic polyamide having a film thickness of 60 mm or less at the center when a load of 0.5 kg / mm 2 is applied to a film of 610 mm width and 2 m length. A magnetic recording medium characterized in that a magnetic layer is provided on the surface of the film.

【0007】[0007]

【発明の実施の形態】本発明の芳香族ポリアミドとして
は、次の一般式(I)および/または一般式(II)で表
わされる繰り返し単位を50モル%以上含むものが好ま
しく、70モル%以上からなるものがより好ましい。
BEST MODE FOR CARRYING OUT THE INVENTION The aromatic polyamide of the present invention preferably contains at least 50 mol% of repeating units represented by the following general formulas (I) and / or (II), more preferably at least 70 mol%. Is more preferred.

【0008】一般式(I)Formula (I)

【化1】 一般式(II)Embedded image General formula (II)

【化2】 ここで、Ar1、Ar2、Ar3は 例えば、Embedded image Here, Ar 1 , Ar 2 , and Ar 3 are, for example,

【化3】 などが挙げられ、X、Yは −O−,−CH2−,−CO−,−SO2−, −S−,
−C(CH32− 等から選ばれるが、これに限定されるものではない。更
にこれらの芳香環上の水素原子の一部が、ハロゲン基
(特に塩素)、ニトロ基、C1 〜C3 のアルキル基(特
にメチル基)、C1 〜C3 のアルコキシ基などの置換基
で置換されているものも含み、また、重合体を構成する
アミド結合中の水素が他の置換基によって置換されてい
るものも含む。特性面からは上記の芳香環がパラ位で結
合されたものが、全芳香環の50%以上、好ましくは7
0%以上を占める重合体が、フィルムの剛性が高く耐熱
性も良好となるため好ましい。また吸湿率を小さくする
点からは、芳香環上の水素原子の一部がハロゲン基(特
に塩素)で置換された芳香環が全体の30%以上である
重合体が好ましい。
Embedded image And the like, X, Y is -O -, - CH 2 -, - CO -, - SO 2 -, -S-,
—C (CH 3 ) 2 — and the like, but is not limited thereto. Further, some of the hydrogen atoms on these aromatic rings may be substituted with a substituent such as a halogen group (especially chlorine), a nitro group, a C 1 -C 3 alkyl group (especially a methyl group), a C 1 -C 3 alkoxy group. And those in which the hydrogen in the amide bond constituting the polymer is substituted by another substituent. From the viewpoint of characteristics, those in which the above aromatic rings are bonded at the para position are 50% or more, preferably 7%, of the total aromatic rings.
A polymer occupying 0% or more is preferable because the film has high rigidity and good heat resistance. From the viewpoint of reducing the moisture absorption, a polymer in which a part of hydrogen atoms on an aromatic ring is substituted with a halogen group (particularly chlorine) and the aromatic ring is 30% or more of the whole is preferable.

【0009】芳香族ポリアミドのより好ましい構造とし
ては、
A more preferred structure of the aromatic polyamide is as follows:

【化4】 (ここでm、nは0〜4)を50モル%以上、さらに好
ましくは70モル%以上からなるものである。
Embedded image (Where m and n are from 0 to 4) are at least 50 mol%, more preferably at least 70 mol%.

【0010】本発明の芳香族ポリアミドは、一般式
(I)および/または一般式(II)で表される繰り返し
単位を50モル%以上含むものが好ましく、たとえば芳
香族ポリイミドなど他の繰り返し単位が50モル%未満
が共重合、またはブレンドされていてもよく、またフィ
ルムの物性を損なわない程度に導電性粒子、滑剤、酸化
防止剤その他の添加剤等がブレンドされていてもよい。
The aromatic polyamide of the present invention preferably contains at least 50 mol% of the repeating units represented by the general formula (I) and / or the general formula (II). Less than 50 mol% may be copolymerized or blended, and conductive particles, lubricants, antioxidants and other additives may be blended to such an extent that the physical properties of the film are not impaired.

【0011】本発明のフィルムの厚さは1μm以上20
μm以下が好ましい。より好ましくは2μm以上6μm
以下である。
The film of the present invention has a thickness of 1 μm or more and 20 μm or more.
μm or less is preferred. More preferably, 2 μm or more and 6 μm
It is as follows.

【0012】本発明のフィルムは610mm幅で2m長
のフィルムに0.5kg/mm2の荷重をかけた際の中
央部でのフィルムのタルミ量が60mm以下である必要
がある。好ましくは30mm以下である。60mmより
大きいと蒸着の場合はドラムなどの支持体上でフィルム
が支持体から離れ、フィルムが熱で変形するなどの問題
が発生する。またフィルムを走行させる時にガイドロー
ルとの接触が不良となり、フィルムに傷が入るなどの問
題も発生する。
In the film of the present invention, when a load of 0.5 kg / mm 2 is applied to a film having a width of 610 mm and a length of 2 m, the thickness of the film at the central portion needs to be 60 mm or less. Preferably it is 30 mm or less. If it is larger than 60 mm, in the case of vapor deposition, the film separates from the support on a support such as a drum, and problems such as deformation of the film by heat occur. Further, when the film is run, the contact with the guide roll becomes poor, and problems such as scratching of the film occur.

【0013】本発明のフィルムは磁性層を設ける面(A
面と称する)とは異なる非磁性層面(B面と称する)の
摩擦係数を2以下とすることが好ましく、より好ましく
は1以下である。下限は特に限定されないが0.2程度
が好ましい。摩擦係数が2より大きいと蒸着時に支持体
上でシワが入った場合、フィルムが滑りにくくなり、そ
のためにシワが伸びきらず、熱でフィルムが変形するな
どの問題が発生する。
The film of the present invention has a surface (A) on which a magnetic layer is provided.
The friction coefficient of the nonmagnetic layer surface (referred to as surface B) different from that of the nonmagnetic layer (referred to as surface B) is preferably 2 or less, more preferably 1 or less. The lower limit is not particularly limited, but is preferably about 0.2. If the coefficient of friction is larger than 2, when wrinkles are formed on the support during vapor deposition, the film becomes less slippery, so that the wrinkles cannot be extended and the film is deformed by heat.

【0014】また磁性層を設ける面の十点平均粗さRz
は1〜100nmであることが好ましい。より好ましく
は2〜50nmである。これより大きいと磁気特性の低
下などが懸念される。
The ten-point average roughness Rz of the surface on which the magnetic layer is provided is
Is preferably 1 to 100 nm. More preferably, it is 2 to 50 nm. If it is larger than this, there is a concern that the magnetic properties may deteriorate.

【0015】本発明のフィルムは表面粗さや摩擦係数を
維持するために、フィルム中に粒子を存在させておくこ
とが好ましい。粒子の種類としては、SiO2、Ti
2、Al23、CaSO4、BaSO4、CaCO3、カ
−ボンブラック、ゼオライト、その他の金属微粉末など
の無機粒子や、シリコン粒子、ポリイミド粒子、架橋共
重合体粒子、架橋ポリエステル粒子、テフロン粒子など
の有機高分子などがあるが、耐熱性の点から無機粒子の
方がより好ましい。粒子径は0.01〜5μm、より好
ましくは0.05〜2μmの範囲である。また含有量は
0.005〜10wt%が好ましく、0.01〜5wt
%がより好ましい。
The film of the present invention preferably contains particles in the film in order to maintain the surface roughness and the coefficient of friction. The types of particles include SiO 2 , Ti
Inorganic particles such as O 2 , Al 2 O 3 , CaSO 4 , BaSO 4 , CaCO 3 , carbon black, zeolite and other metal fine powders, silicon particles, polyimide particles, cross-linked copolymer particles, cross-linked polyester particles And organic polymers such as Teflon particles, but inorganic particles are more preferable from the viewpoint of heat resistance. The particle size is in the range of 0.01 to 5 μm, more preferably 0.05 to 2 μm. The content is preferably 0.005 to 10 wt%, and 0.01 to 5 wt%.
% Is more preferred.

【0016】A面とB面の表面性は同じでも異なってい
てもよいが、特に金属薄膜型の場合にはB面側を粗らす
ことが好ましい。表面性を変えるには公知の方法で行う
ことができ、例えばフィルムの表面に粒子とバインダー
を塗布する方法、口金や積層管で積層する方法などがあ
る。さらにA層とB層との間に他の層を1層以上設けて
もよい。
The surface properties of the surface A and the surface B may be the same or different, but it is preferable to roughen the surface B especially in the case of a metal thin film type. The surface properties can be changed by a known method, for example, a method of applying particles and a binder to the surface of a film, a method of laminating with a die or a laminated tube, and the like. Further, one or more other layers may be provided between the layer A and the layer B.

【0017】本発明のフィルムは150℃でのTD方向
の熱収縮率が2%以下が好ましい。より好ましくは1%
以下である。2%より大きいと蒸着の場合は熱でフィル
ムが変形しやすい。
The film of the present invention preferably has a heat shrinkage in the TD direction at 150 ° C. of 2% or less. More preferably 1%
It is as follows. If it exceeds 2%, the film is likely to be deformed by heat in the case of vapor deposition.

【0018】また本発明のフィルムのヤング率はMD方
向が700kg/mm2以上、TD方向は800kg/
mm2以上、より好ましくはTD方向は1000kg/
mm2あることが好ましい。
The Young's modulus of the film of the present invention is 700 kg / mm 2 or more in the MD direction and 800 kg / mm 2 in the TD direction.
mm 2 or more, more preferably 1000 kg /
mm 2 is preferred.

【0019】本発明のフィルムの伸度は10%以上が好
ましく、より好ましくは20%以上、更に好ましくは3
0%以上であると適度な柔軟性を持つので望ましい。
The elongation of the film of the present invention is preferably 10% or more, more preferably 20% or more, and still more preferably 3% or more.
If it is 0% or more, it is desirable because it has appropriate flexibility.

【0020】またフィルムは長手方向にテンシライズま
たは幅方向にテンシライズされてもよい。テンシライズ
の度合いは特に限定されないが、伸度、引き裂き抵抗力
等の特性を考慮に入れると、長手方向の引張りヤング率
EMDと幅方向の引張りヤング率ETDが、 0.5≦EMD/ETD≦2 の範囲であるのが実用的である。
The film may be tensilized in the longitudinal direction or tensilized in the width direction. The degree of tensilization is not particularly limited, but considering characteristics such as elongation and tear resistance, the tensile Young's modulus EMD in the longitudinal direction and the tensile Young's modulus EtD in the width direction are 0.5 ≦ EMD / ETD ≦ 2. Is practical.

【0021】本発明のフィルムの吸湿率は、4%以下が
好ましく、より好ましくは3%以下、更に好ましくは2
%以下である。吸湿率が小さいほど湿度変化による磁気
記録媒体の寸法変化が小さく、良好な電磁変換特性を保
てるので望ましい。
The moisture absorption of the film of the present invention is preferably 4% or less, more preferably 3% or less, and further preferably 2% or less.
% Or less. The smaller the moisture absorption, the smaller the dimensional change of the magnetic recording medium due to the change in humidity, and can maintain good electromagnetic conversion characteristics.

【0022】本発明の磁気記録媒体は上記のフィルムに
磁性層を設けたものである。
The magnetic recording medium of the present invention is obtained by providing a magnetic layer on the above-mentioned film.

【0023】磁性層の厚さは2μm以下、より好ましく
は1μm以下である。短波長記録には薄い方が良いが薄
すぎると出力の低下を招くので下限は一般には0.1μ
m以上である。磁性層としてはNi、Cr、Fe、Co
等の金属やこれらの合金が用いられるが、限定されるも
のではない。
The thickness of the magnetic layer is 2 μm or less, more preferably 1 μm or less. For short-wavelength recording, thinner is better, but if too thin, the output will decrease.
m or more. Ni, Cr, Fe, Co
And the like, and alloys thereof, but are not limited thereto.

【0024】磁気記録媒体としては、一般にはバックコ
ート層を設けることが好ましい。バックコート層の厚さ
は1μm以下であることが好ましい。
Generally, it is preferable to provide a back coat layer as a magnetic recording medium. The thickness of the back coat layer is preferably 1 μm or less.

【0025】さらに磁性層の上には、耐久性向上のため
に保護層を設けることができる。例えばカーボン層や潤
滑剤層などであり、1種あるいは数種組み合わせて設け
ることができる。
Further, a protective layer can be provided on the magnetic layer to improve durability. For example, it is a carbon layer, a lubricant layer, or the like, and can be provided alone or in combination of several kinds.

【0026】次に本発明の製造方法について説明する
が、これに限定されるものではない。
Next, the manufacturing method of the present invention will be described, but the present invention is not limited thereto.

【0027】まず芳香族ポリアミドであるが、酸クロリ
ドとジアミンから得る場合には、N−メチルピロリドン
(NMP)、ジメチルアセトアミド(DMAc)、ジメ
チルホルムアミド(DMF)などの非プロトン性有機極
性溶媒中で、溶液重合したり、水系媒体を使用する界面
重合などで合成される。ポリマー溶液は、単量体として
酸クロリドとジアミンを使用すると塩化水素が副生する
が、これを中和する場合には、水酸化カルシウム、水酸
化リチウム、炭酸カルシウム、炭酸リチウムなどの無機
の中和剤、またエチレンオキサイド、プロピレンオキサ
イド、アンモニア、トリエチルアミン、トリエタノール
アミン、ジエタノールアミン、などの有機の中和剤が使
用される。また、イソシアネートとカルボン酸との反応
は、非プロトン性有機極性溶媒中、触媒の存在下で行な
われる。
First, an aromatic polyamide. When it is obtained from an acid chloride and a diamine, it is prepared in an aprotic organic polar solvent such as N-methylpyrrolidone (NMP), dimethylacetamide (DMAc) or dimethylformamide (DMF). It is synthesized by solution polymerization or interfacial polymerization using an aqueous medium. When acid chloride and diamine are used as monomers in a polymer solution, hydrogen chloride is produced as a by-product, but when neutralizing this, inorganic chlorides such as calcium hydroxide, lithium hydroxide, calcium carbonate, and lithium carbonate are used. A wetting agent and an organic neutralizing agent such as ethylene oxide, propylene oxide, ammonia, triethylamine, triethanolamine and diethanolamine are used. The reaction between the isocyanate and the carboxylic acid is performed in an aprotic organic polar solvent in the presence of a catalyst.

【0028】これらのポリマー溶液はそのまま製膜原液
として使用してもよく、あるいはポリマーを一度単離し
てから上記の有機溶媒や、硫酸等の無機溶剤に再溶解し
て製膜原液を調製してもよい。
These polymer solutions may be directly used as a stock solution for film formation, or the polymer may be isolated once and then redissolved in the above organic solvent or an inorganic solvent such as sulfuric acid to prepare a stock solution for film formation. Is also good.

【0029】本発明の芳香族ポリアミドフィルムを得る
ためにはポリマーの固有粘度(ポリマー0.5gを硫酸
中で100mlの溶液として30℃で測定した値)は、
0.5以上であることが好ましい。製膜原液には溶解助
剤として無機塩、例えば、塩化カルシウム、塩化マグネ
シム、塩化リチウム、硝酸リチウムなどを添加する場合
もある。製膜原液中のポリマー濃度は2〜40wt%程度
が好ましい。
In order to obtain the aromatic polyamide film of the present invention, the intrinsic viscosity of the polymer (measured at 30 ° C. as a 100 ml solution of 0.5 g of polymer in sulfuric acid)
It is preferably 0.5 or more. In some cases, an inorganic salt, for example, calcium chloride, magnesium chloride, lithium chloride, lithium nitrate, or the like is added as a dissolution aid to the stock solution for film formation. The polymer concentration in the film forming stock solution is preferably about 2 to 40% by weight.

【0030】粒子の添加方法は、粒子を予め溶媒中に十
分スラリ−化した後、重合用溶媒または希釈用溶媒とし
て使用する方法や、製膜原液を調製した後に直接添加す
る方法などがある。
As a method for adding the particles, there is a method in which the particles are sufficiently slurried in a solvent in advance and then used as a solvent for polymerization or a solvent for dilution, or a method in which a stock solution is directly added after preparing a stock solution.

【0031】上記のように調製された製膜原液は、いわ
ゆる溶液製膜法によりフィルム化が行なわれる。溶液製
膜法には乾湿式法、乾式法、湿式法などがあり、いずれ
の方法で製膜されても差し支えないが、ここでは乾湿式
法を例にとって説明する。
The stock solution prepared as described above is formed into a film by a so-called solution casting method. The solution film forming method includes a dry-wet method, a dry method, a wet method and the like, and any method may be used for forming the film. Here, the dry-wet method will be described as an example.

【0032】乾湿式法で製膜する場合は該原液を口金か
らニッケル、ステンレス、銅、チタン、ハステロイ、タ
ンタル等の材質からなるドラム、エンドレスベルト等の
支持体上に押し出して薄膜とし、次いでかかる薄膜層か
ら溶媒を飛散させ薄膜が自己保持性をもつまで乾燥す
る。乾燥条件は室温〜250℃、60分以内の範囲が好
ましく、より好ましくは室温〜200℃の範囲である。
乾燥温度が250℃を越えると急激な加熱によるボイド
の発生、表面の荒れ等が起こり実用的なフィルムが得ら
れない。
When a film is formed by a dry-wet method, the undiluted solution is extruded from a die onto a support made of a material such as nickel, stainless steel, copper, titanium, hastelloy, tantalum or the like, a drum, an endless belt or the like to form a thin film. The solvent is scattered from the thin film layer and dried until the thin film has a self-holding property. Drying conditions are preferably in the range of room temperature to 250 ° C and within 60 minutes, more preferably in the range of room temperature to 200 ° C.
When the drying temperature exceeds 250 ° C., voids are generated due to rapid heating, the surface is roughened, and a practical film cannot be obtained.

【0033】上記乾式工程を終えたフィルムは支持体か
ら剥離されて湿式工程に導入され、フィルムに含有され
ている溶剤や不純物が除去される。この工程の浴は一般
に水系媒体からなるものであり、水の他に有機溶媒や無
機塩等を含有していてもよい。水の含有量は30%以上
が好ましく、より好ましくは50%以上、浴温度は0〜
100℃で使用される。
The film after the above-mentioned dry process is peeled from the support and introduced into the wet process to remove the solvent and impurities contained in the film. The bath in this step is generally composed of an aqueous medium, and may contain an organic solvent or an inorganic salt in addition to water. The water content is preferably 30% or more, more preferably 50% or more, and the bath temperature is 0 to 0%.
Used at 100 ° C.

【0034】湿式工程を出たフィルムは更に乾燥、延伸
が行われる。乾燥、延伸は常温〜400℃で、延伸倍率
は面倍率で0.8〜5.0(面倍率とは延伸後のフィル
ム面積を延伸前のフィルムの面積で除した値で定義す
る。1以下はリラックスを意味する。)の範囲で行われ
る。より好ましい延伸倍率は1.1〜3.0である。ポ
リマーの種類によっては含水状態で延伸したほうがよい
ものもあり、室温に近い80℃以下で延伸してもよい。
The film after the wet process is further dried and stretched. Drying and stretching are performed at room temperature to 400 ° C., and the stretching ratio is 0.8 to 5.0 in area ratio (the area ratio is defined as a value obtained by dividing the area of the film after stretching by the area of the film before stretching. 1 or less. Means relaxation.) A more preferred stretching ratio is 1.1 to 3.0. Depending on the type of polymer, it may be better to stretch in a water-containing state, and it may be stretched at 80 ° C. or lower, which is close to room temperature.

【0035】さらにTD方向の平面性の向上をはかるに
はTD方向の延伸温度むらを平均温度の2%以下に維持
することが好ましい。フィルムは延伸後に室温まで冷却
されるが、この際のTD方向の温度むらは15%以下と
することで本発明の平面性を得ることができる。
In order to further improve the flatness in the TD direction, it is preferable to maintain the stretching temperature unevenness in the TD direction at 2% or less of the average temperature. The film is cooled to room temperature after stretching, and the flatness of the present invention can be obtained by controlling the temperature unevenness in the TD direction at this time to 15% or less.

【0036】次にこのフィルム上に磁性層を設ける。フ
ィルム上に金属薄膜を設けるには、A面側に事前にグロ
ー放電処理やコロナ表面処理を行うことがフィルムと磁
性層の密着性を向上させるのに有効である。
Next, a magnetic layer is provided on this film. In order to provide a metal thin film on the film, it is effective to perform a glow discharge treatment or a corona surface treatment on the surface A in advance to improve the adhesion between the film and the magnetic layer.

【0037】次いで真空蒸着やスパタリング等の方法で
磁性層を設ける。この際A面を内側にしてカールが発生
することが多いが、磁気記録媒体として使用するにはカ
ールを除去する必要がある。このためにはB面側を加熱
ロールに接触させてフィルムを加熱収縮させたり、加熱
オーブン中を通したりする方法が用いられる。
Next, a magnetic layer is provided by a method such as vacuum evaporation or sputtering. At this time, curling often occurs with the A side inside, but it is necessary to remove the curl in order to use it as a magnetic recording medium. For this purpose, a method is used in which the film B is heated and shrunk by bringing the surface B into contact with a heating roll or passed through a heating oven.

【0038】さらに磁性層とは反対側の非磁性層面に
は、公知の方法でバックコート層を設けることが好まし
い。これらの処理が終わった後、スリットして本発明の
磁気記録媒体となる。
Further, it is preferable to provide a back coat layer by a known method on the non-magnetic layer surface opposite to the magnetic layer. After these processes are completed, slitting is performed to obtain the magnetic recording medium of the present invention.

【0039】[0039]

【実施例】以下、実施例で本願発明を詳細に説明する。The present invention will be described in detail below with reference to examples.

【0040】本発明の物性の測定方法は次の方法によ
る。
The physical properties of the present invention are measured by the following methods.

【0041】(1)タルミ量 図1、2を用いて測定方法を説明する。すなわち、図1
に示すようにTD方向の幅が610mmのフィルム1を
切り出し、これをMD方向に2m以上準備する。これを
2mの距離をおいた2本のロールにフィルムを渡し、M
D方向に0.5kg/mm2の荷重をかける。2本のロ
ールの中央にロール3と平行に糸2を渡し、フィルム1
と接するように糸2を張り、糸2から最も離れたフィル
ムの位置までの距離を測定してタルミ量とする。なお、
測定は25℃、湿度50%RHで行う。(2)摩擦係数 フィルムを75mm×100mmのサイズに切り、非磁
性面となる面どうしを重ね合わせ平板の上に置き下側の
フィルムを固定する。この上に200gで60mm×6
0mmの正方形の底面をもつ重りをのせ、15cm/分
の速度で上側のフィルムを引張り、その時の引張り張力
から摩擦係数を求める。なお23℃、60%RHの雰囲
気下に48時間放置して調湿後、その雰囲気下で測定し
た。
(1) Tarumi amount The measuring method will be described with reference to FIGS. That is, FIG.
As shown in (1), a film 1 having a width of 610 mm in the TD direction is cut out and prepared for 2 m or more in the MD direction. Transfer the film to two rolls separated by a distance of 2 m.
A load of 0.5 kg / mm 2 is applied in the D direction. Pass the thread 2 in parallel with the roll 3 at the center of the two rolls,
The yarn 2 is stretched so as to be in contact with the film 2 and the distance from the yarn 2 to the position of the film farthest from the yarn 2 is measured to determine the amount of tarmi. In addition,
The measurement is performed at 25 ° C. and 50% RH. (2) Coefficient of friction The film is cut into a size of 75 mm x 100 mm, the non-magnetic surfaces are superposed on each other, placed on a flat plate, and the lower film is fixed. On top of this, 200g 60mm x 6
A weight having a square bottom surface of 0 mm is placed, and the upper film is pulled at a speed of 15 cm / min, and the friction coefficient is determined from the tensile tension at that time. In addition, it measured for 48 hours by leaving it to stand in an atmosphere of 23 ° C. and 60% RH, and then adjusting the humidity.

【0042】(3)熱収縮率 幅10mm×長さ250mmとなるようにTD方向に長
いサンプルを切り出し200mmの間隔に標線を描く。
これを150℃のオーブンで10分間加熱後、フィルム
を取り出し標線の間隔を測定する。加熱前後の寸法より
収縮率を求める。
(3) Heat Shrinkage A sample long in the TD direction is cut out so as to have a width of 10 mm and a length of 250 mm, and a mark is drawn at intervals of 200 mm.
After heating this in an oven at 150 ° C. for 10 minutes, the film is taken out and the interval between the marked lines is measured. The shrinkage is determined from the dimensions before and after heating.

【0043】(4)十点平均粗さRz 小坂研究所製の薄膜段差測定器(ET−10)で、触針
先端半径0.5μm、触針荷重5mg、カットオフ値
0.008mm、測定長0.5mmの条件で5回測定
し、その平均で表す。
(4) Ten-point average roughness Rz Using a thin film level measuring device (ET-10) manufactured by Kosaka Laboratories, stylus tip radius 0.5 μm, stylus load 5 mg, cutoff value 0.008 mm, measurement length The measurement was performed five times under the condition of 0.5 mm, and the average value was expressed.

【0044】実施例1 重合槽にNーメチルー2ーピロリドン(NMP)を仕込
み、この中に芳香族ジアミン成分として85モル%に相
当する2−クロルパラフェニレンジアミンと、15モル
%に相当する4、4’−ジアミノジフェニルエ−テルと
を溶解させた。さらにNMPに分散した0.08μmの
コロイダルシリカを、粒子量がポリマーに対して0.0
5wt%になるように0.6μmカットフイルターを通
して添加した。これに99.5モル%に相当する2−ク
ロルテレフタル酸クロリドを添加し、重合を完了した。
さらに炭酸リチウムで発生塩化水素の97モル%を中和
し、次いでアンモニアを10モル%相当量添加してポリ
マー溶液を得た。そしてポリマー濃度10.7wt%、
30℃での溶液粘度を4000ポイズに調整して製膜原
液とした(これをA液とする)。
Example 1 N-methyl-2-pyrrolidone (NMP) was charged into a polymerization vessel, and 2-chloroparaphenylenediamine corresponding to 85 mol% as an aromatic diamine component and 4,4 corresponding to 15 mol% were contained therein. '-Diaminodiphenyl ether was dissolved. Further, 0.08 μm of colloidal silica dispersed in NMP was added to the polymer in an amount of 0.08 μm.
It was added through a 0.6 μm cut filter so as to be 5 wt%. To this was added 2-chloroterephthalic acid chloride corresponding to 99.5 mol% to complete the polymerization.
Further, 97 mol% of the generated hydrogen chloride was neutralized with lithium carbonate, and then ammonia was added in an amount equivalent to 10 mol% to obtain a polymer solution. And polymer concentration 10.7wt%,
The solution viscosity at 30 ° C. was adjusted to 4000 poise to obtain a film forming stock solution (this is referred to as “solution A”).

【0045】次に上記と同様にしてコロイダルシリカを
添加しない溶液を調整後、一次粒径0.02μmの乾式
シリカを二次粒径0.2μmに分散したスラリーを粒子
量がポリマーに対して1.6wt%となるように添加
し、ポリマー濃度が10.6wt%、30℃で4000
ポイズの溶液を調整した(これをB液とする)。
Next, a solution in which colloidal silica was not added was prepared in the same manner as described above. 0.6 wt%, and the polymer concentration is 10.6 wt%, and 4000 at 30 ° C.
A poise solution was prepared (this is referred to as solution B).

【0046】このA液を0.7μmカット、B液を1μ
mカットのフイルターで濾過した後、最終フィルム厚み
で4μmになるように口金より金属ベルト上に流延し
た。この際、A層は2.5μm、B層は1.5μmにな
るように原液量を調整した。流延されたフィルムを13
0℃の熱風で加熱して溶媒を蒸発させ、自己保持性のフ
ィルムをベルトから連続的に剥離した。次に水槽内へフ
ィルムを導入して残存溶媒と中和で生じた無機塩等の抽
出を行なった。なお、縦方向(MD方向)には1.15
倍延伸した。
The solution A was cut by 0.7 μm, and the solution B was cut by 1 μm.
After filtration with a m-cut filter, the film was cast from a die onto a metal belt so as to have a final film thickness of 4 μm. At this time, the amount of the stock solution was adjusted so that the layer A was 2.5 μm and the layer B was 1.5 μm. 13 cast film
The solvent was evaporated by heating with hot air at 0 ° C., and the self-holding film was continuously peeled off from the belt. Next, the film was introduced into the water tank, and the residual solvent and the inorganic salts generated by the neutralization were extracted. 1.15 in the vertical direction (MD direction)
It was stretched twice.

【0047】次ににテンタ−に導入し、300℃で水分
の乾燥と延伸、熱処理を行なった。この間にフィルムの
TD方向に1.4倍延伸を行なった。この時の延伸部分
のTD方向の温度むらは2℃(0.7%)であった。つ
いで200℃でTD方向に1.035倍に再延伸し、さ
らにテンター出口を25℃の室温まで冷却したが、冷却
過程全域に渡って温度むらは最大で8%であった。最も
むらの大きい部分はテンター出口付近で平均25℃の温
度に対し2℃のむらがあった。得られたフィルムのヤン
グ率はMD方向が1150kg/mm2、TD方向が1
600kg/mm2であった。フィルムのタルミ量と非
磁性面側の摩擦係数を表1に示した。なお、吸湿率は
1.5%であった。
Next, the mixture was introduced into a tenter and dried at 300 ° C., stretched, and heat-treated. During this time, the film was stretched 1.4 times in the TD direction. At this time, the temperature unevenness in the TD direction of the stretched portion was 2 ° C. (0.7%). Subsequently, the film was stretched again at 200 ° C. in the TD by 1.035 times, and the tenter outlet was further cooled to room temperature of 25 ° C., but the temperature unevenness was at most 8% throughout the entire cooling process. The portion having the largest unevenness had an unevenness of 2 ° C. at an average temperature of 25 ° C. near the exit of the tenter. The Young's modulus of the obtained film was 1150 kg / mm 2 in the MD direction and 1 in the TD direction.
It was 600 kg / mm 2 . Table 1 shows the thickness of the film and the coefficient of friction on the non-magnetic surface side. The moisture absorption was 1.5%.

【0048】得られたフィルムを真空蒸着機に入れ、1
-5Torrに排気後、−10℃に冷却されたドラムに
沿わせ、40m/分の速度で走行させてCoを0.2μ
mの厚みに蒸着した。これらの工程でフィルムが熱で変
形したり、シワになるなどの問題はなかった。これを2
00℃の加熱ロールに接触させてフィルムを収縮させ、
蒸着で発生したカールを矯正後、バックコート層を0.
5μ塗布し、磁気テープにスリットしたが、平面性の優
れたテープが得られた。
The obtained film was placed in a vacuum evaporation machine,
After evacuating to 0 -5 Torr, Co was run at a speed of 40 m / min along a drum cooled to -10 ° C. to reduce Co to 0.2 μm.
m to a thickness of m. In these steps, there was no problem such as deformation of the film due to heat or wrinkling. This is 2
The film is shrunk by contacting with a heating roll of 00 ° C.
After straightening the curl generated by the vapor deposition, the back coat layer was treated with 0.1%.
5 μm was applied and slit on a magnetic tape, but a tape with excellent flatness was obtained.

【0049】実施例2 実施例1と同じポリマー溶液を用い、実施例1と同様に
製膜を行った。テンター温度は280℃、延伸倍率はM
D方向が1.1倍、TD方向が1.45倍で温度むらは
2℃で0.7%であった。再延伸条件は実施例1と同じ
である。また冷却時の温度むらは8%であった。このフ
ィルムの特性を表1に示すがタルミ量は小さなものであ
った。
Example 2 Using the same polymer solution as in Example 1, a film was formed in the same manner as in Example 1. Tenter temperature is 280 ° C, stretching ratio is M
The D direction was 1.1 times, the TD direction was 1.45 times, and the temperature unevenness was 0.7% at 2 ° C. Re-stretching conditions are the same as in Example 1. The temperature unevenness during cooling was 8%. The properties of this film are shown in Table 1, but the amount of tarmi was small.

【0050】これを得られたフィルムを用いて実施例1
と同様に磁気テープを作製したが、その製造工程でフィ
ルムが熱で変形したり、シワになるなどの問題もなく良
好な磁気テープが得られた。
Example 1 using the obtained film
A magnetic tape was produced in the same manner as described above, but a good magnetic tape was obtained without any problem such as deformation of the film due to heat or wrinkling in the manufacturing process.

【0051】実施例3 実施例1と同じポリマー溶液を用い、実施例1と同様に
製膜を行った。テンター温度は300℃、延伸倍率はM
D方向が1.1倍、TD方向が1.3倍で温度むらは5
℃で1.7%であった。再延伸条件は実施例1と同じで
ある。また冷却時の温度むらは11%であった。このフ
ィルムの特性を表1に示すが実施例1、2よりタルミ量
は両端部が大きかった。
Example 3 Using the same polymer solution as in Example 1, a film was formed in the same manner as in Example 1. Tenter temperature is 300 ° C, stretching ratio is M
D direction is 1.1 times, TD direction is 1.3 times, and temperature unevenness is 5 times.
It was 1.7% at ° C. Re-stretching conditions are the same as in Example 1. The temperature unevenness during cooling was 11%. The properties of this film are shown in Table 1, but the amount of tarmi was larger at both ends than in Examples 1 and 2.

【0052】これを用いて実施例1と同様に磁気テープ
を作製したが、工程内でフィルムの両端部が熱で一部変
色していたが、中央部は問題なかった。また巻き取った
際にシワになるなどの問題はなかった。
Using this, a magnetic tape was produced in the same manner as in Example 1, but both ends of the film were partially discolored by heat in the process, but there was no problem in the center. There were no problems such as wrinkles when wound up.

【0053】比較例1 実施例1と同じポリマー溶液を用い製膜を行った。テン
ター温度は300℃、延伸倍率はMD方向が1.1倍、
TD方向が1.3倍であったが、温度むらは12℃と4
%の大きなむらがあった。再延伸条件は実施例1と同じ
である。一方冷却時の温度むらは8%であった。得られ
たフィルムの特性を表1に示すがタルミ量の大きなフィ
ルムであった。
Comparative Example 1 A film was formed using the same polymer solution as in Example 1. Tenter temperature is 300 ° C, stretching ratio is 1.1 times in MD direction,
The TD direction was 1.3 times, but the temperature unevenness was 12 ° C and 4 ° C.
There was a large unevenness of%. Re-stretching conditions are the same as in Example 1. On the other hand, the temperature unevenness during cooling was 8%. The properties of the obtained film are shown in Table 1. The film had a large amount of tarmi.

【0054】これを実施例1と同様にして磁気テープを
作製したが、工程内でフィルムのタルミに相当する部分
が熱で変色し、さらフィルム走行時にシワが入り巻き取
ったものにはシワが多数あった。これを欠点の少ない部
分を選んで8mm幅で50mの磁気テープにしたが、数
mごとに小さな変色やしわがあり、評価に耐えるものに
はならなかった。
A magnetic tape was produced in the same manner as in Example 1. However, in the process, the portion corresponding to the film thickness was discolored by heat, and wrinkles were formed when the film was run. There were many. A portion having few defects was selected and a magnetic tape having a width of 8 mm and a length of 50 m was used. However, small discoloration and wrinkles were found every few meters, and the evaluation was not acceptable.

【0055】比較例2 実施例1と同じポリマー溶液を用い製膜を行った。テン
ター温度は290℃、延伸倍率はMD方向が1.1倍、
TD方向が1.3倍で温度むらは10℃(3.4%)で
あった。また冷却時の温度むらは20%であった。この
フィルムの特性を表1に示すがタルミ量は大きなもので
あった。
Comparative Example 2 A film was formed using the same polymer solution as in Example 1. The tenter temperature is 290 ° C., the stretching ratio is 1.1 times in the MD direction,
The TD direction was 1.3 times and the temperature unevenness was 10 ° C. (3.4%). The temperature unevenness during cooling was 20%. The properties of this film are shown in Table 1, and the amount of tarmi was large.

【0056】これを用いて実施例1と同様に磁気テープ
を作製したが、変色やシワがあった。またテープにはす
り傷が多かった。
Using this, a magnetic tape was produced in the same manner as in Example 1, but there was discoloration and wrinkles. The tape had many scratches.

【0057】比較例3 実施例1と同じポリマー溶液を用い3μmのフィルムの
製膜を行った。テンター温度は250℃、延伸倍率はM
D方向が1.1倍、TD方向が1.4倍で温度むらは
0.8%であった。また冷却時の温度むらは17%であ
った。このフィルムの特性を表1に示す。
Comparative Example 3 A 3 μm film was formed using the same polymer solution as in Example 1. Tenter temperature is 250 ° C, stretching ratio is M
The D direction was 1.1 times, the TD direction was 1.4 times, and the temperature unevenness was 0.8%. The temperature unevenness during cooling was 17%. Table 1 shows the properties of this film.

【0058】これを用いて実施例1と同様に磁気テープ
を作製しようとしたが、工程内でフィルムが熱で変形し
てしまい、作製することはできなかった。
An attempt was made to manufacture a magnetic tape in the same manner as in Example 1, but the film was deformed by heat in the process, and could not be manufactured.

【0059】[0059]

【表1】 [Table 1]

【0060】[0060]

【発明の効果】フィルムのタルミ量を規定した本発明の
フィルムを使用することで、磁性層形成時のシワや熱変
形がなく、さらにすり傷もない平坦性の優れた磁気テー
プが得られる。
By using the film of the present invention in which the thickness of the film is specified, a magnetic tape having excellent flatness without wrinkles or thermal deformation at the time of forming the magnetic layer and without scratches can be obtained.

【図面の簡単な説明】[Brief description of the drawings]

【図1】タルミ量の測定方法を示す概略図である。FIG. 1 is a schematic view showing a method of measuring the amount of tarmi.

【図2】タルミ量を求める方法を示す図である。FIG. 2 is a diagram illustrating a method for obtaining a tarmi amount.

【符号の説明】[Explanation of symbols]

1:フィルム 2:糸 3:ロール 1: Film 2: Thread 3: Roll

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】610mm幅で2m長のフィルムに0.5
kg/mm2の荷重をかけた際の中央部でのフィルムの
タルミ量が60mm以下である芳香族ポリアミドフィル
ムの表面に磁性層を設けたことを特徴とする磁気記録媒
体。
1. A film of 610 mm width and 2 m length has a thickness of 0.5
A magnetic recording medium characterized in that a magnetic layer is provided on the surface of an aromatic polyamide film having a film thickness of 60 mm or less at the center when a load of kg / mm 2 is applied.
【請求項2】非磁性層面の摩擦係数が2以下であること
を特徴とする請求項1に記載の磁気記録媒体。
2. The magnetic recording medium according to claim 1, wherein the coefficient of friction of the nonmagnetic layer surface is 2 or less.
JP10177597A 1998-06-24 1998-06-24 Magnetic recording medium Pending JP2000011363A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10177597A JP2000011363A (en) 1998-06-24 1998-06-24 Magnetic recording medium

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10177597A JP2000011363A (en) 1998-06-24 1998-06-24 Magnetic recording medium

Publications (1)

Publication Number Publication Date
JP2000011363A true JP2000011363A (en) 2000-01-14

Family

ID=16033787

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10177597A Pending JP2000011363A (en) 1998-06-24 1998-06-24 Magnetic recording medium

Country Status (1)

Country Link
JP (1) JP2000011363A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001307319A (en) * 2000-04-25 2001-11-02 Toray Ind Inc Magnetic recording medium

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001307319A (en) * 2000-04-25 2001-11-02 Toray Ind Inc Magnetic recording medium

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