JP2000001765A - Vacuum carburization method and apparatus therefor - Google Patents

Vacuum carburization method and apparatus therefor

Info

Publication number
JP2000001765A
JP2000001765A JP11104855A JP10485599A JP2000001765A JP 2000001765 A JP2000001765 A JP 2000001765A JP 11104855 A JP11104855 A JP 11104855A JP 10485599 A JP10485599 A JP 10485599A JP 2000001765 A JP2000001765 A JP 2000001765A
Authority
JP
Japan
Prior art keywords
carburizing
gas
chamber
flow rate
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP11104855A
Other languages
Japanese (ja)
Other versions
JP3839615B2 (en
Inventor
Masaomi Waka
正臣 和歌
Toru Monno
門野  徹
Satoru Harai
哲 原井
Tetsuya Okada
徹也 岡田
Naoaki Imai
直明 今井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nachi Fujikoshi Corp
Original Assignee
Nachi Fujikoshi Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nachi Fujikoshi Corp filed Critical Nachi Fujikoshi Corp
Priority to JP10485599A priority Critical patent/JP3839615B2/en
Publication of JP2000001765A publication Critical patent/JP2000001765A/en
Application granted granted Critical
Publication of JP3839615B2 publication Critical patent/JP3839615B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To provide an inexpensive vacuum carburization treatment method which solves the trouble by the excess of a surface carbon concn. including corner parts, allows the treatment under broad carburization pressures and obviates the generation of soot and an apparatus therefor. SOLUTION: Gaseous ethylene or a gaseous mixture composed of the gaseous ethylene and gaseous acetylene is used as a carburizing gas. The supply rate of this carburizing gas is periodically or impulsively changed from a high flow rate level to a low flow rate level and further to the high flow rate level. The pressure of a carburization chamber 10 at the time of the high level is regulated to a range of 1 to 10 kPa, the flow rate level ratio of the low flow rate level to the high flow rate level to 0 to 50% and the time ratio to 50 to 3,000%. Further, the regulation of the pressure in the carburization chamber is executed by regulating a valve or movable orifice mechanism 16 disposed between an evacuation device 12 and a discharge port 17 of the carburization chamber.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は鉄鋼材料の真空浸炭
処理方法及び装置に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method and an apparatus for vacuum carburizing steel materials.

【0002】[0002]

【従来の技術】鉄鋼材料の浸炭には従来からガス浸炭、
真空浸炭、プラズマ浸炭等が行われている。ガス浸炭は
現状広く行われているが、可燃ガスによる危険性、処理
品表面の粒界酸化、高温浸炭による短サイクル化が難し
い等の問題点がある。またプラズマ浸炭はコストが高く
特殊浸炭に限定されている。真空浸炭では900〜11
00℃で浸炭ガスとして飽和炭化水素(メタンガス、プ
ロパンガス、ブタン)を用いて10〜70kPaの圧力
で処理する方法がある。
2. Description of the Related Art Conventionally, gas carburizing has been used for carburizing steel materials.
Vacuum carburizing, plasma carburizing and the like are performed. Although gas carburizing is currently widely practiced, there are problems such as the danger of combustible gas, grain boundary oxidation of the surface of treated products, and short cycle due to high-temperature carburizing. Plasma carburizing is expensive and limited to special carburizing. 900-11 for vacuum carburizing
There is a method in which a saturated hydrocarbon (methane gas, propane gas, butane) is used as a carburizing gas at 00 ° C. at a pressure of 10 to 70 kPa.

【0003】さらに、アセチレンを用いた浸炭処理方法
として、特開平8-325701号公報では、真空浸炭処理室の
圧力を1kPa以下とし、一定時間アセチレンガスを流
し、その後ガスを一定時間停止し処理品内部へ炭素を拡
散させている。
Further, as a carburizing treatment method using acetylene, Japanese Patent Laid-Open Publication No. 8-325701 discloses a method in which the pressure of a vacuum carburizing chamber is set to 1 kPa or less, acetylene gas is flowed for a fixed time, and then the gas is stopped for a fixed time. It diffuses carbon inside.

【0004】[0004]

【発明が解決しようとする課題】かかる真空浸炭の場合
にはガス浸炭と比較すると炉内の炭素濃度が高くなるた
め、温度が同じでも、内部との炭素濃度勾配が大きくな
るため浸炭時間を短縮することができるという利点を有
する。しかし、真空浸炭においては、表面、特に、コー
ナー部表面は平面部と比べ内部へ炭素が拡散する面積が
少ないため、炭素濃度が高くなり残留オーステナイトが
多くなり、又は網状の炭化物が生成されやすくなるとい
う問題があった。この残留オーステナイトが多すぎた
り、網状の炭化物が生成されると浸炭製品の品質を大き
く低下させるという問題があった。又、アセチレンでは
1kPa、エチレンでは10kPaをそれぞれ超えると
煤が発生し、制御範囲が狭いという問題があった。
In the case of such vacuum carburizing, the carbon concentration in the furnace is higher than that of gas carburizing, so that even at the same temperature, the carbon concentration gradient with the inside becomes large, so that the carburizing time is shortened. Has the advantage that it can be However, in vacuum carburization, the surface, particularly the corner surface, has a smaller area where carbon diffuses into the inside than the plane portion, so that the carbon concentration increases and the amount of retained austenite increases, or a network-like carbide is easily generated. There was a problem. If the amount of retained austenite is too large or a network-like carbide is generated, there is a problem that the quality of the carburized product is greatly reduced. Also, when acetylene exceeds 1 kPa and ethylene exceeds 10 kPa, soot is generated, and there is a problem that the control range is narrow.

【0005】本発明の目的はかかる問題点に鑑みて、真
空浸炭処理方法において、コーナー部も含めた表面炭素
濃度過多による不具合を解決し、かつ幅広い浸炭圧力で
の処理が可能で煤の発生も無く安価に浸炭する方法及び
装置を提供することである。
SUMMARY OF THE INVENTION In view of the above problems, it is an object of the present invention to solve the problems caused by excessive surface carbon concentration including corners in a vacuum carburizing method, and to perform soaking at a wide range of carburizing pressures and generate soot. It is an object of the present invention to provide a method and apparatus for carburizing without any cost.

【0006】[0006]

【課題を解決するための手段】本発明においては、真空
浸炭処理において、浸炭ガスとしてエチレンガス又はエ
チレンガスとアセチレンガスの混合ガスを用い、該浸炭
ガスの供給量を少なくとも一度高流量レベルから低流量
レベルへ、さらに高流量レベルから低流量レベルへと、
繰り返して変化させ、かつ前記浸炭ガスの高流量レベル
時の浸炭室の圧力が1〜10kPaの範囲にされている
ことを特徴とする真空浸炭方法を提供することにより上
記課題を解決した。
According to the present invention, in the vacuum carburizing treatment, ethylene gas or a mixed gas of ethylene gas and acetylene gas is used as a carburizing gas, and the supply amount of the carburizing gas is reduced at least once from a high flow rate level to a low flow rate. From flow level to high flow level to low flow level
The above-mentioned problem has been solved by providing a vacuum carburizing method wherein the pressure is repeatedly changed and the pressure of the carburizing chamber at the high flow rate level of the carburizing gas is set in a range of 1 to 10 kPa.

【0007】浸炭ガスにエチレンガス又はエチレンガス
とアセチレンガスの混合ガスを用いて真空浸炭を行う事
により、エチレンやアセチレンは鋼表面で効率的に分解
して、浸炭源の炭素を供給する。浸炭室の圧力を1〜1
0kPaの範囲にして、浸炭期に規定のガス量を規定時
間流し炭素を表面に浸透させ、拡散期では浸炭ガスを規
定時間停止又は減少させて、炭素を内部へ拡散すること
を繰り返すパルス浸炭を行うことにより、特にコーナー
部の炭素の高濃度化による網状の炭化物の生成を抑制す
ることができる。
[0007] By performing vacuum carburization using ethylene gas or a mixed gas of ethylene gas and acetylene gas as the carburizing gas, ethylene and acetylene are efficiently decomposed on the steel surface to supply carbon as a carburizing source. 1 ~ 1 pressure of carburizing chamber
In the range of 0 kPa, a pulsed carburization is performed in which a prescribed amount of gas is flowed for a prescribed time during the carburizing period to permeate carbon into the surface, and during the diffusion period, the carburizing gas is stopped or reduced for a prescribed time and carbon is diffused inside. By doing so, it is possible to suppress the generation of a network-like carbide due to the high concentration of carbon particularly at the corners.

【0008】これは浸炭ガス供給を低レベルに保ってい
る間は、炭素源の供給が抑制されるとともに、表層の炭
素は熱拡散によりワークの内部へ拡散する。浸炭ガスの
供給を高いレベルに戻すことにより再び活発な浸炭が繰
り返される。このように浸炭ガスの供給量を高レベルと
低レベルの間で変化させこれを繰り返すことにより、表
層部の炭素の拡散が進行しやすくなるので、表面異常層
のない浸炭処理ができるのである。また、細い穴部等の
浸炭ガスの流れがよくなるので、狭い空間部の浸炭も均
一になる。
This is because while the carburizing gas supply is kept at a low level, the supply of the carbon source is suppressed and the carbon in the surface layer is diffused into the work by thermal diffusion. The active carburization is repeated again by returning the carburizing gas supply to a higher level. By changing the supply amount of the carburizing gas between the high level and the low level and repeating this, the diffusion of the carbon in the surface layer portion easily proceeds, so that the carburizing treatment without the abnormal surface layer can be performed. In addition, since the flow of the carburizing gas in the narrow hole and the like is improved, the carburizing in the narrow space becomes uniform.

【0009】本浸炭処理方法では浸炭源を過剰に供給し
ないので、浸炭ガスの消費量が抑制できるとともに、浸
炭室内の煤の発生を抑えることができ、浸炭室の圧力が
従来より広い範囲である1〜10kPaとした。なお、
本方法においては、1kPa以下では浸炭が不十分とな
り、10kPa超では煤の発生が大きくなる。
In the present carburizing method, the carburizing source is not supplied excessively, so that the consumption of carburizing gas can be suppressed and the generation of soot in the carburizing chamber can be suppressed, so that the pressure in the carburizing chamber is wider than before. The pressure was set to 1 to 10 kPa. In addition,
In the present method, carburization is insufficient at 1 kPa or less, and soot generation is large at 10 kPa or more.

【0010】浸炭ガスの流量変化は高流量、低流量、高
流量、低流量としたが、浸炭状況によりこれを繰り返す
のが効果的である。そこで、請求項2においては、浸炭
ガスの流量変化を周期的に変化するようにした。
Although the flow rate of the carburizing gas is changed at a high flow rate, a low flow rate, a high flow rate, and a low flow rate, it is effective to repeat this depending on the carburizing condition. Therefore, in claim 2, the change in the flow rate of the carburizing gas is changed periodically.

【0011】また、請求項3のように、浸炭ガスの流量
変化はパルス状が制御しやすい。
Further, as in claim 3, the pulse shape of the change in the flow rate of the carburizing gas is easily controlled.

【0012】供給ガスの流量変化が少ないと、又、低流
量時の時間が短すぎると低流量時の炭素の内部への拡散
が促進されない。そこで請求項4においては、浸炭ガス
の高流量レベルに対する低流量レベルの流量レベル比を
0〜50%とし、かつ高流量レベルに対する低流量レベ
ルの時間比を50〜3,000%とするのがよい。
If the change in the flow rate of the supply gas is small, or if the time at the low flow rate is too short, the diffusion of carbon into the interior at the low flow rate is not promoted. Therefore, in claim 4, the flow rate ratio of the low flow level to the high flow level of the carburizing gas is set to 0 to 50%, and the time ratio of the low flow level to the high flow level is set to 50 to 3,000%. Good.

【0013】コーナー部の形状や必要な表面組織によ
り、適正な周期やパルス条件(流量と時間)必要であ
る。このためには、浸炭ガスの供給量及び浸炭室内の圧
力の制御が重要である。浸炭室内の圧力の制御は、浸炭
ガスの供給量の変化に対するより、排出側の排出ガス量
を制御する方が変化が大きい。そこで、請求項5におい
ては、浸炭室内の圧力の調整を、真空排気装置と浸炭室
の排気口との間に設けられたバルブ又は可動オリフィス
機構を調整することにより行うこととした。なお、排気
側で流量を制御することにより、入口側制御に比べ、浸
炭ガス流量を少なくすることができる。
Depending on the shape of the corners and the required surface texture, appropriate periods and pulse conditions (flow rate and time) are required. For this purpose, it is important to control the supply amount of the carburizing gas and the pressure in the carburizing chamber. The control of the pressure in the carburizing chamber has a greater change when controlling the exhaust gas amount on the discharge side than when changing the supply amount of the carburizing gas. Therefore, in claim 5, the pressure in the carburizing chamber is adjusted by adjusting a valve or a movable orifice mechanism provided between the vacuum exhaust device and the exhaust port of the carburizing chamber. By controlling the flow rate on the exhaust side, the carburizing gas flow rate can be reduced as compared with the control on the inlet side.

【0014】かかる真空浸炭方法の実施にあたっては、
請求項6のように、加熱装置を具備した浸炭室と、該浸
炭室内を排気する真空排気装置と、該浸炭室内へ浸炭ガ
スを供給する装置と、焼入れ用油槽を備えた冷却室とを
有する真空浸炭装置において、浸炭ガス供給量を少なく
とも一度高流量レベルから低流量レベルさらに高流量レ
ベルから低流量レベルに変化させる制御系を設け、かつ
浸炭室内の圧力を調節するために、浸炭室の排気口と真
空排気装置との間にバルブ又は可動オリフィス機構を設
けた真空浸炭装置により行うことができる。
In carrying out such a vacuum carburizing method,
As in claim 6, a carburizing chamber provided with a heating device, a vacuum exhaust device for evacuating the carburizing chamber, a device for supplying carburizing gas into the carburizing chamber, and a cooling chamber having a quenching oil tank are provided. In the vacuum carburizing apparatus, a control system for changing the supply amount of the carburizing gas at least once from the high flow level to the low flow level and from the high flow level to the low flow level is provided, and in order to adjust the pressure in the carburizing chamber, exhaust of the carburizing chamber is performed. It can be performed by a vacuum carburizing device provided with a valve or a movable orifice mechanism between the port and the vacuum exhaust device.

【0015】[0015]

【発明の実施の形態】本発明の実施の形態について図面
を参照して説明する。図1は本発明の実施の形態を示す
真空浸炭装置の全体概要図である。図1に示すように、
本真空浸炭炉は加熱装置を具備した浸炭室10と、該浸
炭室に接続された冷却室3と、製品出入用の搬送装置2
から構成されている。
Embodiments of the present invention will be described with reference to the drawings. FIG. 1 is an overall schematic diagram of a vacuum carburizing apparatus showing an embodiment of the present invention. As shown in FIG.
This vacuum carburizing furnace includes a carburizing chamber 10 equipped with a heating device, a cooling chamber 3 connected to the carburizing chamber, and a transfer device 2 for entering and leaving the product.
It is composed of

【0016】浸炭室10には、ワーク8を高温加熱する
ための図示しない発熱体が取り付けられ、かつ保温のた
めの断熱箱9が取り付けられている。また、エチレンガ
ス又はエチレンガスとアセチレンガスの混合ガスを図示
しない供給口から浸炭室10内へ供給するようにされて
おり、この浸炭ガス供給量を制御するガス供給盤11と
発熱体を制御する温度制御装置13が備えられている。
これらの構成は従来の真空浸炭装置とほぼ同様であり、
さらに、従来のものでは浸炭室の排気口17が真空排気
装置12に接続されている。しかし、本装置において
は、特に浸炭室の排気口17と真空排気装置12の間に
浸炭室内の圧力を調整するためのバルブ16が接続され
ている。このバルブ16は真空排気装置12と排気口1
7の間にある、図示しない主排気バルブと直列に取付け
た例であるが、並列に取付けてもよい。さらに真空排気
装置12と冷却室3の排気口18の間にも、図示しない
排気バルブが取付けれれている。又、真空排気装置12
は、冷却室3と浸炭室10にそれぞれ設けてもよい。
The carburizing chamber 10 is provided with a heating element (not shown) for heating the workpiece 8 at a high temperature, and a heat insulating box 9 for keeping the temperature warm. In addition, ethylene gas or a mixed gas of ethylene gas and acetylene gas is supplied from a supply port (not shown) into the carburizing chamber 10, and a gas supply panel 11 for controlling the supply amount of the carburizing gas and a heating element are controlled. A temperature control device 13 is provided.
These configurations are almost the same as the conventional vacuum carburizing device,
Further, in the conventional case, the exhaust port 17 of the carburizing chamber is connected to the vacuum exhaust device 12. However, in this apparatus, a valve 16 for adjusting the pressure in the carburizing chamber is connected between the exhaust port 17 of the carburizing chamber and the vacuum exhaust device 12. The valve 16 is connected to the vacuum exhaust device 12 and the exhaust port 1.
7 is mounted in series with a main exhaust valve (not shown), but may be mounted in parallel. Further, an exhaust valve (not shown) is attached between the vacuum exhaust device 12 and the exhaust port 18 of the cooling chamber 3. Also, the evacuation device 12
May be provided in the cooling chamber 3 and the carburizing chamber 10, respectively.

【0017】浸炭室10に接続された冷却室3は、焼き
入れ油槽7と、焼き入れエレベーター5及び炉内搬送装
置6、によって構成され、浸炭室とは中扉15により開
閉可能にされている。さらに、冷却室3は前扉14によ
って開閉可能にされている。扉14、15はそれぞれの
室を密閉できるようにされている。また、冷却室3の排
気口18が真空排気装置12とバルブ16との間に接続
されている。冷却室3の前扉14の前にワークを出し入
れをするための搬送テーブル2が配置されている。な
お、符号1、4、4′8はそれぞれの装置でのワークを
示す。
The cooling chamber 3 connected to the carburizing chamber 10 is constituted by a quenching oil tank 7, a quenching elevator 5 and an in-furnace transfer device 6, which can be opened and closed by a middle door 15 with the carburizing chamber. . Further, the cooling chamber 3 can be opened and closed by a front door 14. The doors 14 and 15 are adapted to seal the respective chambers. Further, an exhaust port 18 of the cooling chamber 3 is connected between the vacuum exhaust device 12 and the valve 16. In front of the front door 14 of the cooling chamber 3, the transfer table 2 for taking in and out the work is arranged. Reference numerals 1, 4, 4'8 indicate works in the respective devices.

【0018】次に本発明の浸炭方法について説明する。
図1の本発明の装置を用いて以下の処理を順次行う。 (1) まず真空排気装置12によりバルブ16をほぼ全開
とし、さらに図示しない浸炭室10の排気バルブ、及び
冷却室3の排気バルブ、を開いた状態、即ち浸炭室10
と冷却室3を連通させた状態で、浸炭室10と冷却室3
を0.05kPa以下まで真空排気する。 (2) 所定の圧力に達した後、浸炭室10を排気しながら
浸炭温度まで昇温する。 (3) 冷却室3の前扉14を開放して、ワーク1を搬送テ
ーブル2によって焼き入れエレベータ5上にワーク4を
搬入し、前扉14を閉める。 (4) 冷却室3を真空排気装置12により0.05kPa
以下まで真空排気する。 (5) 所定の圧力に達した後中扉15を開放して、処理品
4を冷却室3から浸炭室10内に搬送し、中扉を閉め
る。 (6) 浸炭室10を真空加熱しワーク4を所定温度(85
0〜1100℃)に加熱、均熱する。 (7) その後ガス供給盤11により浸炭ガスを浸炭ガス供
給口から浸炭室10内に供給する。さらにバルブ16を
調整することにより浸炭ガスが高流量レベル時の浸炭室
内の圧力が1〜10kPaの範囲の所定圧力になるよう
に調整する。
Next, the carburizing method of the present invention will be described.
The following processing is sequentially performed using the apparatus of the present invention shown in FIG. (1) First, the valve 16 is almost fully opened by the vacuum exhaust device 12, and the exhaust valve of the carburizing chamber 10 and the exhaust valve of the cooling chamber 3 (not shown) are opened, that is, the carburizing chamber 10
The carburizing chamber 10 and the cooling chamber 3 are
Is evacuated to 0.05 kPa or less. (2) After reaching a predetermined pressure, the temperature is raised to the carburizing temperature while exhausting the carburizing chamber 10. (3) The front door 14 of the cooling chamber 3 is opened, the work 1 is quenched by the transfer table 2, the work 4 is loaded onto the elevator 5, and the front door 14 is closed. (4) The cooling chamber 3 is evacuated by the vacuum exhaust device 12 to 0.05 kPa.
Evacuate to the following. (5) After reaching the predetermined pressure, the middle door 15 is opened, the processed product 4 is transferred from the cooling chamber 3 into the carburizing chamber 10, and the middle door is closed. (6) The carburizing chamber 10 is vacuum-heated and the work 4 is heated to a predetermined temperature (85
(0 to 1100 ° C). (7) Thereafter, the carburizing gas is supplied from the carburizing gas supply port into the carburizing chamber 10 by the gas supply panel 11. Further, by adjusting the valve 16, the pressure in the carburizing chamber when the carburizing gas is at a high flow rate level is adjusted to be a predetermined pressure in the range of 1 to 10 kPa.

【0019】浸炭期においては浸炭ガスを所定の流量
(高流量レベル)で流し、拡散期において浸炭ガスを停
止又は減少(低流量レベル)させ、これを繰り返す。高
流量レベルに対する低流量レベルの流量レベル比を0〜
50%とされる。これを事前に設定された時間(拡散/
浸炭の時間比50〜3,000%)により高温保持中の
間、周期的に繰り返す。 (8) かかるパルス状の浸炭(以下パルス浸炭という)が
終了し高温保持時間終了後、焼き入れ温度まで浸炭室を
降温し、必要に応じさらに均熱加熱する。
In the carburizing period, the carburizing gas is caused to flow at a predetermined flow rate (high flow level), and in the diffusion period, the carburizing gas is stopped or reduced (low flow level), and this is repeated. The flow level ratio of the low flow level to the high flow level is 0
50%. Set this to a preset time (diffusion /
(Time ratio of carburization 50-3,000%), and periodically repeated during high temperature holding. (8) After the completion of the pulse-shaped carburizing (hereinafter referred to as pulse carburizing) and the end of the high-temperature holding time, the temperature of the carburizing chamber is lowered to the quenching temperature and, if necessary, further soaked and heated.

【0020】なお、浸炭室内の圧力は浸炭ガスの量によ
り変化するが、真空排気装置の能力は浸炭ガスの供給量
に比べ十分大きいので、バルブ16により所定の圧力で
制御される。浸炭ガスの高流量レベル時に1〜10kP
aの範囲で調整し、低流量レベル時はそれ以下の圧力で
よいので、バルブ調整は低流量レベル時も調整してもよ
いが、高流量レベル時に合わせて調整しておけばよい。
流量レベル比が0の場合、低流量レベル時は例えば0.
05kPa以下となる。
Although the pressure in the carburizing chamber varies depending on the amount of the carburizing gas, the capacity of the vacuum evacuation device is sufficiently larger than the supply amount of the carburizing gas. 1 to 10 kP at high flow levels of carburizing gas
Since the pressure is adjusted in the range of a and the pressure may be lower at the low flow rate level, the valve may be adjusted at the low flow rate level, but may be adjusted at the high flow rate level.
When the flow rate level ratio is 0, for example, when the flow rate level is low, the flow rate level is set to 0.
It becomes 05 kPa or less.

【0021】(9) 浸炭室10の温度が焼き入れ温度まで
低下した後、中扉15を開放し、内部搬送装置6によっ
てワーク4を冷却室3に移動し、エレベーター5の上に
搬出した後、中扉15を閉め、エレベーター5を下降さ
せ、油槽7の油中にワーク4′を浸して焼き入れ処理す
る。このとき窒素ガスを大気圧未満まで導入する。 (10)油中で所定の時間保持した後エレベーター5を上昇
させ、油切りする。 (11)冷却室3を大気圧にする。 (12)前扉14を開放して、ワーク4を炉外の搬送テーブ
ル2に搬出した後、前扉14を閉じ、そして (13)冷却室3を真空排気装置12により0.05kPa
以下まで真空排気することにより、1サイクルの真空浸
炭処理が完了する。
(9) After the temperature of the carburizing chamber 10 has decreased to the quenching temperature, the inner door 15 is opened, and the work 4 is moved to the cooling chamber 3 by the internal transfer device 6 and carried out onto the elevator 5. Then, the middle door 15 is closed, the elevator 5 is lowered, and the work 4 'is immersed in the oil in the oil tank 7 to perform quenching. At this time, nitrogen gas is introduced to below the atmospheric pressure. (10) After holding in the oil for a predetermined time, lift the elevator 5 to drain the oil. (11) The cooling chamber 3 is set to the atmospheric pressure. (12) The front door 14 is opened, the work 4 is carried out to the transfer table 2 outside the furnace, the front door 14 is closed, and (13) the cooling chamber 3 is evacuated to 0.05 kPa by the vacuum exhaust device 12.
By evacuating to a vacuum below, one cycle of vacuum carburizing is completed.

【0022】[0022]

【実施例】(実施例1)次に図1に示す本装置を用いた
真空浸炭の実施例を説明する。実施例1では浸炭ガスに
エチレンガスを用いた。材質がSCM415、外径20
mm長さ10mmの丸棒の処理品を浸炭室に搬送し、浸
炭室内の温度を930℃に加熱した後、エチレンガスを
流量1Lit/minで1分間供給して、浸炭室内圧力
1.3kPaになるように排気バルブ調整しながら浸炭
し、その後4分間エチレンガスを停止して拡散し、ま
た、浸炭室内圧力1.3kPaでエチレンガスを1分間
供給し、その後4分間エチレンガスを停止する。これを
1時間(計12回)繰り返すパルス浸炭をした後、焼き
入れ温度である850度迄冷却し、この温度で30分保
持した後、冷却室に移送し油冷した。
(Embodiment 1) Next, an embodiment of vacuum carburization using the present apparatus shown in FIG. 1 will be described. In Example 1, ethylene gas was used as the carburizing gas. Material is SCM415, outer diameter 20
After processing the round bar having a length of 10 mm into a carburizing chamber and heating the temperature of the carburizing chamber to 930 ° C., ethylene gas was supplied at a flow rate of 1 Lit / min for 1 minute, and the pressure of the carburizing chamber was increased to 1.3 kPa. Carburize while adjusting the exhaust valve so that the ethylene gas is stopped and diffused for 4 minutes, and then ethylene gas is supplied at a pressure of 1.3 kPa for 1 minute, and then the ethylene gas is stopped for 4 minutes. This was repeated for 1 hour (total 12 times) by pulse carburization, cooled to a quenching temperature of 850 ° C., kept at this temperature for 30 minutes, transferred to a cooling chamber, and oil-cooled.

【0023】かかる真空浸炭処理を行った処理品の炭素
分析をしたところ、表面の炭素濃度は0.81%、炭素
濃度が0.3%になる表面からの距離は0.55mmと
なり適正な値であった。またコーナー部の組織には網状
の炭化物は見られず、残留オーステナイトも正常であ
り、煤の発生も無かった。
A carbon analysis of the treated product subjected to the vacuum carburizing treatment revealed that the carbon concentration on the surface was 0.81%, and the distance from the surface where the carbon concentration was 0.3% was 0.55 mm, which was an appropriate value. Met. No network carbides were found in the corner structure, the retained austenite was normal, and no soot was generated.

【0024】(実施例2)次に、浸炭ガスにエチレンガ
ス70%とアセチレンガス30%との混合ガスを用いた
本発明の実施例2について説明する。実施例2では、図
1に示す本装置を使用し、材質がSCM415、外径2
0mm長さ10mmの丸棒の処理品を浸炭室に搬送し、
浸炭室内の温度を930℃に加熱した後、浸炭室内圧力
2.6kPaになるように排気バルブ調整しながら、エ
チレンガス70%とアセチレンガス30%との混合ガス
を流量1Lit/minで1分間供給して浸炭し、その
後、浸炭室内圧力0.13kPaになるように排気バル
ブ調整しながら、混合ガスを流量0.1Lit/min
に減じて5分間流し拡散しこれを1時間(10回)繰り
返すパルス浸炭をした後、焼き入れ温度850度迄冷却
し、この温度で30分保持した後、冷却室に移送し油冷
した。
(Embodiment 2) Next, Embodiment 2 of the present invention using a mixed gas of 70% ethylene gas and 30% acetylene gas as the carburizing gas will be described. In Example 2, the apparatus shown in FIG. 1 was used, and the material was SCM415 and the outer diameter was 2
The processed product of the round bar having a length of 0 mm and a length of 10 mm is transported to the carburizing chamber,
After heating the temperature of the carburizing chamber to 930 ° C., while adjusting the exhaust valve so that the pressure in the carburizing chamber becomes 2.6 kPa, a mixed gas of 70% of ethylene gas and 30% of acetylene gas is supplied at a flow rate of 1 Lit / min for 1 minute. Then, while adjusting the exhaust valve so that the pressure in the carburizing chamber becomes 0.13 kPa, the mixed gas was supplied at a flow rate of 0.1 Lit / min.
After being subjected to pulse carburization repeated for 1 hour (10 times), cooled to a quenching temperature of 850 ° C., kept at this temperature for 30 minutes, transferred to a cooling chamber and oil-cooled.

【0025】かかる処理品の炭素分析をしたところ、表
面の炭素濃度は0.84%、炭素濃度が0.3%になる
表面からの距離は0.58mmと適正な値であった。また
コーナー部の組織には網状の炭化物は見られず、残留オ
ーステナイトも正常であり、煤の発生が無かった。
The carbon analysis of the treated product showed that the carbon concentration on the surface was 0.84% and the distance from the surface at which the carbon concentration was 0.3% was 0.58 mm, which was an appropriate value. Further, no network-like carbide was observed in the structure of the corner portion, the retained austenite was normal, and no soot was generated.

【0026】[0026]

【発明の効果】本発明の方法によれば、エチレンガス又
はエチレンガスとアセチレンガスの混合ガスの供給量を
少なくとも一度高流量レベルから低流量レベルさらに高
流量レベルと繰り返し変化させたパルス浸炭としたの
で、表面異常層のない浸炭処理ができ、狭い空間部の浸
炭も均一になる。特にコーナー部も含めた表面炭素濃度
過多による不具合がない。また、浸炭ガスの高流量レベ
ル時の浸炭室の圧力を0.1〜10kPaの範囲にした
ので、煤の発生も無く安価に浸炭する方法を提供するも
のとなった。
According to the method of the present invention, pulse carburization is performed in which the supply amount of ethylene gas or a mixed gas of ethylene gas and acetylene gas is repeatedly changed at least once from a high flow level to a low flow level and further to a high flow level. Therefore, carburizing treatment without an abnormal surface layer can be performed, and carburizing in a narrow space becomes uniform. In particular, there is no problem due to excessive surface carbon concentration including the corners. Further, since the pressure of the carburizing chamber at the time of the high flow rate of the carburizing gas is set in the range of 0.1 to 10 kPa, a method for carburizing at low cost without generating soot is provided.

【0027】また、パルス浸炭により、浸炭源を過剰に
供給せず、浸炭ガスの消費量を抑制できるので、トータ
ルのランニングコストを下げることができる新たな真空
浸炭装置を提供でき、産業上非常に有益である。
In addition, since pulse carburizing can suppress the consumption of carburizing gas without excessively supplying a carburizing source, it is possible to provide a new vacuum carburizing apparatus which can reduce the total running cost, and is very industrially possible. It is informative.

【0028】また、浸炭ガスの流量変化を周期的に変化
するようにしたので、より浸炭が均一なものとなった。
Further, since the change in the flow rate of the carburizing gas is changed periodically, the carburizing becomes more uniform.

【0029】また、浸炭ガスの流量変化をパルス状の制
御としたので、制御がしやすく従来の真空浸炭装置を簡
単に本装置に改造できる。
Further, since the change in the flow rate of the carburizing gas is controlled in a pulse-like manner, it is easy to control and the conventional vacuum carburizing apparatus can be easily modified into the present apparatus.

【0030】また、高流量レベルと低流量レベルの流量
レベル比を0〜50%とし、かつ高流量レベルに対する
低流量レベルの時間比を50〜3,000%とすること
により、より確実に浸炭ができるものとなった。浸炭室
内の圧力の調整を、バルブ又は可動オリフィス機構を調
整することにより排気側で流量を制御するので、制御が
簡単で、浸炭ガス流量も少なくすることができ、さらな
るコストが低減できる。
Further, by setting the flow rate ratio between the high flow rate level and the low flow rate level to 0 to 50%, and setting the time ratio of the low flow rate level to the high flow rate level to 50 to 3,000%, the carburizing is more reliably performed. Can be done. Since the flow rate is controlled on the exhaust side by adjusting the pressure in the carburizing chamber by adjusting the valve or the movable orifice mechanism, the control is simple, the carburizing gas flow rate can be reduced, and the cost can be further reduced.

【0031】加熱装置を具備した浸炭室と、浸炭室内を
排気する真空排気装置と、浸炭室内へ浸炭ガスを供給す
る装置と、焼入れ用油槽を備えた冷却室とを有する従来
の真空浸炭装置に加えて、浸炭ガス供給量を少なくとも
一度高流量レベルから低流量レベルさらに高流量レベル
に変化させる制御系と、浸炭室内の圧力を調節するため
に、浸炭室の排気口と真空排気装置との間にバルブ又は
可動オリフィス機構を設けることにより、パルス浸炭を
実施でき、上記表面異常層のない、均一で表面炭素濃度
過多による不具合がない煤の発生のない、コストを下げ
た真空浸炭装置を提供するものとなった。
A conventional vacuum carburizing apparatus having a carburizing chamber equipped with a heating device, a vacuum exhaust device for exhausting the carburizing chamber, a device for supplying a carburizing gas into the carburizing chamber, and a cooling chamber having a quenching oil tank. In addition, a control system for changing the carburizing gas supply at least once from the high flow level to the low flow level and further to the high flow level, and the control between the exhaust port of the carburizing chamber and the vacuum exhaust device to adjust the pressure in the carburizing chamber. By providing a valve or a movable orifice mechanism in the apparatus, pulse carburizing can be carried out, and there is provided a vacuum carburizing apparatus which has no abnormal surface layer, does not generate soot free from problems due to excessive surface carbon concentration, and has low cost. It became something.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施の形態を示す真空浸炭装置の全体
概要図である。
FIG. 1 is an overall schematic diagram of a vacuum carburizing apparatus showing an embodiment of the present invention.

【符号の説明】[Explanation of symbols]

3 冷却室 7 (焼き入れ用)油槽 10 浸炭室 11 供給する装置
(ガス供給盤) 12 真空排気装置 16 調整バルブ(バ
ルブ又は可動オ リフィス機構) 17 排気口
Reference Signs List 3 Cooling room 7 Oil tank (for quenching) 10 Carburizing chamber 11 Supply device (gas supply panel) 12 Vacuum exhaust device 16 Adjustment valve (valve or movable orifice mechanism) 17 Exhaust port

───────────────────────────────────────────────────── フロントページの続き (72)発明者 原井 哲 富山県富山市不二越本町一丁目1番1号株 式会社不二越内 (72)発明者 岡田 徹也 富山県富山市不二越本町一丁目1番1号株 式会社不二越内 (72)発明者 今井 直明 富山県富山市北代村巻10番 ──────────────────────────────────────────────────続 き Continuing on the front page (72) Inventor Tetsu Harai 1-1-1, Fujikoshi Honcho, Toyama City, Toyama Prefecture Inside Fujikoshi Corporation (72) Inventor Tetsuya Okada 1-1-1, Fujikoshi Honcho, Toyama City, Toyama Prefecture Fujikoshi Co., Ltd. (72) Inventor Naoaki Imai 10

Claims (6)

【特許請求の範囲】[Claims] 【請求項1】 真空浸炭処理において、浸炭ガスとして
エチレンガス又はエチレンガスとアセチレンガスの混合
ガスを用い、該浸炭ガスの供給量を少なくとも一度高流
量レベルから低流量レベルへ、さらに高流量レベルから
低流量レベルへと、繰り返して変化させ、かつ前記浸炭
ガスの高流量レベル時の浸炭室の圧力が1〜10kPa
の範囲にされていることを特徴とする真空浸炭方法。
In a vacuum carburizing treatment, ethylene gas or a mixed gas of ethylene gas and acetylene gas is used as a carburizing gas, and a supply amount of the carburizing gas is at least once reduced from a high flow level to a low flow level, and further increased from a high flow level. It is repeatedly changed to a low flow level, and the pressure of the carburizing chamber at the high flow level of the carburizing gas is 1 to 10 kPa
Vacuum carburizing method characterized by being in the range of.
【請求項2】 前記浸炭ガスの流量変化は周期的に変化
するようにされていることを特徴とする請求項1記載の
真空浸炭方法
2. The vacuum carburizing method according to claim 1, wherein a change in the flow rate of the carburizing gas is changed periodically.
【請求項3】 前記浸炭ガスの流量変化はパルス状であ
ることことを特徴とする請求項1又は2記載の真空浸炭
方法
3. The vacuum carburizing method according to claim 1, wherein the change in the flow rate of the carburizing gas is a pulse.
【請求項4】 前記浸炭室へ浸炭ガスの高流量レベルに
対する低流量レベルの流量レベル比が0〜50%であ
り、かつ高流量レベルに対する低流量レベルの時間比が
50〜3,000%であることを特徴とする請求項1又
は2又は3に記載の真空浸炭方法。
4. The method according to claim 1, wherein the flow rate ratio of the low flow level to the high flow level of the carburizing gas is 0 to 50% and the time ratio of the low flow level to the high flow level is 50 to 3,000%. The vacuum carburizing method according to claim 1, 2 or 3, wherein
【請求項5】 浸炭室内の圧力の調整を、真空排気装置
と浸炭室の排気口間に設けられたバルブ又は可動オリフ
ィス機構を調整することにより行うことを特徴とする請
求項1乃至4のいずれか一に記載の真空浸炭方法。
5. The method according to claim 1, wherein the pressure in the carburizing chamber is adjusted by adjusting a valve or a movable orifice mechanism provided between the vacuum exhaust device and an exhaust port of the carburizing chamber. The vacuum carburizing method according to any one of the above.
【請求項6】 加熱装置を具備した浸炭室と、該浸炭室
内を排気する真空排気装置と、該浸炭室内へ浸炭ガスを
供給する装置と、焼入れ用油槽を備えた冷却室とを有す
る真空浸炭装置において、浸炭ガス供給量を少なくとも
一度高流量レベルから低流量レベルさらに高流量レベル
から低流量レベルに変化させる制御系を設け、かつ浸炭
室内の圧力を調節するために、浸炭室の排気口と真空排
気装置との間にバルブ又は可動オリフィス機構を設けた
ことを特徴とする真空浸炭装置。
6. A carburizing chamber having a heating device, a vacuum exhaust device for evacuating the carburizing chamber, a device for supplying a carburizing gas into the carburizing chamber, and a cooling carburization having a quenching oil tank. In the apparatus, a control system for changing the supply amount of the carburizing gas at least once from the high flow level to the low flow level and further from the high flow level to the low flow level is provided, and in order to adjust the pressure in the carburizing chamber, an exhaust port of the carburizing chamber is provided. A vacuum carburizing device comprising a valve or a movable orifice mechanism provided between the vacuum carburizing device and the vacuum exhaust device.
JP10485599A 1998-04-14 1999-04-13 Vacuum carburizing method Expired - Lifetime JP3839615B2 (en)

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