JP2000001456A - Production of high purity terephthalic acid - Google Patents

Production of high purity terephthalic acid

Info

Publication number
JP2000001456A
JP2000001456A JP10163701A JP16370198A JP2000001456A JP 2000001456 A JP2000001456 A JP 2000001456A JP 10163701 A JP10163701 A JP 10163701A JP 16370198 A JP16370198 A JP 16370198A JP 2000001456 A JP2000001456 A JP 2000001456A
Authority
JP
Japan
Prior art keywords
terephthalic acid
water
slurry
cta
hydrogenation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10163701A
Other languages
Japanese (ja)
Other versions
JP3864563B2 (en
Inventor
Hiroshi Suzuki
弘 鈴木
Daisuke Maruyama
大輔 丸山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Chemicals Inc
Original Assignee
Mitsui Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Chemicals Inc filed Critical Mitsui Chemicals Inc
Priority to JP16370198A priority Critical patent/JP3864563B2/en
Priority to KR1019990020961A priority patent/KR20000005983A/en
Priority to TW088109689A priority patent/TWI239948B/en
Priority to IDP990569A priority patent/ID22868A/en
Priority to CN99108444A priority patent/CN1090172C/en
Publication of JP2000001456A publication Critical patent/JP2000001456A/en
Application granted granted Critical
Publication of JP3864563B2 publication Critical patent/JP3864563B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C51/00Preparation of carboxylic acids or their salts, halides or anhydrides
    • C07C51/16Preparation of carboxylic acids or their salts, halides or anhydrides by oxidation
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C231/00Preparation of carboxylic acid amides
    • C07C231/22Separation; Purification; Stabilisation; Use of additives
    • C07C231/24Separation; Purification

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)

Abstract

PROBLEM TO BE SOLVED: To propose a method for producing high purity terephthalic acid by accelerating the separation of bubbles to homogeneously disperse powder crude terephthalic acid (CTA), forming a highly concentrated aqueous slurry and subsequently efficiently hydrogenating the slurry, capable of efficiently producing the terephthalic acid (PTA). SOLUTION: This method for producing highly pure terephthalic acid (PTA) 16 comprises preliminarily mixing powder crude terephthalic acid (CTA) 1 with a part of water 2a in a kneading device 3 to form the preliminary mixture having a concentration of 55-75 wt.%, mixing the preliminary mixture with the remaining part of water in a slurr-preparing tank 5 to form a slurry, and further subjecting the product to a hydrogenation process 8, a crystallization process 10, a solid-liquid separation process 12, and a drying process 15.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明はパラキシレンの液相
酸化によって得られる粗テレフタル酸(以下、CTAと
いう場合がある)を水素添加処理して高純度テレフタル
酸(以下、PTAという場合がある)を製造する方法に
関するものである。
The present invention relates to a high-purity terephthalic acid (hereinafter sometimes referred to as PTA) obtained by subjecting crude terephthalic acid (hereinafter sometimes referred to as CTA) obtained by liquid phase oxidation of para-xylene to hydrogenation treatment. And a method for producing the same.

【0002】[0002]

【従来の技術】パラキシレンを分子状酸素含有ガスによ
り液相で酸化すると、テレフタル酸(以下、TAという
場合がある)のほかに、主たる不純物として4−カルボ
キシベンズアルデヒド(以下、4−CBAという場合が
ある)を含むCTAが生成する。ところがポリエステル
繊維の製造にはPTAが原料として要求されるため、上
記CTAの精製が必要になる。
2. Description of the Related Art When para-xylene is oxidized in a liquid phase with a molecular oxygen-containing gas, in addition to terephthalic acid (hereinafter sometimes referred to as TA), 4-carboxybenzaldehyde (hereinafter referred to as 4-CBA) is a main impurity. CTA) is generated. However, since PTA is required as a raw material for the production of polyester fibers, the above-mentioned CTA must be purified.

【0003】PTAを製造する方法として、CTAを水
素添加触媒の存在下に水素添加処理する方法が知られて
いる(例えば特開平4−66553号)。この方法では
水素添加により4−CBAを低温でも水溶性のパラトル
イル酸に還元し、晶析、固液分離等によりパラトルイル
酸をテレフタル酸から分離することにより、PTAを製
造するものである。
[0003] As a method for producing PTA, there is known a method in which CTA is subjected to a hydrogenation treatment in the presence of a hydrogenation catalyst (for example, JP-A-4-66553). In this method, 4-CBA is reduced to water-soluble paratoluic acid even at a low temperature by hydrogenation, and PTA is produced by separating paratoluic acid from terephthalic acid by crystallization, solid-liquid separation or the like.

【0004】上記の水素添加処理は反応器に固形触媒の
固定層を形成し、この触媒層にCTA水溶液を通液しな
がら水素を供給することにより行われる。この場合、C
TA水溶液はCTA粉末を水に分散させたスラリーを形
成し、これを加熱することによりCTAを水に溶解させ
て調製している。このとき反応を効率よく行うために
は、加熱時のテレフタル酸の溶解度に相当する濃度のス
ラリーを形成することが要求される。
The above-mentioned hydrogenation treatment is carried out by forming a fixed layer of a solid catalyst in a reactor and supplying hydrogen while passing a CTA aqueous solution through the catalyst layer. In this case, C
The TA aqueous solution is prepared by forming a slurry in which CTA powder is dispersed in water and heating the slurry to dissolve CTA in water. At this time, in order to carry out the reaction efficiently, it is required to form a slurry having a concentration corresponding to the solubility of terephthalic acid during heating.

【0005】従来のCTAのスラリー化は、一般に回転
式の攪拌羽根を有する水スラリー調製槽に水と粉末CT
Aを導入して攪拌することによりスラリーを形成してい
る。この方法はスラリー調製槽内に充満する液を攪拌し
ながら連続的に水と粉末CTAを供給することにより粉
末CTAを水中に分散させる方法である。
[0005] The conventional CTA slurry is generally prepared by adding water and powder CT to a water slurry preparation tank having a rotary stirring blade.
The slurry is formed by introducing and stirring A. This method is a method of dispersing powder CTA in water by continuously supplying water and powder CTA while stirring the liquid filled in the slurry preparation tank.

【0006】ところが粉末CTAは水との親和性が高く
ないため、気泡を含んだ状態で分散することがあり、気
泡の分離が困難である。気泡を含んだ状態では粉末CT
Aは塊状のまま流れ、加熱しても溶解せず塊状のまま水
素添加反応器に流入して水素添加触媒層に捕捉され目詰
まりの原因となる。
However, since powdered CTA does not have a high affinity for water, it may be dispersed in a state containing air bubbles, and it is difficult to separate the air bubbles. In the state containing bubbles, powder CT
A flows as a lump, does not melt even when heated, flows into the hydrogenation reactor as a lump, is captured by the hydrogenation catalyst layer, and causes clogging.

【0007】これを防止するために、従来は水に分散さ
せる粉末CTAの量を少なくし、低濃度の水スラリーを
形成することにより、気泡を含んで塊状となるCTAの
量を少なくし、これにより加熱によって溶解できるよう
にしている。しかし低濃度のスラリーを供給すると水素
添加反応の効率が低くなるという問題点がある。
[0007] In order to prevent this, conventionally, the amount of powdered CTA dispersed in water is reduced, and a low-concentration water slurry is formed to reduce the amount of bulky CTA including bubbles. Can be dissolved by heating. However, there is a problem that the efficiency of the hydrogenation reaction is reduced when a slurry having a low concentration is supplied.

【0008】[0008]

【発明が解決しようとする課題】本発明の課題は、気泡
の分離を促進して粉末CTAを均一に分散させ、高濃度
の水スラリーを形成して水素添加反応を効率よく行い、
これによりPTAを効率よく製造することが可能な高純
度テレフタル酸の製造方法を提案することである。
SUMMARY OF THE INVENTION An object of the present invention is to promote the separation of air bubbles to uniformly disperse powdered CTA, to form a high-concentration water slurry, and to efficiently perform a hydrogenation reaction.
It is an object of the present invention to propose a method for producing high-purity terephthalic acid, which enables efficient production of PTA.

【0009】[0009]

【課題を解決するための手段】本発明は、次の高純度テ
レフタル酸の製造方法である。 (1)パラキシレンの液相酸化によって得られる粗テレ
フタル酸を水と混合してスラリーを形成し、このスラリ
ーを加熱して粗テレフタル酸溶液を形成し、水素添加触
媒の存在下に水素添加処理して、高純度テレフタル酸を
製造する方法において、粉末粗テレフタル酸と一部の水
とを混練装置で予混合して55〜75重量%濃度の予混
合物を形成し、この予混合物を残部の水と混合してスラ
リーを形成し、水素添加処理を行うことを特徴とする高
純度テレフタル酸の製造方法。 (2)連続式の混練装置で予混合を行う上記(1)記載
の方法。 (3) 水平方向に配置された回転円板により粉末CT
Aを放射方向に送り出しながら水を混合し、混合物を狭
いジクザク状の抵抗路を移動させて均質化させる回転円
板形混練装置で予混合を行う上記(1)記載の方法。
The present invention is the following method for producing high-purity terephthalic acid. (1) Crude terephthalic acid obtained by liquid phase oxidation of para-xylene is mixed with water to form a slurry, and this slurry is heated to form a crude terephthalic acid solution, which is subjected to a hydrogenation treatment in the presence of a hydrogenation catalyst. Then, in the method for producing high-purity terephthalic acid, the powdery crude terephthalic acid and a part of water are premixed in a kneading apparatus to form a premix having a concentration of 55 to 75% by weight, and this premix is mixed with the remainder. A method for producing high-purity terephthalic acid, comprising mixing with water to form a slurry and performing a hydrogenation treatment. (2) The method according to the above (1), wherein the premixing is performed by a continuous kneading apparatus. (3) Powder CT by rotating disk arranged horizontally
The method according to the above (1), wherein the water is mixed while A is fed in the radial direction, and the mixture is premixed by a rotating disk-type kneading device which homogenizes the mixture by moving it through a narrow zigzag resistance path.

【0010】本発明において水素添加処理の対象となる
粗テレフタル酸(CTA)はパラキシレンの液相酸化に
よって得られる粗テレフタル酸である。このようなテレ
フタル酸は一般に主たる不純物として4−CBAを0.
1〜0.4重量%程度含有している。
The crude terephthalic acid (CTA) to be subjected to the hydrogenation treatment in the present invention is crude terephthalic acid obtained by the liquid phase oxidation of para-xylene. Such terephthalic acid generally contains 4-CBA as a major impurity in 0.1%.
About 1 to 0.4% by weight is contained.

【0011】上記のパラキシレンの液相酸化は溶媒およ
び触媒を用いて行われる。パラキシレンの液相酸化にお
ける溶媒としては、酢酸、プロピオン酸、n−酪酸、イ
ソ酪酸、n−吉草酸、トリメチル酢酸、カプロン酸など
の脂肪酸、あるいはこれらと水との混合物を例示でき
る。これらの中では酢酸または後述の如く水を含む酢酸
が好ましい。
The liquid phase oxidation of para-xylene is carried out using a solvent and a catalyst. Examples of the solvent in the liquid-phase oxidation of para-xylene include fatty acids such as acetic acid, propionic acid, n-butyric acid, isobutyric acid, n-valeric acid, trimethylacetic acid, and caproic acid, or a mixture of these with water. Among them, acetic acid or acetic acid containing water as described below is preferable.

【0012】パラキシレンの液相酸化触媒としては、重
金属化合物および/または臭素含有化合物が一般的であ
り、前者としてはニッケル、コバルト、鉄、クロム、マ
ンガン等であり、両者共に元素形態または化合物とし
て、好ましくは反応系に溶解する形で使用される。好ま
しい態様としては、コバルト化合物、マンガン化合物お
よび臭素化合物を用いるものであり、コバルト化合物の
使用量は通常溶媒に対してコバルトとして10ないし1
0,000ppm、好ましくは100ないし3000p
pmである。またマンガン化合物はコバルトに対するマ
ンガンの原子比として0.001ないし2であり、同様
に臭素化合物はコバルトに対する原子比として0.1な
いし5である。
As a liquid phase oxidation catalyst for para-xylene, a heavy metal compound and / or a bromine-containing compound is generally used, and the former is nickel, cobalt, iron, chromium, manganese or the like. , Preferably in a form dissolved in the reaction system. In a preferred embodiment, a cobalt compound, a manganese compound and a bromine compound are used, and the amount of the cobalt compound used is usually 10 to 1 as cobalt with respect to the solvent.
0,000 ppm, preferably 100 to 3000p
pm. The manganese compound has an atomic ratio of manganese to cobalt of 0.001 to 2, and the bromine compound has an atomic ratio of cobalt to cobalt of 0.1 to 5.

【0013】パラキシレンの液相酸化は分子状酸素含有
ガスを用いて行われる。このような酸素含有ガスとして
は通常不活性ガスで稀釈された酸素が用いられ、例えば
空気や酸素富化された空気が利用される。酸化反応の温
度は通常150ないし270℃、好ましくは170ない
し220℃であり、圧力は少なくとも反応温度において
混合物が液相を保持できる圧力以上であり、通常0.5
ないし4MPa(ゲージ圧)である。さらに反応時間は
装置の大きさ等にもよるが、通常滞留時間として20分
ないし180分程度である。反応系内の水分濃度は通常
3ないし30重量%であり、好ましくは5ないし15重
量%である。
The liquid phase oxidation of para-xylene is performed using a molecular oxygen-containing gas. As such an oxygen-containing gas, oxygen diluted with an inert gas is generally used, and for example, air or oxygen-enriched air is used. The temperature of the oxidation reaction is usually from 150 to 270 ° C., preferably from 170 to 220 ° C., and the pressure is at least a pressure at which the mixture can maintain a liquid phase at least at the reaction temperature, and is usually at least 0.5.
To 4 MPa (gauge pressure). Further, the reaction time depends on the size of the apparatus and the like, but is usually about 20 minutes to 180 minutes as the residence time. The water concentration in the reaction system is usually 3 to 30% by weight, preferably 5 to 15% by weight.

【0014】上記の液相酸化反応により得られるCTA
を反応器に導入し、水素添加触媒の存在下に水素添加処
理を行ってPTAが製造されるが、この場合、液相酸化
反応における母液から分離したCTAを水スラリー化
し、得られる水スラリーを加熱、加圧してテレフタル酸
水溶液として反応器に導入し、水素添加処理する。一般
にスラリーのCTA濃度は10〜40重量%、好ましく
は20〜30重量%であるが、加熱、加圧時の溶解度に
相当する濃度とするのが好ましい。
CTA obtained by the above liquid phase oxidation reaction
Is introduced into a reactor, and hydrogenation treatment is performed in the presence of a hydrogenation catalyst to produce PTA. In this case, CTA separated from the mother liquor in the liquid phase oxidation reaction is turned into a water slurry, and the obtained water slurry is The mixture is heated and pressurized and introduced into a reactor as an aqueous terephthalic acid solution, followed by hydrogenation treatment. Generally, the CTA concentration of the slurry is 10 to 40% by weight, preferably 20 to 30% by weight, but is preferably a concentration corresponding to the solubility when heated and pressed.

【0015】本発明ではこのスラリーを形成するために
粉末CTAと一部の水とを混練装置により予混合して5
5〜75重量%、好ましくは60〜70重量%の濃度の
予混合物を形成し、この予混合物を残部の水を混合する
ことにより、粉末CTAを均一に分散させて気泡や塊状
物の少ないスラリーを形成する。
In the present invention, in order to form this slurry, powder CTA and a portion of water are premixed by a kneading device to form a slurry.
A premix having a concentration of 5 to 75% by weight, preferably 60 to 70% by weight, is formed, and the premix is mixed with the remaining water to uniformly disperse the powdered CTA so as to obtain a slurry having less bubbles and agglomerates. To form

【0016】粉末CTAと一部の水との予混合は混練装
置により行われる。混練装置は粉末CTAを水の存在下
に練り合せる装置であり、一般的な混練装置が使用可能
である。このような混練装置としては、容器回転形とし
てボールミル形;容器固定形として水平軸回転式のブレ
ード形、ロール形、スクリュー形、円板形、ならびに垂
直軸回転式のブレード形、ホイール形、高速流動形、回
転円板形、らいかい形;容器振動形として振動ミルなど
があげられるが、連続式のものが好ましい。
The premixing of the powdered CTA and a part of water is performed by a kneading apparatus. The kneading device is a device for kneading powder CTA in the presence of water, and a general kneading device can be used. Such kneading devices include a ball mill type as a container rotating type; a horizontal axis rotating type blade type, a roll type, a screw type, a disk type, a vertical axis rotating type blade type, a wheel type, and a high speed as a container rotating type. Fluid type, rotating disk type, rough type; vibrating mill and the like as a container vibrating type, but a continuous type is preferable.

【0017】特に好ましい混練装置としては、水平方向
に配置された回転円板により粉末CTAを放射方向に送
り出しながら水を混合し、混合物を狭いジクザク状の抵
抗路を移動させて均質化させる回転円板形混合装置があ
げられる。
A particularly preferred kneading apparatus is a rotating circle which mixes water while feeding powder CTA in a radial direction by a rotating disk arranged in a horizontal direction, and homogenizes the mixture by moving it through a narrow zigzag resistance path. A plate type mixing device can be used.

【0018】このような混練装置で粉末CTA濃度が5
5〜75重量%、好ましくは60〜70重量%となるよ
うに粉末CTAと一部の水との混合を行うことにより、
粉末CTAに付着している気泡が分離して粉末CTAと
水とが均一に混合して、均質化した予混合物が形成され
る。
With such a kneading apparatus, the powder CTA concentration is 5
By mixing the powdered CTA and a part of water so as to be 5 to 75% by weight, preferably 60 to 70% by weight,
Bubbles adhering to the powdered CTA are separated and the powdered CTA and water are uniformly mixed to form a homogenized premix.

【0019】こうして得られる予混合物は気泡が除去さ
れ、水とCTAが均一に混合した状態であるので、これ
を残部の水とともにスラリー調製槽に導入して攪拌混合
することにより、粉末CTAは均一に分散し、均質化し
たスラリーが形成される。この場合の混合手段としては
回転式の攪拌羽根を有する混合槽のように、従来からス
ラリーの調整に使用されているものが使用できる。
Since the premix obtained in this way is a state in which bubbles are removed and water and CTA are uniformly mixed, the mixture is introduced into a slurry preparation tank together with the remaining water and mixed by stirring, whereby powder CTA is uniformly mixed. And a homogenized slurry is formed. In this case, as the mixing means, a means conventionally used for adjusting a slurry, such as a mixing tank having a rotary stirring blade, can be used.

【0020】このときのスラリーのCTA濃度は前述の
通りとされるが、この場合予混合物中の気泡が除去され
て塊状物が少なくなっているため、スラリー濃度を高く
しても溶解が容易であり、スラリー濃度を溶解度に近い
値とすることができる。
The CTA concentration of the slurry at this time is as described above. In this case, since bubbles in the pre-mixture are removed and lumps are reduced, dissolution is easy even if the slurry concentration is increased. Yes, the slurry concentration can be set to a value close to the solubility.

【0021】こうして得られるスラリーは加熱によりC
TAを溶解させてテレフタル酸溶液とし、これを反応器
に導入して水素添加処理を行う。水素添加処理を行うた
めの反応器は内部に触媒を充填し、CTA水溶液と接触
した状態で水素を供給できるものであればその形状、構
造等は制限されない。
The slurry thus obtained is heated to form C
TA is dissolved to form a terephthalic acid solution, which is introduced into a reactor for hydrogenation treatment. The shape, structure, and the like of the reactor for performing the hydrogenation treatment are not limited as long as the reactor is filled with a catalyst and can supply hydrogen in contact with the CTA aqueous solution.

【0022】好ましい反応器としては、固形の触媒を充
填して固定層を形成し、これにCTA水溶液を通液する
ように導入路および導出路を有し、さらに水素を供給で
きるように水素供給路を有するものが好ましい。CTA
溶液は上向流でもよいが、下向流通液するように導入路
が反応器の上部に、導出路が下部に連絡するのが好まし
く、水素は上部から供給するように、反応器上部に連絡
するのが好ましい。
As a preferred reactor, a solid catalyst is filled to form a fixed bed, and an inlet and an outlet for passing a CTA aqueous solution therethrough. Those having a path are preferred. CTA
The solution may flow upward, but it is preferable that the introduction path communicates with the upper part of the reactor and the discharge path communicates with the lower part so that the liquid flows downward.Hydrogen is connected to the upper part of the reactor so that hydrogen is supplied from the upper part. Is preferred.

【0023】水素添加触媒としては、従来から用いられ
ているものが使用でき、例えばパラジウム、ルテニウ
ム、ロジウム、オスミウム、イリジウム、白金、白金
黒、パラジウム黒、鉄、コバルト−ニッケル等が用いら
れるが、固定層を形成できるようにこれらを担体、好ま
しくは活性炭等の吸着性の担体に担持した固形触媒が好
ましい。
As the hydrogenation catalyst, those conventionally used can be used. For example, palladium, ruthenium, rhodium, osmium, iridium, platinum, platinum black, palladium black, iron, cobalt-nickel and the like are used. A solid catalyst in which these are supported on a carrier, preferably an adsorptive carrier such as activated carbon, so that a fixed layer can be formed is preferred.

【0024】水素添加処理は定常状態においては、CT
Aの水スラリーを温度230℃以上、好ましくは240
〜300℃、圧力1〜11MPa、好ましくは3〜9M
Pa(ゲージ圧)に加熱、加圧してテレフタル酸を溶解
させ、得られるCTA水溶液を、反応器に供給して触媒
層を通過させながら、水素ガスを粗テレフタル酸水溶液
中の4−CBAの1.5倍モル以上、好ましくは2倍モ
ル以上の流量で供給して水素添加を行う。水素添加の反
応温度は230℃以上、好ましくは255〜300℃、
圧力は1〜11MPa、好ましくは3〜9MPa(ゲー
ジ圧)、水素分圧は0.05MPa以上、好ましくは
0.05〜2MPa程度とされる。
In the hydrogenation treatment in a steady state, CT
A water slurry at a temperature of 230 ° C. or higher, preferably 240 ° C.
~ 300 ° C, pressure 1 ~ 11MPa, preferably 3 ~ 9M
While heating and pressurizing to Pa (gauge pressure) to dissolve terephthalic acid, the resulting CTA aqueous solution is supplied to the reactor and passed through the catalyst layer, and hydrogen gas is passed through the crude terephthalic acid aqueous solution while passing through the catalyst layer. Hydrogenation is carried out by supplying at a flow rate of at least 0.5 times mol, preferably at least 2 times mol. The reaction temperature for hydrogenation is 230 ° C or higher, preferably 255 to 300 ° C,
The pressure is 1 to 11 MPa, preferably 3 to 9 MPa (gauge pressure), and the hydrogen partial pressure is 0.05 MPa or more, preferably about 0.05 to 2 MPa.

【0025】水素添加処理により、CTA中の4−CB
Aは水溶性のパラトルイル酸に還元されるので、300
℃以下、好ましくは100〜280℃で晶析し、固液分
離を行うことにより、テレフタル酸スラリーからパラト
ルイル酸を分離して精製テレフタル酸を得る。この精製
テレフタル酸は再水スラリー化して、結晶に付着してい
る異物を水側に移行させ、その後固液分離および乾燥を
行って高純度テレフタル酸(PTA)を製造する。
By the hydrogenation treatment, 4-CB in CTA
Since A is reduced to water-soluble paratoluic acid, 300
Crystallization is performed at a temperature of 100 ° C. or lower, preferably 100 to 280 ° C., and solid-liquid separation is performed to separate paratoluic acid from the terephthalic acid slurry to obtain purified terephthalic acid. The purified terephthalic acid is re-slurried to transfer foreign substances adhering to the crystals to the water side, and then subjected to solid-liquid separation and drying to produce high-purity terephthalic acid (PTA).

【0026】[0026]

【発明の効果】本発明によれば、粉末CTAと一部の水
とを混練して予混合物を形成し、この混合物を残部の水
と混合してスラリーを形成するようにしたので、気泡の
分離を促進して粉末CTAを均一に分散させ、高濃度の
水スラリーを形成して水素添加反応を効率よく行い、こ
れによりPTAを効率よく製造することができる。
According to the present invention, the powder CTA and a portion of water are kneaded to form a premix, and this mixture is mixed with the remaining water to form a slurry. Separation is promoted to uniformly disperse the powdered CTA, and a high-concentration water slurry is formed to efficiently carry out the hydrogenation reaction, whereby PTA can be efficiently produced.

【0027】[0027]

【発明の実施の形態】以下、本発明の実施の形態を図面
により説明する。図1は実施形態による高純度テレフタ
ル酸の製造方法を示すフローシートである。
Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a flow sheet showing a method for producing high-purity terephthalic acid according to the embodiment.

【0028】図1において高純度テレフタル酸(PT
A)の製造は、まず粉末テレフタル酸(CTA)1を一
部の水2aとともに混練装置3に供給して予混合を行っ
て、55〜75重量%濃度の予混合物4を形成し、これ
を他の水2bとともにスラリー調製槽5に供給し、必要
によりさらに他の水(補給水)2cを供給し、攪拌して
スラリーを形成する。このスラリーは加熱、加圧してC
TAを溶解し、このCTA水溶液6および水素7を水素
添加反応器8に供給して水素添加処理を行う。水素添加
処理した反応液9は減圧し冷却して晶析槽10に導入し
晶析を行う。
In FIG. 1, high purity terephthalic acid (PT
In the production of A), first, powdered terephthalic acid (CTA) 1 is supplied to a kneading apparatus 3 together with a part of water 2a and premixed to form a premix 4 having a concentration of 55 to 75% by weight. The water is supplied to the slurry preparation tank 5 together with the other water 2b, and if necessary, another water (supplementary water) 2c is supplied and stirred to form a slurry. This slurry is heated and pressed to C
The TA is dissolved, and the CTA aqueous solution 6 and the hydrogen 7 are supplied to the hydrogenation reactor 8 to perform a hydrogenation treatment. The reaction solution 9 subjected to the hydrogenation treatment is reduced in pressure, cooled and introduced into a crystallization tank 10 for crystallization.

【0029】生成するスラリー11を固液分離装置12
に導入して固液分離を行う。固液分離は通常複数段にわ
たって行われ、前段の分離液13aは廃水として排出
し、後段の固液分離では水(洗浄水)2dを供給して再
スラリー化して固液分離し、この後段の分離液13bは
水2a、2bとして循環する。分離した結晶14は乾燥
器15において乾燥し、高純度テレフタル酸(PTA)
16を製造する。
The resulting slurry 11 is separated into a solid-liquid separation device 12
To perform solid-liquid separation. The solid-liquid separation is usually performed in a plurality of stages, and the separated liquid 13a in the former stage is discharged as waste water, and in the latter solid-liquid separation, water (washing water) 2d is supplied to re-slurry to perform solid-liquid separation. The separated liquid 13b circulates as water 2a, 2b. The separated crystal 14 is dried in a dryer 15 and is made of high-purity terephthalic acid (PTA).
16 is manufactured.

【0030】図2は混練装置3の断面図であり、垂直軸
回転式の回転円板形混練装置が用いられている。混練装
置3は垂直回転軸21によって回転する水平方向に配置
された回転円板22の中心部に対向してCTA供給路2
3が開口し、その先端部の周囲に環状の間隙24を介し
て回転円板22とほぼ平行に、周辺部が厚くなるドーナ
ツ盤状の隔板25が設けられ、これらの周縁部を下およ
び上側から覆うガイド板26、27の周辺部間にジクザ
ク状の抵抗路28が形成されている。29はCTA供給
路23を囲むように設けられた水供給路、30はケーシ
ングである。
FIG. 2 is a cross-sectional view of the kneading apparatus 3, in which a rotating disk type kneading apparatus of a vertical axis rotation type is used. The kneading device 3 is opposed to the center of a rotating disk 22 arranged in a horizontal direction and rotated by a vertical rotating shaft 21 so as to face the CTA supply path 2.
3 is opened, and a donut-shaped partition plate 25 having a thicker peripheral portion is provided around the distal end portion thereof in parallel with the rotating disk 22 via an annular gap 24, and these peripheral portions are provided below and below the peripheral portion. A zigzag resistance path 28 is formed between the peripheral portions of the guide plates 26 and 27 covering from above. 29 is a water supply path provided so as to surround the CTA supply path 23, and 30 is a casing.

【0031】混練装置3では回転軸21により回転円板
22を回転させながら、CTA供給路23から粉末CT
A1を供給し、水供給路29から水2aを供給すると、
CTA供給路23から出た粉末CTA1は回転円板22
に衝突し、放射状に流れて間隙24から出る水と混合さ
れて周辺方向に渦巻状に流れ、隔板25の上側から流れ
る水と混合されて抵抗路28をジクザク状に流れ、これ
により粉末CTAと水が予混合されて気泡が分離して粉
末CTAと水が均一に混和し、均質な予混合物4が形成
される。
In the kneading device 3, while rotating the rotating disk 22 by the rotating shaft 21, the powder CT
When A1 is supplied and water 2a is supplied from the water supply path 29,
The powder CTA1 coming out of the CTA supply path 23 is
And flows radially and mixes with the water exiting the gap 24 and spirals in the peripheral direction, mixes with the water flowing from above the diaphragm 25 and flows in a zigzag manner through the resistance path 28, thereby forming a powder CTA. And water are premixed to separate air bubbles, whereby the powdered CTA and water are uniformly mixed to form a homogeneous premix 4.

【0032】このように均質化した予混合物4はスラリ
ー調製槽5において水2b、2cと攪拌、混合すること
により、粉末CTAは塊状になることなく均質に水に分
散し、均質化したスラリーが形成される。このためスラ
リーのCTA濃度を高くしても加熱加圧したときにほぼ
完全に溶解して均一なTA水溶液が得られ、水素添加反
応器8における水素添加処理の反応効率を高くすること
ができる。
The homogenized pre-mixture 4 is stirred and mixed with the water 2b and 2c in the slurry preparation tank 5, so that the powder CTA is uniformly dispersed in water without forming a lump, and the homogenized slurry is dispersed. It is formed. Therefore, even when the CTA concentration of the slurry is increased, the TA solution is almost completely dissolved when heated and pressurized to obtain a uniform TA aqueous solution, and the reaction efficiency of the hydrogenation treatment in the hydrogenation reactor 8 can be increased.

【0033】なお、以上の例では混練装置として回転円
板形のものを用いたが他の形式のものでもよい。また固
液分離装置12において固液分離した結晶14をそのま
ま乾燥したが、分離した結晶14に水を加えて再水スラ
リー化し、この再水スラリー化したスラリーを再度固液
分離して精製してもよい。
In the above example, a rotary disk type kneading device is used, but another type may be used. Further, the crystal 14 subjected to solid-liquid separation in the solid-liquid separation device 12 is dried as it is, but water is added to the separated crystal 14 to form a re-water slurry, and the re-water slurry is purified again by solid-liquid separation. Is also good.

【0034】[0034]

【実施例】以下、本発明の実施例について説明する。Embodiments of the present invention will be described below.

【0035】参考例1 回転羽根式の攪拌機を有する図1のスラリー調製槽5に
粉末CTA200Kgと水800Kgを導入して攪拌混
合し20重量%スラリーを形成し、30分間静置して相
分離の状態を観察した。
REFERENCE EXAMPLE 1 200 kg of powdered CTA and 800 kg of water were introduced into the slurry preparation tank 5 of FIG. 1 having a rotating blade type stirrer and mixed by stirring to form a 20% by weight slurry. The condition was observed.

【0036】実施例1、2、参考例2、3 図2に示す回転円板形混練装置3に粉末CTAと一部の
水を導入して混練し、予混合物と残部の水を参考例1と
同様に図1のスラリー調製槽5に導入して攪拌混合し2
0重量%のスラリーを調製し、同様に30分間静置後の
分離状態を観察した。上記の結果を表1に示す。
Examples 1 and 2, Reference Examples 2 and 3 Powder CTA and a portion of water were introduced into a rotary disk-type kneading apparatus 3 shown in FIG. 2 and kneaded. 1 and introduced into the slurry preparation tank 5 of FIG.
A 0% by weight slurry was prepared, and the separation state after similarly standing for 30 minutes was observed. Table 1 shows the above results.

【0037】[0037]

【表1】 [Table 1]

【0038】表1の結果より、粉末CTAと一部の水を
混練して55〜75重量%、特に60〜70重量%濃度
の予混合物を形成し、これを残部の水と混合してスラリ
ーを形成することにより、気泡および浮遊CTAが少な
く、均質化したスラリーが得られることがわかる。
From the results shown in Table 1, the powder CTA and a portion of water were kneaded to form a premix having a concentration of 55 to 75% by weight, particularly 60 to 70% by weight, and this was mixed with the remaining water to form a slurry. It can be seen that the formation of makes it possible to obtain a homogenized slurry with less bubbles and suspended CTA.

【図面の簡単な説明】[Brief description of the drawings]

【図1】実施形態の高純度テレフタル酸の製造方法を示
すフローシートである。
FIG. 1 is a flow sheet showing a method for producing high-purity terephthalic acid according to an embodiment.

【図2】混練装置の断面図である。FIG. 2 is a sectional view of a kneading device.

【符号の説明】[Explanation of symbols]

1 粉末CTA 2a、2b、2c、2d 水 3 混練装置 4 予混合物 5 スラリー調製槽 6 CTA水溶液 7 水素 8 水素添加反応器 9 反応液 10 晶析槽 11 スラリー 12 固液分離装置 13a、13b 分離液 14 結晶 15 乾燥機 16 PTA 21 回転軸 22 回転円板 23 CTA供給路 24 間隙 25 隔板 26、27 ガイド板 28 抵抗路 29 水供給路 30 ケーシング DESCRIPTION OF SYMBOLS 1 Powder CTA 2a, 2b, 2c, 2d Water 3 Kneading apparatus 4 Premix 5 Slurry preparation tank 6 CTA aqueous solution 7 Hydrogen 8 Hydrogenation reactor 9 Reaction liquid 10 Crystallization tank 11 Slurry 12 Solid-liquid separation apparatus 13a, 13b Separation liquid 14 Crystal 15 Dryer 16 PTA 21 Rotating shaft 22 Rotating disk 23 CTA supply path 24 Gap 25 Separator 26, 27 Guide plate 28 Resistance path 29 Water supply path 30 Casing

───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 4H006 AA02 AC46 BA14 BA16 BA19 BA20 BA21 BA37 BD10 BD81 BE30 BE60 BJ50 BS30 4H039 CA65 CC30  ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 4H006 AA02 AC46 BA14 BA16 BA19 BA20 BA21 BA37 BD10 BD81 BE30 BE60 BJ50 BS30 4H039 CA65 CC30

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】 パラキシレンの液相酸化によって得られ
る粗テレフタル酸を水と混合してスラリーを形成し、こ
のスラリーを加熱して粗テレフタル酸溶液を形成し、水
素添加触媒の存在下に水素添加処理して、高純度テレフ
タル酸を製造する方法において、粉末粗テレフタル酸と
一部の水とを混練装置で予混合して55〜75重量%濃
度の予混合物を形成し、この予混合物を残部の水と混合
してスラリーを形成し、水素添加処理を行うことを特徴
とする高純度テレフタル酸の製造方法。
1. A crude terephthalic acid obtained by liquid-phase oxidation of para-xylene is mixed with water to form a slurry, and the slurry is heated to form a crude terephthalic acid solution, which is then treated with hydrogen in the presence of a hydrogenation catalyst. In the method for producing high-purity terephthalic acid by adding, premixed crude terephthalic acid and a portion of water in a kneading apparatus to form a premix having a concentration of 55 to 75% by weight. A method for producing high-purity terephthalic acid, comprising mixing with the remaining water to form a slurry and performing a hydrogenation treatment.
【請求項2】 連続式の混練装置で予混合を行う請求項
1記載の方法。
2. The method according to claim 1, wherein the premixing is performed by a continuous kneading apparatus.
【請求項3】 水平方向に配置された回転円板により粉
末CTAを放射方向に送り出しながら水を混合し、混合
物を狭いジクザク状の抵抗路を移動させて均質化させる
回転円板形混練装置で予混合を行う請求項1記載の方
法。
3. A rotating disk-type kneader for mixing water while feeding powder CTA in a radial direction by a horizontally disposed rotating disk, and homogenizing the mixture by moving it through a narrow zigzag resistance path. The method of claim 1, wherein premixing is performed.
JP16370198A 1998-06-11 1998-06-11 Method for producing high purity terephthalic acid Expired - Fee Related JP3864563B2 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP16370198A JP3864563B2 (en) 1998-06-11 1998-06-11 Method for producing high purity terephthalic acid
KR1019990020961A KR20000005983A (en) 1998-06-11 1999-06-07 Process for Producing Purified Terephthalic Acid
TW088109689A TWI239948B (en) 1998-06-11 1999-06-10 Process for producing purified terephthalic acid
IDP990569A ID22868A (en) 1998-06-11 1999-06-11 PROCESS FOR PRODUCING PURE REALIZED ACID
CN99108444A CN1090172C (en) 1998-06-11 1999-06-11 Process for producing purified terephthalic acid

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16370198A JP3864563B2 (en) 1998-06-11 1998-06-11 Method for producing high purity terephthalic acid

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JP3864563B2 JP3864563B2 (en) 2007-01-10

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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002088066A1 (en) * 2001-04-27 2002-11-07 Mitsubishi Gas Chemical Company, Inc. Method of purifying aromatic polycarboxylic acid
US7547803B2 (en) * 2003-06-20 2009-06-16 Mitsubishi Gas Chemical Company, Inc. Process for producing a high purity aromatic polycarboxylic acid
JP2022520199A (en) * 2019-02-08 2022-03-29 ビーエーエスエフ ソシエタス・ヨーロピア Method for Producing 4,4'-Dichlorodiphenyl Sulfoxide
JP2022522109A (en) * 2019-02-08 2022-04-14 ビーエーエスエフ ソシエタス・ヨーロピア Method for Producing 4,4'-Dichlorodiphenyl Sulfoxide

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN101186573B (en) * 2002-11-14 2011-12-14 三菱化学株式会社 Process for producing terephthalic acid

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2931048B2 (en) * 1990-07-04 1999-08-09 三井化学株式会社 Method for producing high-purity terephthalic acid
JP3232765B2 (en) * 1993-04-19 2001-11-26 三菱化学株式会社 Method for producing high-purity terephthalic acid

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002088066A1 (en) * 2001-04-27 2002-11-07 Mitsubishi Gas Chemical Company, Inc. Method of purifying aromatic polycarboxylic acid
US7005540B2 (en) * 2001-04-27 2006-02-28 Mitsubishi Gas Chemical Company, Inc. Method of purifying aromatic polycarboxylic acid
US7547803B2 (en) * 2003-06-20 2009-06-16 Mitsubishi Gas Chemical Company, Inc. Process for producing a high purity aromatic polycarboxylic acid
JP2022520199A (en) * 2019-02-08 2022-03-29 ビーエーエスエフ ソシエタス・ヨーロピア Method for Producing 4,4'-Dichlorodiphenyl Sulfoxide
JP2022522109A (en) * 2019-02-08 2022-04-14 ビーエーエスエフ ソシエタス・ヨーロピア Method for Producing 4,4'-Dichlorodiphenyl Sulfoxide

Also Published As

Publication number Publication date
CN1090172C (en) 2002-09-04
JP3864563B2 (en) 2007-01-10
TWI239948B (en) 2005-09-21
CN1239090A (en) 1999-12-22
ID22868A (en) 1999-12-16
KR20000005983A (en) 2000-01-25

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