JP1624668S - - Google Patents

Info

Publication number
JP1624668S
JP1624668S JPD2018-12651F JP2018012651F JP1624668S JP 1624668 S JP1624668 S JP 1624668S JP 2018012651 F JP2018012651 F JP 2018012651F JP 1624668 S JP1624668 S JP 1624668S
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JPD2018-12651F
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JPD2018-12651F priority Critical patent/JP1624668S/ja
Priority to US29/671,716 priority patent/USD911985S1/en
Application granted granted Critical
Publication of JP1624668S publication Critical patent/JP1624668S/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JPD2018-12651F 2018-06-08 2018-06-08 Active JP1624668S (enExample)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JPD2018-12651F JP1624668S (enExample) 2018-06-08 2018-06-08
US29/671,716 USD911985S1 (en) 2018-06-08 2018-11-29 Gas introduction plate for plasma etching apparatus for etching semiconductor wafer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JPD2018-12651F JP1624668S (enExample) 2018-06-08 2018-06-08

Publications (1)

Publication Number Publication Date
JP1624668S true JP1624668S (enExample) 2019-02-18

Family

ID=65358714

Family Applications (1)

Application Number Title Priority Date Filing Date
JPD2018-12651F Active JP1624668S (enExample) 2018-06-08 2018-06-08

Country Status (2)

Country Link
US (1) USD911985S1 (enExample)
JP (1) JP1624668S (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD1005974S1 (en) * 2022-05-19 2023-11-28 Asm Ip Holding B.V. Gas distributor for semiconductor manufacturing apparatus
USD1037778S1 (en) * 2022-07-19 2024-08-06 Applied Materials, Inc. Gas distribution plate
USD1052548S1 (en) * 2023-06-26 2024-11-26 Applied Materials, Inc. Gas diffuser

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6379466B1 (en) * 1992-01-17 2002-04-30 Applied Materials, Inc. Temperature controlled gas distribution plate
USD363464S (en) * 1992-08-27 1995-10-24 Tokyo Electron Yamanashi Limited Electrode for a semiconductor processing apparatus
USD411516S (en) * 1996-03-15 1999-06-29 Tokyo Electron Limited Gas diffusion plate for electrode of semiconductor wafer processing apparatus
USD699816S1 (en) * 2001-08-17 2014-02-18 Neoperl Gmbh Stream straightener for faucet
US7479304B2 (en) * 2002-02-14 2009-01-20 Applied Materials, Inc. Gas distribution plate fabricated from a solid yttrium oxide-comprising substrate
US20050252447A1 (en) * 2004-05-11 2005-11-17 Applied Materials, Inc. Gas blocker plate for improved deposition
JP5044931B2 (ja) * 2005-10-31 2012-10-10 東京エレクトロン株式会社 ガス供給装置及び基板処理装置
US20090159002A1 (en) * 2007-12-19 2009-06-25 Kallol Bera Gas distribution plate with annular plenum having a sloped ceiling for uniform distribution
US8206506B2 (en) * 2008-07-07 2012-06-26 Lam Research Corporation Showerhead electrode
US8402918B2 (en) * 2009-04-07 2013-03-26 Lam Research Corporation Showerhead electrode with centering feature
SG169960A1 (en) * 2009-09-18 2011-04-29 Lam Res Corp Clamped monolithic showerhead electrode
US8573152B2 (en) * 2010-09-03 2013-11-05 Lam Research Corporation Showerhead electrode
USD654882S1 (en) * 2010-10-21 2012-02-28 Tokyo Electron Limited Gas-separating plate for reactor for manufacturing semiconductor
USD655261S1 (en) * 2010-10-21 2012-03-06 Tokyo Electron Limited Gas-separating plate for reactor for manufacturing semiconductor
USD655260S1 (en) * 2010-10-21 2012-03-06 Tokyo Electron Limited Gas-separating plate for reactor for manufacturing semiconductor
JP1438745S (enExample) * 2011-09-20 2015-04-06
JP1438319S (enExample) * 2011-09-20 2015-04-06
USD733257S1 (en) * 2014-02-14 2015-06-30 Hansgrohe Se Overhead shower
USD736348S1 (en) * 2014-07-07 2015-08-11 Jiangmen Triumph Rain Showers Co., LTD Spray head for a shower
USD751176S1 (en) * 2014-08-07 2016-03-08 Hansgrohe Se Overhead shower
USD787458S1 (en) * 2015-11-18 2017-05-23 Asm Ip Holding B.V. Gas supply plate for semiconductor manufacturing apparatus
TWD178424S (zh) * 2016-01-08 2016-09-21 Asm Ip Holding Bv 用於半導體製造設備的氣流控制板
USD880437S1 (en) * 2018-02-01 2020-04-07 Asm Ip Holding B.V. Gas supply plate for semiconductor manufacturing apparatus

Also Published As

Publication number Publication date
USD911985S1 (en) 2021-03-02

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