JP1556809S - - Google Patents

Info

Publication number
JP1556809S
JP1556809S JPD2015-21002F JP2015021002F JP1556809S JP 1556809 S JP1556809 S JP 1556809S JP 2015021002 F JP2015021002 F JP 2015021002F JP 1556809 S JP1556809 S JP 1556809S
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JPD2015-21002F
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JPD2015-21002F priority Critical patent/JP1556809S/ja
Priority to TW105301322F priority patent/TWD179918S/zh
Priority to US29/558,926 priority patent/USD799768S1/en
Application granted granted Critical
Publication of JP1556809S publication Critical patent/JP1556809S/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JPD2015-21002F 2015-09-24 2015-09-24 Active JP1556809S (fr)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JPD2015-21002F JP1556809S (fr) 2015-09-24 2015-09-24
TW105301322F TWD179918S (zh) 2015-09-24 2016-03-15 基板洗淨用滾子之部分
US29/558,926 USD799768S1 (en) 2015-09-24 2016-03-23 Roller for substrate cleaning

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JPD2015-21002F JP1556809S (fr) 2015-09-24 2015-09-24

Publications (1)

Publication Number Publication Date
JP1556809S true JP1556809S (fr) 2016-08-22

Family

ID=56687127

Family Applications (1)

Application Number Title Priority Date Filing Date
JPD2015-21002F Active JP1556809S (fr) 2015-09-24 2015-09-24

Country Status (3)

Country Link
US (1) USD799768S1 (fr)
JP (1) JP1556809S (fr)
TW (1) TWD179918S (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD811454S1 (en) * 2016-08-25 2018-02-27 Sancilio & Company, Inc. Mold for a medical dosage form

Family Cites Families (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS596974A (ja) * 1982-07-05 1984-01-14 カネボウ株式会社 洗浄方法
DE3685277D1 (de) * 1985-09-20 1992-06-17 Uni Charm Corp Vorrichtung und verfahren zur herstellung von durchbrochenen vliesstoffen.
US5401231A (en) * 1993-08-23 1995-03-28 Hebert; Jacques O. Texturing roller
US6027573A (en) * 1994-10-06 2000-02-22 Xomed Surgical Products, Inc. Industrial cleaning sponge apparatus and method for extracting residue from a sponge material
US6004402A (en) * 1994-10-06 1999-12-21 Xomed Surgical Products, Inc. Method of cleaning silicon material with a sponge
US6080092A (en) * 1994-10-06 2000-06-27 Xomed Surgical Products, Inc. Industrial cleaning sponge
US5675856A (en) * 1996-06-14 1997-10-14 Solid State Equipment Corp. Wafer scrubbing device
US5745945A (en) * 1996-06-28 1998-05-05 International Business Machines Corporation Brush conditioner for a semiconductor cleaning brush
EP0837493B8 (fr) * 1996-10-21 2007-11-07 Ebara Corporation Appareil de nettoyage
US6502273B1 (en) * 1996-11-08 2003-01-07 Kanebo, Ltd. Cleaning sponge roller
JPH11179646A (ja) * 1997-12-19 1999-07-06 Speedfam Co Ltd 洗浄装置
US6070284A (en) * 1998-02-04 2000-06-06 Silikinetic Technology, Inc. Wafer cleaning method and system
US6182323B1 (en) * 1998-03-27 2001-02-06 Rippey Corporation Ultraclean surface treatment device
US6247197B1 (en) * 1998-07-09 2001-06-19 Lam Research Corporation Brush interflow distributor
US6299698B1 (en) * 1998-07-10 2001-10-09 Applied Materials, Inc. Wafer edge scrubber and method
US6202658B1 (en) * 1998-11-11 2001-03-20 Applied Materials, Inc. Method and apparatus for cleaning the edge of a thin disc
US6405399B1 (en) * 1999-06-25 2002-06-18 Lam Research Corporation Method and system of cleaning a wafer after chemical mechanical polishing or plasma processing
US6240588B1 (en) * 1999-12-03 2001-06-05 Lam Research Corporation Wafer scrubbing brush core
US6557202B1 (en) * 1999-12-03 2003-05-06 Lam Research Corporation Wafer scrubbing brush core having an internal motor and method of making the same
USD456667S1 (en) * 2001-01-12 2002-05-07 World Kitchen, Inc. Handle sleeve
US20020100132A1 (en) * 2001-01-30 2002-08-01 Mcmullen Daniel T. Porous polymeric substrate treatment device and method
US20020121289A1 (en) * 2001-03-05 2002-09-05 Applied Materials, Inc. Spray bar
US7955693B2 (en) * 2001-04-20 2011-06-07 Tolland Development Company, Llc Foam composition roller brush with embedded mandrel
USD482566S1 (en) * 2001-05-21 2003-11-25 Mr. Bar-B-Q-, Inc. Hand grip for barbecue tool
US6904637B2 (en) * 2001-10-03 2005-06-14 Applied Materials, Inc. Scrubber with sonic nozzle
US6616516B1 (en) * 2001-12-13 2003-09-09 Lam Research Corporation Method and apparatus for asymmetric processing of front side and back side of semiconductor substrates
US20050109371A1 (en) * 2003-10-27 2005-05-26 Applied Materials, Inc. Post CMP scrubbing of substrates
JP4813185B2 (ja) * 2006-01-17 2011-11-09 富士通セミコンダクター株式会社 ウェハの洗浄装置及び洗浄方法
US7735177B1 (en) * 2006-02-10 2010-06-15 Lam Research Corporation Brush core assembly
USD622920S1 (en) * 2007-05-02 2010-08-31 Entegris Corporation Cleaning sponge roller
USD682497S1 (en) * 2010-12-21 2013-05-14 Entegris, Inc. Substrate cleaning brush
USD707408S1 (en) * 2011-04-20 2014-06-17 Ebara Corporation Roller for semiconductor wafer cleaning

Also Published As

Publication number Publication date
TWD179918S (zh) 2016-12-01
USD799768S1 (en) 2017-10-10

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