JP1433951S - - Google Patents
Info
- Publication number
- JP1433951S JP1433951S JPD2011-8763F JP2011008763F JP1433951S JP 1433951 S JP1433951 S JP 1433951S JP 2011008763 F JP2011008763 F JP 2011008763F JP 1433951 S JP1433951 S JP 1433951S
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US29/378,161 USD641829S1 (en) | 2010-10-29 | 2010-10-29 | Plasma reactor showerhead face plate having concentric ridge pattern |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP1433951S true JP1433951S (en) | 2015-02-09 |
Family
ID=44262361
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JPD2011-8763F Active JP1433951S (en) | 2010-10-29 | 2011-04-15 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | USD641829S1 (en) |
| JP (1) | JP1433951S (en) |
| TW (1) | TWD148169S (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9315899B2 (en) | 2012-06-15 | 2016-04-19 | Novellus Systems, Inc. | Contoured showerhead for improved plasma shaping and control |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD694357S1 (en) | 2012-03-09 | 2013-11-26 | Durst Corporation, Inc. | Showerhead |
| US9121097B2 (en) | 2012-08-31 | 2015-09-01 | Novellus Systems, Inc. | Variable showerhead flow by varying internal baffle conductance |
| USD790039S1 (en) * | 2016-04-08 | 2017-06-20 | Applied Materials, Inc. | Showerhead for a semiconductor processing chamber |
| USD793526S1 (en) * | 2016-04-08 | 2017-08-01 | Applied Materials, Inc. | Showerhead for a semiconductor processing chamber |
| USD794753S1 (en) * | 2016-04-08 | 2017-08-15 | Applied Materials, Inc. | Showerhead for a semiconductor processing chamber |
| USD1027120S1 (en) * | 2020-12-17 | 2024-05-14 | Applied Materials, Inc. | Seal for an assembly in a vapor deposition chamber |
| USD967935S1 (en) * | 2022-01-23 | 2022-10-25 | Kaiping Linlong Sanitary Ware Technology Co., Ltd. | Faucet |
| USD967936S1 (en) * | 2022-01-23 | 2022-10-25 | Jiangmen Dongrui Technology Co., Ltd. | Faucet |
-
2010
- 2010-10-29 US US29/378,161 patent/USD641829S1/en active Active
-
2011
- 2011-04-15 JP JPD2011-8763F patent/JP1433951S/ja active Active
- 2011-04-15 TW TW100301797F patent/TWD148169S/en unknown
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9315899B2 (en) | 2012-06-15 | 2016-04-19 | Novellus Systems, Inc. | Contoured showerhead for improved plasma shaping and control |
| US9598770B2 (en) | 2012-06-15 | 2017-03-21 | Novellus Systems, Inc. | Contoured showerhead for improved plasma shaping and control |
Also Published As
| Publication number | Publication date |
|---|---|
| TWD148169S (en) | 2012-07-11 |
| USD641829S1 (en) | 2011-07-19 |