ITVA20030028A1 - Sistemi fotopolimerizzabili trasparenti per la preparazione di rivestimenti ad elevato spessore. - Google Patents

Sistemi fotopolimerizzabili trasparenti per la preparazione di rivestimenti ad elevato spessore.

Info

Publication number
ITVA20030028A1
ITVA20030028A1 IT000028A ITVA20030028A ITVA20030028A1 IT VA20030028 A1 ITVA20030028 A1 IT VA20030028A1 IT 000028 A IT000028 A IT 000028A IT VA20030028 A ITVA20030028 A IT VA20030028A IT VA20030028 A1 ITVA20030028 A1 IT VA20030028A1
Authority
IT
Italy
Prior art keywords
preparation
systems
photopolymized
transparent
high thickness
Prior art date
Application number
IT000028A
Other languages
English (en)
Italian (it)
Inventor
Bassi Giuseppe Li
Gabriele Norcini
Stefano Romagnano
Marco Visconti
Original Assignee
Lamberti Spa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lamberti Spa filed Critical Lamberti Spa
Priority to IT000028A priority Critical patent/ITVA20030028A1/it
Priority to DK04766405.7T priority patent/DK1670740T3/da
Priority to AT04766405T priority patent/ATE507200T1/de
Priority to CA2532458A priority patent/CA2532458C/en
Priority to DE602004032452T priority patent/DE602004032452D1/de
Priority to CNB2004800224878A priority patent/CN100554234C/zh
Priority to JP2006522355A priority patent/JP4638869B2/ja
Priority to US10/566,880 priority patent/US7534880B2/en
Priority to PCT/EP2004/051699 priority patent/WO2005014515A2/en
Priority to EP04766405A priority patent/EP1670740B1/en
Publication of ITVA20030028A1 publication Critical patent/ITVA20030028A1/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
    • C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
    • C07D295/10—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms
    • C07D295/104—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms with the ring nitrogen atoms and the doubly bound oxygen or sulfur atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings
    • C07D295/108—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms with the ring nitrogen atoms and the doubly bound oxygen or sulfur atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings to an acyclic saturated chain
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C225/00—Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones
    • C07C225/02—Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones having amino groups bound to acyclic carbon atoms of the carbon skeleton
    • C07C225/14—Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones having amino groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being unsaturated
    • C07C225/16—Compounds containing amino groups and doubly—bound oxygen atoms bound to the same carbon skeleton, at least one of the doubly—bound oxygen atoms not being part of a —CHO group, e.g. amino ketones having amino groups bound to acyclic carbon atoms of the carbon skeleton the carbon skeleton being unsaturated and containing six-membered aromatic rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
    • C07C45/45—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by condensation
    • C07C45/46—Friedel-Crafts reactions
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
    • C07C45/61—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups
    • C07C45/63—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by introduction of halogen; by substitution of halogen atoms by other halogen atoms
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
    • C07C45/61—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups
    • C07C45/64—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by reactions not involving the formation of >C = O groups by introduction of functional groups containing oxygen only in singly bound form
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
    • C07C49/76—Ketones containing a keto group bound to a six-membered aromatic ring
    • C07C49/84—Ketones containing a keto group bound to a six-membered aromatic ring containing ether groups, groups, groups, or groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C2601/00—Systems containing only non-condensed rings
    • C07C2601/12—Systems containing only non-condensed rings with a six-membered ring
    • C07C2601/14—The ring being saturated

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Polymerisation Methods In General (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Paints Or Removers (AREA)
  • Heterocyclic Carbon Compounds Containing A Hetero Ring Having Nitrogen And Oxygen As The Only Ring Hetero Atoms (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
IT000028A 2003-08-07 2003-08-07 Sistemi fotopolimerizzabili trasparenti per la preparazione di rivestimenti ad elevato spessore. ITVA20030028A1 (it)

Priority Applications (10)

Application Number Priority Date Filing Date Title
IT000028A ITVA20030028A1 (it) 2003-08-07 2003-08-07 Sistemi fotopolimerizzabili trasparenti per la preparazione di rivestimenti ad elevato spessore.
DK04766405.7T DK1670740T3 (da) 2003-08-07 2004-08-03 Klare fotopolymeriserbare systemer til fremstilling af overtræk med stor tykkelse
AT04766405T ATE507200T1 (de) 2003-08-07 2004-08-03 Klare photopolymerisierbare systeme zur herstellung von beschichtungen grosser dicke
CA2532458A CA2532458C (en) 2003-08-07 2004-08-03 Clear photopolymerizable systems for the preparation of high thickness coatings
DE602004032452T DE602004032452D1 (de) 2003-08-07 2004-08-03 Klare photopolymerisierbare systeme zur herstellung von beschichtungen grosser dicke
CNB2004800224878A CN100554234C (zh) 2003-08-07 2004-08-03 用于制备高厚度涂层的透明的光可聚合体系
JP2006522355A JP4638869B2 (ja) 2003-08-07 2004-08-03 高厚コーティングの製造のための透明な光重合可能なシステム
US10/566,880 US7534880B2 (en) 2003-08-07 2004-08-03 Clear photopolymerizable systems for the preparation of high thickness coatings
PCT/EP2004/051699 WO2005014515A2 (en) 2003-08-07 2004-08-03 Clear photopolymerizable systems for the preparation of high thickness coatings
EP04766405A EP1670740B1 (en) 2003-08-07 2004-08-03 Clear photopolymerizable systems for the preparation of high thickness coatings

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT000028A ITVA20030028A1 (it) 2003-08-07 2003-08-07 Sistemi fotopolimerizzabili trasparenti per la preparazione di rivestimenti ad elevato spessore.

Publications (1)

Publication Number Publication Date
ITVA20030028A1 true ITVA20030028A1 (it) 2005-02-08

Family

ID=34131257

Family Applications (1)

Application Number Title Priority Date Filing Date
IT000028A ITVA20030028A1 (it) 2003-08-07 2003-08-07 Sistemi fotopolimerizzabili trasparenti per la preparazione di rivestimenti ad elevato spessore.

Country Status (10)

Country Link
US (1) US7534880B2 (https=)
EP (1) EP1670740B1 (https=)
JP (1) JP4638869B2 (https=)
CN (1) CN100554234C (https=)
AT (1) ATE507200T1 (https=)
CA (1) CA2532458C (https=)
DE (1) DE602004032452D1 (https=)
DK (1) DK1670740T3 (https=)
IT (1) ITVA20030028A1 (https=)
WO (1) WO2005014515A2 (https=)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ITVA20030040A1 (it) * 2003-10-27 2005-04-28 Lamberti Spa Fotoiniziatore solido bianco in polvere e procedimento per la sua preparazione.
ITVA20050049A1 (it) * 2005-08-05 2007-02-06 Lamberti Spa Sistemi fotopolimerizzabili contenenti coiniziatori a bassa estraibilita' e volatilita'
CN103601628B (zh) 2010-11-12 2015-11-18 深圳市有为化学技术有限公司 对位或间位官能团化芳香酮类化合物、其制备方法及其光聚合引发剂
CN102504054B (zh) * 2011-11-01 2014-07-02 长沙新宇高分子科技有限公司 降低直至消除voc排放的多官能团羟基酮光引发剂
BE1022066B1 (nl) * 2013-06-28 2016-02-15 Chemstream Bvba Oppervlakteactief middel en bereiding daarvan
CN104974053B (zh) * 2015-06-24 2017-04-26 天津久日新材料股份有限公司 一种新的氨基酮类光引发剂及在uv‑led光固化体系的应用
JP6725663B2 (ja) 2015-12-15 2020-07-22 常州強力先端電子材料有限公司Ｃｈａｎｇｚｈｏｕ Ｔｒｏｎｌｙ Ａｄｖａｎｃｅｄ Ｅｌｅｃｔｒｏｎｉｃ Ｍａｔｅｒｉａｌｓ Ｃｏ．，Ｌｔｄ． フルオレン類多官能光開始剤およびその製造ならびに使用、フルオレン類光開始剤含有感光性樹脂組成物およびその使用
EP3514135B1 (en) * 2016-09-13 2021-04-21 Changzhou Tronly Advanced Electronic Materials Co., Ltd. Fluorene photoinitiator, preparation method therefor, photocurable composition having same, and use of same in photocuring field
US11399986B2 (en) * 2016-12-16 2022-08-02 The Procter & Gamble Company Article comprising energy curable ink
KR102252495B1 (ko) 2017-02-17 2021-05-14 창저우 트론리 어드벤스드 일렉트로닉 머티어리얼스 컴퍼니, 리미티드 플루오레닐아미노케톤 광개시제, 이의 제조 방법 및 이를 함유하는 uv 광경화성 조성물
JP7394759B2 (ja) * 2018-06-29 2023-12-08 株式会社Adeka オキシムエステル化合物およびこれを含有する光重合開始剤
CN109678735B (zh) * 2018-12-28 2022-02-22 山东久日化学科技有限公司 一种烷基胺原位回收利用技术制备

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3715293A (en) * 1971-12-17 1973-02-06 Union Carbide Corp Acetophenone-type photosensitizers for radiation curable coatings
DE2722264C2 (de) * 1977-05-17 1984-06-28 Merck Patent Gmbh, 6100 Darmstadt Verwendung von substituierten Oxyalkylphenonen als Photosensibilisatoren
EP0003002B1 (de) 1977-12-22 1984-06-13 Ciba-Geigy Ag Verwendung von aromatisch-aliphatischen Ketonen als Photoinitiatoren, photopolymerisierbare Systeme enthaltend solche Ketone und neue aromatisch-aliphatische Ketone
EP0088050B1 (de) * 1982-02-26 1986-09-03 Ciba-Geigy Ag Photohärtbare gefärbte Massen
IT1176018B (it) * 1984-04-12 1987-08-12 Lamberti Flli Spa Chetoni aromatico alifatici polimerici o polimerizzabili adatti all'impiego come fotoiniziatori di polimerizzazione
IT1208494B (it) 1985-01-28 1989-07-10 Lamberti Flli Spa Polimerizzazione. derivati solforati di chetoni aromatico-alifatici e alifatici come fotoiniziatori di
EP0284561B1 (de) 1987-03-26 1993-05-12 Ciba-Geigy Ag Neue alpha-Aminoacetophenone als Photoinitiatoren
EP0850253B1 (en) 1995-09-11 1999-12-01 LAMBERTI S.p.A. Betaketosulfonic derivatives suitable to the use as polymerization photoinitiators and photopolymerizable systems containing the same
IT1303775B1 (it) * 1998-11-19 2001-02-23 Lamberti Spa Fotoiniziatori impiegabili nella fotopolimerizzazione, e relativeformulazioni.
ES2207485T3 (es) * 1999-01-12 2004-06-01 Clariant Finance (Bvi) Limited Benzofenonas y su uso como fotoiniciadores.

Also Published As

Publication number Publication date
CN1832912A (zh) 2006-09-13
CN100554234C (zh) 2009-10-28
CA2532458A1 (en) 2005-02-17
US7534880B2 (en) 2009-05-19
DK1670740T3 (da) 2011-08-15
ATE507200T1 (de) 2011-05-15
CA2532458C (en) 2012-01-03
WO2005014515A2 (en) 2005-02-17
JP4638869B2 (ja) 2011-02-23
EP1670740B1 (en) 2011-04-27
US20060246228A1 (en) 2006-11-02
JP2007501776A (ja) 2007-02-01
DE602004032452D1 (de) 2011-06-09
WO2005014515A3 (en) 2005-04-28
EP1670740A2 (en) 2006-06-21

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