IT952933B - Procedimento per alterare in modo controllabile la conduttivita di un corpo vetroso amorfo e dispo sitivo semiconduttore a giunzione utilizzante tale procedimento - Google Patents

Procedimento per alterare in modo controllabile la conduttivita di un corpo vetroso amorfo e dispo sitivo semiconduttore a giunzione utilizzante tale procedimento

Info

Publication number
IT952933B
IT952933B IT67732/72A IT6773272A IT952933B IT 952933 B IT952933 B IT 952933B IT 67732/72 A IT67732/72 A IT 67732/72A IT 6773272 A IT6773272 A IT 6773272A IT 952933 B IT952933 B IT 952933B
Authority
IT
Italy
Prior art keywords
procedure
altering
conductivity
glass body
amorphous glass
Prior art date
Application number
IT67732/72A
Other languages
English (en)
Original Assignee
Innotech Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Innotech Corp filed Critical Innotech Corp
Application granted granted Critical
Publication of IT952933B publication Critical patent/IT952933B/it

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03GELECTROGRAPHY; ELECTROPHOTOGRAPHY; MAGNETOGRAPHY
    • G03G5/00Recording members for original recording by exposure, e.g. to light, to heat, to electrons; Manufacture thereof; Selection of materials therefor
    • G03G5/02Charge-receiving layers
    • G03G5/04Photoconductive layers; Charge-generation layers or charge-transporting layers; Additives therefor; Binders therefor
    • G03G5/043Photoconductive layers characterised by having two or more layers or characterised by their composite structure
    • G03G5/0433Photoconductive layers characterised by having two or more layers or characterised by their composite structure all layers being inorganic
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03CCHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C21/00Treatment of glass, not in the form of fibres or filaments, by diffusing ions or metals in the surface
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/40Crystalline structures
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/80Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
    • H10D62/82Heterojunctions
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00Constructional details of devices covered by this subclass
    • H10F77/10Semiconductor bodies
    • H10F77/16Material structures, e.g. crystalline structures, film structures or crystal plane orientations
    • H10F77/162Non-monocrystalline materials, e.g. semiconductor particles embedded in insulating materials
    • H10F77/166Amorphous semiconductors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/011Manufacture or treatment of multistable switching devices
    • H10N70/021Formation of switching materials, e.g. deposition of layers
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/011Manufacture or treatment of multistable switching devices
    • H10N70/041Modification of switching materials after formation, e.g. doping
    • H10N70/043Modification of switching materials after formation, e.g. doping by implantation
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/011Manufacture or treatment of multistable switching devices
    • H10N70/041Modification of switching materials after formation, e.g. doping
    • H10N70/046Modification of switching materials after formation, e.g. doping by diffusion, e.g. photo-dissolution
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/20Multistable switching devices, e.g. memristors
    • H10N70/24Multistable switching devices, e.g. memristors based on migration or redistribution of ionic species, e.g. anions, vacancies
    • H10N70/245Multistable switching devices, e.g. memristors based on migration or redistribution of ionic species, e.g. anions, vacancies the species being metal cations, e.g. programmable metallization cells
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/801Constructional details of multistable switching devices
    • H10N70/821Device geometry
    • H10N70/826Device geometry adapted for essentially vertical current flow, e.g. sandwich or pillar type devices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N70/00Solid-state devices having no potential barriers, and specially adapted for rectifying, amplifying, oscillating or switching
    • H10N70/801Constructional details of multistable switching devices
    • H10N70/881Switching materials
    • H10N70/883Oxides or nitrides
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02EREDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00Energy generation through renewable energy sources
    • Y02E10/50Photovoltaic [PV] energy

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Glass Compositions (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Light Receiving Elements (AREA)
  • Formation Of Insulating Films (AREA)
IT67732/72A 1971-03-09 1972-03-08 Procedimento per alterare in modo controllabile la conduttivita di un corpo vetroso amorfo e dispo sitivo semiconduttore a giunzione utilizzante tale procedimento IT952933B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US12242271A 1971-03-09 1971-03-09

Publications (1)

Publication Number Publication Date
IT952933B true IT952933B (it) 1973-07-30

Family

ID=22402639

Family Applications (1)

Application Number Title Priority Date Filing Date
IT67732/72A IT952933B (it) 1971-03-09 1972-03-08 Procedimento per alterare in modo controllabile la conduttivita di un corpo vetroso amorfo e dispo sitivo semiconduttore a giunzione utilizzante tale procedimento

Country Status (8)

Country Link
US (1) US3921191A (it)
CA (2) CA959175A (it)
DE (1) DE2211156B2 (it)
FR (1) FR2128729A1 (it)
GB (1) GB1386098A (it)
IL (1) IL38881A (it)
IT (1) IT952933B (it)
NL (1) NL7203132A (it)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2526804B2 (de) * 1975-06-16 1979-06-07 Jenaer Glaswerk Schott & Gen., 6500 Mainz Verfahren zur Veränderung der
US4177473A (en) * 1977-05-18 1979-12-04 Energy Conversion Devices, Inc. Amorphous semiconductor member and method of making the same
US4353506A (en) * 1980-09-15 1982-10-12 L. R. Nelson Corporation Pop-up sprinkler
DE3503264A1 (de) * 1985-01-31 1986-08-07 Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V., 3400 Göttingen Verfahren zur aenderung der lokalen, atomaren zusammensetzung von festkoerpern, insbesondere halbleitern
US5319218A (en) * 1993-05-06 1994-06-07 The United States Of America As Represented By The Secretary Of The Army Pulse sharpening using an optical pulse
US7988071B2 (en) 2007-10-30 2011-08-02 Bredberg Anthony J Lawn sprinkler
US9108206B1 (en) 2013-03-15 2015-08-18 Anthony J. Bredberg Water control system for sprinkler nozzle
US9227207B1 (en) 2013-03-15 2016-01-05 Anthony J. Bredberg Multi-nozzle cam driven sprinkler head
CN105322091B (zh) * 2015-12-09 2018-09-25 中国科学院物理研究所 一种光写入阻变存储单元及其制备、操作方法和应用
EP3208856B1 (en) * 2016-02-17 2019-07-10 Heraeus Deutschland GmbH & Co. KG Solid electrolyte for reram
EP3208855B1 (en) * 2016-02-17 2019-06-26 Heraeus Deutschland GmbH & Co. KG Resistive switching memory cell

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3451126A (en) * 1964-08-08 1969-06-24 Rikagaku Kenkyusho Method of making a woven fiber circuit element
US3507646A (en) * 1965-12-27 1970-04-21 Xerox Corp Electrophotographic process using a single phase photoconductive glass imaging layer
US3564353A (en) * 1969-04-16 1971-02-16 Westinghouse Electric Corp Bulk semiconductor switching device formed from amorphous glass type substance and having symmetrical switching characteristics
US3656032A (en) * 1969-09-22 1972-04-11 Energy Conversion Devices Inc Controllable semiconductor switch
JPS5130438B1 (it) * 1970-04-06 1976-09-01

Also Published As

Publication number Publication date
IL38881A (en) 1976-02-29
US3921191A (en) 1975-11-18
NL7203132A (it) 1972-09-12
FR2128729A1 (en) 1972-10-20
GB1386098A (en) 1975-03-05
IL38881A0 (en) 1972-05-30
CA959175A (en) 1974-12-10
DE2211156B2 (de) 1976-12-30
FR2128729B1 (it) 1977-12-30
CA959178A (en) 1974-12-10
DE2211156A1 (de) 1972-09-14

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