IT8822803A0 - CHEMICAL VAPOR DEPOSITION BY LASER USING OPTICAL BEAM DELIVERY THROUGH FIBERS - Google Patents

CHEMICAL VAPOR DEPOSITION BY LASER USING OPTICAL BEAM DELIVERY THROUGH FIBERS

Info

Publication number
IT8822803A0
IT8822803A0 IT8822803A IT2280388A IT8822803A0 IT 8822803 A0 IT8822803 A0 IT 8822803A0 IT 8822803 A IT8822803 A IT 8822803A IT 2280388 A IT2280388 A IT 2280388A IT 8822803 A0 IT8822803 A0 IT 8822803A0
Authority
IT
Italy
Prior art keywords
fibers
laser
vapor deposition
chemical vapor
optical beam
Prior art date
Application number
IT8822803A
Other languages
Italian (it)
Other versions
IT1227653B (en
Inventor
Tushar Shashikant Chande
Original Assignee
Gen Electric Co S
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Gen Electric Co S filed Critical Gen Electric Co S
Publication of IT8822803A0 publication Critical patent/IT8822803A0/en
Application granted granted Critical
Publication of IT1227653B publication Critical patent/IT1227653B/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
    • C23C16/483—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation using coherent light, UV to IR, e.g. lasers
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/047—Coating on selected surface areas, e.g. using masks using irradiation by energy or particles

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Toxicology (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
IT8822803A 1987-11-30 1988-11-30 VAPOR CHEMICAL DEPOSITION USING LASER USING DISPENSING OF OPTICAL BEAM THROUGH FIBERS IT1227653B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US12698887A 1987-11-30 1987-11-30

Publications (2)

Publication Number Publication Date
IT8822803A0 true IT8822803A0 (en) 1988-11-30
IT1227653B IT1227653B (en) 1991-04-23

Family

ID=22427741

Family Applications (1)

Application Number Title Priority Date Filing Date
IT8822803A IT1227653B (en) 1987-11-30 1988-11-30 VAPOR CHEMICAL DEPOSITION USING LASER USING DISPENSING OF OPTICAL BEAM THROUGH FIBERS

Country Status (5)

Country Link
JP (1) JPH01212770A (en)
DE (1) DE3840042A1 (en)
FR (1) FR2623820A1 (en)
GB (1) GB2212819A (en)
IT (1) IT1227653B (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3926023A1 (en) * 1988-09-06 1990-03-15 Schott Glaswerke CVD COATING METHOD FOR PRODUCING LAYERS AND DEVICE FOR CARRYING OUT THE METHOD
US5097793A (en) * 1989-05-11 1992-03-24 Mitsubishi Denki Kabushiki Kaisha Thin film vacuum evaporation device
HU203585B (en) * 1989-08-07 1991-08-28 Mta Koezponti Fiz Kutato Intez Process for laser-activated chemical gas-phase precipitation on carier
GB2250751B (en) * 1990-08-24 1995-04-12 Kawasaki Heavy Ind Ltd Process for the production of dielectric thin films
FR2685127B1 (en) * 1991-12-13 1994-02-04 Christian Licoppe GAS PHOTONANOGRAPH FOR THE MANUFACTURE AND OPTICAL ANALYSIS OF PATTERNS ON THE NANOMETRIC SCALE.
FR2709763B1 (en) * 1993-09-08 1995-10-13 Commissariat Energie Atomique Device for processing a material, with miniaturized photo-ion head.
JP3268443B2 (en) 1998-09-11 2002-03-25 科学技術振興事業団 Laser heating device
JP4274409B2 (en) * 2002-09-30 2009-06-10 富士フイルム株式会社 Laser equipment
CN101501243A (en) * 2006-02-17 2009-08-05 康乃尔研究基金会有限公司 Patterning during film growth
WO2013163040A1 (en) * 2012-04-23 2013-10-31 Lawrence Livermore National Security, Llc Localized atmospheric laser chemical vapor deposition
US10179948B2 (en) * 2014-04-24 2019-01-15 United Technologies Corporation Method and system for controlling coating in non-line-of-sight locations
US10865477B2 (en) * 2016-02-08 2020-12-15 Illinois Tool Works Inc. Method and system for the localized deposit of metal on a surface

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4676586A (en) * 1982-12-20 1987-06-30 General Electric Company Apparatus and method for performing laser material processing through a fiber optic
DE3300449A1 (en) * 1983-01-08 1984-07-12 Philips Patentverwaltung Gmbh, 2000 Hamburg METHOD FOR PRODUCING AN ELECTRODE FOR A HIGH PRESSURE GAS DISCHARGE LAMP
FR2548218B1 (en) * 1983-06-29 1987-03-06 Pauleau Yves METHOD FOR DEPOSITING THIN FILMS BY GAS PHASE CHEMICAL REACTION USING TWO DIFFERENT RADIATIONS
JPS6066896A (en) * 1983-09-16 1985-04-17 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション Method of bonding metal copper on substrate
CA1245726A (en) * 1984-01-19 1988-11-29 Francis A. L'esperance Laser incisional device
US4581248A (en) * 1984-03-07 1986-04-08 Roche Gregory A Apparatus and method for laser-induced chemical vapor deposition
GB2155357B (en) * 1984-03-10 1987-09-09 Standard Telephones Cables Ltd Optical fibres
JPS60260125A (en) * 1984-06-06 1985-12-23 Hitachi Ltd Selective formation of semiconductor substrate
US4681396A (en) * 1984-10-09 1987-07-21 General Electric Company High power laser energy delivery system
US4782787A (en) * 1986-01-08 1988-11-08 Roche Gregory A Apparatus for laser-induced chemical vapor deposition
GB2185494B (en) * 1986-01-18 1989-11-15 Stc Plc Vapour phase deposition process
US4748045A (en) * 1986-04-09 1988-05-31 Massachusetts Institute Of Technology Method and apparatus for photodeposition of films on surfaces

Also Published As

Publication number Publication date
DE3840042A1 (en) 1989-06-08
IT1227653B (en) 1991-04-23
FR2623820A1 (en) 1989-06-02
GB2212819A (en) 1989-08-02
JPH01212770A (en) 1989-08-25
GB8827836D0 (en) 1988-12-29

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