IT8247576A0 - APPARATUS AND PROCEDURE FOR THE PRODUCTION OF PRINTED CIRCUIT PANELS - Google Patents
APPARATUS AND PROCEDURE FOR THE PRODUCTION OF PRINTED CIRCUIT PANELSInfo
- Publication number
- IT8247576A0 IT8247576A0 IT8247576A IT4757682A IT8247576A0 IT 8247576 A0 IT8247576 A0 IT 8247576A0 IT 8247576 A IT8247576 A IT 8247576A IT 4757682 A IT4757682 A IT 4757682A IT 8247576 A0 IT8247576 A0 IT 8247576A0
- Authority
- IT
- Italy
- Prior art keywords
- procedure
- production
- printed circuit
- circuit panels
- panels
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/0275—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with dithiol or polysulfide compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
- G03F7/2012—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image using liquid photohardening compositions, e.g. for the production of reliefs such as flexographic plates or stamps
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0073—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces
- H05K3/0082—Masks not provided for in groups H05K3/02 - H05K3/46, e.g. for photomechanical production of patterned surfaces characterised by the exposure method of radiation-sensitive masks
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/05—Patterning and lithography; Masks; Details of resist
- H05K2203/0548—Masks
- H05K2203/056—Using an artwork, i.e. a photomask for exposing photosensitive layers
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
- H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
- H05K3/061—Etching masks
- H05K3/064—Photoresists
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US22581081A | 1981-01-16 | 1981-01-16 |
Publications (2)
Publication Number | Publication Date |
---|---|
IT8247576A0 true IT8247576A0 (en) | 1982-01-15 |
IT1196537B IT1196537B (en) | 1988-11-16 |
Family
ID=22846343
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IT47576/82A IT1196537B (en) | 1981-01-16 | 1982-01-15 | APPARATUS AND PROCESS FOR THE PRODUCTION OF PANELS OF PRINTED CIRCUITS |
Country Status (11)
Country | Link |
---|---|
JP (1) | JPS57164595A (en) |
AU (1) | AU557941B2 (en) |
CA (1) | CA1158091A (en) |
DE (1) | DE3201577A1 (en) |
FR (1) | FR2498410B1 (en) |
GB (3) | GB2091493B (en) |
IT (1) | IT1196537B (en) |
NL (1) | NL8200133A (en) |
PH (1) | PH19408A (en) |
SE (1) | SE459708B (en) |
ZA (1) | ZA8244B (en) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4591265A (en) * | 1982-04-01 | 1986-05-27 | Sullivan Donald F | System for contact printing with liquid photopolymers |
JPS6244461U (en) * | 1985-09-06 | 1987-03-17 | ||
IT1234376B (en) * | 1989-08-07 | 1992-05-15 | 3B Spa | EQUIPMENT FOR COATING A SURFACE AND THE EDGES OF A WOODEN OR SIMILAR PANEL WITH A SHEET OF HEAT-DEFORMABLE MATERIAL. |
CA2075026A1 (en) * | 1991-08-08 | 1993-02-09 | William E. Nelson | Method and apparatus for patterning an imaging member |
US5449429A (en) * | 1993-12-03 | 1995-09-12 | Langenbrunner; James R. | Apparatus for stretching and mounting films |
AUPM527894A0 (en) * | 1994-04-26 | 1994-05-19 | Fawcett, Alan John | Magnetic holding device |
GB201000858D0 (en) * | 2010-01-20 | 2010-03-10 | Th Group Ltd | Electronic circuit assembly |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1099566A (en) * | 1965-04-06 | 1968-01-17 | Dunham Tool Company Inc | Universal rotary chuck |
DE1764456C3 (en) * | 1968-06-08 | 1979-10-11 | Robert Bosch Gmbh, 7000 Stuttgart | Process for the imaging of a pattern on a photoresist layer |
US3579376A (en) * | 1968-07-23 | 1971-05-18 | United Aircraft Corp | Method of forming a resist pattern on a circuit board or the like |
FR2029328A5 (en) * | 1969-01-24 | 1970-10-16 | Grace W R Ltd | Photographic print setting apparatus and - materials |
GB1323415A (en) * | 1969-07-04 | 1973-07-18 | British United Shoe Machinery | Workpiece holding devices |
GB1289075A (en) * | 1970-04-30 | 1972-09-13 | ||
BE793732A (en) * | 1972-01-10 | 1973-05-02 | Grace W R & Co | COMPOSITION CONTAINING A POLYENE AND A POLYTHIOL |
US3907268A (en) * | 1974-03-29 | 1975-09-23 | Thomas F Hale | Valve means for vacuum holding device |
JPS51123140A (en) * | 1975-04-19 | 1976-10-27 | Nippon Paint Co Ltd | Photosensitive compositions and processing method thereof |
CA1122999A (en) * | 1978-05-01 | 1982-05-04 | Alan D. Rousseau | Photopolymerizable composition |
US4158141A (en) * | 1978-06-21 | 1979-06-12 | Hughes Aircraft Company | Process for channeling ion beams |
US4228232A (en) * | 1979-02-27 | 1980-10-14 | Minnesota Mining And Manufacturing Company | Photopolymerizable composition containing ethylenically unsaturated oligomers |
-
1982
- 1982-01-05 ZA ZA8244A patent/ZA8244B/en unknown
- 1982-01-07 AU AU79263/82A patent/AU557941B2/en not_active Ceased
- 1982-01-12 SE SE8200131A patent/SE459708B/en not_active IP Right Cessation
- 1982-01-12 PH PH26728A patent/PH19408A/en unknown
- 1982-01-14 NL NL8200133A patent/NL8200133A/en not_active Application Discontinuation
- 1982-01-14 JP JP57003546A patent/JPS57164595A/en active Pending
- 1982-01-15 CA CA000394223A patent/CA1158091A/en not_active Expired
- 1982-01-15 IT IT47576/82A patent/IT1196537B/en active
- 1982-01-15 GB GB8201146A patent/GB2091493B/en not_active Expired
- 1982-01-15 DE DE19823201577 patent/DE3201577A1/en not_active Ceased
- 1982-01-15 FR FR8200633A patent/FR2498410B1/en not_active Expired
-
1984
- 1984-07-31 GB GB08419444A patent/GB2151519B/en not_active Expired
-
1985
- 1985-02-19 GB GB08504266A patent/GB2152861B/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
GB2152861A (en) | 1985-08-14 |
AU557941B2 (en) | 1987-01-15 |
NL8200133A (en) | 1982-08-16 |
GB2091493B (en) | 1985-10-23 |
CA1158091A (en) | 1983-12-06 |
SE8200131L (en) | 1982-07-17 |
AU7926382A (en) | 1982-07-22 |
ZA8244B (en) | 1982-11-24 |
IT1196537B (en) | 1988-11-16 |
SE459708B (en) | 1989-07-24 |
JPS57164595A (en) | 1982-10-09 |
GB2151519B (en) | 1985-12-24 |
GB8504266D0 (en) | 1985-03-20 |
GB2091493A (en) | 1982-07-28 |
GB2151519A (en) | 1985-07-24 |
PH19408A (en) | 1986-04-10 |
FR2498410A1 (en) | 1982-07-23 |
GB2152861B (en) | 1985-11-13 |
GB8419444D0 (en) | 1984-09-05 |
DE3201577A1 (en) | 1982-09-23 |
FR2498410B1 (en) | 1986-05-23 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
TA | Fee payment date (situation as of event date), data collected since 19931001 |
Effective date: 19940129 |