IT1318061B1 - Catodi per deposizione catodica di leghe getter e processo per la loro produzione. - Google Patents
Catodi per deposizione catodica di leghe getter e processo per la loro produzione.Info
- Publication number
- IT1318061B1 IT1318061B1 IT2000MI001453A ITMI20001453A IT1318061B1 IT 1318061 B1 IT1318061 B1 IT 1318061B1 IT 2000MI001453 A IT2000MI001453 A IT 2000MI001453A IT MI20001453 A ITMI20001453 A IT MI20001453A IT 1318061 B1 IT1318061 B1 IT 1318061B1
- Authority
- IT
- Italy
- Prior art keywords
- cathodes
- production
- cathodic deposition
- getter alloys
- getter
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3414—Targets
- H01J37/3426—Material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F1/00—Metallic powder; Treatment of metallic powder, e.g. to facilitate working or to improve properties
- B22F1/09—Mixtures of metallic powders
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
- C23C14/3414—Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J7/00—Details not provided for in the preceding groups and common to two or more basic types of discharge tubes or lamps
- H01J7/14—Means for obtaining or maintaining the desired pressure within the vessel
- H01J7/18—Means for absorbing or adsorbing gas, e.g. by gettering
- H01J7/183—Composition or manufacture of getters
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F2999/00—Aspects linked to processes or compositions used in powder metallurgy
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Analytical Chemistry (AREA)
- Plasma & Fusion (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Vessels, Lead-In Wires, Accessory Apparatuses For Cathode-Ray Tubes (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IT2000MI001453A IT1318061B1 (it) | 2000-06-28 | 2000-06-28 | Catodi per deposizione catodica di leghe getter e processo per la loro produzione. |
PCT/IT2001/000332 WO2002000959A1 (en) | 2000-06-28 | 2001-06-26 | Cathodes for cathodic deposition of getter alloys and a process for the manufacture thereof |
AU2001270998A AU2001270998A1 (en) | 2000-06-28 | 2001-06-26 | Cathodes for cathodic deposition of getter alloys and a process for the manufacture thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IT2000MI001453A IT1318061B1 (it) | 2000-06-28 | 2000-06-28 | Catodi per deposizione catodica di leghe getter e processo per la loro produzione. |
Publications (3)
Publication Number | Publication Date |
---|---|
ITMI20001453A0 ITMI20001453A0 (it) | 2000-06-28 |
ITMI20001453A1 ITMI20001453A1 (it) | 2001-12-28 |
IT1318061B1 true IT1318061B1 (it) | 2003-07-21 |
Family
ID=11445361
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IT2000MI001453A IT1318061B1 (it) | 2000-06-28 | 2000-06-28 | Catodi per deposizione catodica di leghe getter e processo per la loro produzione. |
Country Status (3)
Country | Link |
---|---|
AU (1) | AU2001270998A1 (it) |
IT (1) | IT1318061B1 (it) |
WO (1) | WO2002000959A1 (it) |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6833058B1 (en) | 2000-10-24 | 2004-12-21 | Honeywell International Inc. | Titanium-based and zirconium-based mixed materials and sputtering targets |
EP1386344A2 (en) | 2001-05-01 | 2004-02-04 | Koninklijke Philips Electronics N.V. | Discharge lamp |
ITMI20012389A1 (it) * | 2001-11-12 | 2003-05-12 | Getters Spa | Catodo cavo con getter integrato per lampade a scarica e metodi per la sua realizzazione |
GB2523583C (en) * | 2014-02-28 | 2019-12-25 | Castings Tech International Limited | Forming a composite component |
CN113136504B (zh) * | 2021-04-24 | 2022-07-19 | 杨阳 | 吸气合金及其应用、吸气靶材及吸气薄膜 |
CN115185169A (zh) * | 2022-09-07 | 2022-10-14 | 上海晶维材料科技有限公司 | 一种用于空间氢原子钟上具有抗粉化能力的吸附泵 |
US20240093998A1 (en) * | 2022-09-15 | 2024-03-21 | Honeywell International Inc. | Stabilized evaporable getter for increased handleability |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB723306A (en) * | 1949-03-17 | 1955-02-09 | American Electro Metal Corp | Method of manufacturing a titanium-rich alloy body |
TW287117B (it) * | 1994-12-02 | 1996-10-01 | Getters Spa | |
US6673400B1 (en) * | 1996-10-15 | 2004-01-06 | Texas Instruments Incorporated | Hydrogen gettering system |
-
2000
- 2000-06-28 IT IT2000MI001453A patent/IT1318061B1/it active
-
2001
- 2001-06-26 AU AU2001270998A patent/AU2001270998A1/en not_active Abandoned
- 2001-06-26 WO PCT/IT2001/000332 patent/WO2002000959A1/en active Application Filing
Also Published As
Publication number | Publication date |
---|---|
ITMI20001453A1 (it) | 2001-12-28 |
WO2002000959A1 (en) | 2002-01-03 |
AU2001270998A1 (en) | 2002-01-08 |
ITMI20001453A0 (it) | 2000-06-28 |
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