IT1231108B - Procedimento litografico ad alta risoluzione per la produzione di circuiti integrati monolitici. - Google Patents

Procedimento litografico ad alta risoluzione per la produzione di circuiti integrati monolitici.

Info

Publication number
IT1231108B
IT1231108B IT8921496A IT2149689A IT1231108B IT 1231108 B IT1231108 B IT 1231108B IT 8921496 A IT8921496 A IT 8921496A IT 2149689 A IT2149689 A IT 2149689A IT 1231108 B IT1231108 B IT 1231108B
Authority
IT
Italy
Prior art keywords
production
integrated circuits
high resolution
monolithic integrated
resolution lithographic
Prior art date
Application number
IT8921496A
Other languages
English (en)
Other versions
IT8921496A0 (it
Inventor
Giorgio Degiorgis
Original Assignee
Sgs Thomson Microelectronics
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sgs Thomson Microelectronics filed Critical Sgs Thomson Microelectronics
Priority to IT8921496A priority Critical patent/IT1231108B/it
Publication of IT8921496A0 publication Critical patent/IT8921496A0/it
Priority to EP19900113668 priority patent/EP0412326A3/en
Priority to JP2196390A priority patent/JPH0395560A/ja
Application granted granted Critical
Publication of IT1231108B publication Critical patent/IT1231108B/it

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/265—Selective reaction with inorganic or organometallic reagents after image-wise exposure, e.g. silylation

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
IT8921496A 1989-08-10 1989-08-10 Procedimento litografico ad alta risoluzione per la produzione di circuiti integrati monolitici. IT1231108B (it)

Priority Applications (3)

Application Number Priority Date Filing Date Title
IT8921496A IT1231108B (it) 1989-08-10 1989-08-10 Procedimento litografico ad alta risoluzione per la produzione di circuiti integrati monolitici.
EP19900113668 EP0412326A3 (en) 1989-08-10 1990-07-17 A high-resolution lithographic method of making monolithic integrated circuits
JP2196390A JPH0395560A (ja) 1989-08-10 1990-07-26 単一結晶片を利用した集積回路の高分解能のリソグラフィ方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT8921496A IT1231108B (it) 1989-08-10 1989-08-10 Procedimento litografico ad alta risoluzione per la produzione di circuiti integrati monolitici.

Publications (2)

Publication Number Publication Date
IT8921496A0 IT8921496A0 (it) 1989-08-10
IT1231108B true IT1231108B (it) 1991-11-18

Family

ID=11182687

Family Applications (1)

Application Number Title Priority Date Filing Date
IT8921496A IT1231108B (it) 1989-08-10 1989-08-10 Procedimento litografico ad alta risoluzione per la produzione di circuiti integrati monolitici.

Country Status (3)

Country Link
EP (1) EP0412326A3 (it)
JP (1) JPH0395560A (it)
IT (1) IT1231108B (it)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05150459A (ja) * 1991-05-24 1993-06-18 Nippon Paint Co Ltd レジストパターンの形成方法
US5576143A (en) * 1991-12-03 1996-11-19 Fuji Photo Film Co., Ltd. Light-sensitive composition

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2171530B (en) * 1985-02-27 1989-06-28 Imtec Products Inc Method of producing reversed photoresist images by vapour diffusion
US4657845A (en) * 1986-01-14 1987-04-14 International Business Machines Corporation Positive tone oxygen plasma developable photoresist
US4814243A (en) * 1987-09-08 1989-03-21 American Telephone And Telegraph Company Thermal processing of photoresist materials

Also Published As

Publication number Publication date
IT8921496A0 (it) 1989-08-10
JPH0395560A (ja) 1991-04-19
EP0412326A2 (en) 1991-02-13
EP0412326A3 (en) 1991-08-28

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Legal Events

Date Code Title Description
TA Fee payment date (situation as of event date), data collected since 19931001

Effective date: 19970829