IT1207445B - PROCEDURE AND DEVICE FOR CHEMICAL DEPOSITION FROM STEAM PHASE ACTIVATED BY PLASMA. - Google Patents

PROCEDURE AND DEVICE FOR CHEMICAL DEPOSITION FROM STEAM PHASE ACTIVATED BY PLASMA.

Info

Publication number
IT1207445B
IT1207445B IT8683671A IT8367186A IT1207445B IT 1207445 B IT1207445 B IT 1207445B IT 8683671 A IT8683671 A IT 8683671A IT 8367186 A IT8367186 A IT 8367186A IT 1207445 B IT1207445 B IT 1207445B
Authority
IT
Italy
Prior art keywords
plasma
procedure
chemical deposition
steam phase
phase activated
Prior art date
Application number
IT8683671A
Other languages
Italian (it)
Other versions
IT8683671A0 (en
Inventor
Ubaldo Mastromatteo
Silvia Fossati
Original Assignee
Sgs Microelettronica Spa
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sgs Microelettronica Spa filed Critical Sgs Microelettronica Spa
Priority to IT8683671A priority Critical patent/IT1207445B/en
Publication of IT8683671A0 publication Critical patent/IT8683671A0/en
Priority to FR8717945A priority patent/FR2608634A1/en
Priority to NL8703117A priority patent/NL8703117A/en
Application granted granted Critical
Publication of IT1207445B publication Critical patent/IT1207445B/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
IT8683671A 1986-12-23 1986-12-23 PROCEDURE AND DEVICE FOR CHEMICAL DEPOSITION FROM STEAM PHASE ACTIVATED BY PLASMA. IT1207445B (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
IT8683671A IT1207445B (en) 1986-12-23 1986-12-23 PROCEDURE AND DEVICE FOR CHEMICAL DEPOSITION FROM STEAM PHASE ACTIVATED BY PLASMA.
FR8717945A FR2608634A1 (en) 1986-12-23 1987-12-22 Process and device for chemical deposition in plasma-activated vapour phase
NL8703117A NL8703117A (en) 1986-12-23 1987-12-23 METHOD AND APPARATUS FOR PLASMA-ACTIVATED CHEMICAL VAPORATION

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IT8683671A IT1207445B (en) 1986-12-23 1986-12-23 PROCEDURE AND DEVICE FOR CHEMICAL DEPOSITION FROM STEAM PHASE ACTIVATED BY PLASMA.

Publications (2)

Publication Number Publication Date
IT8683671A0 IT8683671A0 (en) 1986-12-23
IT1207445B true IT1207445B (en) 1989-05-17

Family

ID=11323750

Family Applications (1)

Application Number Title Priority Date Filing Date
IT8683671A IT1207445B (en) 1986-12-23 1986-12-23 PROCEDURE AND DEVICE FOR CHEMICAL DEPOSITION FROM STEAM PHASE ACTIVATED BY PLASMA.

Country Status (3)

Country Link
FR (1) FR2608634A1 (en)
IT (1) IT1207445B (en)
NL (1) NL8703117A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5374456A (en) * 1992-12-23 1994-12-20 Hughes Aircraft Company Surface potential control in plasma processing of materials
JP3164019B2 (en) * 1997-05-21 2001-05-08 日本電気株式会社 Silicon oxide film, method for forming the same, and film forming apparatus

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4287851A (en) * 1980-01-16 1981-09-08 Dozier Alfred R Mounting and excitation system for reaction in the plasma state
JPS58212128A (en) * 1982-06-03 1983-12-09 Shigeru Minomura Manufacture of amorphous semiconductor film

Also Published As

Publication number Publication date
NL8703117A (en) 1988-07-18
IT8683671A0 (en) 1986-12-23
FR2608634A1 (en) 1988-06-24

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TA Fee payment date (situation as of event date), data collected since 19931001

Effective date: 19961227