IT1187677B - Procedimento per rivestire un substrato con un composto metallico - Google Patents
Procedimento per rivestire un substrato con un composto metallicoInfo
- Publication number
- IT1187677B IT1187677B IT21441/85A IT2144185A IT1187677B IT 1187677 B IT1187677 B IT 1187677B IT 21441/85 A IT21441/85 A IT 21441/85A IT 2144185 A IT2144185 A IT 2144185A IT 1187677 B IT1187677 B IT 1187677B
- Authority
- IT
- Italy
- Prior art keywords
- procedure
- coating
- substrate
- metallic compound
- metallic
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45502—Flow conditions in reaction chamber
- C23C16/4551—Jet streams
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/32—Carbides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/34—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/36—Carbonitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/38—Borides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45563—Gas nozzles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45582—Expansion of gas before it reaches the substrate
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US06/629,534 US4668538A (en) | 1984-07-10 | 1984-07-10 | Processes for depositing metal compound coatings |
Publications (2)
Publication Number | Publication Date |
---|---|
IT8521441A0 IT8521441A0 (it) | 1985-07-04 |
IT1187677B true IT1187677B (it) | 1987-12-23 |
Family
ID=24523415
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IT21441/85A IT1187677B (it) | 1984-07-10 | 1985-07-04 | Procedimento per rivestire un substrato con un composto metallico |
Country Status (4)
Country | Link |
---|---|
US (1) | US4668538A (it) |
JP (1) | JPS6152364A (it) |
FR (1) | FR2567542B1 (it) |
IT (1) | IT1187677B (it) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR920000801B1 (ko) * | 1988-02-04 | 1992-01-23 | 이데미쯔세끼유가가꾸 가부시기가이샤 | 다이아몬드박막부착 초경합금의 제조방법 |
DE4118072C2 (de) * | 1991-06-01 | 1997-08-07 | Linde Ag | Verfahren zur Stoßwellenbeschichtung von Substraten |
US5277932A (en) * | 1991-07-29 | 1994-01-11 | Syracuse University | CVD method for forming metal boride films using metal borane cluster compounds |
US5821548A (en) * | 1996-12-20 | 1998-10-13 | Technical Visions, Inc. | Beam source for production of radicals and metastables |
WO2004073045A2 (en) * | 2003-02-12 | 2004-08-26 | Arizona Board Of Regents, A Body Corporate Of The State Of Arizona, Acting For And On Behalf Of Arizona State University | Epitaxial growth of a zirconium diboride layer on silicon substrates |
US8803194B2 (en) * | 2007-01-04 | 2014-08-12 | Arizona Board Of Regents, A Body Corporate Of The State Of Arizona Acting For And On Behalf Of Arizona State University | Zirconium and hafnium boride alloy templates on silicon for nitride integration applications |
WO2008105360A1 (ja) | 2007-02-27 | 2008-09-04 | Ulvac, Inc. | 半導体装置の製造方法及び半導体装置の製造装置 |
EP2045819A1 (en) * | 2007-10-03 | 2009-04-08 | Nederlandse Organisatie voor toegepast- natuurwetenschappelijk onderzoek TNO | Neutron translucent construction material |
TWI559381B (zh) * | 2013-02-19 | 2016-11-21 | 應用材料股份有限公司 | 金屬合金薄膜的原子層沉積 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1031607A (fr) * | 1949-10-21 | 1953-06-25 | Procédé d'obtention de précipités métalliques par dissociation thermique de composés métalliques | |
US2884894A (en) * | 1956-11-02 | 1959-05-05 | Metallgesellschaft Ag | Apparatus for producing hard coatings on workpieces |
US3540920A (en) * | 1967-08-24 | 1970-11-17 | Texas Instruments Inc | Process of simultaneously vapor depositing silicides of chromium and titanium |
FR1594957A (fr) * | 1968-01-19 | 1970-06-08 | Texas Instruments Inc | Article revetu de carboniture de titane et son procede de fabrication |
US3654895A (en) * | 1969-08-15 | 1972-04-11 | Texas Instruments Inc | Apparatus for forming a refractory coating on the inner periphery of a tubular object |
JPS5320904B2 (it) * | 1972-07-28 | 1978-06-29 | ||
FR2210675B1 (it) * | 1972-12-15 | 1978-05-12 | Ppg Industries Inc | |
JPS5210869A (en) * | 1975-07-15 | 1977-01-27 | Toshinori Takagi | Thin film forming method |
JPS5283173A (en) * | 1975-12-30 | 1977-07-11 | Fujitsu Ltd | Circuit packaging substrate |
US4052530A (en) * | 1976-08-09 | 1977-10-04 | Materials Technology Corporation | Co-deposited coating of aluminum oxide and titanium oxide and method of making same |
JPS5418496A (en) * | 1977-07-11 | 1979-02-10 | Matsushita Electric Ind Co Ltd | Production of tin oxide film |
JPS5437077A (en) * | 1977-08-02 | 1979-03-19 | Agency Of Ind Science & Technol | Chemical evaporation method and apparatus for same |
US4268582A (en) * | 1979-03-02 | 1981-05-19 | General Electric Company | Boride coated cemented carbide |
FR2511047A1 (fr) * | 1981-08-07 | 1983-02-11 | Solarex Corp | Procede pour appliquer un revetement antireflechissant et/ou dielectrique pour des cellules solaires |
-
1984
- 1984-07-10 US US06/629,534 patent/US4668538A/en not_active Expired - Fee Related
-
1985
- 1985-07-04 IT IT21441/85A patent/IT1187677B/it active
- 1985-07-09 FR FR858510504A patent/FR2567542B1/fr not_active Expired
- 1985-07-10 JP JP60150337A patent/JPS6152364A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPH0350835B2 (it) | 1991-08-02 |
FR2567542A1 (fr) | 1986-01-17 |
FR2567542B1 (fr) | 1989-12-29 |
US4668538A (en) | 1987-05-26 |
JPS6152364A (ja) | 1986-03-15 |
IT8521441A0 (it) | 1985-07-04 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
ES505103A0 (es) | Procedimiento para revestir un sustrato | |
ES550306A0 (es) | Un procedimiento para la deposicion no electrolitica de cobre sobre un substrato. | |
MX159813A (es) | Un metodo mejorado para aplicar un revestimiento ceramico a un substrato metalico | |
GB8414914D0 (en) | Substrate structures | |
ZA851755B (en) | Electroplated substrate | |
GB2164383B (en) | Fastener for a substrate | |
ES508634A0 (es) | Mejoras introducidas en el metodo de preparacion de un sustrato metalico recubierto. | |
GB8530151D0 (en) | Coating metallic substrate | |
ES544754A0 (es) | Un compuesto | |
IL66081A (en) | Method of providing a ceramic coating on a metallic substrate | |
GB2198151B (en) | Metallic coating on an inorganic substrate | |
GB2166144B (en) | Coated substrates | |
ES529275A0 (es) | Un procedimiento de formacion de un recubrimiento resistente a la corrosion sobre un sustrato metalico | |
GB2134008B (en) | Coated substrate | |
EP0166940A3 (en) | Running-in coating for a turbomachine | |
ES550422A0 (es) | Metodo para fabricar un sustrato revestido. | |
IT1187677B (it) | Procedimento per rivestire un substrato con un composto metallico | |
DE3466249D1 (en) | Metal-coating a metallic substrate | |
ES506050A0 (es) | Procedimiento para revestir un sustrato | |
ES541986A0 (es) | Un metodo de revestir un sustrato | |
IT1139638B (it) | Disposizione per la patinatura di un nastro | |
DE3560639D1 (en) | Coating for metallic substrates | |
ES539880A0 (es) | Un compuesto | |
MX159803A (es) | Metodo mejorado para depositar un revestimiento metalico adherente sobre un substrato de metal | |
IT1210201B (it) | Procedimento per produrre un rivestimento anticorrosivo su un substrato metallico. |