IT1163105B - Procedimento per trattare silicio allo scopo di produrre clorosilani - Google Patents
Procedimento per trattare silicio allo scopo di produrre clorosilaniInfo
- Publication number
- IT1163105B IT1163105B IT19598/83A IT1959883A IT1163105B IT 1163105 B IT1163105 B IT 1163105B IT 19598/83 A IT19598/83 A IT 19598/83A IT 1959883 A IT1959883 A IT 1959883A IT 1163105 B IT1163105 B IT 1163105B
- Authority
- IT
- Italy
- Prior art keywords
- chlorosilans
- procedure
- producing
- treating silicon
- treating
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
- C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
- C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
- C01B33/10715—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by reacting chlorine with silicon or a silicon-containing material
- C01B33/10731—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by reacting chlorine with silicon or a silicon-containing material with the preferential formation of trichlorosilane
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
- C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
- C01B33/10715—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by reacting chlorine with silicon or a silicon-containing material
- C01B33/10731—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by reacting chlorine with silicon or a silicon-containing material with the preferential formation of trichlorosilane
- C01B33/10736—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by reacting chlorine with silicon or a silicon-containing material with the preferential formation of trichlorosilane from silicon
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
- C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
- C01B33/10742—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material
- C01B33/10757—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material with the preferential formation of trichlorosilane
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/08—Compounds containing halogen
- C01B33/107—Halogenated silanes
- C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
- C01B33/10742—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material
- C01B33/10757—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material with the preferential formation of trichlorosilane
- C01B33/10763—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof prepared by hydrochlorination of silicon or of a silicon-containing material with the preferential formation of trichlorosilane from silicon
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Silicon Compounds (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US34940182A | 1982-02-16 | 1982-02-16 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| IT8319598A0 IT8319598A0 (it) | 1983-02-15 |
| IT8319598A1 IT8319598A1 (it) | 1984-08-15 |
| IT1163105B true IT1163105B (it) | 1987-04-08 |
Family
ID=23372246
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IT19598/83A IT1163105B (it) | 1982-02-16 | 1983-02-15 | Procedimento per trattare silicio allo scopo di produrre clorosilani |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JPS58172221A (it) |
| DE (1) | DE3303903A1 (it) |
| IT (1) | IT1163105B (it) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3809784C1 (it) * | 1988-03-23 | 1989-07-13 | Huels Ag, 4370 Marl, De | |
| DE3828344C1 (it) * | 1988-08-20 | 1989-07-06 | Huels Ag, 4370 Marl, De | |
| US5530151A (en) * | 1995-06-26 | 1996-06-25 | General Electric Company | Method of passivating organochlorosilane reactor fines and salvaging chlorosilane values therefrom |
| US5871705A (en) * | 1996-09-19 | 1999-02-16 | Tokuyama Corporation | Process for producing trichlorosilane |
| US6013235A (en) * | 1999-07-19 | 2000-01-11 | Dow Corning Corporation | Conversion of direct process high-boiling residue to monosilanes |
| DE102006009954A1 (de) | 2006-03-03 | 2007-09-06 | Wacker Chemie Ag | Wiederverwertung von hochsiedenden Verbindungen innerhalb eines Chlorsilanverbundes |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3704104A (en) * | 1970-06-01 | 1972-11-28 | Texas Instruments Inc | Process for the production of trichlorosilane |
| BE792542A (fr) * | 1971-12-11 | 1973-03-30 | Degussa | Procede pour la fabrication de chlorosilanes exempts de metaux lors de la chloration ou l'hydrochloration de ferrosilicium |
| DE2630542C3 (de) * | 1976-07-07 | 1981-04-02 | Dynamit Nobel Ag, 5210 Troisdorf | Verfahren zur Herstellung von Trichlorsilan und Siliciumtetrahlorid |
| US4307242A (en) * | 1980-10-03 | 1981-12-22 | General Electric Company | Process for removing impurities from residual silicon powder |
-
1983
- 1983-02-05 DE DE19833303903 patent/DE3303903A1/de not_active Withdrawn
- 1983-02-14 JP JP58021749A patent/JPS58172221A/ja active Granted
- 1983-02-15 IT IT19598/83A patent/IT1163105B/it active
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58172221A (ja) | 1983-10-11 |
| IT8319598A1 (it) | 1984-08-15 |
| IT8319598A0 (it) | 1983-02-15 |
| JPH0448725B2 (it) | 1992-08-07 |
| DE3303903A1 (de) | 1983-08-25 |
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