IT1099206B - Procedimento e dispositivo per la deposizione di materiale semiconduttore - Google Patents

Procedimento e dispositivo per la deposizione di materiale semiconduttore

Info

Publication number
IT1099206B
IT1099206B IT28167/78A IT2816778A IT1099206B IT 1099206 B IT1099206 B IT 1099206B IT 28167/78 A IT28167/78 A IT 28167/78A IT 2816778 A IT2816778 A IT 2816778A IT 1099206 B IT1099206 B IT 1099206B
Authority
IT
Italy
Prior art keywords
deposition
procedure
semiconductive material
semiconductive
Prior art date
Application number
IT28167/78A
Other languages
English (en)
Italian (it)
Other versions
IT7828167A0 (it
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag filed Critical Siemens Ag
Publication of IT7828167A0 publication Critical patent/IT7828167A0/it
Application granted granted Critical
Publication of IT1099206B publication Critical patent/IT1099206B/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
    • C30B25/02—Epitaxial-layer growth
    • C30B25/16—Controlling or regulating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/52—Controlling or regulating the coating process

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Chemical Vapour Deposition (AREA)
IT28167/78A 1977-09-29 1978-09-28 Procedimento e dispositivo per la deposizione di materiale semiconduttore IT1099206B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2743950A DE2743950C2 (de) 1977-09-29 1977-09-29 Vorrichtung zum Abscheiden von Halbleitermaterial

Publications (2)

Publication Number Publication Date
IT7828167A0 IT7828167A0 (it) 1978-09-28
IT1099206B true IT1099206B (it) 1985-09-18

Family

ID=6020264

Family Applications (1)

Application Number Title Priority Date Filing Date
IT28167/78A IT1099206B (it) 1977-09-29 1978-09-28 Procedimento e dispositivo per la deposizione di materiale semiconduttore

Country Status (7)

Country Link
JP (1) JPS5458350A (US20110232667A1-20110929-C00004.png)
BR (1) BR7806432A (US20110232667A1-20110929-C00004.png)
DE (1) DE2743950C2 (US20110232667A1-20110929-C00004.png)
IN (1) IN149401B (US20110232667A1-20110929-C00004.png)
IT (1) IT1099206B (US20110232667A1-20110929-C00004.png)
PL (1) PL115365B1 (US20110232667A1-20110929-C00004.png)
SU (1) SU810086A3 (US20110232667A1-20110929-C00004.png)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3107421C2 (de) * 1981-02-27 1985-02-14 Heraeus Quarzschmelze Gmbh, 6450 Hanau Glocke aus Quarzgut für die Abscheidung von Poly-Silizium
JPH0239525A (ja) * 1988-07-29 1990-02-08 Hitachi Ltd 半導体熱処理装置
US8613358B2 (en) 2010-03-18 2013-12-24 Jong Soo Park Structure for detachable coupling of containers
US9656782B2 (en) 2010-03-18 2017-05-23 Jong Soo Park Structure for detachable coupling of containers

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1221612B (de) * 1962-09-15 1966-07-28 Siemens Ag Vorrichtung zum Konstanthalten der Temperatur eines bei einer pyrolitischen Zersetzung einer Halbleiterverbindung benutzten Traegers
GB1209580A (en) * 1969-03-17 1970-10-21 Hamco Mach & Elect Co Automatic control for crystal growing apparatus
DE2518853C3 (de) * 1975-04-28 1979-03-22 Siemens Ag, 1000 Berlin Und 8000 Muenchen Vorrichtung zum Abscheiden von elementarem Silicium aus einem Reaktionsgas

Also Published As

Publication number Publication date
JPS5639048B2 (US20110232667A1-20110929-C00004.png) 1981-09-10
JPS5458350A (en) 1979-05-11
SU810086A3 (ru) 1981-02-28
PL209746A1 (pl) 1979-06-04
DE2743950C2 (de) 1987-02-12
PL115365B1 (en) 1981-03-31
IN149401B (US20110232667A1-20110929-C00004.png) 1981-11-28
DE2743950A1 (de) 1979-04-12
BR7806432A (pt) 1979-05-08
IT7828167A0 (it) 1978-09-28

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