IT1087439B - Tin lead alloy plating electrolyte - contg. thiourea, hypophosphite, hydrochloric acid and the metals - Google Patents
Tin lead alloy plating electrolyte - contg. thiourea, hypophosphite, hydrochloric acid and the metalsInfo
- Publication number
- IT1087439B IT1087439B IT2943877A IT2943877A IT1087439B IT 1087439 B IT1087439 B IT 1087439B IT 2943877 A IT2943877 A IT 2943877A IT 2943877 A IT2943877 A IT 2943877A IT 1087439 B IT1087439 B IT 1087439B
- Authority
- IT
- Italy
- Prior art keywords
- thiourea
- hypophosphite
- contg
- metals
- hydrochloric acid
- Prior art date
Links
Landscapes
- Chemically Coating (AREA)
Abstract
An aq. electrolyte for deposition of Sn-Pb alloys comprises 7.5-75.0 g/1 Sn (as SnCl2), 1-99% total Sn+Pb concn. of Pb (as PbCl2), 10-200 g/1 of a thiourea, 0-300 g/1 NH4Cl, 10-200 g/1 Na+, NH4+ or K+ H2PO2-, 2H2O and 20-500 ml/1 conc HCl and has pH 0.5-1.5. The alloys deposited are pref. 93% Sn 7% Pb or 60% Sn 40% Pb. The complexing agent may be thiourea or di- or tetramethyl thiourea. When NH4Cl is employed to stabilised the bath it is pref. used in amounts of 40-300 g/1. 30-100 g/1 hypophosphate is used, pref. Na or K, and 20-150 ml/1 HCl. The bath is usually operated at 130-200 degrees F at current densities of 5-100 amp/ft2. Surfactants may be added. Circuit elements and terminals may be deposited onto printed circuit boards. Deposit compsn. is consistent and both can be operated at 5-800 amp/ft2.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IT2943877A IT1087439B (en) | 1977-11-08 | 1977-11-08 | Tin lead alloy plating electrolyte - contg. thiourea, hypophosphite, hydrochloric acid and the metals |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IT2943877A IT1087439B (en) | 1977-11-08 | 1977-11-08 | Tin lead alloy plating electrolyte - contg. thiourea, hypophosphite, hydrochloric acid and the metals |
Publications (1)
Publication Number | Publication Date |
---|---|
IT1087439B true IT1087439B (en) | 1985-06-04 |
Family
ID=11226995
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IT2943877A IT1087439B (en) | 1977-11-08 | 1977-11-08 | Tin lead alloy plating electrolyte - contg. thiourea, hypophosphite, hydrochloric acid and the metals |
Country Status (1)
Country | Link |
---|---|
IT (1) | IT1087439B (en) |
-
1977
- 1977-11-08 IT IT2943877A patent/IT1087439B/en active
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TWI242607B (en) | Bath and method of electroless plating of silver on metal surfaces | |
GB1492506A (en) | Immersion plating of tin-lead alloys | |
KR920018241A (en) | How to electroless plate tin, lead or tin-lead alloys | |
GB2099460A (en) | Plating bath for the immersion deposition of gold | |
ES8404421A1 (en) | Metal stripping composition and process | |
CN1876891B (en) | Method for direct metallization of non-conducting substrates | |
TW583349B (en) | Method for enhancing the solderability of a surface | |
US5435838A (en) | Immersion plating of tin-bismuth solder | |
US5143544A (en) | Tin lead plating solution | |
IT1087439B (en) | Tin lead alloy plating electrolyte - contg. thiourea, hypophosphite, hydrochloric acid and the metals | |
NL7712008A (en) | Tin lead alloy plating electrolyte - contg. thiourea, hypophosphite, hydrochloric acid and the metals | |
FR2408666A1 (en) | Tin lead alloy plating electrolyte - contg. thiourea, hypophosphite, hydrochloric acid and the metals | |
US5173109A (en) | Process for forming reflowable immersion tin lead deposit | |
JP3677617B2 (en) | Electroless gold plating solution | |
US3582415A (en) | Method of etching cu with use of pb and sn layers as a mask | |
JP2003253454A (en) | Method for plating electronic parts, and electronic parts | |
JPS57140891A (en) | Pretreating solution for silver plating | |
JP2002285377A5 (en) | ||
US5296268A (en) | Pretreatment process of tin lead plating | |
JPH0250990B2 (en) | ||
Ali et al. | A review of electroless gold deposition processes | |
JP3685276B2 (en) | Palladium / silver alloy plating bath | |
JP2004149824A (en) | Gold plating liquid, plating method using the gold plating liquid, method of producing electronic component, and electronic component | |
JPH0635665B2 (en) | Method for dissolving copper particles formed during electroless copper coating | |
JPS56112496A (en) | Plating method |