IT1026651B - Sistema di deflessione di unfascic di elettroni - Google Patents

Sistema di deflessione di unfascic di elettroni

Info

Publication number
IT1026651B
IT1026651B IT29998/74A IT2999874A IT1026651B IT 1026651 B IT1026651 B IT 1026651B IT 29998/74 A IT29998/74 A IT 29998/74A IT 2999874 A IT2999874 A IT 2999874A IT 1026651 B IT1026651 B IT 1026651B
Authority
IT
Italy
Prior art keywords
unfascic
electrons
deflection system
deflection
unfascic deflection
Prior art date
Application number
IT29998/74A
Other languages
English (en)
Original Assignee
Ibm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibm filed Critical Ibm
Application granted granted Critical
Publication of IT1026651B publication Critical patent/IT1026651B/it

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1472Deflecting along given lines
    • H01J37/1474Scanning means
    • H01J37/1475Scanning means magnetic
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/04Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
IT29998/74A 1973-12-28 1974-11-29 Sistema di deflessione di unfascic di elettroni IT1026651B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US429410A US3930181A (en) 1973-12-28 1973-12-28 Lens and deflection unit arrangement for electron beam columns

Publications (1)

Publication Number Publication Date
IT1026651B true IT1026651B (it) 1978-10-20

Family

ID=23703121

Family Applications (1)

Application Number Title Priority Date Filing Date
IT29998/74A IT1026651B (it) 1973-12-28 1974-11-29 Sistema di deflessione di unfascic di elettroni

Country Status (6)

Country Link
US (1) US3930181A (it)
JP (1) JPS5099464A (it)
CA (1) CA1024667A (it)
DE (1) DE2449000A1 (it)
FR (1) FR2256526A1 (it)
IT (1) IT1026651B (it)

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2386109A1 (fr) * 1977-04-01 1978-10-27 Cgr Mev Tete d'irradiation a rayons g pour une irradiation panoramique et generateur de rayons g comportant une telle tete d'irradiation
US4475044A (en) * 1979-04-23 1984-10-02 Hitachi, Ltd. Apparatus for focus-deflecting a charged particle beam
JPS5760647A (en) * 1980-09-26 1982-04-12 Jeol Ltd Magnetic field intensity control method
US4376249A (en) * 1980-11-06 1983-03-08 International Business Machines Corporation Variable axis electron beam projection system
JPS57206173A (en) * 1981-06-15 1982-12-17 Nippon Telegr & Teleph Corp <Ntt> Focusing deflecting device for charged corpuscule beam
US4395691A (en) * 1982-03-04 1983-07-26 Hughes Aircraft Company Beam deflection system
US4544846A (en) * 1983-06-28 1985-10-01 International Business Machines Corporation Variable axis immersion lens electron beam projection system
DE3521464A1 (de) * 1985-06-14 1986-12-18 Siemens AG, 1000 Berlin und 8000 München Spektrometer-objektiv fuer die elektronenstrahl-messtechnik
EP0236807A3 (de) * 1986-03-07 1990-05-16 Siemens Aktiengesellschaft Spektrometerobjektiv für die Korpuskularstrahl-Messtechnik
US6090528A (en) * 1999-10-27 2000-07-18 Gordon; Michael S. Spot-to-spot stitching in electron beam lithography utilizing square aperture with serrated edge
EP1238405B1 (en) * 1999-12-14 2014-06-18 Applied Materials, Inc. Method and system for the examination of specimen using a charged particle beam
US7800062B2 (en) * 2002-06-11 2010-09-21 Applied Materials, Inc. Method and system for the examination of specimen
US7528614B2 (en) 2004-12-22 2009-05-05 Applied Materials, Inc. Apparatus and method for voltage contrast analysis of a wafer using a tilted pre-charging beam
US8461526B2 (en) 2010-12-01 2013-06-11 Kla-Tencor Corporation Electron beam column and methods of using same
US8362425B2 (en) 2011-03-23 2013-01-29 Kla-Tencor Corporation Multiple-beam system for high-speed electron-beam inspection
US8664594B1 (en) 2011-04-18 2014-03-04 Kla-Tencor Corporation Electron-optical system for high-speed and high-sensitivity inspections
US9192707B2 (en) 2011-04-29 2015-11-24 Medtronic, Inc. Electrolyte and pH monitoring for fluid removal processes
US9848778B2 (en) 2011-04-29 2017-12-26 Medtronic, Inc. Method and device to monitor patients with kidney disease
JP6002428B2 (ja) * 2012-04-24 2016-10-05 株式会社日立ハイテクノロジーズ 荷電粒子線装置
US10010663B2 (en) 2013-02-01 2018-07-03 Medtronic, Inc. Fluid circuit for delivery of renal replacement therapies
US9623164B2 (en) 2013-02-01 2017-04-18 Medtronic, Inc. Systems and methods for multifunctional volumetric fluid control
US10543052B2 (en) 2013-02-01 2020-01-28 Medtronic, Inc. Portable dialysis cabinet
US9884145B2 (en) 2013-11-26 2018-02-06 Medtronic, Inc. Parallel modules for in-line recharging of sorbents using alternate duty cycles
US9713665B2 (en) 2014-12-10 2017-07-25 Medtronic, Inc. Degassing system for dialysis

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2803770A (en) * 1950-09-18 1957-08-20 Fernseh Gmbh Electron discharge tube apparatus
BE620211A (it) * 1961-08-23
US3158774A (en) * 1962-06-08 1964-11-24 Joel F Fleming Image orthicon focusing coil and field flaring ring
GB1044090A (en) * 1963-12-06 1966-09-28 Tokyo Shibaura Electric Co Television pickup tubes and methods of operating the same
US3471741A (en) * 1967-04-07 1969-10-07 Rca Corp Television camera including an image isocon tube
GB1187901A (en) * 1968-04-03 1970-04-15 Graham Stuart Plows Electron Beam Apparatus.
US3714422A (en) * 1970-04-06 1973-01-30 Hitachi Ltd Scanning stereoscopic electron microscope
US3801784A (en) * 1972-04-14 1974-04-02 Research Corp Scanning electron microscope operating in area scan and angle scan modes

Also Published As

Publication number Publication date
CA1024667A (en) 1978-01-17
JPS5099464A (it) 1975-08-07
US3930181A (en) 1975-12-30
DE2449000A1 (de) 1975-07-03
FR2256526A1 (it) 1975-07-25

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