IT1020073B - Procedimento per fabbricare una disposizione a spostamento di carica bifase - Google Patents

Procedimento per fabbricare una disposizione a spostamento di carica bifase

Info

Publication number
IT1020073B
IT1020073B IT26465/74A IT2646574A IT1020073B IT 1020073 B IT1020073 B IT 1020073B IT 26465/74 A IT26465/74 A IT 26465/74A IT 2646574 A IT2646574 A IT 2646574A IT 1020073 B IT1020073 B IT 1020073B
Authority
IT
Italy
Prior art keywords
procedure
manufacturing
phase charge
shifting arrangement
charge shifting
Prior art date
Application number
IT26465/74A
Other languages
English (en)
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag filed Critical Siemens Ag
Application granted granted Critical
Publication of IT1020073B publication Critical patent/IT1020073B/it

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D44/00—Charge transfer devices
    • H10D44/40—Charge-coupled devices [CCD]
    • H10D44/45—Charge-coupled devices [CCD] having field effect produced by insulated gate electrodes 
    • H10D44/472—Surface-channel CCD
    • H10D44/474—Two-phase CCD
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/60—Electrodes characterised by their materials
    • H10D64/66—Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes
    • H10D64/661—Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes the conductor comprising a layer of silicon contacting the insulator, e.g. polysilicon having vertical doping variation
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/60—Electrodes characterised by their materials
    • H10D64/66—Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes
    • H10D64/661—Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes the conductor comprising a layer of silicon contacting the insulator, e.g. polysilicon having vertical doping variation
    • H10D64/662—Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes the conductor comprising a layer of silicon contacting the insulator, e.g. polysilicon having vertical doping variation the conductor further comprising additional layers, e.g. multiple silicon layers having different crystal structures
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/60—Electrodes characterised by their materials
    • H10D64/66—Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes
    • H10D64/671—Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes the conductor having lateral variation in doping or structure
IT26465/74A 1973-08-24 1974-08-21 Procedimento per fabbricare una disposizione a spostamento di carica bifase IT1020073B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2342923A DE2342923C2 (de) 1973-08-24 1973-08-24 Verfahren zur Herstellung einer Zweiphasen-Ladungsverschlebeanordnung und nach diesem Verfahren hergestellte Zweiphasen-Ladungs Verschiebeanordnung

Publications (1)

Publication Number Publication Date
IT1020073B true IT1020073B (it) 1977-12-20

Family

ID=5890680

Family Applications (1)

Application Number Title Priority Date Filing Date
IT26465/74A IT1020073B (it) 1973-08-24 1974-08-21 Procedimento per fabbricare una disposizione a spostamento di carica bifase

Country Status (9)

Country Link
US (1) US3967365A (it)
JP (1) JPS5046489A (it)
BE (1) BE819135A (it)
DE (1) DE2342923C2 (it)
FR (1) FR2241874B1 (it)
GB (1) GB1445906A (it)
IT (1) IT1020073B (it)
LU (1) LU70779A1 (it)
NL (1) NL7410686A (it)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4100313A (en) * 1975-10-28 1978-07-11 Rca Corporation Process for forming an optical waveguide
JPS5325373A (en) * 1976-08-20 1978-03-09 Sony Corp Production of charge transfer device
US4156247A (en) * 1976-12-15 1979-05-22 Electron Memories & Magnetic Corporation Two-phase continuous poly silicon gate CCD
US4173064A (en) * 1977-08-22 1979-11-06 Texas Instruments Incorporated Split gate electrode, self-aligned antiblooming structure and method of making same
US4490736A (en) * 1979-04-23 1984-12-25 Texas Instruments Incorporated Semiconductor device and method of making
US4213142A (en) * 1979-04-23 1980-07-15 Texas Instruments Incorporated Semiconductor device and method
US4319261A (en) * 1980-05-08 1982-03-09 Westinghouse Electric Corp. Self-aligned, field aiding double polysilicon CCD electrode structure
US4542577A (en) * 1982-12-30 1985-09-24 International Business Machines Corporation Submicron conductor manufacturing
US5270226A (en) * 1989-04-03 1993-12-14 Matsushita Electric Industrial Co., Ltd. Manufacturing method for LDDFETS using oblique ion implantion technique
KR940010932B1 (ko) * 1991-12-23 1994-11-19 금성일렉트론주식회사 Ccd영상소자 제조방법
JP2965061B2 (ja) * 1996-04-19 1999-10-18 日本電気株式会社 電荷結合素子およびその製造方法

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2123592A5 (it) * 1971-01-14 1972-09-15 Commissariat Energie Atomique
US3796932A (en) * 1971-06-28 1974-03-12 Bell Telephone Labor Inc Charge coupled devices employing nonuniform concentrations of immobile charge along the information channel
US3873371A (en) * 1972-11-07 1975-03-25 Hughes Aircraft Co Small geometry charge coupled device and process for fabricating same

Also Published As

Publication number Publication date
GB1445906A (en) 1976-08-11
NL7410686A (nl) 1975-02-26
JPS5046489A (it) 1975-04-25
FR2241874B1 (it) 1978-03-31
DE2342923C2 (de) 1975-10-23
BE819135A (fr) 1974-12-16
US3967365A (en) 1976-07-06
DE2342923B1 (de) 1975-03-13
LU70779A1 (it) 1975-01-02
FR2241874A1 (it) 1975-03-21

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