IN2014MN02081A - - Google Patents
Info
- Publication number
- IN2014MN02081A IN2014MN02081A IN2081MUN2014A IN2014MN02081A IN 2014MN02081 A IN2014MN02081 A IN 2014MN02081A IN 2081MUN2014 A IN2081MUN2014 A IN 2081MUN2014A IN 2014MN02081 A IN2014MN02081 A IN 2014MN02081A
- Authority
- IN
- India
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0402—Apparatus for fluid treatment
- H10P72/0404—Apparatus for fluid treatment for general liquid treatment, e.g. etching followed by cleaning
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0402—Apparatus for fluid treatment
- H10P72/0406—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
- H10P72/0411—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
- H10P72/0414—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing using mainly spraying means, e.g. nozzles
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0402—Apparatus for fluid treatment
- H10P72/0418—Apparatus for fluid treatment for etching
- H10P72/0422—Apparatus for fluid treatment for etching for wet etching
- H10P72/0424—Apparatus for fluid treatment for etching for wet etching using mainly spraying means, e.g. nozzles
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0448—Apparatus for applying a liquid, a resin, an ink or the like
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102012102740 | 2012-03-29 | ||
| DE102012103330A DE102012103330A1 (de) | 2012-03-29 | 2012-04-17 | Vorrichtung zum Entfernen einer Beschichtung von einem Substrat und Verfahren |
| PCT/EP2013/056333 WO2013144108A1 (de) | 2012-03-29 | 2013-03-26 | Vorrichtung zum entfernen einer beschichtung von einem substrat und verfahren |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| IN2014MN02081A true IN2014MN02081A (de) | 2015-08-21 |
Family
ID=49154610
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| IN2081MUN2014 IN2014MN02081A (de) | 2012-03-29 | 2014-10-17 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20150068556A1 (de) |
| EP (2) | EP2831910B1 (de) |
| CN (1) | CN104272448A (de) |
| DE (1) | DE102012103330A1 (de) |
| IN (1) | IN2014MN02081A (de) |
| RU (1) | RU2630520C2 (de) |
| WO (1) | WO2013144108A1 (de) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102022117344A1 (de) | 2021-07-15 | 2023-01-19 | Osiris International GmbH | Vorrichtung zum Entschichten von eckigen Substraten |
| JP2024526780A (ja) | 2021-07-15 | 2024-07-19 | オサイアリス インターナショナル ゲーエムベーハー | 角形の基板からコーティングを除去するための装置 |
| DE102023126128A1 (de) * | 2023-09-26 | 2025-03-27 | Osiris International GmbH | Entschichtungsvorrichtung und Verfahren zum Entschichten von unebenen Substraten |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4036615A (en) * | 1975-09-15 | 1977-07-19 | Leo Heintzelman | Mist separator |
| US5608943A (en) * | 1993-08-23 | 1997-03-11 | Tokyo Electron Limited | Apparatus for removing process liquid |
| JP3740207B2 (ja) * | 1996-02-13 | 2006-02-01 | 大日本スクリーン製造株式会社 | 基板表面に形成されたシリカ系被膜の膜溶解方法 |
| JP3300624B2 (ja) * | 1997-01-24 | 2002-07-08 | 東京エレクトロン株式会社 | 基板端面の洗浄方法 |
| US6716478B2 (en) * | 1999-08-04 | 2004-04-06 | Tokyo Electron Limited | Coating film forming apparatus and coating film forming method |
| US20060169202A1 (en) * | 2003-03-28 | 2006-08-03 | Erickson Stuart J | Coating system |
| JP4763575B2 (ja) * | 2006-01-26 | 2011-08-31 | 大日本スクリーン製造株式会社 | 基板処理装置および基板処理方法 |
-
2012
- 2012-04-17 DE DE102012103330A patent/DE102012103330A1/de not_active Ceased
-
2013
- 2013-03-26 WO PCT/EP2013/056333 patent/WO2013144108A1/de not_active Ceased
- 2013-03-26 US US14/389,038 patent/US20150068556A1/en not_active Abandoned
- 2013-03-26 EP EP13717727.5A patent/EP2831910B1/de active Active
- 2013-03-26 CN CN201380021526.1A patent/CN104272448A/zh active Pending
- 2013-03-26 EP EP21207200.3A patent/EP4080553B1/de active Active
- 2013-03-26 RU RU2014142308A patent/RU2630520C2/ru active
-
2014
- 2014-10-17 IN IN2081MUN2014 patent/IN2014MN02081A/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| EP2831910A1 (de) | 2015-02-04 |
| EP4080553B1 (de) | 2023-12-20 |
| US20150068556A1 (en) | 2015-03-12 |
| EP4080553A1 (de) | 2022-10-26 |
| EP2831910B1 (de) | 2021-11-10 |
| RU2630520C2 (ru) | 2017-09-11 |
| RU2014142308A (ru) | 2016-05-20 |
| DE102012103330A1 (de) | 2013-10-02 |
| CN104272448A (zh) | 2015-01-07 |
| EP4080553C0 (de) | 2023-12-20 |
| WO2013144108A1 (de) | 2013-10-03 |