IN2014CN04288A - - Google Patents

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Publication number
IN2014CN04288A
IN2014CN04288A IN4288CHN2014A IN2014CN04288A IN 2014CN04288 A IN2014CN04288 A IN 2014CN04288A IN 4288CHN2014 A IN4288CHN2014 A IN 4288CHN2014A IN 2014CN04288 A IN2014CN04288 A IN 2014CN04288A
Authority
IN
India
Prior art keywords
soot body
quartz glass
ppm
raw material
silicon compound
Prior art date
Application number
Inventor
Martin Trommer
Steffen Zwarg
Ralph Sattmann
Bodo Kuehn
Original Assignee
Heraeus Quarzglas
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Heraeus Quarzglas filed Critical Heraeus Quarzglas
Publication of IN2014CN04288A publication Critical patent/IN2014CN04288A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01406—Deposition reactors therefor
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01413—Reactant delivery systems
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C13/00—Fibre or filament compositions
    • C03C13/008—Polycrystalline optical fibres
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/06—Doped silica-based glasses
    • C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2201/00—Type of glass produced
    • C03B2201/80—Non-oxide glasses or glass-type compositions
    • C03B2201/84—Halide glasses other than fluoride glasses, i.e. Cl, Br or I glasses, e.g. AgCl-AgBr "glass"
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/30—For glass precursor of non-standard type, e.g. solid SiH3F
    • C03B2207/32—Non-halide
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/36—Fuel or oxidant details, e.g. flow rate, flow rate ratio, fuel additives
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2213/00—Glass fibres or filaments

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Glass Compositions (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)

Abstract

2Known is a method for producing synthetic quartz glass comprising the following method steps: (a) reacting a carbonic silicon compound containing raw material with oxygen in a reaction zone into SiOparticles (b) precipitating the SiO2 particles on a sedimentation area by forming a porous SiO2 soot body containing hydrogen and hydroxyl groups (c) drying the porous SiO2 soot body and (d) glazing to the synthetic quartz glass by heating the soot body up to a glazing temperature. In order to indicate a method proceeding therefrom which facilitates a cost efficient production of quartz glass by means of pyrolysing or hydrolysing a carbon containing silicon compound using a carbon containing raw material the invention describes the production of a soot body with a carbon content within the range of 1 ppm by weight to 50 ppm by weight.
IN4288CHN2014 2011-12-15 2012-12-12 IN2014CN04288A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102011121153A DE102011121153B3 (en) 2011-12-15 2011-12-15 Process for the production of synthetic quartz glass and quartz glass for use as cladding material of an optical fiber
PCT/EP2012/075197 WO2013087678A1 (en) 2011-12-15 2012-12-12 Method for producing synthetic quartz glass, and quartz glass for use as a sheath material for an optical fibre

Publications (1)

Publication Number Publication Date
IN2014CN04288A true IN2014CN04288A (en) 2015-09-04

Family

ID=47458903

Family Applications (1)

Application Number Title Priority Date Filing Date
IN4288CHN2014 IN2014CN04288A (en) 2011-12-15 2012-12-12

Country Status (8)

Country Link
US (1) US9272942B2 (en)
EP (1) EP2791070B8 (en)
JP (1) JP6058693B2 (en)
KR (1) KR101569797B1 (en)
CN (1) CN103987670B (en)
DE (1) DE102011121153B3 (en)
IN (1) IN2014CN04288A (en)
WO (1) WO2013087678A1 (en)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102011121190A1 (en) * 2011-12-16 2013-06-20 Heraeus Quarzglas Gmbh & Co. Kg OMCTS evaporation method
EP2835360A1 (en) * 2013-08-06 2015-02-11 Heraeus Quarzglas GmbH & Co. KG Process for making silica soot body in presence of carbon monoxide
EP3390296B1 (en) 2015-12-18 2024-09-04 Heraeus Quarzglas GmbH & Co. KG Production of a quartz glass body in a multichamber furnace
TWI764879B (en) * 2015-12-18 2022-05-21 德商何瑞斯廓格拉斯公司 Reducing carbon content of silicon dioxide granulate and the preparation of a quartz glass body
TWI794149B (en) 2015-12-18 2023-03-01 德商何瑞斯廓格拉斯公司 Quartz glass grain, opaque formed body and process for preparing the same
EP3390290B1 (en) 2015-12-18 2023-03-15 Heraeus Quarzglas GmbH & Co. KG Production of an opaque quartz glass body
TWI808933B (en) 2015-12-18 2023-07-21 德商何瑞斯廓格拉斯公司 Quartz glass body, silicon dioxide granulate, light guide, illuminant, and formed body, and process for preparing the same
KR20180095622A (en) 2015-12-18 2018-08-27 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 Manufacture of Silica Glass Products from Molten Crucibles Made of Refractory Metals
EP3390303B1 (en) 2015-12-18 2024-02-07 Heraeus Quarzglas GmbH & Co. KG Production of quartz glass bodies with dewpoint control in a melting furnace
EP3390308B1 (en) 2015-12-18 2024-08-28 Heraeus Quarzglas GmbH & Co. KG Glass fibres of quartz glass with low oh, cl and al contents
US11492285B2 (en) 2015-12-18 2022-11-08 Heraeus Quarzglas Gmbh & Co. Kg Preparation of quartz glass bodies from silicon dioxide granulate
KR20180095879A (en) * 2015-12-18 2018-08-28 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 Treating the carbon-doped silica granules at elevated temperatures to reduce the alkaline earth metal content of the silica granules
TWI840318B (en) 2015-12-18 2024-05-01 德商何瑞斯廓格拉斯公司 Quartz glass body, light guide, illuminant, formed body, and process for preparing the same, and use of silicon component
JP6650820B2 (en) * 2016-04-19 2020-02-19 株式会社フジクラ Manufacturing method of glass ingot
JP2018084755A (en) * 2016-11-25 2018-05-31 富士通株式会社 Optical fiber array connector and optical module
CN110040942B (en) * 2018-01-16 2021-10-12 中天科技集团有限公司 Method for dehydroxylating powder and method for preparing quartz glass
JP6793676B2 (en) * 2018-04-02 2020-12-02 信越化学工業株式会社 Manufacturing equipment and manufacturing method for porous glass base material for optical fibers
US11919805B2 (en) * 2018-06-01 2024-03-05 Corning Incorporated Carbon-doped silicon dioxide glass and methods of manufacturing thereof
KR101943598B1 (en) 2018-08-08 2019-01-30 주식회사 에스티아이 Vaporizer integrated burner
JP6978991B2 (en) * 2018-08-23 2021-12-08 信越化学工業株式会社 Manufacturing method and manufacturing equipment for porous glass base material for optical fiber
JP7093732B2 (en) * 2019-02-13 2022-06-30 信越化学工業株式会社 Manufacturing method of glass base material for optical fiber
JP7194301B2 (en) * 2019-06-11 2022-12-21 信越化学工業株式会社 Manufacturing method of porous glass base material for optical fiber
JP7058627B2 (en) 2019-06-11 2022-04-22 信越化学工業株式会社 Manufacturing equipment and manufacturing method for porous glass base material for optical fiber
CN113943094A (en) * 2020-07-15 2022-01-18 信越石英株式会社 Large hollow porous quartz glass base material and method for producing same
CN114249524A (en) * 2020-09-22 2022-03-29 中天科技精密材料有限公司 Low-hydroxyl high-purity quartz glass and preparation method thereof
JP7428632B2 (en) 2020-12-14 2024-02-06 信越化学工業株式会社 Manufacturing method and manufacturing device for porous glass base material
EP4015468A1 (en) 2020-12-16 2022-06-22 Heraeus Quarzglas GmbH & Co. KG Method for the manufacture of synthetic quartz glass
EP4015466A1 (en) * 2020-12-16 2022-06-22 Heraeus Quarzglas GmbH & Co. KG Method for the manufacture of synthetic quartz glass
EP4015467A1 (en) * 2020-12-16 2022-06-22 Heraeus Quarzglas GmbH & Co. KG Method for the manufacture of synthetic quartz glass
KR102578368B1 (en) * 2021-01-08 2023-09-15 대한광통신(주) Method, apparatus and computer program for prediction of depositing process of synthetic silica glass by machine learning model
EP4030204B1 (en) 2021-01-19 2023-09-20 Heraeus Quarzglas GmbH & Co. KG Microstructured optical fibre and preform for same
KR102388684B1 (en) * 2021-11-25 2022-04-20 비씨엔씨 주식회사 Synthetic quartz glass manufacturing method through OVD process with improved deposition efficincy

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB8905966D0 (en) * 1989-03-15 1989-04-26 Tsl Group Plc Improved vitreous silica products
JP2898138B2 (en) * 1992-01-24 1999-05-31 信越化学工業株式会社 Quartz glass substrate for thin film transistor
TW440548B (en) * 1997-05-14 2001-06-16 Nippon Kogaku Kk Synthetic silica glass optical member and method of manufacturing the same
JPH11209128A (en) * 1998-01-20 1999-08-03 Nikon Corp Synthetic quartz glass-producing device and synthetic quartz glass produced with this synthetic quartz glass-producing device
JP2001010833A (en) * 1999-06-21 2001-01-16 Nikon Corp Quartz glass member
JP2002060248A (en) 2000-08-10 2002-02-26 Mitsubishi Cable Ind Ltd Quartz-base optical fiber
US6606883B2 (en) 2001-04-27 2003-08-19 Corning Incorporated Method for producing fused silica and doped fused silica glass
WO2004050570A1 (en) * 2002-11-29 2004-06-17 Shin-Etsu Quartz Products Co., Ltd. Method for producing synthetic quartz glass and synthetic quartz glass article
JP2008063181A (en) * 2006-09-07 2008-03-21 Shin Etsu Chem Co Ltd Synthetic quartz glass substrate for excimer laser and production method therefor

Also Published As

Publication number Publication date
EP2791070B1 (en) 2017-07-19
KR101569797B1 (en) 2015-11-19
WO2013087678A1 (en) 2013-06-20
CN103987670A (en) 2014-08-13
EP2791070B8 (en) 2017-08-23
US20140349830A1 (en) 2014-11-27
US9272942B2 (en) 2016-03-01
DE102011121153B3 (en) 2013-03-21
EP2791070A1 (en) 2014-10-22
CN103987670B (en) 2016-10-19
JP6058693B2 (en) 2017-01-11
KR20140095560A (en) 2014-08-01
JP2015505809A (en) 2015-02-26

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