|
US4075037A
(en)
*
|
1976-05-17 |
1978-02-21 |
Westinghouse Electric Corporation |
Tailoring of recovery charge in power diodes and thyristors by irradiation
|
|
DE2627855A1
(de)
*
|
1976-06-22 |
1977-12-29 |
Siemens Ag |
Halbleiterbauelement mit wenigstens zwei, einen pn-uebergang bildenden zonen unterschiedlichen leitungstyps sowie verfahren zu dessen herstellung
|
|
US4259683A
(en)
*
|
1977-02-07 |
1981-03-31 |
General Electric Company |
High switching speed P-N junction devices with recombination means centrally located in high resistivity layer
|
|
JPS53110483A
(en)
*
|
1977-03-09 |
1978-09-27 |
Hitachi Ltd |
Thyristor
|
|
US4137099A
(en)
*
|
1977-07-11 |
1979-01-30 |
General Electric Company |
Method of controlling leakage currents and reverse recovery time of rectifiers by hot electron irradiation and post-annealing treatments
|
|
US4292644A
(en)
*
|
1977-08-26 |
1981-09-29 |
General Electric Company |
Control of valley current in a unijunction transistor by electron irradiation
|
|
US4134778A
(en)
*
|
1977-09-02 |
1979-01-16 |
General Electric Company |
Selective irradiation of thyristors
|
|
DE2755418A1
(de)
*
|
1977-12-13 |
1979-06-21 |
Bosch Gmbh Robert |
Verfahren zur herstellung eines halbleiter-bauelements
|
|
US4113514A
(en)
*
|
1978-01-16 |
1978-09-12 |
Rca Corporation |
Method of passivating a semiconductor device by treatment with atomic hydrogen
|
|
US4240844A
(en)
*
|
1978-12-22 |
1980-12-23 |
Westinghouse Electric Corp. |
Reducing the switching time of semiconductor devices by neutron irradiation
|
|
US4278475A
(en)
*
|
1979-01-04 |
1981-07-14 |
Westinghouse Electric Corp. |
Forming of contoured irradiated regions in materials such as semiconductor bodies by nuclear radiation
|
|
US4230791A
(en)
*
|
1979-04-02 |
1980-10-28 |
General Electric Company |
Control of valley current in a unijunction transistor by electron irradiation
|
|
US4291329A
(en)
*
|
1979-08-31 |
1981-09-22 |
Westinghouse Electric Corp. |
Thyristor with continuous recombination center shunt across planar emitter-base junction
|
|
US4318750A
(en)
*
|
1979-12-28 |
1982-03-09 |
Westinghouse Electric Corp. |
Method for radiation hardening semiconductor devices and integrated circuits to latch-up effects
|
|
IN152079B
(enExample)
*
|
1980-01-09 |
1983-10-08 |
Westinghouse Electric Corp |
|
|
US4311534A
(en)
*
|
1980-06-27 |
1982-01-19 |
Westinghouse Electric Corp. |
Reducing the reverse recovery charge of thyristors by nuclear irradiation
|
|
JPS60207376A
(ja)
*
|
1984-03-31 |
1985-10-18 |
Toyota Central Res & Dev Lab Inc |
高速静電誘導サイリスタおよびその製造方法
|
|
US4620211A
(en)
*
|
1984-08-13 |
1986-10-28 |
General Electric Company |
Method of reducing the current gain of an inherent bipolar transistor in an insulated-gate semiconductor device and resulting devices
|
|
JPS6276556A
(ja)
*
|
1985-09-28 |
1987-04-08 |
Toyota Central Res & Dev Lab Inc |
高速静電誘導サイリスタ
|
|
US4752818A
(en)
*
|
1985-09-28 |
1988-06-21 |
Kabushiki Kaisha Toyota Chuo Kenkyusho |
Semiconductor device with multiple recombination center layers
|
|
JP2604580B2
(ja)
*
|
1986-10-01 |
1997-04-30 |
三菱電機株式会社 |
アノード短絡形ゲートターンオフサイリスタ
|
|
JPS649658A
(en)
*
|
1987-07-01 |
1989-01-12 |
Mitsubishi Electric Corp |
Gto thyristor
|
|
JPH0722198B2
(ja)
*
|
1987-07-15 |
1995-03-08 |
富士電機株式会社 |
絶縁ゲ−ト形バイポ−ラトランジスタ
|
|
US5510274A
(en)
*
|
1987-08-19 |
1996-04-23 |
Mitsubishi Denki Kabushiki Kaisha |
Method of controlling a carrier lifetime in a semiconductor switching device
|
|
GB2213988B
(en)
*
|
1987-12-18 |
1992-02-05 |
Matsushita Electric Works Ltd |
Semiconductor device
|
|
EP0343369A1
(de)
*
|
1988-05-19 |
1989-11-29 |
Siemens Aktiengesellschaft |
Verfahren zum Herstellen eines Thyristors
|
|
EP0398120B1
(de)
*
|
1989-05-18 |
1993-10-13 |
Asea Brown Boveri Ag |
Halbleiterbauelement
|
|
US5284780A
(en)
*
|
1989-09-28 |
1994-02-08 |
Siemens Aktiengesellschaft |
Method for increasing the electric strength of a multi-layer semiconductor component
|
|
US5243205A
(en)
*
|
1989-10-16 |
1993-09-07 |
Kabushiki Kaisha Toshiba |
Semiconductor device with overvoltage protective function
|
|
US5554883A
(en)
*
|
1990-04-28 |
1996-09-10 |
Mitsubishi Denki Kabushiki Kaisha |
Semiconductor device and manufacturing method therefor
|
|
US5247230A
(en)
*
|
1992-06-02 |
1993-09-21 |
Lucerne Products, Inc. |
Unilateral diac for motor speed control
|
|
DE4421529C2
(de)
*
|
1994-06-20 |
1996-04-18 |
Semikron Elektronik Gmbh |
Schnelle Leistungsdiode
|
|
JP3869466B2
(ja)
*
|
1995-07-03 |
2007-01-17 |
シーメンス アクチエンゲゼルシヤフト |
改善されたスイッチオンオフ特性を有するサイリスタ及びその製造方法
|
|
JP3394383B2
(ja)
*
|
1996-03-18 |
2003-04-07 |
三菱電機株式会社 |
サイリスタの製造方法およびサイリスタ
|
|
DE19650762A1
(de)
*
|
1996-09-30 |
1998-07-02 |
Eupec Gmbh & Co Kg |
Thyristor mit Durchbruchbereich
|
|
EP0931351B1
(de)
|
1996-09-30 |
2004-01-28 |
EUPEC Europäische Gesellschaft für Leistungshalbleiter mbH & Co. KG |
Thyristor mit durchbruchbereich
|
|
DE19649800A1
(de)
*
|
1996-12-02 |
1998-06-04 |
Asea Brown Boveri |
Verfahren zur Herstellung eines Abschaltthyristors mit einer anodenseitigen Stopschicht und einem transparenten Anodenemitter
|
|
US6274892B1
(en)
*
|
1998-03-09 |
2001-08-14 |
Intersil Americas Inc. |
Devices formable by low temperature direct bonding
|
|
JP4775539B2
(ja)
*
|
2005-03-22 |
2011-09-21 |
サンケン電気株式会社 |
半導体装置の製法
|