IL84298A0 - Improved photosensitive laminate - Google Patents

Improved photosensitive laminate

Info

Publication number
IL84298A0
IL84298A0 IL84298A IL8429887A IL84298A0 IL 84298 A0 IL84298 A0 IL 84298A0 IL 84298 A IL84298 A IL 84298A IL 8429887 A IL8429887 A IL 8429887A IL 84298 A0 IL84298 A0 IL 84298A0
Authority
IL
Israel
Prior art keywords
photosensitive laminate
improved photosensitive
improved
laminate
photosensitive
Prior art date
Application number
IL84298A
Other languages
English (en)
Original Assignee
Thiokol Morton Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Thiokol Morton Inc filed Critical Thiokol Morton Inc
Publication of IL84298A0 publication Critical patent/IL84298A0/xx

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/061—Etching masks
    • H05K3/064—Photoresists
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/06—Lamination
    • H05K2203/066—Transfer laminating of insulating material, e.g. resist as a whole layer, not as a pattern

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Laminated Bodies (AREA)
IL84298A 1986-11-14 1987-10-28 Improved photosensitive laminate IL84298A0 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US93139686A 1986-11-14 1986-11-14

Publications (1)

Publication Number Publication Date
IL84298A0 true IL84298A0 (en) 1988-03-31

Family

ID=25460721

Family Applications (1)

Application Number Title Priority Date Filing Date
IL84298A IL84298A0 (en) 1986-11-14 1987-10-28 Improved photosensitive laminate

Country Status (6)

Country Link
EP (1) EP0267807A3 (xx)
JP (1) JPS63197942A (xx)
KR (1) KR880006965A (xx)
AU (1) AU599166B2 (xx)
DK (1) DK596887A (xx)
IL (1) IL84298A0 (xx)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN1260617C (zh) 1999-06-24 2006-06-21 日立化成工业株式会社 感光元件、感光元件辊、使用其的抗蚀图形的制法、抗蚀图形、抗蚀图形的积层片、布线图形的制法及布线图形
FR2803246B1 (fr) * 1999-12-31 2002-11-29 Rollin Sa Plaque d'impression presentee en rouleau et procede d'obtention
TWI341788B (en) * 2004-07-06 2011-05-11 Fujifilm Corp Apparatus for and method of manufacturing photosensitive laminated body
CN102707571A (zh) 2006-12-19 2012-10-03 日立化成工业株式会社 感光性元件
KR101102186B1 (ko) 2007-01-31 2012-01-02 히다치 가세고교 가부시끼가이샤 감광성 엘리먼트
WO2009054705A2 (en) * 2007-10-25 2009-04-30 Kolon Industries, Inc. Film type transfer material
CN101836162B (zh) * 2007-10-25 2012-11-14 可隆工业株式会社 薄膜型转印材料
US9439291B2 (en) 2010-12-16 2016-09-06 Hitachi Chemical Company, Ltd. Photosensitive element, method for forming resist pattern, and method for producing printed circuit board
CN102799070B (zh) * 2012-08-27 2014-03-05 珠海市能动科技光学产业有限公司 双层涂布的负性光致抗蚀干膜
JP6043693B2 (ja) * 2012-10-19 2016-12-14 富士フイルム株式会社 保護膜形成用の樹脂組成物、保護膜、パターン形成方法、電子デバイスの製造方法及び電子デバイス
CN110312965A (zh) * 2017-03-30 2019-10-08 富士胶片株式会社 感光性转印材料以及电路配线的制造方法
WO2019187364A1 (ja) * 2018-03-29 2019-10-03 富士フイルム株式会社 感光性転写材料、レジストパターンの製造方法、回路配線の製造方法、タッチパネル、及び、タッチパネル表示装置
JP7011047B2 (ja) * 2018-03-29 2022-01-26 富士フイルム株式会社 感光性転写材料、感光性転写材料の製造方法、レジストパターンの製造方法、回路配線の製造方法、タッチパネル、及び、タッチパネル表示装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3388995A (en) * 1964-08-10 1968-06-18 Gen Aniline & Film Corp Photopolymer offset printing plates
DE2106574A1 (de) * 1970-03-03 1971-09-23 Shpley Co Inc Lichtempfindliches Laminat
JPS56140341A (en) * 1980-04-04 1981-11-02 Muromachi Kagaku Kogyo Kk Photosensitive laminate

Also Published As

Publication number Publication date
EP0267807A2 (en) 1988-05-18
DK596887D0 (da) 1987-11-13
JPS63197942A (ja) 1988-08-16
DK596887A (da) 1988-05-15
AU8120887A (en) 1988-05-19
AU599166B2 (en) 1990-07-12
KR880006965A (ko) 1988-07-25
EP0267807A3 (en) 1990-08-01

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