IL83316A0 - Chemical vapor deposition apparatus
- Google Patents
Chemical vapor deposition apparatus
Info
Publication number
IL83316A0
IL83316A0IL83316AIL8331687AIL83316A0IL 83316 A0IL83316 A0IL 83316A0IL 83316 AIL83316 AIL 83316AIL 8331687 AIL8331687 AIL 8331687AIL 83316 A0IL83316 A0IL 83316A0
Authority
IL
Israel
Prior art keywords
vapor deposition
chemical vapor
deposition apparatus
chemical
vapor
Prior art date
Application number
IL83316A
Original Assignee
Anicon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US06/528,193external-prioritypatent/US4539933A/en
Application filed by Anicon IncfiledCriticalAnicon Inc
Priority to IL83316ApriorityCriticalpatent/IL83316A0/en
Publication of IL83316A0publicationCriticalpatent/IL83316A0/en