IL322388A - שיטת המטרולוגיה וכלי המטרולוגיה הנלווה - Google Patents

שיטת המטרולוגיה וכלי המטרולוגיה הנלווה

Info

Publication number
IL322388A
IL322388A IL322388A IL32238825A IL322388A IL 322388 A IL322388 A IL 322388A IL 322388 A IL322388 A IL 322388A IL 32238825 A IL32238825 A IL 32238825A IL 322388 A IL322388 A IL 322388A
Authority
IL
Israel
Prior art keywords
radiation
scattered
metrology
target
dispersive element
Prior art date
Application number
IL322388A
Other languages
English (en)
Inventor
Der Post Sietse Thijmen Van
Stephen Edward
Johan Reinink
Hugo Augustinus Joseph Cramer
Teunis Willem Tukker
Original Assignee
Asml Netherlands Bv
Der Post Sietse Thijmen Van
Stephen Edward
Johan Reinink
Hugo Augustinus Joseph Cramer
Teunis Willem Tukker
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from EP23156294.3A external-priority patent/EP4414785A1/en
Application filed by Asml Netherlands Bv, Der Post Sietse Thijmen Van, Stephen Edward, Johan Reinink, Hugo Augustinus Joseph Cramer, Teunis Willem Tukker filed Critical Asml Netherlands Bv
Publication of IL322388A publication Critical patent/IL322388A/he

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/706843—Metrology apparatus
    • G03F7/706849—Irradiation branch, e.g. optical system details, illumination mode or polarisation control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70625—Dimensions, e.g. line width, critical dimension [CD], profile, sidewall angle or edge roughness

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
IL322388A 2023-02-13 2024-01-23 שיטת המטרולוגיה וכלי המטרולוגיה הנלווה IL322388A (he)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP23156294.3A EP4414785A1 (en) 2023-02-13 2023-02-13 Metrology method with beams incident on a target at a plurality of different angles of incidence and associated metrology tool
EP24152531 2024-01-18
PCT/EP2024/051539 WO2024170230A1 (en) 2023-02-13 2024-01-23 Metrology method and associated metrology tool

Publications (1)

Publication Number Publication Date
IL322388A true IL322388A (he) 2025-09-01

Family

ID=89662230

Family Applications (1)

Application Number Title Priority Date Filing Date
IL322388A IL322388A (he) 2023-02-13 2024-01-23 שיטת המטרולוגיה וכלי המטרולוגיה הנלווה

Country Status (4)

Country Link
CN (1) CN120615181A (he)
IL (1) IL322388A (he)
TW (1) TW202507421A (he)
WO (1) WO2024170230A1 (he)

Family Cites Families (26)

* Cited by examiner, † Cited by third party
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US668506A (en) 1900-10-24 1901-02-19 Henry M Enright Tracer.
GB626384A (en) * 1947-03-03 1949-07-14 John Henry Jeffree Improvements in or relating to optical objective systems
US5596413A (en) * 1995-08-17 1997-01-21 Lucent Technologies Inc. Sub-micron through-the-lens positioning utilizing out of phase segmented gratings
JP3977324B2 (ja) 2002-11-12 2007-09-19 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置
US7791727B2 (en) 2004-08-16 2010-09-07 Asml Netherlands B.V. Method and apparatus for angular-resolved spectroscopic lithography characterization
US7481579B2 (en) 2006-03-27 2009-01-27 Jordan Valley Applied Radiation Ltd. Overlay metrology using X-rays
NL1036245A1 (nl) 2007-12-17 2009-06-18 Asml Netherlands Bv Diffraction based overlay metrology tool and method of diffraction based overlay metrology.
NL1036734A1 (nl) 2008-04-09 2009-10-12 Asml Netherlands Bv A method of assessing a model, an inspection apparatus and a lithographic apparatus.
NL1036857A1 (nl) 2008-04-21 2009-10-22 Asml Netherlands Bv Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method.
CN102171618B (zh) 2008-10-06 2014-03-19 Asml荷兰有限公司 使用二维目标的光刻聚焦和剂量测量
KR101429629B1 (ko) 2009-07-31 2014-08-12 에이에스엠엘 네델란즈 비.브이. 계측 방법 및 장치, 리소그래피 시스템, 및 리소그래피 처리 셀
WO2012022584A1 (en) 2010-08-18 2012-02-23 Asml Netherlands B.V. Substrate for use in metrology, metrology method and device manufacturing method
US10801975B2 (en) 2012-05-08 2020-10-13 Kla-Tencor Corporation Metrology tool with combined X-ray and optical scatterometers
US8848277B2 (en) * 2012-05-31 2014-09-30 Asml Netherlands B.V. System and method for protecting a seed laser in an EUV light source with a Bragg AOM
US10013518B2 (en) 2012-07-10 2018-07-03 Kla-Tencor Corporation Model building and analysis engine for combined X-ray and optical metrology
IL297220B2 (he) 2014-11-26 2024-06-01 Asml Netherlands Bv שיטה מטרולוגית, תוצר מחשב ומערכת
JP6602388B6 (ja) 2015-03-25 2020-01-15 エーエスエムエル ネザーランズ ビー．ブイ． メトロロジ方法、メトロロジ装置、及びデバイス製造装置
NL2016937A (en) 2015-06-17 2016-12-22 Asml Netherlands Bv Recipe selection based on inter-recipe consistency
US10401735B2 (en) * 2015-11-30 2019-09-03 Asml Netherlands B.V. Lithographic method and apparatus
CN113376975B (zh) 2015-12-23 2025-01-07 Asml荷兰有限公司 量测方法、量测设备、器件制造方法和计算机程序产品
EP3296723A1 (en) * 2016-09-14 2018-03-21 ASML Netherlands B.V. Illumination source for an inspection apparatus, inspection apparatus and inspection method
US11035804B2 (en) 2017-06-28 2021-06-15 Kla Corporation System and method for x-ray imaging and classification of volume defects
US10959318B2 (en) 2018-01-10 2021-03-23 Kla-Tencor Corporation X-ray metrology system with broadband laser produced plasma illuminator
EP3582009A1 (en) 2018-06-15 2019-12-18 ASML Netherlands B.V. Reflector and method of manufacturing a reflector
EP3719545A1 (en) * 2019-04-03 2020-10-07 ASML Netherlands B.V. Manufacturing a reflective diffraction grating
KR20240036031A (ko) * 2021-07-23 2024-03-19 에이에스엠엘 네델란즈 비.브이. 계측 방법 및 계측 디바이스

Also Published As

Publication number Publication date
WO2024170230A1 (en) 2024-08-22
CN120615181A (zh) 2025-09-09
TW202507421A (zh) 2025-02-16

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