IL310980A - Patterning device defect detection systems and methods - Google Patents

Patterning device defect detection systems and methods

Info

Publication number
IL310980A
IL310980A IL310980A IL31098024A IL310980A IL 310980 A IL310980 A IL 310980A IL 310980 A IL310980 A IL 310980A IL 31098024 A IL31098024 A IL 31098024A IL 310980 A IL310980 A IL 310980A
Authority
IL
Israel
Prior art keywords
methods
patterning device
defect detection
detection systems
device defect
Prior art date
Application number
IL310980A
Other languages
Hebrew (he)
Inventor
Lare Marie-Claire Van
Marco Jan-Jaco Wieland
Original Assignee
Asml Netherlands Bv
Van Lare Marie Claire
Wieland Marco Jan Jaco
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv, Van Lare Marie Claire, Wieland Marco Jan Jaco filed Critical Asml Netherlands Bv
Publication of IL310980A publication Critical patent/IL310980A/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/7065—Defects, e.g. optical inspection of patterned layer for defects
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/0002—Inspection of images, e.g. flaw detection
    • G06T7/0004—Industrial image inspection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N2021/95676—Masks, reticles, shadow masks
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/10—Image acquisition modality
    • G06T2207/10056—Microscopic image
    • G06T2207/10061—Microscopic image from scanning electron microscope
    • G—PHYSICS
    • G06—COMPUTING; CALCULATING OR COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T2207/00—Indexing scheme for image analysis or image enhancement
    • G06T2207/30—Subject of image; Context of image processing
    • G06T2207/30108—Industrial image inspection
    • G06T2207/30148—Semiconductor; IC; Wafer
IL310980A 2021-09-09 2022-08-15 Patterning device defect detection systems and methods IL310980A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP21195866.5A EP4148499A1 (en) 2021-09-09 2021-09-09 Patterning device defect detection systems and methods
PCT/EP2022/072752 WO2023036561A1 (en) 2021-09-09 2022-08-15 Patterning device defect detection systems and methods

Publications (1)

Publication Number Publication Date
IL310980A true IL310980A (en) 2024-04-01

Family

ID=77710584

Family Applications (1)

Application Number Title Priority Date Filing Date
IL310980A IL310980A (en) 2021-09-09 2022-08-15 Patterning device defect detection systems and methods

Country Status (5)

Country Link
EP (1) EP4148499A1 (en)
CN (1) CN117918007A (en)
IL (1) IL310980A (en)
TW (1) TW202326293A (en)
WO (1) WO2023036561A1 (en)

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5229872A (en) 1992-01-21 1993-07-20 Hughes Aircraft Company Exposure device including an electrically aligned electronic mask for micropatterning
JPH09211840A (en) * 1996-02-05 1997-08-15 Matsushita Electric Ind Co Ltd Inspection method and inspection device for reticle as well as inspection method and inspection device for pattern
US8213704B2 (en) * 2007-05-09 2012-07-03 Kla-Tencor Corp. Methods and systems for detecting defects in a reticle design pattern
US8041106B2 (en) * 2008-12-05 2011-10-18 Kla-Tencor Corp. Methods and systems for detecting defects on a reticle
US10395358B2 (en) * 2016-11-10 2019-08-27 Kla-Tencor Corp. High sensitivity repeater defect detection

Also Published As

Publication number Publication date
CN117918007A (en) 2024-04-23
EP4148499A1 (en) 2023-03-15
WO2023036561A1 (en) 2023-03-16
TW202326293A (en) 2023-07-01

Similar Documents

Publication Publication Date Title
EP4081938A4 (en) Systems and methods for pose detection and measurement
EP3716142A4 (en) Entry/departure status detection method and device
EP4109822A4 (en) Fault detection method and device
EP3995978A4 (en) Abnormality detection device and abnormality detection method
EP3716714A4 (en) Method and device for signal detection
SG11202100089PA (en) Detection device and detection method
EP3805735A4 (en) Defect detection method and device
ZA202004651B (en) Systems and methods for device detection and registration
EP3818423A4 (en) Moving device and object detection method thereof
SG11202011193PA (en) Detection device and detection system
SG11202011154RA (en) Detection device and detection system
EP3826203A4 (en) Signal detection device and signal detection method
EP3879370A4 (en) Abnormality detection device and abnormality detection method
EP3805728A4 (en) Abnormality detection device and abnormality detection method
EP4167506A4 (en) In-situ flow detection method and related device
EP3934240A4 (en) Unattended object detection device and unattended object detection method
EP4095550A4 (en) Detection method and device
IL307518A (en) Anomaly detection systems and methods
EP4261965A4 (en) Offset detection method and offset detection device
ZA201905508B (en) Device for detecting rail defects and associated detection method
EP3886374A4 (en) Abnormality detection method and abnormality detection device
EP3816829A4 (en) Detection device and detection method
PL3603389T3 (en) Agricultural detection device and method for detecting agricultural objects
IL310980A (en) Patterning device defect detection systems and methods
EP3778156A4 (en) Abnormality detection device and abnormality detection method