IL289986A - Micromirror arrays - Google Patents

Micromirror arrays

Info

Publication number
IL289986A
IL289986A IL289986A IL28998622A IL289986A IL 289986 A IL289986 A IL 289986A IL 289986 A IL289986 A IL 289986A IL 28998622 A IL28998622 A IL 28998622A IL 289986 A IL289986 A IL 289986A
Authority
IL
Israel
Prior art keywords
micromirror arrays
micromirror
arrays
Prior art date
Application number
IL289986A
Other languages
Hebrew (he)
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of IL289986A publication Critical patent/IL289986A/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G02B26/085—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD the reflecting means being moved or deformed by electromagnetic means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B3/00—Devices comprising flexible or deformable elements, e.g. comprising elastic tongues or membranes
    • B81B3/0018—Structures acting upon the moving or flexible element for transforming energy into mechanical movement or vice versa, i.e. actuators, sensors, generators
    • B81B3/0021—Transducers for transforming electrical into mechanical energy or vice versa
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B7/00—Microstructural systems ; Auxiliary parts of microstructural devices or systems
    • B81B7/0083—Temperature control
    • B81B7/0087—On-device systems and sensors for controlling, regulating or monitoring
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2201/00—Specific applications of microelectromechanical systems
    • B81B2201/04—Optical MEMS
    • B81B2201/042—Micromirrors, not used as optical switches
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2203/00—Basic microelectromechanical structures
    • B81B2203/01—Suspended structures, i.e. structures allowing a movement
    • B81B2203/0136—Comb structures
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B2203/00—Basic microelectromechanical structures
    • B81B2203/01—Suspended structures, i.e. structures allowing a movement
    • B81B2203/0145—Flexible holders
    • B81B2203/0163—Spring holders

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
IL289986A 2019-08-19 2022-01-19 Micromirror arrays IL289986A (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP19192294 2019-08-19
EP19199722 2019-09-26
PCT/EP2020/072006 WO2021032484A1 (en) 2019-08-19 2020-08-05 Micromirror arrays

Publications (1)

Publication Number Publication Date
IL289986A true IL289986A (en) 2022-03-01

Family

ID=71899780

Family Applications (1)

Application Number Title Priority Date Filing Date
IL289986A IL289986A (en) 2019-08-19 2022-01-19 Micromirror arrays

Country Status (9)

Country Link
US (1) US12259546B2 (en)
EP (1) EP4018265A1 (en)
JP (1) JP7550214B2 (en)
KR (1) KR102901745B1 (en)
CN (1) CN114341700B (en)
IL (1) IL289986A (en)
NL (1) NL2026217A (en)
TW (1) TWI859302B (en)
WO (1) WO2021032484A1 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2023506671A (en) * 2019-08-19 2023-02-20 エーエスエムエル ネザーランズ ビー．ブイ． micromirror array
IT202100013106A1 (en) * 2021-05-20 2022-11-20 St Microelectronics Srl MICROELECTROMECHANICAL MIRROR DEVICE WITH PIEZOELECTRIC ACTUATION AND PIEZORESISTIVE DETECTION WITH SELF-CALIBRATION PROPERTIES
CN115373134A (en) * 2021-05-20 2022-11-22 意法半导体股份有限公司 Piezoelectric actuated and piezoresistive sensing micro-electromechanical mirror device with self-calibration properties
DE102022209413A1 (en) * 2022-09-09 2024-03-14 Carl Zeiss Smt Gmbh Microelectromechanical device with heating element
DE102022209935A1 (en) 2022-09-21 2024-03-21 Carl Zeiss Smt Gmbh Device for stress-reduced storage of MEMS-based micromirrors

Family Cites Families (37)

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US5523193A (en) 1988-05-31 1996-06-04 Texas Instruments Incorporated Method and apparatus for patterning and imaging member
DE59105735D1 (en) 1990-05-02 1995-07-20 Fraunhofer Ges Forschung EXPOSURE DEVICE.
FR2667972B1 (en) 1990-10-12 1992-11-27 Thomson Csf COLOR IMAGE VIEWING DEVICE.
ATE216091T1 (en) 1997-01-29 2002-04-15 Micronic Laser Systems Ab METHOD AND DEVICE FOR GENERATING A PATTERN ON A SUBSTRATE COATED WITH PHOTORESIST USING A FOCUSED LASER BEAM
SE509062C2 (en) 1997-02-28 1998-11-30 Micronic Laser Systems Ab Data conversion method for a multi-beam laser printer for very complex microcolytographic designs
JP3065611B1 (en) 1999-05-28 2000-07-17 三菱電機株式会社 Micromirror device and manufacturing method thereof
US6480320B2 (en) * 2001-02-07 2002-11-12 Transparent Optical, Inc. Microelectromechanical mirror and mirror array
US20020122237A1 (en) * 2001-03-01 2002-09-05 Torbjorn Sandstrom Method and apparatus for spatial light modulation
CN100376918C (en) * 2001-12-26 2008-03-26 株式会社尼康 Light beam switching/adjusting device and manufacturing method thereof
US20040160118A1 (en) 2002-11-08 2004-08-19 Knollenberg Clifford F. Actuator apparatus and method for improved deflection characteristics
US6844953B2 (en) * 2003-03-12 2005-01-18 Hewlett-Packard Development Company, L.P. Micro-mirror device including dielectrophoretic liquid
CN100378496C (en) * 2003-06-02 2008-04-02 明锐有限公司 High-fill-factor reflective spatial light modulator with hidden hinge
US6861277B1 (en) * 2003-10-02 2005-03-01 Hewlett-Packard Development Company, L.P. Method of forming MEMS device
WO2005102909A1 (en) * 2004-04-22 2005-11-03 Matsushita Electric Industrial Co., Ltd. Actuator
EP1591824B1 (en) * 2004-04-26 2012-05-09 Panasonic Corporation Microactuator
US7344262B2 (en) 2004-09-29 2008-03-18 Lucent Technologies Inc. MEMS mirror with tip or piston motion for use in adaptive optics
US7855825B2 (en) 2005-04-15 2010-12-21 Panasonic Corporation Micromachine structure system and method for manufacturing same
US7139113B1 (en) * 2005-07-29 2006-11-21 Texas Instruments Incorporated Digital micro-mirror device with free standing spring tips and distributed address electrodes
US7518780B2 (en) * 2005-08-08 2009-04-14 Lawrence Livermore National Laboratory, Llc Nanolaminate deformable mirrors
JP5194030B2 (en) * 2007-02-06 2013-05-08 カール・ツァイス・エスエムティー・ゲーエムベーハー Method and apparatus for monitoring a multi-mirror array in an illumination system of a microlithographic projection exposure apparatus
NL1036786A1 (en) 2008-05-08 2009-11-11 Asml Netherlands Bv Lithographic apparatus and method.
DE102008049556B4 (en) * 2008-09-30 2011-07-07 Carl Zeiss SMT GmbH, 73447 Microlithographic projection exposure machine
WO2010138968A2 (en) 2009-05-29 2010-12-02 University Of Florida Research Foundation, Inc. Method and apparatus for providing high-fill-factor micromirror/micromirror arrays with surface mounting capability
WO2012062858A1 (en) 2010-11-12 2012-05-18 Asml Netherlands B.V. Metrology method and apparatus, lithographic system and device manufacturing method
DE102011003928B4 (en) 2011-02-10 2012-10-31 Carl Zeiss Smt Gmbh Illumination optics for projection lithography
JP5739224B2 (en) 2011-05-16 2015-06-24 浜松ホトニクス株式会社 Optical component manufacturing method and optical component
DE102012223034A1 (en) 2012-12-13 2013-12-12 Carl Zeiss Smt Gmbh Illumination system for extreme UV-projection exposure system used for projecting reflecting structures arranged on lower side in mask on photo resist, has solid body joint including three joint legs, which bend during deflecting rod
DE102013206531A1 (en) * 2013-04-12 2014-05-08 Carl Zeiss Smt Gmbh Device for displacing micromirror in optical module of illumination system, has compensating unit compensating linear displacement of micromirror or predetermined pivot axis during pivoting of micromirror
CN103336363B (en) 2013-06-06 2015-08-19 上海交通大学 Full aluminium profiles electrostatic drives micro mirror and preparation method thereof
US10444492B2 (en) * 2013-07-16 2019-10-15 Lawrence Livermore National Security, Llc Flexure-based, tip-tilt-piston actuation micro-array
US9874817B2 (en) 2013-08-26 2018-01-23 Nikon Corporation Microelectromechanical mirror assembly
US9670056B2 (en) 2014-01-31 2017-06-06 Stmicroelectronics S.R.L. Electrostatically driven MEMS device
NL2015160A (en) * 2014-07-28 2016-07-07 Asml Netherlands Bv Illumination system, inspection apparatus including such an illumination system, inspection method and manufacturing method.
DE102015204874A1 (en) * 2015-03-18 2016-09-22 Carl Zeiss Smt Gmbh Device for pivoting a mirror element with two pivoting degrees of freedom
CN107539945B (en) * 2016-06-28 2020-04-21 华为技术有限公司 Micromirror unit and preparation method, micromirror array and optical cross connection module
DE102016223657A1 (en) 2016-11-29 2017-01-12 Carl Zeiss Smt Gmbh Assembly of an optical system, in particular in a microlithographic projection exposure apparatus
US11279613B2 (en) * 2017-08-02 2022-03-22 Government Of The United States, As Represented By The Secretary Of The Air Force MEMS device for large angle beamsteering

Also Published As

Publication number Publication date
KR20220044962A (en) 2022-04-12
TWI859302B (en) 2024-10-21
CN114341700A (en) 2022-04-12
NL2026217A (en) 2021-02-24
US20220342199A1 (en) 2022-10-27
US12259546B2 (en) 2025-03-25
JP7550214B2 (en) 2024-09-12
WO2021032484A1 (en) 2021-02-25
TW202113502A (en) 2021-04-01
KR102901745B1 (en) 2025-12-17
JP2022544747A (en) 2022-10-21
EP4018265A1 (en) 2022-06-29
CN114341700B (en) 2024-08-09

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