IL274772B - Inspection system and method of inspection - Google Patents

Inspection system and method of inspection

Info

Publication number
IL274772B
IL274772B IL274772A IL27477220A IL274772B IL 274772 B IL274772 B IL 274772B IL 274772 A IL274772 A IL 274772A IL 27477220 A IL27477220 A IL 27477220A IL 274772 B IL274772 B IL 274772B
Authority
IL
Israel
Prior art keywords
inspection
inspection system
Prior art date
Application number
IL274772A
Other languages
Hebrew (he)
Other versions
IL274772A (en
Original Assignee
Machine Vision Lighting Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Machine Vision Lighting Inc filed Critical Machine Vision Lighting Inc
Publication of IL274772A publication Critical patent/IL274772A/en
Publication of IL274772B publication Critical patent/IL274772B/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/24—Measuring arrangements characterised by the use of optical techniques for measuring contours or curvatures
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/25—Colour; Spectral properties, i.e. comparison of effect of material on the light at two or more different wavelengths or wavelength bands
    • G01N21/255—Details, e.g. use of specially adapted sources, lighting or optical systems
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/93—Detection standards; Calibrating baseline adjustment, drift correction
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/0004—Microscopes specially adapted for specific applications
    • G02B21/0016—Technical microscopes, e.g. for inspection or measuring in industrial production processes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/28—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 for polarising
    • G02B27/288—Filters employing polarising elements, e.g. Lyot or Solc filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/205—Neutral density filters
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/30—Polarising elements
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G01N2021/8845—Multiple wavelengths of illumination or detection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8806—Specially adapted optical and illumination features
    • G01N2021/8848—Polarisation of light
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G01N2021/8854—Grading and classifying of flaws
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • G01N2021/95676—Masks, reticles, shadow masks
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/06—Means for illuminating specimens
    • G02B21/08—Condensers
    • G02B21/082—Condensers for incident illumination only

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Analytical Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Immunology (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Pathology (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Signal Processing (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Length Measuring Devices By Optical Means (AREA)
IL274772A 2017-12-05 2020-05-19 Inspection system and method of inspection IL274772B (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2017233858A JP6451821B1 (en) 2017-12-05 2017-12-05 Inspection system and inspection method
PCT/JP2018/010667 WO2019111426A1 (en) 2017-12-05 2018-03-17 Inspection system and inspection method

Publications (2)

Publication Number Publication Date
IL274772A IL274772A (en) 2020-07-30
IL274772B true IL274772B (en) 2021-07-29

Family

ID=65020432

Family Applications (1)

Application Number Title Priority Date Filing Date
IL274772A IL274772B (en) 2017-12-05 2020-05-19 Inspection system and method of inspection

Country Status (8)

Country Link
US (1) US10883944B2 (en)
EP (1) EP3620777B1 (en)
JP (1) JP6451821B1 (en)
KR (1) KR102061163B1 (en)
CN (1) CN110691966B (en)
IL (1) IL274772B (en)
SG (1) SG11202003241TA (en)
WO (1) WO2019111426A1 (en)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110068534A (en) * 2019-05-17 2019-07-30 北京领邦智能装备股份公司 Detection accurate electro-optical device and measuring instrument out
JP2021085815A (en) * 2019-11-29 2021-06-03 シーシーエス株式会社 Light irradiation device, inspection system, and light irradiation method
WO2021107027A1 (en) * 2019-11-29 2021-06-03 マシンビジョンライティング株式会社 Shape reconstruction method and image measurement device
JP6799272B1 (en) * 2020-06-14 2020-12-16 マシンビジョンライティング株式会社 Inspection measurement system and inspection measurement method
CN114144661B (en) * 2020-06-14 2023-11-17 机械视觉照明有限公司 Lighting device for inspection and measurement, inspection and measurement system, and inspection and measurement method
JP7206020B2 (en) 2020-11-17 2023-01-17 マシンビジョンライティング株式会社 Image observation device and its illumination optical system
WO2022113369A1 (en) * 2020-11-30 2022-06-02 ヤマハ発動機株式会社 Mounting-board inspection apparatus and inspection apparatus
JP2023019494A (en) * 2021-07-29 2023-02-09 パナソニックＩｐマネジメント株式会社 inspection system
JP7714493B2 (en) * 2022-03-22 2025-07-29 株式会社東芝 Optical inspection device and optical inspection method
WO2024014273A1 (en) * 2022-07-13 2024-01-18 パナソニックＩｐマネジメント株式会社 Inspection system, and method for correcting angle of inclination of object surface using same
JPWO2024116634A1 (en) * 2022-11-28 2024-06-06
JPWO2024116674A1 (en) * 2022-11-29 2024-06-06
JP7458617B1 (en) * 2023-12-02 2024-04-01 マシンビジョンライティング株式会社 Inspection lighting equipment, illumination optical system, and inspection system

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07306023A (en) * 1994-05-10 1995-11-21 Shigeki Kobayashi Shape measuring instrument, inspection device, and product manufacturing method
US6201601B1 (en) * 1997-09-19 2001-03-13 Kla-Tencor Corporation Sample inspection system
US7289222B1 (en) 2003-10-31 2007-10-30 Carl Zeiss Smt Ag Interferometer apparatus and method of processing a substrate having an optical surface
US7295303B1 (en) * 2004-03-25 2007-11-13 Kla-Tencor Technologies Corporation Methods and apparatus for inspecting a sample
WO2006002150A1 (en) * 2004-06-22 2006-01-05 Applied Materials Israel, Ltd. Wafer inspection system
US7924517B2 (en) * 2006-06-21 2011-04-12 Applied Materials Israel, Ltd. Spatial filter, a system and method for collecting light from an object
JP4719284B2 (en) 2008-10-10 2011-07-06 トヨタ自動車株式会社 Surface inspection device
JP5170154B2 (en) * 2010-04-26 2013-03-27 オムロン株式会社 Shape measuring apparatus and calibration method
JP5895305B2 (en) * 2011-12-06 2016-03-30 シーシーエス株式会社 Inspection illumination device and inspection illumination method
JP6086362B2 (en) * 2012-12-03 2017-03-01 シーシーエス株式会社 Inspection system and illumination device for inspection
US9726617B2 (en) * 2013-06-04 2017-08-08 Kla-Tencor Corporation Apparatus and methods for finding a best aperture and mode to enhance defect detection
JP5866573B1 (en) * 2015-03-23 2016-02-17 マシンビジョンライティング株式会社 Inspection lighting device and inspection system
JP5866586B1 (en) 2015-09-22 2016-02-17 マシンビジョンライティング株式会社 Inspection lighting device and inspection system

Also Published As

Publication number Publication date
US20200158657A1 (en) 2020-05-21
WO2019111426A1 (en) 2019-06-13
JP2019100930A (en) 2019-06-24
JP6451821B1 (en) 2019-01-16
IL274772A (en) 2020-07-30
EP3620777B1 (en) 2024-06-05
EP3620777C0 (en) 2024-06-05
CN110691966B (en) 2022-08-12
US10883944B2 (en) 2021-01-05
SG11202003241TA (en) 2020-05-28
KR20190138868A (en) 2019-12-16
EP3620777A1 (en) 2020-03-11
KR102061163B1 (en) 2019-12-31
CN110691966A (en) 2020-01-14
EP3620777A4 (en) 2020-09-23

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