IL160585A0 - Laser lithography light source with beam delivery - Google Patents

Laser lithography light source with beam delivery

Info

Publication number
IL160585A0
IL160585A0 IL16058502A IL16058502A IL160585A0 IL 160585 A0 IL160585 A0 IL 160585A0 IL 16058502 A IL16058502 A IL 16058502A IL 16058502 A IL16058502 A IL 16058502A IL 160585 A0 IL160585 A0 IL 160585A0
Authority
IL
Israel
Prior art keywords
light source
beam delivery
laser lithography
lithography light
laser
Prior art date
Application number
IL16058502A
Other languages
English (en)
Original Assignee
Cymer Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US09/943,343 external-priority patent/US6567450B2/en
Priority claimed from US10/000,991 external-priority patent/US6795474B2/en
Priority claimed from US10/006,913 external-priority patent/US6535531B1/en
Priority claimed from US10/036,676 external-priority patent/US6882674B2/en
Priority claimed from US10/036,727 external-priority patent/US6865210B2/en
Application filed by Cymer Inc filed Critical Cymer Inc
Publication of IL160585A0 publication Critical patent/IL160585A0/xx

Links

Classifications

    • H—ELECTRICITY
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    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
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    • H01S3/03—Constructional details of gas laser discharge tubes
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
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    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70025—Production of exposure light, i.e. light sources by lasers
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    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70008—Production of exposure light, i.e. light sources
    • G03F7/70041—Production of exposure light, i.e. light sources by pulsed sources, e.g. multiplexing, pulse duration, interval control or intensity control
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    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
    • H01S3/2256—KrF, i.e. krypton fluoride is comprised for lasing around 248 nm
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
    • H01S3/2258—F2, i.e. molecular fluoride is comprised for lasing around 157 nm

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  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Lasers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
IL16058502A 2001-08-29 2002-08-19 Laser lithography light source with beam delivery IL160585A0 (en)

Applications Claiming Priority (7)

Application Number Priority Date Filing Date Title
US09/943,343 US6567450B2 (en) 1999-12-10 2001-08-29 Very narrow band, two chamber, high rep rate gas discharge laser system
US10/000,991 US6795474B2 (en) 2000-11-17 2001-11-14 Gas discharge laser with improved beam path
US10/006,913 US6535531B1 (en) 2001-11-29 2001-11-29 Gas discharge laser with pulse multiplier
US10/036,676 US6882674B2 (en) 1999-12-27 2001-12-21 Four KHz gas discharge laser system
US10/036,727 US6865210B2 (en) 2001-05-03 2001-12-21 Timing control for two-chamber gas discharge laser system
US10/141,216 US6693939B2 (en) 2001-01-29 2002-05-07 Laser lithography light source with beam delivery
PCT/US2002/026400 WO2003021732A1 (en) 2001-08-29 2002-08-19 Laser lithography light source with beam delivery

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Publication Number Publication Date
IL160585A0 true IL160585A0 (en) 2004-07-25

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IL16058502A IL160585A0 (en) 2001-08-29 2002-08-19 Laser lithography light source with beam delivery

Country Status (7)

Country Link
US (1) US6693939B2 (ko)
EP (1) EP1421653A4 (ko)
JP (2) JP4290001B2 (ko)
KR (1) KR100909018B1 (ko)
CA (1) CA2458111A1 (ko)
IL (1) IL160585A0 (ko)
WO (1) WO2003021732A1 (ko)

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Publication number Publication date
CA2458111A1 (en) 2003-03-13
US20020191654A1 (en) 2002-12-19
JP4290001B2 (ja) 2009-07-01
JP4705082B2 (ja) 2011-06-22
EP1421653A4 (en) 2006-07-05
JP2005502211A (ja) 2005-01-20
EP1421653A1 (en) 2004-05-26
US6693939B2 (en) 2004-02-17
JP2008034871A (ja) 2008-02-14
KR20040047802A (ko) 2004-06-05
KR100909018B1 (ko) 2009-07-22
WO2003021732A1 (en) 2003-03-13

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