IL160477A0 - A method and a system for real-time defects verification - Google Patents

A method and a system for real-time defects verification

Info

Publication number
IL160477A0
IL160477A0 IL16047704A IL16047704A IL160477A0 IL 160477 A0 IL160477 A0 IL 160477A0 IL 16047704 A IL16047704 A IL 16047704A IL 16047704 A IL16047704 A IL 16047704A IL 160477 A0 IL160477 A0 IL 160477A0
Authority
IL
Israel
Prior art keywords
verification
real
time defects
defects
time
Prior art date
Application number
IL16047704A
Original Assignee
Camtek Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Camtek Ltd filed Critical Camtek Ltd
Priority to IL16047704A priority Critical patent/IL160477A0/en
Publication of IL160477A0 publication Critical patent/IL160477A0/en
Priority to PCT/IL2005/000202 priority patent/WO2005079154A2/en

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501Semiconductor wafers
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/95Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956Inspecting patterns on the surface of objects
    • G01N21/95684Patterns showing highly reflecting parts, e.g. metallic elements
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01NINVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84Systems specially adapted for particular applications
    • G01N21/88Investigating the presence of flaws or contamination
    • G01N21/8851Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G01N2021/8854Grading and classifying of flaws
IL16047704A 2004-02-19 2004-02-19 A method and a system for real-time defects verification IL160477A0 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
IL16047704A IL160477A0 (en) 2004-02-19 2004-02-19 A method and a system for real-time defects verification
PCT/IL2005/000202 WO2005079154A2 (en) 2004-02-19 2005-02-17 A method and a system for real-time defects verification

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IL16047704A IL160477A0 (en) 2004-02-19 2004-02-19 A method and a system for real-time defects verification

Publications (1)

Publication Number Publication Date
IL160477A0 true IL160477A0 (en) 2004-07-25

Family

ID=34073867

Family Applications (1)

Application Number Title Priority Date Filing Date
IL16047704A IL160477A0 (en) 2004-02-19 2004-02-19 A method and a system for real-time defects verification

Country Status (2)

Country Link
IL (1) IL160477A0 (en)
WO (1) WO2005079154A2 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9885671B2 (en) 2014-06-09 2018-02-06 Kla-Tencor Corporation Miniaturized imaging apparatus for wafer edge
US9645097B2 (en) 2014-06-20 2017-05-09 Kla-Tencor Corporation In-line wafer edge inspection, wafer pre-alignment, and wafer cleaning
CN107389689B (en) * 2017-07-26 2020-05-22 武汉精测电子集团股份有限公司 AOI management system and management method for defect detection
CN109633937A (en) * 2018-12-10 2019-04-16 武汉精立电子技术有限公司 It is a kind of to sentence system again online
CN112697813A (en) * 2020-12-24 2021-04-23 江苏汇成光电有限公司 AOI special scanning operation method
CN112712149B (en) * 2020-12-30 2022-12-02 盛泰光电科技股份有限公司 Production information management system based on two-dimensional code recognition

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IL79097A0 (en) * 1985-06-17 1986-09-30 Visionetics Corp Automatic optical inspection of printed circuit boards
US6476913B1 (en) * 1998-11-30 2002-11-05 Hitachi, Ltd. Inspection method, apparatus and system for circuit pattern
US6597381B1 (en) * 1999-07-24 2003-07-22 Intelligent Reasoning Systems, Inc. User interface for automated optical inspection systems
DE10010241C1 (en) * 2000-03-02 2001-03-01 Siemens Ag Shipment addresses reading method
IL149588A (en) * 2001-05-11 2007-07-24 Orbotech Ltd Image searching defect detector
US7042564B2 (en) * 2002-08-08 2006-05-09 Applied Materials, Israel, Ltd. Wafer inspection methods and an optical inspection tool
US7203355B2 (en) * 2002-12-24 2007-04-10 Orbotech Ltd. Automatic optical inspection system and method

Also Published As

Publication number Publication date
WO2005079154A2 (en) 2005-09-01
WO2005079154A3 (en) 2007-05-24

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