IL159935A0 - Method and apparatus for producing uniform process rates - Google Patents

Method and apparatus for producing uniform process rates

Info

Publication number
IL159935A0
IL159935A0 IL15993502A IL15993502A IL159935A0 IL 159935 A0 IL159935 A0 IL 159935A0 IL 15993502 A IL15993502 A IL 15993502A IL 15993502 A IL15993502 A IL 15993502A IL 159935 A0 IL159935 A0 IL 159935A0
Authority
IL
Israel
Prior art keywords
producing uniform
uniform process
process rates
rates
producing
Prior art date
Application number
IL15993502A
Other languages
English (en)
Original Assignee
Lam Res Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Lam Res Corp filed Critical Lam Res Corp
Publication of IL159935A0 publication Critical patent/IL159935A0/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32467—Material

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Drying Of Semiconductors (AREA)
  • Plasma Technology (AREA)
  • Variable-Direction Aerials And Aerial Arrays (AREA)
IL15993502A 2001-07-27 2002-07-18 Method and apparatus for producing uniform process rates IL159935A0 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US30846901P 2001-07-27 2001-07-27
US10/033,807 US6518705B2 (en) 1999-11-15 2001-12-18 Method and apparatus for producing uniform process rates
PCT/US2002/023092 WO2003012821A2 (en) 2001-07-27 2002-07-18 Method and apparatus for producing uniform process rates

Publications (1)

Publication Number Publication Date
IL159935A0 true IL159935A0 (en) 2004-06-20

Family

ID=26710153

Family Applications (1)

Application Number Title Priority Date Filing Date
IL15993502A IL159935A0 (en) 2001-07-27 2002-07-18 Method and apparatus for producing uniform process rates

Country Status (9)

Country Link
US (2) US6518705B2 (de)
EP (1) EP1412963B1 (de)
JP (1) JP4378169B2 (de)
KR (1) KR100887910B1 (de)
CN (1) CN1309001C (de)
AU (1) AU2002322547A1 (de)
IL (1) IL159935A0 (de)
TW (1) TW564574B (de)
WO (1) WO2003012821A2 (de)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6744213B2 (en) * 1999-11-15 2004-06-01 Lam Research Corporation Antenna for producing uniform process rates
CA2432068C (en) * 2000-12-27 2008-10-07 Japan Science And Technology Corporation Plasma generator
US6731059B2 (en) * 2002-01-29 2004-05-04 Osram Sylvania Inc. Magnetically transparent electrostatic shield
US20070247371A1 (en) * 2006-04-25 2007-10-25 Waldemar Kunysz Dual sphere uwb antenna
US20080118663A1 (en) * 2006-10-12 2008-05-22 Applied Materials, Inc. Contamination reducing liner for inductively coupled chamber
CN101543141B (zh) * 2006-11-28 2013-07-17 莎姆克株式会社 等离子处理装置
WO2008127158A1 (en) * 2007-04-11 2008-10-23 Telefonaktiebolaget Lm Ericsson (Publ) Arrangement and method for simulating a radio access network
JPWO2009081761A1 (ja) * 2007-12-20 2011-05-06 株式会社アルバック プラズマソース機構及び成膜装置
US20090220865A1 (en) * 2008-02-29 2009-09-03 Applied Materials, Inc. Method and apparatus for source field shaping in a plasma etch reactor
US20110284167A1 (en) 2009-01-15 2011-11-24 Ryoji Nishio Plasma processing equipment and plasma generation equipment
JP5410950B2 (ja) * 2009-01-15 2014-02-05 株式会社日立ハイテクノロジーズ プラズマ処理装置
US9313872B2 (en) 2009-10-27 2016-04-12 Tokyo Electron Limited Plasma processing apparatus and plasma processing method
KR101757921B1 (ko) 2009-10-27 2017-07-14 도쿄엘렉트론가부시키가이샤 플라즈마 처리 장치 및 플라즈마 처리 방법
JP5592098B2 (ja) 2009-10-27 2014-09-17 東京エレクトロン株式会社 プラズマ処理装置及びプラズマ処理方法
US8741097B2 (en) 2009-10-27 2014-06-03 Tokyo Electron Limited Plasma processing apparatus and plasma processing method
JP5554047B2 (ja) * 2009-10-27 2014-07-23 東京エレクトロン株式会社 プラズマ処理装置
US8749446B2 (en) * 2011-07-29 2014-06-10 The Boeing Company Wide-band linked-ring antenna element for phased arrays
KR101853370B1 (ko) * 2011-09-16 2018-04-30 세메스 주식회사 안테나 구조체 및 플라즈마 발생 장치
US20130098871A1 (en) 2011-10-19 2013-04-25 Fei Company Internal Split Faraday Shield for an Inductively Coupled Plasma Source
KR102171725B1 (ko) * 2013-06-17 2020-10-29 어플라이드 머티어리얼스, 인코포레이티드 플라즈마 반응기를 위한 강화된 플라즈마 소스
US9660314B1 (en) * 2013-07-24 2017-05-23 Hrl Laboratories, Llc High efficiency plasma tunable antenna and plasma tuned delay line phaser shifter
KR20150088453A (ko) * 2014-01-24 2015-08-03 한국전자통신연구원 다중 대역 플라즈마 루프 안테나
CN107301943A (zh) * 2017-07-27 2017-10-27 北京北方华创微电子装备有限公司 法拉第屏蔽件及反应腔室
CN109681398B (zh) * 2018-12-12 2020-08-28 上海航天控制技术研究所 一种新型微波ecr离子推力器放电室
JP7225058B2 (ja) 2019-08-19 2023-02-20 株式会社東芝 高周波アンテナ及びプラズマ処理装置
CN111785605A (zh) * 2020-06-23 2020-10-16 北京北方华创微电子装备有限公司 一种线圈结构及半导体加工设备
US12451327B2 (en) * 2022-02-03 2025-10-21 Tokyo Electron Limited Apparatus for plasma processing
US12074390B2 (en) 2022-11-11 2024-08-27 Tokyo Electron Limited Parallel resonance antenna for radial plasma control

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5643394A (en) * 1994-09-16 1997-07-01 Applied Materials, Inc. Gas injection slit nozzle for a plasma process reactor
JP3153743B2 (ja) * 1995-08-31 2001-04-09 東京エレクトロン株式会社 プラズマ処理装置
CA2207154A1 (en) * 1996-06-10 1997-12-10 Lam Research Corporation Inductively coupled source for deriving substantially uniform plasma flux
JP3739137B2 (ja) * 1996-06-18 2006-01-25 日本電気株式会社 プラズマ発生装置及びこのプラズマ発生装置を使用した表面処理装置
CN1118090C (zh) * 1997-03-17 2003-08-13 松下电器产业株式会社 等离子体处理方法及装置
US6028395A (en) * 1997-09-16 2000-02-22 Lam Research Corporation Vacuum plasma processor having coil with added conducting segments to its peripheral part
JPH11135438A (ja) * 1997-10-28 1999-05-21 Nippon Asm Kk 半導体プラズマ処理装置
US6320320B1 (en) 1999-11-15 2001-11-20 Lam Research Corporation Method and apparatus for producing uniform process rates
US6322661B1 (en) 1999-11-15 2001-11-27 Lam Research Corporation Method and apparatus for controlling the volume of a plasma
US6302966B1 (en) 1999-11-15 2001-10-16 Lam Research Corporation Temperature control system for plasma processing apparatus
US6341574B1 (en) 1999-11-15 2002-01-29 Lam Research Corporation Plasma processing systems

Also Published As

Publication number Publication date
JP4378169B2 (ja) 2009-12-02
US20030145952A1 (en) 2003-08-07
CN1555568A (zh) 2004-12-15
WO2003012821A3 (en) 2003-12-24
KR100887910B1 (ko) 2009-03-12
US20020175869A1 (en) 2002-11-28
US6518705B2 (en) 2003-02-11
AU2002322547A1 (en) 2003-02-17
KR20040015370A (ko) 2004-02-18
JP2004537830A (ja) 2004-12-16
EP1412963A2 (de) 2004-04-28
CN1309001C (zh) 2007-04-04
TW564574B (en) 2003-12-01
EP1412963B1 (de) 2013-03-20
WO2003012821A2 (en) 2003-02-13

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