IL156719A0 - A multi-stage open ion system in various topologies - Google Patents

A multi-stage open ion system in various topologies

Info

Publication number
IL156719A0
IL156719A0 IL15671903A IL15671903A IL156719A0 IL 156719 A0 IL156719 A0 IL 156719A0 IL 15671903 A IL15671903 A IL 15671903A IL 15671903 A IL15671903 A IL 15671903A IL 156719 A0 IL156719 A0 IL 156719A0
Authority
IL
Israel
Prior art keywords
ion system
various topologies
stage open
open ion
stage
Prior art date
Application number
IL15671903A
Original Assignee
Axiomic Technologies Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Axiomic Technologies Inc filed Critical Axiomic Technologies Inc
Priority to IL15671903A priority Critical patent/IL156719A0/en
Publication of IL156719A0 publication Critical patent/IL156719A0/en
Priority to PCT/IL2004/000580 priority patent/WO2005001020A2/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J41/00—Discharge tubes for measuring pressure of introduced gas or for detecting presence of gas; Discharge tubes for evacuation by diffusion of ions
    • H01J41/12—Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps
    • H01J41/14—Discharge tubes for evacuating by diffusion of ions, e.g. ion pumps, getter ion pumps with ionisation by means of thermionic cathodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/08—Ion sources; Ion guns
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32357—Generation remote from the workpiece, e.g. down-stream
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J7/00—Details not provided for in the preceding groups and common to two or more basic types of discharge tubes or lamps
    • H01J7/14—Means for obtaining or maintaining the desired pressure within the vessel
    • H01J7/16—Means for permitting pumping during operation of the tube or lamp

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Particle Accelerators (AREA)
IL15671903A 2003-06-30 2003-06-30 A multi-stage open ion system in various topologies IL156719A0 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
IL15671903A IL156719A0 (en) 2003-06-30 2003-06-30 A multi-stage open ion system in various topologies
PCT/IL2004/000580 WO2005001020A2 (en) 2003-06-30 2004-06-30 A multi-stage open ion system in various topologies

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
IL15671903A IL156719A0 (en) 2003-06-30 2003-06-30 A multi-stage open ion system in various topologies

Publications (1)

Publication Number Publication Date
IL156719A0 true IL156719A0 (en) 2004-01-04

Family

ID=32587687

Family Applications (1)

Application Number Title Priority Date Filing Date
IL15671903A IL156719A0 (en) 2003-06-30 2003-06-30 A multi-stage open ion system in various topologies

Country Status (2)

Country Link
IL (1) IL156719A0 (en)
WO (1) WO2005001020A2 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IL156719A0 (en) * 2003-06-30 2004-01-04 Axiomic Technologies Inc A multi-stage open ion system in various topologies
US7098667B2 (en) * 2003-12-31 2006-08-29 Fei Company Cold cathode ion gauge
US8575421B2 (en) 2007-12-20 2013-11-05 Basf Plant Science Gmbh Plants having enhanced yield-related traits and a method for making the same
DE102009005620B4 (en) * 2009-01-22 2010-12-30 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Method and arrangement for generating an electron beam

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5283177A (en) * 1975-12-31 1977-07-11 Fujitsu Ltd Electron beam exposure device
US4800100A (en) * 1987-10-27 1989-01-24 Massachusetts Institute Of Technology Combined ion and molecular beam apparatus and method for depositing materials
US5274306A (en) * 1990-08-31 1993-12-28 Kaufman & Robinson, Inc. Capacitively coupled radiofrequency plasma source
GB9021629D0 (en) * 1990-10-04 1990-11-21 Superion Ltd Apparatus for and method of producing ion beams
IT1246684B (en) * 1991-03-07 1994-11-24 Proel Tecnologie Spa CYCLOTRONIC RESONANCE IONIC PROPULSOR.
DE69205098T2 (en) * 1991-07-23 1996-02-29 Nissin Electric Co Ltd Ion source with mass separation device.
DE29507225U1 (en) * 1995-04-29 1995-07-13 Grünewald, Wolfgang, Dr.rer.nat., 09122 Chemnitz Ion beam preparation device for electron microscopy
JP3449198B2 (en) * 1997-10-22 2003-09-22 日新電機株式会社 Ion implanter
US6335534B1 (en) * 1998-04-17 2002-01-01 Kabushiki Kaisha Toshiba Ion implantation apparatus, ion generating apparatus and semiconductor manufacturing method with ion implantation processes
GB9813327D0 (en) * 1998-06-19 1998-08-19 Superion Ltd Apparatus and method relating to charged particles
US6335535B1 (en) * 1998-06-26 2002-01-01 Nissin Electric Co., Ltd Method for implanting negative hydrogen ion and implanting apparatus
IL156719A0 (en) * 2003-06-30 2004-01-04 Axiomic Technologies Inc A multi-stage open ion system in various topologies

Also Published As

Publication number Publication date
WO2005001020A2 (en) 2005-01-06
WO2005001020A3 (en) 2006-12-07

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