IL119265A0 - Electron beam evaporation apparatus and method - Google Patents

Electron beam evaporation apparatus and method

Info

Publication number
IL119265A0
IL119265A0 IL11926596A IL11926596A IL119265A0 IL 119265 A0 IL119265 A0 IL 119265A0 IL 11926596 A IL11926596 A IL 11926596A IL 11926596 A IL11926596 A IL 11926596A IL 119265 A0 IL119265 A0 IL 119265A0
Authority
IL
Israel
Prior art keywords
electron beam
beam evaporation
evaporation apparatus
electron
evaporation
Prior art date
Application number
IL11926596A
Other languages
English (en)
Original Assignee
Boc Group Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Boc Group Inc filed Critical Boc Group Inc
Publication of IL119265A0 publication Critical patent/IL119265A0/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H01J9/022—Manufacture of electrodes or electrode systems of cold cathodes
    • H01J9/025—Manufacture of electrodes or electrode systems of cold cathodes of field emission cathodes
    • H01L21/203—
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation
    • C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/31—Processing objects on a macro-scale
    • H01J2237/3132—Evaporating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Cold Cathode And The Manufacture (AREA)
IL11926596A 1995-11-30 1996-09-18 Electron beam evaporation apparatus and method IL119265A0 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US56504095A 1995-11-30 1995-11-30

Publications (1)

Publication Number Publication Date
IL119265A0 true IL119265A0 (en) 1996-12-05

Family

ID=24256963

Family Applications (1)

Application Number Title Priority Date Filing Date
IL11926596A IL119265A0 (en) 1995-11-30 1996-09-18 Electron beam evaporation apparatus and method

Country Status (5)

Country Link
EP (1) EP0777252A1 (fr)
JP (1) JPH09176839A (fr)
KR (1) KR970030276A (fr)
CA (1) CA2185640A1 (fr)
IL (1) IL119265A0 (fr)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4912599B2 (ja) * 2005-02-18 2012-04-11 株式会社アルバック 成膜方法
CN111218650A (zh) * 2020-01-13 2020-06-02 何元金 半导体薄膜制备装置及制备方法
JP7314209B2 (ja) * 2021-06-30 2023-07-25 キヤノントッキ株式会社 成膜装置、成膜方法及び蒸発源ユニット
JP7314210B2 (ja) * 2021-06-30 2023-07-25 キヤノントッキ株式会社 成膜装置、成膜方法及び蒸発源ユニット

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2711450B1 (fr) * 1993-10-18 1996-01-05 Pixel Int Sa Installation et procédé pour la fabrication d'écrans plats de visualisation.
FR2733253B1 (fr) * 1995-04-24 1997-06-13 Commissariat Energie Atomique Dispositif pour deposer un materiau par evaporation sur des substrats de grande surface

Also Published As

Publication number Publication date
EP0777252A1 (fr) 1997-06-04
CA2185640A1 (fr) 1997-05-31
JPH09176839A (ja) 1997-07-08
KR970030276A (ko) 1997-06-26

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