IL107901A - Device and method for measuring the thickness of thin membranes - Google Patents
Device and method for measuring the thickness of thin membranesInfo
- Publication number
- IL107901A IL107901A IL107901A IL10790193A IL107901A IL 107901 A IL107901 A IL 107901A IL 107901 A IL107901 A IL 107901A IL 10790193 A IL10790193 A IL 10790193A IL 107901 A IL107901 A IL 107901A
- Authority
- IL
- Israel
- Prior art keywords
- layer
- thickness
- self
- normalizing
- detected
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B11/00—Measuring arrangements characterised by the use of optical techniques
- G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
- G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
- G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
- G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IL11929993A IL119299A (en) | 1992-12-10 | 1993-12-06 | Device and method for measuring the thickness of thin membranes |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US07/987,926 US5365340A (en) | 1992-12-10 | 1992-12-10 | Apparatus and method for measuring the thickness of thin films |
Publications (2)
Publication Number | Publication Date |
---|---|
IL107901A0 IL107901A0 (en) | 1994-04-12 |
IL107901A true IL107901A (en) | 1998-02-08 |
Family
ID=25533699
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IL107901A IL107901A (en) | 1992-12-10 | 1993-12-06 | Device and method for measuring the thickness of thin membranes |
Country Status (7)
Country | Link |
---|---|
US (1) | US5365340A (ja) |
EP (1) | EP0601580B1 (ja) |
JP (1) | JPH0830646B2 (ja) |
KR (1) | KR970011746B1 (ja) |
DE (1) | DE69317736T2 (ja) |
IL (1) | IL107901A (ja) |
TW (1) | TW229265B (ja) |
Families Citing this family (47)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5555472A (en) * | 1993-12-22 | 1996-09-10 | Integrated Process Equipment Corp. | Method and apparatus for measuring film thickness in multilayer thin film stack by comparison to a reference library of theoretical signatures |
US6454761B1 (en) | 1995-01-30 | 2002-09-24 | Philip D. Freedman | Laser surgery device and method |
US5943550A (en) * | 1996-03-29 | 1999-08-24 | Advanced Micro Devices, Inc. | Method of processing a semiconductor wafer for controlling drive current |
US6366861B1 (en) * | 1997-04-25 | 2002-04-02 | Applied Materials, Inc. | Method of determining a wafer characteristic using a film thickness monitor |
US5963329A (en) * | 1997-10-31 | 1999-10-05 | International Business Machines Corporation | Method and apparatus for measuring the profile of small repeating lines |
US6142855A (en) | 1997-10-31 | 2000-11-07 | Canon Kabushiki Kaisha | Polishing apparatus and polishing method |
US6483580B1 (en) | 1998-03-06 | 2002-11-19 | Kla-Tencor Technologies Corporation | Spectroscopic scatterometer system |
US6392756B1 (en) | 1999-06-18 | 2002-05-21 | N&K Technology, Inc. | Method and apparatus for optically determining physical parameters of thin films deposited on a complex substrate |
US6091485A (en) * | 1999-12-15 | 2000-07-18 | N & K Technology, Inc. | Method and apparatus for optically determining physical parameters of underlayers |
US7115858B1 (en) | 2000-09-25 | 2006-10-03 | Nanometrics Incorporated | Apparatus and method for the measurement of diffracting structures |
US7365860B2 (en) * | 2000-12-21 | 2008-04-29 | Sensory Analytics | System capable of determining applied and anodized coating thickness of a coated-anodized product |
US7274463B2 (en) * | 2003-12-30 | 2007-09-25 | Sensory Analytics | Anodizing system with a coating thickness monitor and an anodized product |
US6674533B2 (en) | 2000-12-21 | 2004-01-06 | Joseph K. Price | Anodizing system with a coating thickness monitor and an anodized product |
US20080301954A1 (en) * | 2001-01-22 | 2008-12-11 | Robert Garrett | Air powered roofing saw with gear drive |
US6898537B1 (en) | 2001-04-27 | 2005-05-24 | Nanometrics Incorporated | Measurement of diffracting structures using one-half of the non-zero diffracted orders |
DE10123470B4 (de) * | 2001-05-15 | 2010-08-19 | Carl Zeiss Jena Gmbh | Verfahren und Anordnung zur berührungslosen Ermittlung von Produkteigenschaften |
US6713753B1 (en) | 2001-07-03 | 2004-03-30 | Nanometrics Incorporated | Combination of normal and oblique incidence polarimetry for the characterization of gratings |
US6785638B2 (en) * | 2001-08-06 | 2004-08-31 | Timbre Technologies, Inc. | Method and system of dynamic learning through a regression-based library generation process |
US7061615B1 (en) | 2001-09-20 | 2006-06-13 | Nanometrics Incorporated | Spectroscopically measured overlay target |
EP1430270A4 (en) * | 2001-09-21 | 2006-10-25 | Kmac | METHOD AND DEVICE FOR MEASURING THE THICK PROFILE AND THE DISTRIBUTION OF THIN FILM MULTI-LAYER REFRACTIVE INDICES BY TWO-DIMENSIONAL REFLECTOMETRY |
JP4938219B2 (ja) * | 2001-12-19 | 2012-05-23 | ケーエルエー−テンカー コーポレイション | 光学分光システムを使用するパラメトリック・プロフィーリング |
US6949462B1 (en) | 2002-04-04 | 2005-09-27 | Nanometrics Incorporated | Measuring an alignment target with multiple polarization states |
US6982793B1 (en) | 2002-04-04 | 2006-01-03 | Nanometrics Incorporated | Method and apparatus for using an alignment target with designed in offset |
US6992764B1 (en) | 2002-09-30 | 2006-01-31 | Nanometrics Incorporated | Measuring an alignment target with a single polarization state |
FR2852389B1 (fr) * | 2003-03-12 | 2005-05-13 | Commissariat Energie Atomique | Procede de mesure d'objets tridimensionnels par ombroscopie optique a une seule vue |
US7049156B2 (en) * | 2003-03-19 | 2006-05-23 | Verity Instruments, Inc. | System and method for in-situ monitor and control of film thickness and trench depth |
KR100546796B1 (ko) * | 2003-07-21 | 2006-01-25 | 동부아남반도체 주식회사 | 두께와 광학 이미지의 라이브러리를 이용한 절연막검사방법 |
JP2006041352A (ja) * | 2004-07-29 | 2006-02-09 | Dainippon Screen Mfg Co Ltd | 皮膜検査装置、検査システム、プログラム、皮膜検査方法およびプリント基板検査方法 |
US7515253B2 (en) | 2005-01-12 | 2009-04-07 | Kla-Tencor Technologies Corporation | System for measuring a sample with a layer containing a periodic diffracting structure |
US7038776B1 (en) * | 2005-03-25 | 2006-05-02 | Raytheon Company | Polarimeter to simultaneously measure the stokes vector components of light |
US7406394B2 (en) * | 2005-08-22 | 2008-07-29 | Applied Materials, Inc. | Spectra based endpointing for chemical mechanical polishing |
US7226339B2 (en) * | 2005-08-22 | 2007-06-05 | Applied Materials, Inc. | Spectrum based endpointing for chemical mechanical polishing |
US8260446B2 (en) | 2005-08-22 | 2012-09-04 | Applied Materials, Inc. | Spectrographic monitoring of a substrate during processing using index values |
ES2665428T3 (es) * | 2006-03-07 | 2018-04-25 | Sensory Analytics | Aparato móvil capaz de medidas superficiales del espesor de un revestimiento |
US7998358B2 (en) | 2006-10-31 | 2011-08-16 | Applied Materials, Inc. | Peak-based endpointing for chemical mechanical polishing |
US7444198B2 (en) * | 2006-12-15 | 2008-10-28 | Applied Materials, Inc. | Determining physical property of substrate |
US7952708B2 (en) * | 2007-04-02 | 2011-05-31 | Applied Materials, Inc. | High throughput measurement system |
US8352061B2 (en) | 2008-11-14 | 2013-01-08 | Applied Materials, Inc. | Semi-quantitative thickness determination |
US8852175B2 (en) * | 2008-11-21 | 2014-10-07 | Amo Development Llc | Apparatus, system and method for precision depth measurement |
JP5968783B2 (ja) | 2009-11-03 | 2016-08-10 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | スペクトルの等高線図のピーク位置と時間の関係を使用する終点方法 |
US8334986B2 (en) * | 2010-02-25 | 2012-12-18 | Corning Incorporated | Methods and apparatus for the measurement of film thickness |
DE102013107678A1 (de) * | 2013-07-18 | 2015-01-22 | Technische Universität Darmstadt | Verfahren zur Ermittlung einer Schichtdicke |
US10724900B2 (en) * | 2015-09-23 | 2020-07-28 | Filmetrics, Inc. | Determining focus condition in spectral reflectance system |
JP7481090B2 (ja) | 2019-01-09 | 2024-05-10 | 株式会社ディスコ | 厚み計測装置、及び厚み計測装置を備えた加工装置 |
CN111366478A (zh) * | 2020-05-12 | 2020-07-03 | 中国矿业大学(北京) | 一种电测-焦散线-数字散斑相关法同步实验系统及方法 |
DE102020115544B4 (de) * | 2020-06-11 | 2022-03-31 | Trioptics Gmbh | Messvorrichtung und Verfahren zum Messen einer Reflektivität von beschichteten optischen Elementen |
CN112798614A (zh) * | 2020-12-25 | 2021-05-14 | 长江存储科技有限责任公司 | 一种半导体机台及检测方法 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5245455U (ja) * | 1975-09-27 | 1977-03-31 | ||
US4585348A (en) * | 1981-09-28 | 1986-04-29 | International Business Machines Corporation | Ultra-fast photometric instrument |
JPS6176904A (ja) * | 1984-09-21 | 1986-04-19 | Oak Seisakusho:Kk | 膜厚測定方法 |
US4707611A (en) * | 1986-12-08 | 1987-11-17 | Rockwell International Corporation | Incremental monitoring of thin films |
JPH01206203A (ja) * | 1988-02-12 | 1989-08-18 | Toshiba Corp | 膜厚不良検査方法 |
JPH0252205A (ja) * | 1988-08-17 | 1990-02-21 | Dainippon Screen Mfg Co Ltd | 膜厚測定方法 |
JPH0731050B2 (ja) * | 1988-12-29 | 1995-04-10 | オリンパス光学工業株式会社 | 光学式膜厚測定装置 |
US5042949A (en) * | 1989-03-17 | 1991-08-27 | Greenberg Jeffrey S | Optical profiler for films and substrates |
JPH0820224B2 (ja) * | 1990-06-13 | 1996-03-04 | リソテックジャパン株式会社 | フォトレジスト溶解速度の測定方法 |
JPH0817166B2 (ja) * | 1991-04-27 | 1996-02-21 | 信越半導体株式会社 | 超薄膜soi基板の製造方法及び製造装置 |
-
1992
- 1992-12-10 US US07/987,926 patent/US5365340A/en not_active Expired - Lifetime
-
1993
- 1993-12-06 IL IL107901A patent/IL107901A/en not_active IP Right Cessation
- 1993-12-09 EP EP93119876A patent/EP0601580B1/en not_active Expired - Lifetime
- 1993-12-09 DE DE69317736T patent/DE69317736T2/de not_active Expired - Lifetime
- 1993-12-09 TW TW082110456A patent/TW229265B/zh active
- 1993-12-10 JP JP5310844A patent/JPH0830646B2/ja not_active Expired - Lifetime
- 1993-12-10 KR KR1019930027149A patent/KR970011746B1/ko not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
DE69317736T2 (de) | 1998-07-30 |
KR940016660A (ko) | 1994-07-23 |
DE69317736D1 (de) | 1998-05-07 |
KR970011746B1 (ko) | 1997-07-15 |
JPH06281420A (ja) | 1994-10-07 |
JPH0830646B2 (ja) | 1996-03-27 |
TW229265B (ja) | 1994-09-01 |
IL107901A0 (en) | 1994-04-12 |
US5365340A (en) | 1994-11-15 |
EP0601580A1 (en) | 1994-06-15 |
EP0601580B1 (en) | 1998-04-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
FF | Patent granted | ||
KB | Patent renewed | ||
KB | Patent renewed | ||
KB | Patent renewed | ||
MM9K | Patent not in force due to non-payment of renewal fees |