IL107901A - Device and method for measuring the thickness of thin membranes - Google Patents

Device and method for measuring the thickness of thin membranes

Info

Publication number
IL107901A
IL107901A IL107901A IL10790193A IL107901A IL 107901 A IL107901 A IL 107901A IL 107901 A IL107901 A IL 107901A IL 10790193 A IL10790193 A IL 10790193A IL 107901 A IL107901 A IL 107901A
Authority
IL
Israel
Prior art keywords
layer
thickness
self
normalizing
detected
Prior art date
Application number
IL107901A
Other languages
English (en)
Hebrew (he)
Other versions
IL107901A0 (en
Original Assignee
Ipec Precision
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ipec Precision filed Critical Ipec Precision
Priority to IL11929993A priority Critical patent/IL119299A/en
Publication of IL107901A0 publication Critical patent/IL107901A0/xx
Publication of IL107901A publication Critical patent/IL107901A/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B11/00—Measuring arrangements characterised by the use of optical techniques
    • G01B11/02—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness
    • G01B11/06—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material
    • G01B11/0616—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating
    • G01B11/0625—Measuring arrangements characterised by the use of optical techniques for measuring length, width or thickness for measuring thickness ; e.g. of sheet material of coating with measurement of absorption or reflection

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
IL107901A 1992-12-10 1993-12-06 Device and method for measuring the thickness of thin membranes IL107901A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
IL11929993A IL119299A (en) 1992-12-10 1993-12-06 Device and method for measuring the thickness of thin membranes

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/987,926 US5365340A (en) 1992-12-10 1992-12-10 Apparatus and method for measuring the thickness of thin films

Publications (2)

Publication Number Publication Date
IL107901A0 IL107901A0 (en) 1994-04-12
IL107901A true IL107901A (en) 1998-02-08

Family

ID=25533699

Family Applications (1)

Application Number Title Priority Date Filing Date
IL107901A IL107901A (en) 1992-12-10 1993-12-06 Device and method for measuring the thickness of thin membranes

Country Status (7)

Country Link
US (1) US5365340A (ja)
EP (1) EP0601580B1 (ja)
JP (1) JPH0830646B2 (ja)
KR (1) KR970011746B1 (ja)
DE (1) DE69317736T2 (ja)
IL (1) IL107901A (ja)
TW (1) TW229265B (ja)

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US5555472A (en) * 1993-12-22 1996-09-10 Integrated Process Equipment Corp. Method and apparatus for measuring film thickness in multilayer thin film stack by comparison to a reference library of theoretical signatures
US6454761B1 (en) 1995-01-30 2002-09-24 Philip D. Freedman Laser surgery device and method
US5943550A (en) * 1996-03-29 1999-08-24 Advanced Micro Devices, Inc. Method of processing a semiconductor wafer for controlling drive current
US6366861B1 (en) * 1997-04-25 2002-04-02 Applied Materials, Inc. Method of determining a wafer characteristic using a film thickness monitor
US5963329A (en) * 1997-10-31 1999-10-05 International Business Machines Corporation Method and apparatus for measuring the profile of small repeating lines
US6142855A (en) 1997-10-31 2000-11-07 Canon Kabushiki Kaisha Polishing apparatus and polishing method
US6483580B1 (en) 1998-03-06 2002-11-19 Kla-Tencor Technologies Corporation Spectroscopic scatterometer system
US6392756B1 (en) 1999-06-18 2002-05-21 N&K Technology, Inc. Method and apparatus for optically determining physical parameters of thin films deposited on a complex substrate
US6091485A (en) * 1999-12-15 2000-07-18 N & K Technology, Inc. Method and apparatus for optically determining physical parameters of underlayers
US7115858B1 (en) 2000-09-25 2006-10-03 Nanometrics Incorporated Apparatus and method for the measurement of diffracting structures
US7365860B2 (en) * 2000-12-21 2008-04-29 Sensory Analytics System capable of determining applied and anodized coating thickness of a coated-anodized product
US7274463B2 (en) * 2003-12-30 2007-09-25 Sensory Analytics Anodizing system with a coating thickness monitor and an anodized product
US6674533B2 (en) 2000-12-21 2004-01-06 Joseph K. Price Anodizing system with a coating thickness monitor and an anodized product
US20080301954A1 (en) * 2001-01-22 2008-12-11 Robert Garrett Air powered roofing saw with gear drive
US6898537B1 (en) 2001-04-27 2005-05-24 Nanometrics Incorporated Measurement of diffracting structures using one-half of the non-zero diffracted orders
DE10123470B4 (de) * 2001-05-15 2010-08-19 Carl Zeiss Jena Gmbh Verfahren und Anordnung zur berührungslosen Ermittlung von Produkteigenschaften
US6713753B1 (en) 2001-07-03 2004-03-30 Nanometrics Incorporated Combination of normal and oblique incidence polarimetry for the characterization of gratings
US6785638B2 (en) * 2001-08-06 2004-08-31 Timbre Technologies, Inc. Method and system of dynamic learning through a regression-based library generation process
US7061615B1 (en) 2001-09-20 2006-06-13 Nanometrics Incorporated Spectroscopically measured overlay target
EP1430270A4 (en) * 2001-09-21 2006-10-25 Kmac METHOD AND DEVICE FOR MEASURING THE THICK PROFILE AND THE DISTRIBUTION OF THIN FILM MULTI-LAYER REFRACTIVE INDICES BY TWO-DIMENSIONAL REFLECTOMETRY
JP4938219B2 (ja) * 2001-12-19 2012-05-23 ケーエルエー−テンカー コーポレイション 光学分光システムを使用するパラメトリック・プロフィーリング
US6949462B1 (en) 2002-04-04 2005-09-27 Nanometrics Incorporated Measuring an alignment target with multiple polarization states
US6982793B1 (en) 2002-04-04 2006-01-03 Nanometrics Incorporated Method and apparatus for using an alignment target with designed in offset
US6992764B1 (en) 2002-09-30 2006-01-31 Nanometrics Incorporated Measuring an alignment target with a single polarization state
FR2852389B1 (fr) * 2003-03-12 2005-05-13 Commissariat Energie Atomique Procede de mesure d'objets tridimensionnels par ombroscopie optique a une seule vue
US7049156B2 (en) * 2003-03-19 2006-05-23 Verity Instruments, Inc. System and method for in-situ monitor and control of film thickness and trench depth
KR100546796B1 (ko) * 2003-07-21 2006-01-25 동부아남반도체 주식회사 두께와 광학 이미지의 라이브러리를 이용한 절연막검사방법
JP2006041352A (ja) * 2004-07-29 2006-02-09 Dainippon Screen Mfg Co Ltd 皮膜検査装置、検査システム、プログラム、皮膜検査方法およびプリント基板検査方法
US7515253B2 (en) 2005-01-12 2009-04-07 Kla-Tencor Technologies Corporation System for measuring a sample with a layer containing a periodic diffracting structure
US7038776B1 (en) * 2005-03-25 2006-05-02 Raytheon Company Polarimeter to simultaneously measure the stokes vector components of light
US7406394B2 (en) * 2005-08-22 2008-07-29 Applied Materials, Inc. Spectra based endpointing for chemical mechanical polishing
US7226339B2 (en) * 2005-08-22 2007-06-05 Applied Materials, Inc. Spectrum based endpointing for chemical mechanical polishing
US8260446B2 (en) 2005-08-22 2012-09-04 Applied Materials, Inc. Spectrographic monitoring of a substrate during processing using index values
ES2665428T3 (es) * 2006-03-07 2018-04-25 Sensory Analytics Aparato móvil capaz de medidas superficiales del espesor de un revestimiento
US7998358B2 (en) 2006-10-31 2011-08-16 Applied Materials, Inc. Peak-based endpointing for chemical mechanical polishing
US7444198B2 (en) * 2006-12-15 2008-10-28 Applied Materials, Inc. Determining physical property of substrate
US7952708B2 (en) * 2007-04-02 2011-05-31 Applied Materials, Inc. High throughput measurement system
US8352061B2 (en) 2008-11-14 2013-01-08 Applied Materials, Inc. Semi-quantitative thickness determination
US8852175B2 (en) * 2008-11-21 2014-10-07 Amo Development Llc Apparatus, system and method for precision depth measurement
JP5968783B2 (ja) 2009-11-03 2016-08-10 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ スペクトルの等高線図のピーク位置と時間の関係を使用する終点方法
US8334986B2 (en) * 2010-02-25 2012-12-18 Corning Incorporated Methods and apparatus for the measurement of film thickness
DE102013107678A1 (de) * 2013-07-18 2015-01-22 Technische Universität Darmstadt Verfahren zur Ermittlung einer Schichtdicke
US10724900B2 (en) * 2015-09-23 2020-07-28 Filmetrics, Inc. Determining focus condition in spectral reflectance system
JP7481090B2 (ja) 2019-01-09 2024-05-10 株式会社ディスコ 厚み計測装置、及び厚み計測装置を備えた加工装置
CN111366478A (zh) * 2020-05-12 2020-07-03 中国矿业大学(北京) 一种电测-焦散线-数字散斑相关法同步实验系统及方法
DE102020115544B4 (de) * 2020-06-11 2022-03-31 Trioptics Gmbh Messvorrichtung und Verfahren zum Messen einer Reflektivität von beschichteten optischen Elementen
CN112798614A (zh) * 2020-12-25 2021-05-14 长江存储科技有限责任公司 一种半导体机台及检测方法

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5245455U (ja) * 1975-09-27 1977-03-31
US4585348A (en) * 1981-09-28 1986-04-29 International Business Machines Corporation Ultra-fast photometric instrument
JPS6176904A (ja) * 1984-09-21 1986-04-19 Oak Seisakusho:Kk 膜厚測定方法
US4707611A (en) * 1986-12-08 1987-11-17 Rockwell International Corporation Incremental monitoring of thin films
JPH01206203A (ja) * 1988-02-12 1989-08-18 Toshiba Corp 膜厚不良検査方法
JPH0252205A (ja) * 1988-08-17 1990-02-21 Dainippon Screen Mfg Co Ltd 膜厚測定方法
JPH0731050B2 (ja) * 1988-12-29 1995-04-10 オリンパス光学工業株式会社 光学式膜厚測定装置
US5042949A (en) * 1989-03-17 1991-08-27 Greenberg Jeffrey S Optical profiler for films and substrates
JPH0820224B2 (ja) * 1990-06-13 1996-03-04 リソテックジャパン株式会社 フォトレジスト溶解速度の測定方法
JPH0817166B2 (ja) * 1991-04-27 1996-02-21 信越半導体株式会社 超薄膜ｓｏｉ基板の製造方法及び製造装置

Also Published As

Publication number Publication date
DE69317736T2 (de) 1998-07-30
KR940016660A (ko) 1994-07-23
DE69317736D1 (de) 1998-05-07
KR970011746B1 (ko) 1997-07-15
JPH06281420A (ja) 1994-10-07
JPH0830646B2 (ja) 1996-03-27
TW229265B (ja) 1994-09-01
IL107901A0 (en) 1994-04-12
US5365340A (en) 1994-11-15
EP0601580A1 (en) 1994-06-15
EP0601580B1 (en) 1998-04-01

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