HK73396A - Bis-1,2-naphthoquinone-2-diazide-sulfon amide and its use in a photosensitive composition and in a photosensitive registration material - Google Patents

Bis-1,2-naphthoquinone-2-diazide-sulfon amide and its use in a photosensitive composition and in a photosensitive registration material

Info

Publication number
HK73396A
HK73396A HK73396A HK73396A HK73396A HK 73396 A HK73396 A HK 73396A HK 73396 A HK73396 A HK 73396A HK 73396 A HK73396 A HK 73396A HK 73396 A HK73396 A HK 73396A
Authority
HK
Hong Kong
Prior art keywords
photosensitive
diazide
naphthoquinone
bis
registration material
Prior art date
Application number
HK73396A
Other languages
English (en)
Inventor
Wolfgang Zahn Dr
Gerhard Buhr Dr
Original Assignee
Hoechst Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoechst Ag filed Critical Hoechst Ag
Publication of HK73396A publication Critical patent/HK73396A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials For Photolithography (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
HK73396A 1986-02-06 1996-04-25 Bis-1,2-naphthoquinone-2-diazide-sulfon amide and its use in a photosensitive composition and in a photosensitive registration material HK73396A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19863603578 DE3603578A1 (de) 1986-02-06 1986-02-06 Neue bis-1,2-naphthochinon-2-diazid-sulfonsaeure- amide, ihre verwendung in einem strahlungsempfindlichen gemisch und strahlungsempfindliches kopiermaterial

Publications (1)

Publication Number Publication Date
HK73396A true HK73396A (en) 1996-05-03

Family

ID=6293458

Family Applications (1)

Application Number Title Priority Date Filing Date
HK73396A HK73396A (en) 1986-02-06 1996-04-25 Bis-1,2-naphthoquinone-2-diazide-sulfon amide and its use in a photosensitive composition and in a photosensitive registration material

Country Status (6)

Country Link
US (1) US4774171A (xx)
EP (1) EP0231855B1 (xx)
JP (1) JPH0684343B2 (xx)
KR (1) KR950000480B1 (xx)
DE (2) DE3603578A1 (xx)
HK (1) HK73396A (xx)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3810631A1 (de) * 1988-03-29 1989-10-12 Hoechst Ag Positiv arbeitendes lichtempfindliches gemisch und daraus hergestelltes aufzeichnungsmaterial mit hohem waermestand
DE3822522A1 (de) * 1988-07-04 1990-03-22 Hoechst Ag 1,2-naphthochinon-2-diazid-sulfonsaeureamide und lichtempfindliche gemische, die diese enthalten
JPH09319082A (ja) * 1996-05-27 1997-12-12 Hitachi Ltd ポジ型感光性樹脂組成物及びそれを用いた電子装置
JPWO2005045911A1 (ja) * 2003-11-11 2007-11-29 旭硝子株式会社 パターン形成方法、およびこれにより製造される電子回路、並びにこれを用いた電子機器
TW200739265A (en) * 2005-12-06 2007-10-16 Tokyo Ohka Kogyo Co Ltd Positive photoresist composition and method of forming photoresist pattern using the same

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE497135A (xx) * 1949-07-23
DE865108C (de) * 1949-09-14 1953-01-29 Kalle & Co Ag Verfahren zur Herstellung von Kopien, besonders Druckformen, mit Hilfe von Diazoverbindungen
SU113289A1 (ru) * 1957-04-17 1957-11-30 И.М. Жиленко Передвижна бурова каретка
US3687663A (en) * 1970-05-19 1972-08-29 Ind Dyestuff Co Diazo-oxides of sulfonic acid amides and/or esters and photographic element and use thereof
DE3040157A1 (de) * 1980-10-24 1982-06-03 Hoechst Ag, 6000 Frankfurt Lichtemopfindliches gemisch und damit hergestelltes lichtempfindliches kopiermaterial
US4397937A (en) * 1982-02-10 1983-08-09 International Business Machines Corporation Positive resist compositions
EP0147596A3 (en) * 1983-12-30 1987-03-04 International Business Machines Corporation A positive lithographic resist composition

Also Published As

Publication number Publication date
EP0231855B1 (de) 1994-02-23
DE3789118D1 (de) 1994-03-31
DE3603578A1 (de) 1987-08-13
KR950000480B1 (ko) 1995-01-20
EP0231855A3 (en) 1989-07-12
KR870008219A (ko) 1987-09-25
US4774171A (en) 1988-09-27
JPH0684343B2 (ja) 1994-10-26
EP0231855A2 (de) 1987-08-12
JPS63119450A (ja) 1988-05-24

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)