HK67092A - Process for the separation of higher molecular compounds from phenol polymers - Google Patents
Process for the separation of higher molecular compounds from phenol polymersInfo
- Publication number
- HK67092A HK67092A HK670/92A HK67092A HK67092A HK 67092 A HK67092 A HK 67092A HK 670/92 A HK670/92 A HK 670/92A HK 67092 A HK67092 A HK 67092A HK 67092 A HK67092 A HK 67092A
- Authority
- HK
- Hong Kong
- Prior art keywords
- phenol
- molecular weight
- higher molecular
- ammonia
- amine
- Prior art date
Links
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 title abstract 4
- 229920000642 polymer Polymers 0.000 title abstract 4
- 238000000034 method Methods 0.000 title abstract 3
- 150000001875 compounds Chemical class 0.000 title 1
- 238000000926 separation method Methods 0.000 title 1
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 abstract 4
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical class O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 abstract 3
- 150000001412 amines Chemical class 0.000 abstract 2
- 229910021529 ammonia Inorganic materials 0.000 abstract 2
- 239000011260 aqueous acid Substances 0.000 abstract 1
- 239000007859 condensation product Substances 0.000 abstract 1
- 239000000470 constituent Substances 0.000 abstract 1
- 230000007812 deficiency Effects 0.000 abstract 1
- 230000009477 glass transition Effects 0.000 abstract 1
- 239000003960 organic solvent Substances 0.000 abstract 1
- 150000002989 phenols Chemical class 0.000 abstract 1
- 239000002244 precipitate Substances 0.000 abstract 1
- 239000013049 sediment Substances 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
- C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
- C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
- C08G8/12—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ with monohydric phenols having only one hydrocarbon substituent ortho on para to the OH group, e.g. p-tert.-butyl phenol
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
- C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
- G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins
Landscapes
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Phenolic Resins Or Amino Resins (AREA)
- Polyoxymethylene Polymers And Polymers With Carbon-To-Carbon Bonds (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Polyethers (AREA)
- Processes Of Treating Macromolecular Substances (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19863608492 DE3608492A1 (de) | 1986-03-14 | 1986-03-14 | Verfahren zum abtrennen von hoehermolekularen bestandteilen aus phenolpolymeren |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| HK67092A true HK67092A (en) | 1992-09-11 |
Family
ID=6296319
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| HK670/92A HK67092A (en) | 1986-03-14 | 1992-09-03 | Process for the separation of higher molecular compounds from phenol polymers |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US4795829A (xx) |
| EP (1) | EP0237875B1 (xx) |
| JP (1) | JPS62220509A (xx) |
| KR (1) | KR950015123B1 (xx) |
| AT (1) | ATE61606T1 (xx) |
| DE (2) | DE3608492A1 (xx) |
| HK (1) | HK67092A (xx) |
| SG (1) | SG62092G (xx) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19530630A1 (de) * | 1995-08-21 | 1997-02-27 | Hoechst Ag | Verfahren zur Herstellung von methylsubstituierten Polyalkylidenpolyphenolen |
| JP3562673B2 (ja) | 1996-01-22 | 2004-09-08 | 富士写真フイルム株式会社 | ポジ型フォトレジスト組成物 |
| US6506831B2 (en) | 1998-12-20 | 2003-01-14 | Honeywell International Inc. | Novolac polymer planarization films with high temperature stability |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2959622A (en) * | 1960-11-08 | Purification of crude jj-p-bis- | ||
| US2829175A (en) * | 1953-10-14 | 1958-04-01 | Gulf Research Development Co | Purification of bis-phenols |
| US2862976A (en) * | 1953-10-14 | 1958-12-02 | Gulf Research Development Co | Purification process |
| JPS5786830A (en) * | 1980-11-20 | 1982-05-31 | Fujitsu Ltd | Pattern forming material |
| US4348471A (en) * | 1981-06-15 | 1982-09-07 | Polychrome Corporation | Positive acting composition yielding pre-development high visibility image after radiation exposure comprising acid free novolak, diazo oxide and acid sensitive dyestuff |
| DE3344202A1 (de) * | 1983-12-07 | 1985-06-20 | Merck Patent Gmbh, 6100 Darmstadt | Positiv-fotoresistzusammensetzungen |
| US4507509A (en) * | 1984-01-04 | 1985-03-26 | General Electric Company | Purification of bisphenol-A |
| DE3436349A1 (de) * | 1984-10-04 | 1986-04-10 | Hoechst Ag, 6230 Frankfurt | Verfahren zur extraktion von phenolen aus waessrigen loesungen |
-
1986
- 1986-03-14 DE DE19863608492 patent/DE3608492A1/de not_active Withdrawn
-
1987
- 1987-03-05 EP EP87103124A patent/EP0237875B1/de not_active Expired - Lifetime
- 1987-03-05 AT AT87103124T patent/ATE61606T1/de not_active IP Right Cessation
- 1987-03-05 DE DE8787103124T patent/DE3768534D1/de not_active Expired - Fee Related
- 1987-03-13 JP JP62056977A patent/JPS62220509A/ja active Pending
- 1987-03-13 KR KR1019870002261A patent/KR950015123B1/ko active IP Right Grant
- 1987-03-16 US US07/025,976 patent/US4795829A/en not_active Expired - Fee Related
-
1992
- 1992-06-16 SG SG620/92A patent/SG62092G/en unknown
- 1992-09-03 HK HK670/92A patent/HK67092A/xx unknown
Also Published As
| Publication number | Publication date |
|---|---|
| ATE61606T1 (de) | 1991-03-15 |
| EP0237875A2 (de) | 1987-09-23 |
| JPS62220509A (ja) | 1987-09-28 |
| SG62092G (en) | 1992-09-04 |
| EP0237875A3 (en) | 1988-10-05 |
| KR950015123B1 (ko) | 1995-12-22 |
| DE3608492A1 (de) | 1987-09-17 |
| DE3768534D1 (de) | 1991-04-18 |
| US4795829A (en) | 1989-01-03 |
| EP0237875B1 (de) | 1991-03-13 |
| KR870008925A (ko) | 1987-10-22 |
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