HK1198858A2 - Method of marking a solid state material, and solid state materials marked according to such a method - Google Patents
Method of marking a solid state material, and solid state materials marked according to such a methodInfo
- Publication number
- HK1198858A2 HK1198858A2 HK14103658.1A HK14103658A HK1198858A2 HK 1198858 A2 HK1198858 A2 HK 1198858A2 HK 14103658 A HK14103658 A HK 14103658A HK 1198858 A2 HK1198858 A2 HK 1198858A2
- Authority
- HK
- Hong Kong
- Prior art keywords
- solid state
- marking
- marked according
- materials marked
- state material
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B44—DECORATIVE ARTS
- B44C—PRODUCING DECORATIVE EFFECTS; MOSAICS; TARSIA WORK; PAPERHANGING
- B44C1/00—Processes, not specifically provided for elsewhere, for producing decorative surface effects
- B44C1/22—Removing surface-material, e.g. by engraving, by etching
- B44C1/227—Removing surface-material, e.g. by engraving, by etching by etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B28—WORKING CEMENT, CLAY, OR STONE
- B28D—WORKING STONE OR STONE-LIKE MATERIALS
- B28D5/00—Fine working of gems, jewels, crystals, e.g. of semiconductor material; apparatus or devices therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32192—Microwave generated discharge
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/32—Processing objects by plasma generation
- H01J2237/33—Processing objects by plasma generation characterised by the type of processing
- H01J2237/334—Etching
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Mechanical Engineering (AREA)
- General Physics & Mathematics (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
- Laser Beam Processing (AREA)
- Eyeglasses (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
HK14103658.1A HK1198858A2 (en) | 2014-04-16 | 2014-04-16 | Method of marking a solid state material, and solid state materials marked according to such a method |
CN201580025416.1A CN106457610B (zh) | 2014-04-16 | 2015-04-16 | 标记固态材料的方法和根据该方法标记的固态材料 |
EP15779777.0A EP3131724B1 (en) | 2014-04-16 | 2015-04-16 | Method of marking a solid state material |
US15/304,843 US10457089B2 (en) | 2014-04-16 | 2015-04-16 | Method of marking a solid state material, and solid state materials marked according to such a method |
PCT/CN2015/076803 WO2015158290A1 (en) | 2014-04-16 | 2015-04-16 | Method of marking a solid state material, and solid state materials marked according to such a method |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
HK14103658.1A HK1198858A2 (en) | 2014-04-16 | 2014-04-16 | Method of marking a solid state material, and solid state materials marked according to such a method |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1198858A2 true HK1198858A2 (en) | 2015-06-12 |
Family
ID=53276343
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK14103658.1A HK1198858A2 (en) | 2014-04-16 | 2014-04-16 | Method of marking a solid state material, and solid state materials marked according to such a method |
Country Status (5)
Country | Link |
---|---|
US (1) | US10457089B2 (xx) |
EP (1) | EP3131724B1 (xx) |
CN (1) | CN106457610B (xx) |
HK (1) | HK1198858A2 (xx) |
WO (1) | WO2015158290A1 (xx) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2014078589A1 (en) | 2012-11-15 | 2014-05-22 | Micro-Tracers, Inc. | Tracer particles, and methods for making same |
HK1213429A2 (zh) * | 2015-12-31 | 2016-06-30 | Master Dynamic Ltd | 在製品上形成標記的方法和其上有標記的製品 |
US20210146716A1 (en) * | 2018-02-23 | 2021-05-20 | Master Dynamic Limited | Method of marking a solid-state material, markings formed from such methods and solid-state materials marked according to such a method |
DE102018206406B3 (de) * | 2018-04-25 | 2019-09-12 | Carl Zeiss Meditec Ag | Mikroskopiesystem und Verfahren zum Betrieb eines Mikroskopiesystems |
CN114258341A (zh) * | 2019-07-02 | 2022-03-29 | 动力专家有限公司 | 标记固态材料的方法、由该方法形成的标记以及根据该方法标记的固态材料 |
EP3994614A4 (en) * | 2019-07-02 | 2023-04-05 | Master Dynamic Limited | METHOD FOR MARKING A DIAMOND, MARKS FORMED BY SUCH PROCESSES AND DIAMONDS MARKED ACCORDING TO SUCH PROCESS |
JP6755564B1 (ja) * | 2019-10-07 | 2020-09-16 | 株式会社ユーロックテクノパーツ | 標示部材 |
TWI814173B (zh) * | 2020-12-14 | 2023-09-01 | 香港商金展科技有限公司 | 在多個寶石的外表面形成可識別標記的方法和系統,以及根據這種方法標記的寶石 |
CN116626987B (zh) * | 2023-07-17 | 2023-10-10 | 上海鲲游科技有限公司 | 一种基于Lag效应的工艺调制方法 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2325439A (en) * | 1997-05-23 | 1998-11-25 | Gersan Ets | Marking diamond gemstone by plasma or ion beam etching through a laser ablated resist |
GB9727364D0 (en) | 1997-12-24 | 1998-02-25 | Gersan Ets | Watermark |
GB0103881D0 (en) * | 2001-02-16 | 2001-04-04 | Gersan Ets | E-beam marking |
EP1959780A1 (en) * | 2005-12-06 | 2008-08-27 | California Institute of Technology | Enhancing the optical characteristics of a gemstone |
US8313793B2 (en) * | 2006-08-04 | 2012-11-20 | Valinmark Inc. | Method for producing and visualizing an optically hidden mark |
EP2144117A1 (en) | 2008-07-11 | 2010-01-13 | The Provost, Fellows and Scholars of the College of the Holy and Undivided Trinity of Queen Elizabeth near Dublin | Process and system for fabrication of patterns on a surface |
WO2012021932A1 (en) | 2010-08-19 | 2012-02-23 | Newsouth Innovations Pty Limited | A method of forming a structure in a material |
US20120112218A1 (en) * | 2010-11-04 | 2012-05-10 | Agency For Science, Technology And Research | Light Emitting Diode with Polarized Light Emission |
KR101908655B1 (ko) * | 2012-02-16 | 2018-10-16 | 엘지이노텍 주식회사 | 반도체 소자의 벽개면 형성 방법 |
CN102866580A (zh) * | 2012-09-26 | 2013-01-09 | 清华大学 | 一种纳米光刻方法及装置 |
WO2015051640A1 (en) | 2013-10-11 | 2015-04-16 | Goldway Technology Limited | Method of providing markings to precious stones including gemstones and diamonds, and markings and marked precious stones marked according to such a method |
HK1204517A2 (en) * | 2014-10-07 | 2015-11-20 | Goldway Technology Ltd | A system, apparatus and method for viewing a gemstone |
-
2014
- 2014-04-16 HK HK14103658.1A patent/HK1198858A2/xx not_active IP Right Cessation
-
2015
- 2015-04-16 CN CN201580025416.1A patent/CN106457610B/zh active Active
- 2015-04-16 EP EP15779777.0A patent/EP3131724B1/en active Active
- 2015-04-16 WO PCT/CN2015/076803 patent/WO2015158290A1/en active Application Filing
- 2015-04-16 US US15/304,843 patent/US10457089B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
EP3131724A1 (en) | 2017-02-22 |
CN106457610B (zh) | 2019-04-30 |
US10457089B2 (en) | 2019-10-29 |
US20170182838A1 (en) | 2017-06-29 |
WO2015158290A1 (en) | 2015-10-22 |
CN106457610A (zh) | 2017-02-22 |
EP3131724B1 (en) | 2019-08-14 |
EP3131724A4 (en) | 2017-11-29 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PEU | Short-term patents expired |
Effective date: 20220415 |