HK1193800A1 - 用於清除水中的微生物、有機和化學污染物的設備 - Google Patents

用於清除水中的微生物、有機和化學污染物的設備

Info

Publication number
HK1193800A1
HK1193800A1 HK14107233.6A HK14107233A HK1193800A1 HK 1193800 A1 HK1193800 A1 HK 1193800A1 HK 14107233 A HK14107233 A HK 14107233A HK 1193800 A1 HK1193800 A1 HK 1193800A1
Authority
HK
Hong Kong
Prior art keywords
microbic
pollutants
chemical
water
removing organic
Prior art date
Application number
HK14107233.6A
Other languages
English (en)
Inventor
．巴爾胡達羅夫
．塔克塔基什維利
．安皮洛夫
．科蘇季
Original Assignee
普拉澤瑪-普羅有限責任公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 普拉澤瑪-普羅有限責任公司 filed Critical 普拉澤瑪-普羅有限責任公司
Publication of HK1193800A1 publication Critical patent/HK1193800A1/zh

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/34—Treatment of water, waste water, or sewage with mechanical oscillations
    • C02F1/36—Treatment of water, waste water, or sewage with mechanical oscillations ultrasonic vibrations
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/4608—Treatment of water, waste water, or sewage by electrochemical methods using electrical discharges
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/30—Treatment of water, waste water, or sewage by irradiation
    • C02F1/32—Treatment of water, waste water, or sewage by irradiation with ultraviolet light
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/46—Treatment of water, waste water, or sewage by electrochemical methods
    • C02F1/461—Treatment of water, waste water, or sewage by electrochemical methods by electrolysis
    • C02F1/46104—Devices therefor; Their operating or servicing
    • C02F1/46109—Electrodes
    • C02F2001/46133—Electrodes characterised by the material
    • C02F2001/46138—Electrodes comprising a substrate and a coating
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2201/00—Apparatus for treatment of water, waste water or sewage
    • C02F2201/002—Construction details of the apparatus
    • C02F2201/003—Coaxial constructions, e.g. a cartridge located coaxially within another
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2201/00—Apparatus for treatment of water, waste water or sewage
    • C02F2201/46—Apparatus for electrochemical processes
    • C02F2201/461—Electrolysis apparatus
    • C02F2201/46105—Details relating to the electrolytic devices
    • C02F2201/4619—Supplying gas to the electrolyte
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2305/00—Use of specific compounds during water treatment
    • C02F2305/02—Specific form of oxidant
    • C02F2305/023—Reactive oxygen species, singlet oxygen, OH radical
HK14107233.6A 2011-03-29 2014-07-15 用於清除水中的微生物、有機和化學污染物的設備 HK1193800A1 (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
RU2011111756 2011-03-29
PCT/RU2012/000221 WO2012134350A1 (ru) 2011-03-29 2012-03-27 Устройство для отчистки воды от микробных органических и химических загрязнений

Publications (1)

Publication Number Publication Date
HK1193800A1 true HK1193800A1 (zh) 2014-10-03

Family

ID=46931721

Family Applications (1)

Application Number Title Priority Date Filing Date
HK14107233.6A HK1193800A1 (zh) 2011-03-29 2014-07-15 用於清除水中的微生物、有機和化學污染物的設備

Country Status (5)

Country Link
EP (1) EP2692694B1 (zh)
KR (1) KR20140002783A (zh)
CN (1) CN103517879B (zh)
HK (1) HK1193800A1 (zh)
WO (1) WO2012134350A1 (zh)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2873648B1 (en) * 2013-11-13 2022-01-05 Mitsubishi Electric Corporation Dissolved oxygen removal system, circulating water system with dissolved oxygen removal device, heating device comprising said circulating water circuit system and dissolved oxygen removal method
WO2015072049A1 (ja) * 2013-11-18 2015-05-21 パナソニックＩｐマネジメント株式会社 液体処理装置及び液体処理方法
JP5879530B2 (ja) 2013-11-18 2016-03-08 パナソニックＩｐマネジメント株式会社 液体処理装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU1770269C (ru) * 1990-08-20 1992-10-23 Институт Физики Ан Киргсср Трехфазный озонатор
US6558638B2 (en) 1998-03-14 2003-05-06 Splits Technologies Limited Treatment of liquids
DE60117197T2 (de) * 2000-04-26 2006-07-27 Semiconductor Energy Laboratory Co., Ltd., Atsugi Kommunikationssystem und -verfahren zur Identifikation einer Person mittels biologischer Information
JP2002192161A (ja) * 2000-12-26 2002-07-10 Mitsubishi Heavy Ind Ltd 船舶のバラスト水の処理方法及びその処理装置
CN2604846Y (zh) * 2003-02-26 2004-02-25 王守国 常压射频圆筒形外射冷等离子体发生器
CN2728245Y (zh) * 2004-05-27 2005-09-28 福州大学 流面型冷电弧杀菌装置
JP4817407B2 (ja) * 2005-03-07 2011-11-16 学校法人東海大学 プラズマ発生装置及びプラズマ発生方法

Also Published As

Publication number Publication date
EP2692694A4 (en) 2014-10-29
EP2692694A1 (en) 2014-02-05
KR20140002783A (ko) 2014-01-08
CN103517879B (zh) 2015-09-16
WO2012134350A1 (ru) 2012-10-04
CN103517879A (zh) 2014-01-15
EP2692694B1 (en) 2016-10-26

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20200326