HK1171514A1 - Exposure system - Google Patents

Exposure system

Info

Publication number
HK1171514A1
HK1171514A1 HK12112238.3A HK12112238A HK1171514A1 HK 1171514 A1 HK1171514 A1 HK 1171514A1 HK 12112238 A HK12112238 A HK 12112238A HK 1171514 A1 HK1171514 A1 HK 1171514A1
Authority
HK
Hong Kong
Prior art keywords
exposure system
exposure
Prior art date
Application number
HK12112238.3A
Other languages
English (en)
Chinese (zh)
Inventor
Hans Opower
Klaus Juenger
Original Assignee
Kleo Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kleo Ag filed Critical Kleo Ag
Publication of HK1171514A1 publication Critical patent/HK1171514A1/xx

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02—Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06—Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/0604—Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams
    • B23K26/0608—Shaping the laser beam, e.g. by masks or multi-focusing by a combination of beams in the same heat affected zone [HAZ]
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/08—Devices involving relative movement between laser beam and workpiece
    • B23K26/082—Scanning systems, i.e. devices involving movement of the laser beam relative to the laser head
    • B23K26/0821—Scanning systems, i.e. devices involving movement of the laser beam relative to the laser head using multifaceted mirrors, e.g. polygonal mirror
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/08—Devices involving relative movement between laser beam and workpiece
    • B23K26/083—Devices involving movement of the workpiece in at least one axial direction
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/10—Scanning systems
    • G02B26/12—Scanning systems using multifaceted mirrors
    • G02B26/123—Multibeam scanners, e.g. using multiple light sources or beam splitters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70791—Large workpieces, e.g. glass substrates for flat panel displays or solar panels

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
HK12112238.3A 2009-11-18 2012-11-28 Exposure system HK1171514A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102009046809.9A DE102009046809B4 (de) 2009-11-18 2009-11-18 Belichtungsanlage
PCT/EP2010/067010 WO2011061086A1 (de) 2009-11-18 2010-11-08 Belichtungsanlage

Publications (1)

Publication Number Publication Date
HK1171514A1 true HK1171514A1 (en) 2013-05-16

Family

ID=43530083

Family Applications (1)

Application Number Title Priority Date Filing Date
HK12112238.3A HK1171514A1 (en) 2009-11-18 2012-11-28 Exposure system

Country Status (6)

Country Link
US (1) US20130120727A1 (de)
JP (1) JP2013511737A (de)
CN (1) CN102741726B (de)
DE (1) DE102009046809B4 (de)
HK (1) HK1171514A1 (de)
WO (1) WO2011061086A1 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPWO2011129369A1 (ja) * 2010-04-13 2013-07-18 株式会社ニコン 露光装置、基板処理装置及びデバイス製造方法
DE102012108211A1 (de) 2012-09-04 2014-03-06 Kleo Halbleitertechnik Gmbh Belichtungsanlage
DE102017102320A1 (de) * 2017-02-07 2018-08-09 Manz Ag Bearbeitungsanlage
DE102017103624A1 (de) 2017-02-22 2018-08-23 Manz Ag Belichtungsanlage

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03264970A (ja) * 1990-03-15 1991-11-26 Ricoh Co Ltd レーザ書込装置
US5208796A (en) * 1991-01-03 1993-05-04 Xerox Corporation Method and apparatus for transverse image registration on photoreceptive belts
JP2886739B2 (ja) * 1992-07-22 1999-04-26 富士通株式会社 印刷装置用露光制御装置
DE4413829A1 (de) * 1994-04-20 1995-10-26 Deutsche Forsch Luft Raumfahrt Vorrichtung zur Erzeugung eines Bildes
DE19961502B4 (de) * 1998-12-22 2005-07-28 Ricoh Co., Ltd. Optische Scanvorrichtung und Bilderzeugungsvorrichtung
JP4401557B2 (ja) * 2000-11-15 2010-01-20 株式会社アドバンテスト 電子ビーム露光装置、電子ビーム補正方法、電子ビーム露光方法、及び半導体素子製造方法
US7453486B2 (en) * 2000-12-13 2008-11-18 Orbotech Ltd Pulse light pattern writer
WO2003036391A1 (fr) * 2001-10-25 2003-05-01 Toray Engineering Company,Limited Procede et dispositif de marquage d'un code d'identification par un faisceau laser
US7126735B1 (en) * 2005-05-20 2006-10-24 Konica Minolta Business Technologies, Inc. Optical scanning apparatus
JP2007010785A (ja) * 2005-06-28 2007-01-18 Fujifilm Holdings Corp 永久パターン形成方法
JP5218049B2 (ja) * 2006-05-31 2013-06-26 株式会社ニコン 露光装置及び露光方法
DE102006059818B4 (de) * 2006-12-11 2017-09-14 Kleo Ag Belichtungsanlage

Also Published As

Publication number Publication date
CN102741726B (zh) 2015-03-11
DE102009046809B4 (de) 2019-11-21
DE102009046809A1 (de) 2011-05-19
CN102741726A (zh) 2012-10-17
US20130120727A1 (en) 2013-05-16
JP2013511737A (ja) 2013-04-04
WO2011061086A1 (de) 2011-05-26

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20191108