HK1103809A1 - Extreme ultraviolet reticle protection apparatus and methods - Google Patents

Extreme ultraviolet reticle protection apparatus and methods

Info

Publication number
HK1103809A1
HK1103809A1 HK07112331.6A HK07112331A HK1103809A1 HK 1103809 A1 HK1103809 A1 HK 1103809A1 HK 07112331 A HK07112331 A HK 07112331A HK 1103809 A1 HK1103809 A1 HK 1103809A1
Authority
HK
Hong Kong
Prior art keywords
methods
extreme ultraviolet
protection apparatus
reticle protection
ultraviolet reticle
Prior art date
Application number
HK07112331.6A
Other languages
English (en)
Inventor
Michael Sogard
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of HK1103809A1 publication Critical patent/HK1103809A1/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G03F7/70875—Temperature, e.g. temperature control of masks or workpieces via control of stage temperature
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants

Landscapes

  • Health & Medical Sciences (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Toxicology (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
HK07112331.6A 2004-07-23 2007-11-12 Extreme ultraviolet reticle protection apparatus and methods HK1103809A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/898,475 US7030959B2 (en) 2004-07-23 2004-07-23 Extreme ultraviolet reticle protection using gas flow thermophoresis
PCT/US2005/025958 WO2006012462A1 (en) 2004-07-23 2005-07-21 Extreme ultraviolet reticle protection

Publications (1)

Publication Number Publication Date
HK1103809A1 true HK1103809A1 (en) 2007-12-28

Family

ID=35656764

Family Applications (1)

Application Number Title Priority Date Filing Date
HK07112331.6A HK1103809A1 (en) 2004-07-23 2007-11-12 Extreme ultraviolet reticle protection apparatus and methods

Country Status (7)

Country Link
US (2) US7030959B2 (zh)
EP (1) EP1771770A4 (zh)
JP (1) JP2008507848A (zh)
CN (1) CN1989452B (zh)
HK (1) HK1103809A1 (zh)
IL (1) IL180878A0 (zh)
WO (1) WO2006012462A1 (zh)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050223973A1 (en) * 2004-03-30 2005-10-13 Infineon Technologies Ag EUV lithography system and chuck for releasing reticle in a vacuum isolated environment
US7030959B2 (en) * 2004-07-23 2006-04-18 Nikon Corporation Extreme ultraviolet reticle protection using gas flow thermophoresis
US7259834B2 (en) * 2004-10-18 2007-08-21 Nikon Corporation Method and apparatus having a reticle stage safety feature
JP2006287003A (ja) * 2005-04-01 2006-10-19 Tohoku Univ 露光装置
US7554648B2 (en) * 2005-11-04 2009-06-30 Nikon Corporation Blind devices and methods for providing continuous thermophoretic protection of lithographic reticle
US7745079B2 (en) * 2006-03-09 2010-06-29 Nikon Corporation Apparatus for and method of thermophoretic protection of an object in a high-vacuum environment
JP2007281142A (ja) 2006-04-05 2007-10-25 Canon Inc 露光装置及び方法、並びに、デバイス製造方法
US20070285632A1 (en) * 2006-06-08 2007-12-13 Nikon Corporation EUVL reticle stage and reticle protection system and method
JP2008258477A (ja) * 2007-04-06 2008-10-23 Canon Inc 処理装置及び雰囲気置換方法
NL1036181A1 (nl) * 2007-11-30 2009-06-04 Asml Netherlands Bv A lithographic apparatus, a projection system and a device manufacturing method.
US8329260B2 (en) * 2008-03-11 2012-12-11 Varian Semiconductor Equipment Associates, Inc. Cooled cleaving implant
DE102008028868A1 (de) * 2008-06-19 2009-12-24 Carl Zeiss Smt Ag Optische Baugruppe
TWI427839B (zh) * 2010-12-03 2014-02-21 Ind Tech Res Inst 薄膜圖案的沉積裝置與方法
US20130235357A1 (en) * 2012-03-12 2013-09-12 Kla-Tencor Corporation System and Method for Particle Control Near A Reticle
KR102141138B1 (ko) * 2012-03-14 2020-08-05 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치
NL2010916A (en) 2012-07-06 2014-01-07 Asml Netherlands Bv A lithographic apparatus.
US9244368B2 (en) 2012-09-26 2016-01-26 Kla-Tencor Corporation Particle control near reticle and optics using showerhead
JP6328126B2 (ja) 2012-10-31 2018-05-23 エーエスエムエル ホールディング エヌ．ブイ． パターニングデバイス支持体、リソグラフィ装置及びパターニングデバイスの温度制御方法
US9389180B2 (en) 2013-02-15 2016-07-12 Kla-Tencor Corporation Methods and apparatus for use with extreme ultraviolet light having contamination protection
NL2012291A (en) * 2013-02-20 2014-08-21 Asml Netherlands Bv Gas flow optimization in reticle stage environment.
CN107111249A (zh) * 2014-12-31 2017-08-29 Asml控股股份有限公司 具有图案化装置环境的光刻设备
KR102502727B1 (ko) 2015-11-09 2023-02-23 삼성전자주식회사 레티클 및 그를 포함하는 노광 장치
US10088761B1 (en) * 2017-03-28 2018-10-02 Taiwan Semiconductor Manufacturing Co., Ltd. Lithography device and apparatus and method for lithography device
CN109524286B (zh) * 2017-09-20 2021-05-11 台湾积体电路制造股份有限公司 半导体晶圆加工方法、系统及系统的清洁方法
US10714371B2 (en) * 2017-11-16 2020-07-14 Taiwan Semiconductor Manufacturing Co., Ltd. Method and apparatus for lithography in semiconductor fabrication
US11156926B2 (en) * 2019-08-12 2021-10-26 Kla Corporation Vacuum actuator containment for molecular contaminant and particle mitigation
CN113210381B (zh) * 2021-04-14 2022-08-05 东软威特曼生物科技（沈阳）有限公司 用于清洗生化分析仪中比色杯的清洗组件及生化分析仪
CN117234032B (zh) * 2023-11-13 2024-02-06 睿晶半导体(宁波)有限公司 掩模版上污染物的去除方法及吹扫装置

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0394445A (ja) * 1989-09-06 1991-04-19 Mitsubishi Electric Corp 半導体ウエハ搬送システム
JP2860174B2 (ja) * 1991-03-05 1999-02-24 三菱電機株式会社 化学気相成長装置
JP3537843B2 (ja) * 1993-03-19 2004-06-14 株式会社テクノ菱和 クリーンルーム用イオナイザー
US5528118A (en) * 1994-04-01 1996-06-18 Nikon Precision, Inc. Guideless stage with isolated reaction stage
US5874820A (en) * 1995-04-04 1999-02-23 Nikon Corporation Window frame-guided stage mechanism
US6110844A (en) * 1995-09-29 2000-08-29 Sandia Corporation Reduction of particle deposition on substrates using temperature gradient control
JP3783973B2 (ja) 1996-03-22 2006-06-07 独立行政法人 日本原子力研究開発機構 減圧容器内におけるダスト回収方法
US6153044A (en) * 1998-04-30 2000-11-28 Euv Llc Protection of lithographic components from particle contamination
US6072157A (en) * 1998-12-11 2000-06-06 Euv Llc Thermophoretic vacuum wand
US6106634A (en) * 1999-02-11 2000-08-22 Applied Materials, Inc. Methods and apparatus for reducing particle contamination during wafer transport
TW480372B (en) * 1999-11-05 2002-03-21 Asm Lithography Bv Lithographic projection apparatus, method of manufacturing a device using the apparatus, and device manufactured according to the method
TW563002B (en) * 1999-11-05 2003-11-21 Asml Netherlands Bv Lithographic projection apparatus, method of manufacturing a device using a lithographic projection apparatus, and device manufactured by the method
US6492067B1 (en) * 1999-12-03 2002-12-10 Euv Llc Removable pellicle for lithographic mask protection and handling
JP2002151400A (ja) * 2000-11-15 2002-05-24 Canon Inc 露光装置、その保守方法並びに同装置を用いた半導体デバイス製造方法及び半導体製造工場
EP1256844A1 (en) * 2001-05-09 2002-11-13 ASML Netherlands B.V. Lithographic apparatus
JP2002373852A (ja) * 2001-06-15 2002-12-26 Canon Inc 露光装置
US7159719B2 (en) * 2003-07-31 2007-01-09 Intel Corporation Thermophoretic protection of reticles
JP2006049815A (ja) * 2004-07-02 2006-02-16 Canon Inc 露光装置
US7030959B2 (en) * 2004-07-23 2006-04-18 Nikon Corporation Extreme ultraviolet reticle protection using gas flow thermophoresis
JP2006198577A (ja) * 2005-01-24 2006-08-03 Canon Inc 微粒子の分級方法および成膜方法
JP2006269942A (ja) * 2005-03-25 2006-10-05 Canon Inc 露光装置及びデバイス製造方法
US7745079B2 (en) * 2006-03-09 2010-06-29 Nikon Corporation Apparatus for and method of thermophoretic protection of an object in a high-vacuum environment
US20070285632A1 (en) * 2006-06-08 2007-12-13 Nikon Corporation EUVL reticle stage and reticle protection system and method

Also Published As

Publication number Publication date
WO2006012462A1 (en) 2006-02-02
CN1989452B (zh) 2010-05-26
US7030959B2 (en) 2006-04-18
IL180878A0 (en) 2007-07-04
JP2008507848A (ja) 2008-03-13
CN1989452A (zh) 2007-06-27
US20070121091A1 (en) 2007-05-31
EP1771770A1 (en) 2007-04-11
US20060017895A1 (en) 2006-01-26
EP1771770A4 (en) 2011-02-16

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20150721